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2005 ITRS Work in Progress – Do Not Publish 1 International Technology Roadmap for Semiconductors 2005 ITRS/ORTC Product Models For Public 12/13/05 Conference Seoul, Korea (Rev 1, 12/12/05)

2005 ITRS Work in Progress – Do Not Publish 1 International Technology Roadmap for Semiconductors 2005 ITRS/ORTC Product Models For Public 12/13/05 Conference

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Page 1: 2005 ITRS Work in Progress – Do Not Publish 1 International Technology Roadmap for Semiconductors 2005 ITRS/ORTC Product Models For Public 12/13/05 Conference

2005 ITRS Work in Progress – Do Not Publish

1

International Technology Roadmap for Semiconductors

2005 ITRS/ORTC Product ModelsFor Public 12/13/05 Conference

Seoul, Korea

(Rev 1, 12/12/05)

Page 2: 2005 ITRS Work in Progress – Do Not Publish 1 International Technology Roadmap for Semiconductors 2005 ITRS/ORTC Product Models For Public 12/13/05 Conference

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2

ORTC Overview - 2005 ITRS Proposals• Recommendation for one standard TWG table technology trend header

– Presently continue to use DRAM stagger-contacted M1 as typical industry lithography driver – UNCHANGED from the 2003/2004 Roadmap Update

– Remove ITRS single-product “node” label emphasis, to minimize industry guidance confusion; as we transition to product-oriented technology trend drivers and cycles*

• ORTC Table 1a,b - adjusted to Proposed Japan (STRJ) MPU/ASIC M1 Half-Pitch Trend

– Stagger-contacted, same as DRAM– 2.5-year Technology Cycle* (.5x/5yrs) – 180nm/2000; 90nm/2005; 45nm/2010(equal DRAM)– Then continue on a 3-year Technology Cycle*, equal to DRAM 2010-2020

• ORTC Table 1a,b - added Proposed STRJ Flash Poly (Un-contacted dense lines)– 2-year Technology Cycle* (0.5x/4yrs)– 180nm/2000; 130nm/2002; 90nm/2004; 65nm/2006– Then 3-year Technology Cycle* 1 year ahead of DRAM ’06-’20

• ORTC Table 1a,b – adjusted MPU/ASIC Printed Gate Length to FEP and Litho TWG agreement for ratio relationship to Final Physical Gate Length, which remains UNCHANGED from the 2005 ITRS targets (3-year cycle* after 2005)

• TWG table Product-specific technology trend driver header items to be added to individual TWG tables from ORTC Table 1a&b

• Chip Size Models connected to proposals and historical trends, incl. new Flash Model

– Function Size [Logic Gate; SRAM Cell; Dram Cell; Flash Cell (SLC, MLC)]– Functions/Chip [Flash; DRAM; High Performance (hp) MPU; Cost Perf. (cp) MPU]– Chip Size [hp MPU; cp MPU; DRAM; Flash]

*Note: Cycle = time to 0.5xlinear scaling every two

cycle periods ~ 0.71x/ cycle

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Source: 2003 ITRS - Exec. Summary Fig 4

2003/2004 ITRS Definition of the Half Pitch - WAS [DRAM half-pitch determines the 2003 ITRS “node”]

Metal Pitch

Typical DRAM Metal Bit Line

DRAM ½ Pitch = DRAM Metal Pitch/2

Poly Pitch

Typical MPU/ASIC Un-contacted Poly

MPU/ASIC Poly Silicon ½ Pitch = MPU/ASIC Poly Pitch/2

Typical MPU/ASICContacted Metal 1

MPU/ASIC M1 ½ Pitch = MPU/ASIC M1 Pitch/2

Metal 1 (M1) Pitch

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2005 Definition of the Half Pitch – IS[No single-product “node” designation; DRAM half-pitch still litho driver; however,

other product technology trends may be drivers on individual TWG tables]

Metal Pitch

Typical DRAM/MPU/ASIC Metal Bit Line

DRAM ½ Pitch = DRAM Metal Pitch/2

MPU/ASIC M1 ½ Pitch = MPU/ASIC M1 Pitch/2 Poly

Pitch

Typical flash Un-contacted Poly

FLASH Poly Silicon ½ Pitch = Flash Poly Pitch/2

8-16 Lines

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Production Ramp-up Model and Technology NodeV

olu

me

(Par

ts/M

on

th)

1K

10K

100K

Months0-24

1M

10M

100M

Alpha

Tool

12 24-12

Development Production

Beta

Tool

Production

Tool

First

Conf.

Papers

First Two Companies

Reaching Production

Vo

lum

e (W

afer

s/M

on

th)

2

20

200

2K

20K

200K

Source: 2003 ITRS - Exec. Summary Fig 2

Fig 2 [UNCHANGED, except for “node” reference] IS: Cycle Timing

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hp22hp32hp45hp65hp90

20182016

20152013

20122010

20092007

20062004

20032002[Actual]

Year of Production

hp130Technology Node (nm)

WAS: 2003 ITRS Technology Nodes: 3-year cycle*

3-Year Technology Cycle2-Year Technology Cycle [1998-2002actual]

Note: Faster introduction of half-poly pitch from Flash is expected; and Doubling of transistors every 2 years from MPU/ASIC is expected.* Cycle Time = one-half of the time to reach a technology trend reduction to 0.5x

Source: 2003 ITRS - Exec. Summary

Past Future

DRAM hpXX “Node” designationWas added in 2003 ITRS

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Note: Faster introduction of half-poly pitch from Flash is expected; Doubling of transistors every 2 years from MPU/ASIC is expected

2005 ITRS Flash Poly Half-Pitch Technology: 2.0-year cycle until 1yr ahead of DRAM @65nm/’06

3-Year Technology Cycle2-Year Technology Cycle [’98-’06 ]

Year of Production

Technology -UncontactedPoly H-P (nm)

2003 20052001

65 223245 16

2008

20062002[Actual]

20042000[Actual]

90130180

76107151 5057 13

201520122009 2018

201620132010 2019 2020

2005 ITRS MPU M1 Half-Pitch Technology: 2.5-year cycle; then equal DRAM @45nm/2010

Year of Production

Technology- ContactedM1 H-P (nm)

157 136 119 103 78 68 59 52

201620132010 2019[July’08][July’02] 20052000

201820152012 2020

[130]180 [ 65]90 2232 1645

2008200620032001 2002 2004 2007 2009

2.5-Year Technology Cycle3-2-Yr Cycle] 3-Year Technology Cycle

14

IS: 2005 (’05-’20) ITRS Technology Trends DRAM M1 Half-Pitch : 3-year cycle

3-Year Technology Cycle2-Year Technology Cycle [‘98-’04]

Year of Production

Technology - ContactedM1 H-P (nm)

201820152012 2020

201620132010 2019

2003 20052001

65 223245 16

20082006 2009

20072002[Actual]

20042000[Actual]

90130180

80107151 71 57 50 14

10

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Figure 7& 8 ITRS Product Technology TrendsFig 7&8 Simplified – Option 1

2005 ITRS Product Technology Trends - Half-Pitch, Gate-Length

1.0

10.0

100.0

1000.0

1995 2000 2005 2010 2015 2020

Year of Production

Pro

du

ct H

alf-

Pit

ch, G

ate-

Len

gth

(n

m)

DRAM M1 1/2 Pitch

MPU M1 1/2 Pitch(2.5-year cycle)

Flash Poly 1/2 Pitch

MPU Gate Length -Printed

MPUGate Length -Physical

MPU M1.71X/2.5YR

Nanotechnology (<100nm) Era Begins -1999

GLpr IS =1.6818 x GLph

2005 - 2020 ITRS Range

MPU & DRAM M1& Flash Poly

.71X/3YR

Flash Poly.71X/2YR

Gate Length.71X/3YR

Before 1998 .71X/3YR

After 1998.71X/2YR

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2005 ITRS Product Function Size Trends - Cell Size, Logic Gate(4t) Size

1.E-04

1.E-03

1.E-02

1.E-01

1.E+00

1.E+01

2000 2005 2010 2015 2020

Year of Production

Cel

l, L

og

ic G

ate

Siz

e(u

m2

)

DRAM Cell Size (u2)

Flash Cell Size (u2)SLC(NEW)

Flash Eqv.bit Size(u2)MLC(NEW)

MPU SRAM Cell Size(6t)(u2)

MPU Gate Size (4t)(u2)

Note for Flash: SLC = Single-Level-Cell Size

MLC =Multi-Level-Cell

(Electrical Equivalent) Cell Size

2005 - 2020 ITRS Range

Figure xx ITRS Product Function Size (NEW)Fig xx Simplified

(@ 2 MLC bits/physical cell area)

Flash: 4f2 LastDesign Physical AreaFactor Improvement

DRAM: 5f2 LastDesign Area

Factor Improvement

Logic Gate: NODesign Area

Factor Improvement(Only Scaling)

SRAM: GradualDesign Area

Factor Improvement

Flash: (MLC @ 2 bits/cell =

2f2 EquivalentArea Factor)

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Moore’s Law After 40 years (functions per chip)

1,000

10,000

100,000

1,000,000

10,000,000

100,000,000

1,000,000,000

10,000,000,000

1970 1980 1990 2000 2010

40048080

8086

8008

Pentium® Processor

486™ DX Processor386™ Processor

286

Pentium® II Processor

Pentium® III Processor

Itanium® Processor

Pentium® 4 Processor

Itanium® 2 Processor2X/2YR

2X/1YR

2X/2YR

Source: Intel® Corp.Past Future

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2005 ITRS Product Technology Trends Functions/Chip

1.E-06

1.E-05

1.E-04

1.E-03

1.E-02

1.E-01

1.E+00

1.E+01

1.E+02

1.E+03

1970 1975 1980 1985 1990 1995 2000 2005 2010 2015 2020

Year of Production

Pro

duct

Fun

ctio

ns/C

hip

(Gig

a (1

0^9)

- b

its, t

rans

isto

rs )

Flash Bits/Chip (Gbits) Single-Level-Cell(SLC )

Flash Bits/Chip (Gbits) Multi-Level-Cell(MLC)

MPU GTransistors/Chip - high-performance(hp)

MPU GTransistors/Chip - cost-performanc(cp)

DRAM Bits/Chip (Gbits)

Average Industry "Moores Law"

Chip Size Trends – 2005 ITRS Functions/Chip Model Proposal IS

Past Future2005 - 2020 ITRS Range

AverageIndustry 1970-2020

“Moore’s Law”2x Functions/chip

Per 2 years

(@Volume Production, Affordable Chip Size**)

** Affordable Production

Chip Size Targets:DRAM, Flash < 145mm2

hp MPU < 310mm2

cp MPU < 140mm2

** Example Chip Size Targets:1.1Gt P07h MPU

@ intro in 2004/620mm2

@ prod in 2007/310mm2

** Example Chip Size Targets:0.39Gt P07c MPU

@ intro in 2004/280mm2

@ prod in 2007/140mm2

MPU ahead or =“Moore’s Law”2x Xstors/chipPer 2 years Thru 2010

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2005 ITRS Product Technology Trends - Functions per Chip

1.E-02

1.E-01

1.E+00

1.E+01

1.E+02

1.E+03

1995 2000 2005 2010 2015 2020

Year of Production

Pro

du

ct F

un

ctio

ns/

Ch

ip[

Gig

a (1

0^9)

- b

its,

tra

nsi

sto

rs ]

Flash Bits/Chip (Gbits)Single-Level-Cell (SLC )

Flash Bits/Chip (Gbits)Multi-Level-Cell (MLC)

MPU GTransistors/Chip -high-performance (hp)

MPU GTransistors/Chip -cost-performanc (cp)

DRAM Bits/Chip (Gbits)

Average Industry "Moores Law"

2005 - 2020 ITRS Range

AverageIndustry 1970-2020

“Moore’s Law”2x Functions/chip

Per 2 years

Figure yy ITRS Product Functions per Chip (NEW)

Page 13: 2005 ITRS Work in Progress – Do Not Publish 1 International Technology Roadmap for Semiconductors 2005 ITRS/ORTC Product Models For Public 12/13/05 Conference

2005 ITRS Work in Progress – Do Not Publish

13Past Future 2005 - 2020 ITRS Range

Chip Size Trends – 2003/04 vs.2005 ITRS DRAM & Flash (NEW) Model IS

2005 Proposal ITRS DRAM Chip Size Model(Rev 1K, 06/23/05)

0

100

200

300

400

500

600

700

1995 1998 2001 2004 2007 2010 2013 2016 2019 2022 2025

Year of Introduction and Production

(mm

2) DRAM Introduction Chip Size

Sawada Production Chip Size IS

4 chips per Litho Field @ 572mm2 = 143mm2

(22x6.5)

4G 8G 32G 64G16G

Bits/

chip: 128G64M

Bits/

chip:

256M

128G

1G 2G

4G

8G 32G 64G

16G

256G 1T

512M

Prod Cell Area Efficiency (CAE) = 63%-56%

Intro Cell Area Efficiency (CAE) = 73%-75%

90 64 45 22 1632 11 8

5 chips per Litho Field @ 704mm2 = 141mm2

(22x6.4)

WAS/IS: 128180255360

128M

32G

16G

4G

8G

2G

32G

16G

64G2G

8.0 6.011 8.0 8.0 8.0 6.0 6.0 6.06.0DRAM Des.

Factor: 11 6.0 6.0

DRAM

Max Litho Field 2005 ITRS (4x) : 834mm2 (26x32)

2 C

hip

s p

er

Ma

x L

itho

Fie

ld 2

00

5

ITR

S (

4x)

: 4

17

m2

(2

6x

16

)

Page 14: 2005 ITRS Work in Progress – Do Not Publish 1 International Technology Roadmap for Semiconductors 2005 ITRS/ORTC Product Models For Public 12/13/05 Conference

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14Past Future 2005 - 2020 ITRS Range

Chip Size Trends – 2003/04 vs.2005 ITRS Flash (NEW) Model IS2005 Proposal ITRS Flash chip Size (NEW) Model (Allan)

(Rev 1K, 06/23/05)

0

100

200

300

400

500

600

700

1995 1998 2001 2004 2007 2010 2013 2016 2019 2022 2025

Year of Introduction and Production

(mm

2)

Flash SLC Production Chip Size

4 chips per Max Affordable Litho Field @

572mm2 = 143mm2 (22x6.5)

Flash Prod Cell Area Efficiency (CAE) = 67%

Flash Intro Cell Area Efficiency (CAE) =TBD -

no model

5 chips per Max Affordable Litho Field @

704mm2 = 141mm2 (22x6.4)

Flash

Bits/chip: 4G 8G 16G 32G 64G 128G256M 1G64M 2G

16 4.032 8.0 4.0 4.0 4.0 4.0 4.04.0 Flash SLC

Des.Factor: 4.0 4.0

128180255360Flash: 90 64 45 22 1632 11 8WAS/IS: 128180255360

8.0 6.011 8.0 8.0 8.0 6.0 6.0 6.06.011 6.0 6.0

90 64 45 22 1632 11 8

DRAM

HP

DRAM Des.

Factor:

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2005 Proposal ITRS MPU Chip Size Model (Rev 1K, 06/23/05)

0

100

200

300

400

500

600

700

1995 1998 2001 2004 2007 2010 2013 2016 2019 2022 2025

Year of Introduction and Production

(mm

2)

MPU hp Production Chip Size

MPU cp Production Chip Size

MPU hp Introduction Chip Size

MPU cp Introduction Chip Size

DRAM

HP

8G

SRAM Cell Efficiency= 60%Logic Gate Efficiency = 50%

p13c1.5Bt

p16c3.1

p19c p22c

800

Max Litho Field 2005 ITRS (4x): 834mm2 (26x32)

2 C

hip

s p

er

Ma

x L

itho

Fie

ld

2

00

5 I

TR

S (

4x)

: 4

17

m2

(2

6x

16

)

Max Litho Field - Future ITRS? (8x): 208mm2 (13x16)?

p07h1.1Bt

p10h2.2Bt

p07h

1.1Bt

p16h p19h p22hp10h

2.2Bt

p13h

4.4Bt

p02h276Mt

p00h138Mt

p98h69Mt

p04h552Mt

p10c768Mt

hp MPU = 82% SRAM Transistors, 18% Core Logic Transistors

cp MPU = 58% SRAM Transistors, 42% Core Logic Transistors

p02h

276Mt

p04h

552Mt

26% / 2yrsChip Size Growth

p04c192Mt

p02c96Mt

p00c48Mt

p07c384Mt

p07c384Mt

p10c768Mt

p04c96Mt

p02c96Mt

p00c48Mt

p13c1.5Bt

Affordable hp MPU prod Target: 310mm2

Affordable cp MPU prod Target: 140mm2

90 64 45 22 1632 11 8WAS/IS: 12818025536090 68 45 22 1632 11 8

[2

MPU: 136180255360 [2.5yr Technology Cycle

2000- 2010]

Past Future 2005 - 2020 ITRS Range

Chip Size Trends – 2005 ITRS MPU Model Proposal IS

Page 16: 2005 ITRS Work in Progress – Do Not Publish 1 International Technology Roadmap for Semiconductors 2005 ITRS/ORTC Product Models For Public 12/13/05 Conference

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Summary• DRAM Model stagger-contacted M1 is unchanged from

2003/2004 Update ITRS (single-“Node” reference removed)• MPU Revised M1 to stagger-contact half-pitch (same as

DRAM) and 2.5-year cycle* through 2010, then 3-year cycle* same as DRAM

• New Flash Model Added for un-contacted poly half-pitch and equal to DRAM contacted, but continues on 2-year cycle* to 1 year ahead of DRAM in 2006, then 3-year cycle* same as DRAM

• Printed MPU/ASIC Gate Length adjusted to new FEP and Litho TWGs ratio agreement, but Physical GL unchanged and on 3-year cycle* beginning 2005

• Historical chip size models “connected” to new Product model proposals, including design factors, function size, and array efficiencies

• Average industry product “Moore’s Law” met or exceeded throughout 2005-2020 ITRS timeframe

[* ITRS Cycle definition = time to .5x linear scaling every two cycle periods]

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Backup

Note: ITRS Table Colorization Code Reference:

Manufacturable solutions exist, and are being optimized

Manufacturable solutions are known Interim solutions are known

Manufacturable solutions are NOT known

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ORTC Table 1a,b (Near, Long Term) (Draft 04 review 10/31/05):

Table 1a Product Generations and Chip Size Model Technology Trend Targets—Near-term Years Year of Production 2005 2006 2007 2008 2009 2010 2011 2012 2013

DRAM ½ Pitch (nm) (contacted) 80 70 65 57 50 45 40 36 32

MPU/ASIC Metal 1 (M1) ½ Pitch (nm) 90 78 68 59 52 45 40 36 32

MPU Printed Gate Length (nm) †† 54 48 42 38 34 30 27 24 21

MPU Physical Gate Length (nm) 32 28 25 23 20 18 16 14 13 ASIC/Low Operating Power Printed Gate Length (nm) ††

76 64 54 48 42 38 34 30 27

ASIC/Low Operating Power Physical Gate Length (nm)

45 38 32 28 25 23 20 18 16

Flash ½ Pitch (nm) (un-contacted Poly)(f) 76 64 57 51 45 40 36 32 28

Table 1b Product Generations and Chip Size Model Technology Trend Targets—Long-term Years Year of Production 2014 2015 2016 2017 2018 2019 2020

DRAM ½ Pitch (nm) (contacted) 28 25 22 20 18 16 14

MPU/ASIC Metal 1 (M1) ½ Pitch (nm) 28 25 22 20 18 16 14

MPU Printed Gate Length (nm) †† 19 17 15 13 12 11 9

MPU Physical Gate Length (nm) 11 10 9 8 7 6 6

ASIC/Low Operating Power Printed Gate Length (nm) †† 24 21 19 17 15 13 12

ASIC/Low Operating Power Physical Gate Length (nm) 14 13 11 10 9 8 7

Flash ½ Pitch (nm) (un-contacted Poly)(f) 25 23 20 18 16 14 13

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ORTC DRAM & Flash Prod Table 1c (Near Term) (Draft 04 review 10/31/05):Table 1c DRAM & Flash Production Product Generations and Chip Size Model—Near-term Years

Year of Production 2005 2006 2007 2008 2009 2010 2011 2012 2013

DRAM ½ Pitch (nm) (contacted) 80 70 65 57 50 45 40 36 32

MPU/ASIC Metal 1 (M1) ½ Pitch (nm) 90 78 68 59 52 45 40 36 32

MPU Physical Gate Length (nm) 32 28 25 23 20 18 16 14 13

DRAM Product Table

Cell area factor [a] 8 8 8 6 6 6 6 6 6

Cell area [Ca = af2] (mm2) 0.051 0.041 0.032 0.019 0.015 0.012 0.0096 0.0077 0.0061

Cell array area at production (% of chip size) § 63.00% 63.00% 63.00% 56.08% 56.08% 56.08% 56.08% 56.08% 56.08%

Generation at production § 1G 2G 2G 2G 4G 4G 4G 8G 8G

Functions per chip (Gbits) 1.07 2.15 2.15 2.15 4.29 4.29 4.29 8.59 8.59

Chip size at production (mm2)§ 88 139 110 74 117 93 74 117 93

Gbits/cm2 at production § 1.22 1.54 1.94 2.91 3.66 4.62 5.82 7.33 9.23

Flash Product Table Alternate STRJ Proposal (Cross-over DRAM) Flash ½ Pitch (nm) (un-contacted Poly)(f)

75.7 63.6 56.7 50.5 45.0 40.1 35.7 31.8 28.3

Alternate STRJ Proposal (Cross-over DRAM) Cell area factor [a]

4.0 4.0 4.0 4.0 4.0 4.0 4.0 4.0 4.0

Cell area [Ca = af2] (mm

2) 0.023 0.016 0.013 0.010 0.008 0.006 0.005 0.004 0.003

Cell array area at production (% of chip size) § 67.5% 67.5% 67.5% 67.5% 67.5% 67.5% 67.5% 67.5% 67.5%

Generation at production § SLC 4G 4G 4G 8G 8G 8G 16G 16G 16G

Generation at production § MLC 8G 8G 8G 16G 16G 16G 32G 32G 32G

Functions per chip (Gbits) SLC 4.29 4.29 4.29 8.59 8.59 8.59 17.18 17.18 17.18

Functions per chip (Gbits) MLC 8.59 8.59 8.59 17.18 17.18 17.18 34.36 34.36 34.36

Chip size at production (mm2)§ SLC 144 101.8 80.8 128.3 101.8 80.8 128.3 101.8 80.8

Chip size at production (mm2)§ MLC 144 101.8 80.8 128.3 101.8 80.8 128.3 101.8 80.8

Gbits/cm2 at production § SLC 3E+09 4.2E+09 5.3E+09 6.7E+09 8.4E+09 1.1E+10 1.3E+10 1.7E+10 2.1E+10

Gbits/cm2 at production § MLC 6E+09 8.4E+09 1.1E+10 1.3E+10 1.7E+10 2.1E+10 2.7E+10 3.4E+10 4.3E+10

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ORTC DRAM & Flash Prod Table 1d (Long Term) (Draft 04 review 10/31/05):Table 1d DRAM & Flash Production Product Generations and Chip Size Model—Long-term Years

Year of Production 2014 2015 2016 2017 2018 2019 2020

DRAM ½ Pitch (nm) (contacted) 28 25 22 20 18 16 14

MPU/ASIC Metal 1 (M1) ½ Pitch (nm) 28 25 22 20 18 16 14

MPU Physical Gate Length (nm) 11 10 9 8 7 6 6

DRAM Product Table

Cell area factor [a] 6 6 6 6 6 6 6

Cell area [Ca = af2] (mm2) 0.0048 0.0038 0.0030 0.0024 0.0019 0.0015 0.0012

Cell array area at production (% of chip size) § 56.08% 56.08% 56.08% 56.08% 56.08% 56.08% 56.08%

Generation at production § 8G 16G 16G 16G 32G 32G 32G

Functions per chip (Gbits) 8.59 17.18 17.18 17.18 34.36 34.36 34.36

Chip size at production (mm2)§ 74 117 93 74 117 93 74

Gbits/cm2 at production § 11.63 14.65 18.46 23.26 29.31 36.93 46.52

Flash Product Table Alternate STRJ Proposal (Cross-over DRAM) Flash ½ Pitch (nm) (un-contacted Poly)(f)

25.3 22.5 20.0 17.9 15.9 14.2 12.6

Alternate STRJ Proposal (Cross-over DRAM) Cell area factor [a] 4.0 4.0 4.0 4.0 4.0 4.0 4.0

Cell area [Ca = af2] (mm

2) 0.003 0.002 0.002 0.001 0.001 0.001 0.001

Cell array area at production (% of chip size) § 67.5% 67.5% 67.5% 67.5% 67.5% 67.5% 67.5%

Generation at production § SLC 32G 32G 32G 64G 64G 64G 128G

Generation at production § MLC 64G 64G 64G 128G 128G 128G 256G

Functions per chip (Gbits) SLC 34.36 34.36 34.36 68.72 68.72 68.72 137.44

Functions per chip (Gbits) MLC 68.72 68.72 68.72 137.44 137.44 137.44 274.88

Chip size at production (mm2)§ SLC 128.3 101.8 80.8 128.3 101.8 80.8 128.3

Chip size at production (mm2)§ MLC 128.3 101.8 80.8 128.3 101.8 80.8 128.3

Gbits/cm2 at production § SLC 2.7E+10 3.4E+10 4.3E+10 5.4E+10 6.7E+10 8.5E+10 1.1E+11

Gbits/cm2 at production § MLC 5.4E+10 6.7E+10 8.5E+10 1.1E+11 1.3E+11 1.7E+11 2.1E+11

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ORTC Table DRAM Intro 1e,f (Near, Long Term) (Draft 04 review 10/31/05):

Table 1e DRAM Introduction Product Generations and Chip Size Model—Near-term Years Year of Production 2005 2006 2007 2008 2009 2010 2011 2012 2013

DRAM ½ Pitch (nm) (contacted) 80 70 65 57 50 45 40 36 32

MPU/ASIC Metal 1 (M1) ½ Pitch (nm) (f) 90 78 68 59 52 45 40 36 32

MPU Physical Gate Length (nm) 32 28 25 23 20 18 16 14 13

Cell area factor [a] 8 8 8 6 6 6 6 6 6

Cell area [Ca = af2] (mm2) 0.051 0.041 0.032 0.019 0.015 0.012 0.010 0.008 0.006

Cell array area at introduction (% of chip size) § 72.95% 73.25% 73.52% 73.76% 73.97% 74.16% 74.30% 74.47% 74.61%

Generation at introduction § 8G 8G 16G 16G 16G 32G 32G 32G 64G

Functions per chip (Gbits) 8.59 8.59 17.18 17.18 17.18 34.36 34.36 34.36 68.72

Chip size at introduction (mm2) § 606 479 757 449 356 563 446 353 560

Gbits/cm2 at introduction § 1.42 1.79 2.27 3.82 4.83 6.10 7.70 9.73 12.28

Table 1f DRAM Introduction Product Generations and Chip Size Model—Long-term Years Year of Production 2014 2015 2016 2017 2018 2019 2020

DRAM ½ Pitch (nm) (contacted) 28 25 22 20 18 16 14

MPU/ASIC Metal 1 (M1) ½ Pitch (nm) (f) 28 25 22 20 18 16 14

MPU Physical Gate Length (nm) 11 10 9 8 7 6 6

Cell area factor [a] 6 6 6 6 6 6 6

Cell area [Ca = af2] (mm2) 0.005 0.004 0.003 0.002 0.002 0.002 0.001

Cell array area at introduction (% of chip size) § 74.70% 74.83% 74.93% 75.00% 75.09% 75.18% 75.27%

Generation at introduction § 64G 64G 128G 128G 128G 256G 256G

Functions per chip (Gbits) 68.72 68.72 137.44 137.44 137.44 274.88 274.88

Chip size at introduction (mm2) § 444 351 557 442 350 555 440

Gbits/cm2 at introduction § 15.49 19.55 24.67 31.11 39.24 49.50 62.44

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ORTC MPU cp Table 1g (Near Term) (Draft 04 review 10/31/05):Table 1g MPU (High-volume Microprocessor) Cost-Performance Product Generations and

Chip Size Model—Near-term Years Year of Production 2005 2006 2007 2008 2009 2010 2011 2012 2013

DRAM ½ Pitch (nm) (contacted) 80 70 65 57 51 45 40 36 32

MPU/ASIC Metal 1 (M1) ½ Pitch (nm) (f) 90 78 68 59 52 45 40 36 32

MPU Physical Gate Length (nm) 32 28 25 23 20 18 16 14 13

SRAM Cell (6-transistor) Area factor ++ 115.6 113.7 111.9 110.4 109.0 107.8 106.7 105.7 104.8

SRAM Cell (6-transistor) Area factor ++ 91.8 94.5 97.5 100.7 104.1 107.8 106.7 105.7 104.8

Logic Gate (4-transistor) Area factor ++ 320 320 320 320 320 320 320 320 320

Logic Gate (4-transistor) Area factor ++ 254 266 279 292 306 320 320 320 320

SRAM Cell (6-transistor) Area efficiency ++ 0.63 0.63 0.63 0.63 0.63 0.63 0.63 0.63 0.63

Logic Gate (4-transistor) Area efficiency ++ 0.50 0.50 0.50 0.50 0.50 0.50 0.50 0.50 0.50

SRAM Cell (6-transistor) Area ++ 0.74 0.58 0.45 0.35 0.28 0.22 0.17 0.13 0.11

SRAM Cell (6-transistor) Area w/overhead ++ 1.2 0.93 0.73 0.57 0.45 0.35 0.27 0.22 0.17

Logic Gate (4-transistor) Area ++ 2.06 1.63 1.30 1.03 0.82 0.65 0.51 0.41 0.32

Logic Gate (4-transistor) Area w/overhead ++ 4.1 3.3 2.6 2.1 1.6 1.3 1.03 0.82 0.65

Transistor density SRAM (Mtransistors/cm2) 504 646 827 1,057 1,348 1,718 2,187 2,781 3,532

Transistor density logic (Mtransistors/cm2) 97 122 154 194 245 309 389 490 617

Generation at introduction * p07c p10c p10c p10c p13c p13c p13c p16c p16c Functions per chip at introduction (million transistors [Mtransistors]) 386 386 386 773 773 773 1546 1546 1546

Chip size at introduction (mm2) ‡ 222 353 280 222 353 280 222 353 280

Cost performance MPU (Mtransistors/cm2 at

introduction) (including on-chip SRAM) ‡ 174 219 276 348 438 552 696 876 1,104

Generation at production * p04c p04c p07c p07c p07c p10c p10c p10c p13c Functions per chip at production (million transistors [Mtransistors])

193 193 386 386 386 773 773 773 1546

Chip size at production (mm2) §§ 111 88 140 111 88 140 111 88 140

Cost performance MPU (Mtransistors/cm2 at

production, including on-chip SRAM) ‡ 174 219 276 348 438 552 696 876 1,104

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ORTC MPU cp Table 1h (Long Term) (Draft 04 review 10/31/05):

Table 1h MPU (High-volume Microprocessor) Cost-Performance Product Generations and Chip Size Model—Long-term Years

Year of Production 2014 2015 2016 2017 2018 2019 2020

DRAM ½ Pitch (nm) (contacted) 28 25 22 20 18 16 14

MPU/ASIC Metal 1 (M1) ½ Pitch (nm) (f) 28 25 22 20 18 16 14

MPU Physical Gate Length (nm) 11 10 9 8 7 6 6

SRAM Cell (6-transistor) Area factor ++ 104.1 103.4 102.8 102.2 101.7 101.3 100.9

SRAM Cell (6-transistor) Area factor ++ 104.1 103.4 102.8 102.2 101.7 101.3 100.9

Logic Gate (4-transistor) Area factor ++ 320 320 320 320 320 320 320

Logic Gate (4-transistor) Area factor ++ 320 320 320 320 320 320 320

SRAM Cell (6-transistor) Area efficiency ++ 0.63 0.63 0.63 0.63 0.63 0.63 0.63

Logic Gate (4-transistor) Area efficiency ++ 0.50 0.50 0.50 0.50 0.50 0.50 0.50

SRAM Cell (6-transistor) Area ++ 0.084 0.066 0.052 0.041 0.032 0.026 0.020

SRAM Cell (6-transistor) Area w/overhead ++ 0.13 0.106 0.083 0.066 0.052 0.041 0.032

Logic Gate (4-transistor) Area ++ 0.26 0.20 0.16 0.13 0.10 0.08 0.06

Logic Gate (4-transistor) Area w/overhead ++ 0.51 0.41 0.32 0.26 0.20 0.16 0.13

Transistor density SRAM (Mtransistors/cm2) 4,484 5,687 7,208 9,130 11,558 14,625 18,497

Transistor density logic (Mtransistors/cm2) 778 980 1,235 1,555 1,960 2,469 3,111

Generation at introduction * p16c p19c p19c p19c p22c p22c p22c

Functions per chip at introduction (million transistors [Mtransistors]) 3092 3092 3092 6184 6184 6184 12368

Chip size at introduction (mm2) ‡ 222 353 280 222 353 280 222

Cost performance MPU (Mtransistors/cm2 at introduction) (including on-

chip SRAM) ‡ 1,391 1,753 2,209 2,783 3,506 4,417 5,565

Generation at production * p13c p13c p16c p16c p16c p19c p19c

Functions per chip at production (million transistors [Mtransistors]) 1546 1546 3092 3092 3092 6184 6184

Chip size at production (mm2) §§ 111 88 140 111 88 140 111

Cost performance MPU (Mtransistors/cm2 at production, including on-

chip SRAM) ‡ 1,391 1,753 2,209 2,783 3,506 4,417 5,565

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ORTC MPU hp Table 1i (Near Term) (Draft 04 review 10/31/05):

Table 1i High-Performance MPU and ASIC Product Generations and Chip Size Model—Near-term Years Year of Production 2005 2006 2007 2008 2009 2010 2011 2012 2013

DRAM ½ Pitch (nm) (contacted) 80 70 65 57 50 45 40 36 32

MPU/ASIC Metal 1 (M1) ½ Pitch (nm) (f) 90 78 68 59 52 45 40 36 32

MPU Physical Gate Length (nm) 32 28 25 23 20 18 16 14 13 Logic (Low-volume Microprocessor) High-performance ‡

Generation at Introduction p07h p10h p10h p10h p13h p13h p13h p16h p16h Functions per chip at introduction (million transistors)

1106 2212 2212 2212 4424 4424 4424 8848 8848

Chip size at introduction (mm2) 492 781 620 492 781 620 492 781 620

Generation at production ** p04h p04h p07h p07h p07h p10h p10h p10h p13h

Functions per chip at production (million transistors)

553 553 1106 1106 1106 2212 2212 2212 4424

Chip size at production (mm2) §§ 246 195 310 246 195 310 246 195 310

High-performance MPU Mtransistors/cm2 at

introduction and production (including on-chip SRAM) ‡

225 283 357 449 566 714 899 1133 1427

ASIC

ASIC usable Mtransistors/cm2 (auto layout) 225 283 357 449 566 714 899 1,133 1,427

ASIC max chip size at production (mm2) (maximum

lithographic field size) 858 858 858 858 858 858 858 858 858

ASIC maximum functions per chip at production (Mtransistors/chip) (fit in maximum lithographic field size)

1,928 2,430 3,061 3,857 4,859 6,122 7,713 9,718 12,244

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ORTC MPU hp Table 1j (Long Term) (Draft 04 review 10/31/05):

Table 1j High-Performance MPU and ASIC Product Generations and Chip Size Model—Long-term Years Year of Production 2014 2015 2016 2017 2018 2019 2020

DRAM ½ Pitch (nm) (contacted) 28 25 22 20 18 16 14

MPU/ASIC Metal 1 (M1) ½ Pitch (nm) (f) 28 25 22 20 18 16 14

MPU Physical Gate Length (nm) 11 10 9 8 7 6 6

Logic (Low-volume Microprocessor) High-performance ‡ Generation at Introduction p16h p19h p19h p19h p22h p22h p22h

Functions per chip at introduction (million transistors) 8848 17696 17696 17696 35391 35391 35391

Chip size at introduction (mm2) 492 781 620 492 781 620 492

Generation at production ** p13h p13h p16h p16h p16h p19h p19h

Functions per chip at production (million transistors) 4424 4424 8848 8848 8848 17696 17696

Chip size at production (mm2) §§ 246 195 310 246 195 310 246

High-performance MPU Mtransistors/cm2 at introduction

and production (including on-chip SRAM) ‡ 1798 2265 2854 3596 4531 5708 7192

ASIC ASIC usable Mtransistors/cm

2 (auto layout) 1,798 2,265 2,854 3,596 4,531 5,708 7,192

ASIC max chip size at production (mm2) (maximum

lithographic field size) 858 858 858 858 858 858 858

ASIC maximum functions per chip at production (Mtransistors/chip) (fit in maximum lithographic field size)

15,427 19,436 24,488 30,853 38,873 48,977 61,707