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Status of ALD MCP Program at Argonne within last Six Months
Qing Peng, Anil Mane, Joe Libera, Jeffrey Elam
Energy Systems Division
MCP Structure
2
1) resistive coating (ALD)2) emissive coating (ALD)3) conductive coating (thermal evaporation)
pore
Work Plan and Deliverables
Year 1• Emissive coatings• Resistive coatings
Year 2• Stripe coating (“Dynode Chain”)• MCPs from AAO templates• Begin scale-up
Year 3• Scale-up
3
Majority of Year One goals completed!!!
Six months Ago
Only ALD available
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Right NowNew Hardware: Measurement
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Mercury probe – conductance of thin films in air, computer controlled
Fixture for electrode evaporation with end
spoiling on 3 MCPs
Vacuum setup – HV conductance and
thermal coefficient of MCPs
Shadow mask – measure lateral resistance of thin films
Order placed
Various substrate holdersHave been built
General procedures for Fabrication of MCPs
Pristine MCPs
Acetone sonication clean
Air dry at 200C >2h
Loading in Vacuum reactor
Ozone cleanALD coatingsBaking at 400C under N2
Electrode coating
Testing resistance
Deliver for testing
30mins 2 hrs
2 hrs
10 hrs6 hrs
3 hrs
4 hrs
For fabricating one pair MCPs: ~20-30hrs
if everything is right
Resistive Coatings: Al2O3/ZnO (AZO)
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Good: existing process Bad: hard to control (etching of ZnO by trimethyl
aluminum precursor) Can we make working MCPs with AZO?
Still working on it Problem:
Big slope (105 resistance change over 10% composition change)
Etching of ZnO by trimethyl aluminum precursor
Strong dependence of resistivity on Annealing conditions
Strong dependence of resistivity on environment
etching
AZO can be prepared by a variety of methods
Unable to eliminate etching
120C
100C
80C
60C40C
25C
Temperature dependence of 20% AZO conductivity
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Gas chromatograph (GC) for temperature control
MCPs in in GC with leads
Standard Glass MCP: βT=-0.02Micromachined silica MCP: βT=-0.036
Commercial MCP (using our setup): βT=-0.04520% AZO MCP: βT=-0.06
Resistive coatings: MgO/ZnO (MZO)
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No etching in MZO Resistance is tunable MgO is candidate for SEY layer No MCPs made yet with MZO
Thic
knes
s (A
ngst
rom
s)
Quartz Microbalance Data:
Will work more on this system.
Resistive Coatings: “New Chemistry 1”
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No etching Resistance is tunable, small slope (102 over 10%) Very reproducible (different locations, different batches) MCPs work: (20 micron, 60 L/D, 1x106 gain at 1200V) 11 MCPs to testing group
Relative Composition
MCP
Res
ista
nce
(Ohm
s)
Temperature coefficient – “New1”
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Standard Glass MCP (literature): βT=-0.02Commercial MCP (using our setup): βT=-0.045
20% AZO MCP: βT=-0.06New1: βT=-0.027
20 30 40 50 60 70 80 90 100 11014
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16
17
18
19
20
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Ln
(R)
Temperature(C)
Equation y = a + b*x
Weight No Weighting
Residual Sum of Squares
0.00525
Adj. R-Square 0.99797
Value Standard Error
C1 Intercept 17.17536 0.03004
C1 Slope -0.02567 4.37411E-4
Equation y = a + b*x
Weight No Weighting
Residual Sum of Squares
0.03945
Adj. R-Square 0.99008
Value Standard Error
C1Intercept 21.12667 0.06888
Slope -0.02948 0.00104
Emissive Coatings
Substrates: • Si(100) - conductive, smooth, flat,
cheap• Photonis MCPs• ALD MCPs
Films:
• Al2O3, MgO, SiO2, ZnO/Al2O3
• 1-100 nm
Major parameters to investigate:• Annealing conditions• Deposition conditions
55 samples to characterization group Goals:
• Manuscript on ALD emissive coatings• Optimal thickness and composition
for ALD MCPs
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ALD
No ALD
Electrode Deposition
Thermal evaporator (Au)• Hau Wang, MSD: Au has poor adhesion, can’t do endspoiling
E-beam coaters (NiCr)• Orlando Auciello, MSD• Beihai Ma, ES• Robert Erck, ES • John Pearson, MSD • Wai Kwok, MSD• Eileen Hahn (FermiLab) • CNM
Proposal accepted, Ebeam working for three weeks. Can’t do endspoiling
• Outside ANL: Clausing, Arradiance, Photonis (sent samples 3 weeks ago) Electrode first???
Future Plans
AZO: • Manuscript on AZO MCPs• Explore anisotropy of conductance (thru film vs. across film)
MZO: • Manuscript on “ALD method”• Make and test MCPs
“New1”: • Complete study• Continue making and testing MCPs
“New2”, “New3”… Scale-up
• large area coater, Beneq (4/26/10)
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