Embed Size (px)
Citation preview
Sponsored by:
University TechnologyUniversity TechnologyMarketing Boot CampMarketing Boot Camp
Marketing Workshop for Technology Transfer Professionals
Technology Transfer Tactics Distance Learning Total Access Pass allows you to customize a distance learning program for your staff and faculty at a steeply discounted price with 4 convenient formats.
You can get details on our website at www.techtransfercentral.com and click on Tech Transfer University on the left sidebar.
MARGY ELLIOTTMarketing & Communications Manager Columbia Technology Ventures
NICOLE NAIR Senior Marketing CoordinatorOffice of Technology ManagementUniversity of Illinois at Urbana-Champaign
JEREMY STRATTONDirector of Client Services and Content Strategy Nouvant
Uses in addition to web postings
◦ Sell sheets
◦ newsletters
◦ Tradeshow materials
◦ Event materials
◦ Background material for press releases
Timing
◦ When to write summaries
◦ When to post summaries
Who writes your summaries?
Which technologies get written up?
◦ How will you handle inventor portfolios
◦ Don’t assume your readers are experts in the field
◦ Write for a broad audience and follow-up with technical details if requested
◦ Be conscious of statistics & information that will date your summary
◦ Don’t cut & paste from the disclosure or patent application
◦ Be a little careful when making quantitative claims about a market or industry
Written by commercialization analysts and communications interns. Designed by communications interns
TECHNOLOGY BRIEF TECH VENTURES REF: IR M07-063
SOFTWARE CONTROLLED OPTICAL LITHOGRAPHY Lead Inventor: Ioannis (John) Kymissis, Ph.D.
This technology uses a spatial light modulator (SLM) to perform digital, software-controlled lithography. Traditional SLM lithographic systems typically operate in open-loop regime and require expensive high-precision stages for repeatable, reliable substrate exposures. In order to overcome these limitations, this technology uses fluorescence information from the substrate as feedback and adjusts the components of the lithographic process accordingly. One example of this is using the fluorescence information to determine the location of the substrate and adjust the digital SLM image to correct for errors in stage movement.
SOFTWARE CONTROLLED FEED-BACK LOOP OFFER
HIGH-RESOLUTION/ HIGH-YIELD EXPOSURES
WITHOUT USING EXPENSIVE PRECISION STAGES.
Other factors such as Optical lithography is used extensively in fabrication of electronic devices. Cutting edge projection lithography, for example, uses ultraviolet light projected through a series of masks to define features pattern, dose, and exposure can also be dynamically tuned for optimal results. Other factors such as Optical lithography is used extensively fabrication of electronic devices. Cutting edge projection lithography, for example, uses ultraviolet light projected through a series of masks to define features pattern, dose, and exposure can also be dynamically tuned for optimal results.
APPLICATIONS:
> System has a wide range of applications in microelectronics, such as photo marking/ etching, circuit board manufacturing, and screen printing.
> Flat panel manufacturing/repair.
> Rapid microelectronics prototyping.
ADVANTAGES:
> Inexpensive and used with commercially available SLM and microscope objectives.
> Feedback lithographic process allows for correction of many fabrication problems dynamically.
> Information about the optics can be fed back into the software to compensate for issues such as aberration and differential reflectivity of the SLM.
PATENT INFORMATION:
Patent Issued (US 7,955,766) see link below.
Licensing Status: Available for licensing and sponsored research support
RELATED PUBLICATIONS:
I. Kymissis, A. I. Akinwande, V. Bulovic. A Lithographic Process for Integrated Organic Field-Effect Transistors. Journal of Display Technology, Vol. 1, Issue 2, 2005, pp. 289.
CONTACT US TO LEARN MORE:
www.innovation.columbia.edu
