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© M. Schroter 1
Latest developments of HICUM/L2
for mm-wave applications
Michael Schroter1,2, Andreas Pawlak1, Julia Krause1, Paulius Sakalas1,3
1CEDIC, TU Dresden, Dresden, Germany2ECE Dept., UC San Diego, La Jolla, USA3FRL Semic. Phys. Inst., Vilnius, Lithuania
BCTM Open Workshop, Bordeaux (France)Oct. 3, 2013
© M. Schroter 2
Outline
• Introduction
• HICUM/Level2 extensions
• Model verification
• Summary
© M. Schroter 3
Introduction
IntroductionMajor challenge for mm-wave and THz operation:
generating sufficient output power
=> need to exploit process limits by careful device and circuit optimization=> need accurate compact models for active and passive devices
electronics photonics
solid-state THz sources (CW)
© M. Schroter 4
Introduction
HBT modeling challenges ... to be addressed for mm-wave and THz circuit design
• self-heating => thermal stability, reliability
• breakdown => reliability, stability
• high-current effects & quasi-saturation => PAE, operating frequency
• substrate effects => PAE, jitter, operating frequency
• large-signal operation => distortion
• distributed effects: high-frequency, breakdown, thermal, substrate
• gm drop (technology dependent) => drive capability/circuit speed
ALSO: model verification issues ...
• process development is outpacing measurement equipment availability => how to verify large-signal modeling at multi-100 GHz? (incl. distortion!!)
© M. Schroter 5
Introduction
Modeling approaches
Goal: cover large variety of applications & circuit optimization (bias, T, f)=> Physics-based model (cuts design cycle, supports process dev.)
Criteria Behavioral, X-par. Physics-basedaccuracy high (within narrow ranges) moderate to high over wide
rangenumerical stability compromised outside fitting
rangeshigh (for standard models)
fabricated devices need every possible layoutused in circuits
only few devices (6 HF trs, 6 test structures)
measurement effort moderate to high moderate to lowpar. extraction effort moderate to low (per device)
very high for librarymoderate to low (per device)very low for library
geometry scaling inconsistent (typically) consistentpredictive capability none moderate to highstatistical modeling none (very high effort) good to excellent
© M. Schroter 6
Introduction
Physics-based compact model... definition
each spatial region is represented by corresp. equivalent circuit element
• each EC element value is a function of bias, T, structural and physicalparameters
ijBCx
QjS
ijSC
RE
B
RCx
E
C
CEpar
QdS
QjEpijBEp
iTS
S
QBCx, QBCx
,,
Csu
Rsu
RBx
S’
Ti
iBEt E’
B*C
E
BB
© M. Schroter 7
Introduction
Physics-based compact model... definition
each spatial region is represented by corresp. equivalent circuit element • each EC element value is a function of bias, T, structural & physical parameters
=> realized in HICUM/Level2 (from the beginning)=> supports circuit optimization, statistical modeling, process development
ijBCx
QjS
ijSC
RE
B
RCx
E
C
CEpar
QdS
QjEpijBEp
iTS
S
QBCx, QBCx
,,
Csu
Rsu
RBx
S’
Ti
iBEt E’
B*C
E
BB
© M. Schroter 8
HICUM/Level2 extensions
HICUM/Level2 extensions... recent development work during DOT5, DOT7, RF2THz
• transfer current and gm drop (technology dependent) • bias dependence of reverse Early effect => gm degradation at low injection• weight factor for low-current mobile charge => gm degradation at medium injection • temperature dependence of weight factors
• explicit formulation of BC barrier effect
• flexible CE voltage dependence of critical current
• temperature dependence of thermal resistance
• simplification of AC emitter current crowding implementation
• exact implementation of correlated HF noise (verified up to at least 500GHz)
• simplification of input NQS effect description (and verification)
... and: reliable model parameter extraction methods
© M. Schroter 9
HICUM/Level2 extensions
Complete HICUM/L2 equivalent circuit
ijBCx
iBEtp
ijSC
iT
RE
B
ijBCi
RCx
E
C
ijBEi
C’
B’
E’
iAVL
CBEpar2
B*
ijBEp
QjCi
iTS
S
CrBi
ΔTj
CthRthP
Csu
Rsu
RBx
S’
intrinsic transistor
T
thermal networkQr
QjEi Qf
QBCx QdS
QjS
QjEp
,,QBCx,
Rbi*
Inb= 2qIjBEi
Vnb
1S.Vnb
Inc= 2qIT
Vnc
1S.Vnc
1S.VncTb2VncTb1Vnb
Tb1=1+jωτf Bf(2αqf -αIT)
Tb2=jωτf αIT
2 noiselessintrinsic
transistor
noise correlation Qf,nqs
R=τf
Qf,qsτf
αIT
VC1 iT,nqs=VC2
R=τf
VC2τf
iT,qsτf
VC1τf
αQf
αIT3
vertical NQS effects
CBEpar1
iBEti
(Verilog-A implementation)
© M. Schroter 10
HICUM/Level2 extensions
Model features
• large-signal model => small-signal, noise, distortion follow automatically!!
• includes all relevant SiGe HBT related effects(e.g. Ge dependence, BC barrier)
• physics-based => geometry scalable, predictive (statistical simulation) capability
• available in all mainstream simulators (ADS, ELDO, MWO, SPECTRE ...)• vs. "special" models available in only a single simulator
• applied to every Si BJT and SiGe HBT process node since early eighties => spans 90(55)nm to 1μm lithography, 10 to 400 GHz transit frequency
=> continuous model development and improvement
© M. Schroter 11
HICUM/Level2 extensions
Transfer current
=> gm degradation difficult to capture accurately with existing models
10−5
10−3
10−10.7
0.75
0.8
0.85
0.9
0.95
1
JC
(mA/µm2)
g m*V
T/I C
A−1
A0
B−3
B−2
B−1
B0
C−1
C0
HICUM/L2 2.24
10−2
10−1
100
101
10210
−3
10−2
10−1
100
JC
(mA/µm2)
g mR
E
A−1
A0
B−1
B0
C−1
C0
• gm degrades at low-injec-tion for some technologies
• degradation is not related toprocess generations
• not caused by emitter resistance
• not caused by BGN or quantum effects
© M. Schroter 12
HICUM/Level2 extensions
Transconductance
10−4
10−2
1000.75
0.8
0.85
0.9
0.95
1
JC
(mA/µm2)
gm
iVT/I
C
no GeBox GeWeak Ge gradientStrong Ge gradient
0.5 0.6 0.7 0.80
1
2
3
4
5
6
VBE
(V)
h jEi
gradbox
NBNE
p(x)
VBE
x
N (log)Ge (lin)
Ge
VBE=0 V
xjE xpe0xpexpe-dx
ΔVGe
Δw
similar trend observed from device simulationfor graded Ge profile in BE SCR
=> Ge grading causes bias dependence of GICCR weight factor hjEi for BE depletion
charge QjEi:
ITc10
Qp0 hjEiQjEi+------------------------------------
VB'E'VT
----------- exp
VB'C'VT
----------- exp–=
© M. Schroter 13
HICUM/Level2 extensions
Transconductance
=> very accurate modeling of transconductance
10−3
10−2
10−1
100
10110
−3
10−1
101
103
105
Qm
in, Q
min
,T (
fC)
JC
(mA/µm2)
0
100
200
300
400
f T (
GH
z)
grad, Qmin
grad, Qmin,T
box, Qmin
box, Qmin,T
10−5
10−3
10−10.7
0.75
0.8
0.85
0.9
0.95
1
JC
(mA/µm2)g m
*VT/I C
A−1
A0
B−3
B−2
B−1
B0
C−1
C0
HICUM/L2 2.32
• hjEi voltage dependence
with
• hf0: weight factor for mobile charge • graded Ge causes shift in weighted
mobile charge center of gravity in base region
hjEi VB'E'( ) hjEi0u( ) 1–expu
--------------------------=
u ahjEi 1 VB'E' VDEi⁄–=
graded
IT c10
VB'E'VT
----------- exp
VB'C'VT
----------- exp–
Qp0 hjEi VB'E'( )QjEi hf0Qf0+ +---------------------------------------------------------------------------==>
© M. Schroter 14
HICUM/Level2 extensions
AC emitter current crowding (Lateral NQS effect)Issue: generates 2.3MB of code for derivatives!
• gm overestimation by iTf/VT partially compensated by using τf0 instead of τf => reduces code size (ADMS) to 0.3 MB(2.31)
• AC analysis by using
• Previous calculations of diffusion capacitances
and
=> calculated using ddx-operator
• Simplification avoiding ddx operator
and .
CRBi fCRBi CjEi CjCi CdEi CdCi+ + +( )=
CdEidQdEidVBE--------------
VBC
= CdCidQjCidVBC--------------
VBE
=
CdEidQdEidiTf
--------------diTf
dVBE------------- τf0
iTfVT------≈= CdCi τr
iTrVT------≈
B* B’RBi
CRBi
VRBi
© M. Schroter 15
HICUM/Level2 extensions
Temperature dependence of thermal resistance• For potential numerical stability reasons, modeling of Rth(T) was
changed from nonlinear to linear formulation:
to
• For backward compatibility, the present implementation reads
where the previous term and parameter have still been kept• Setting
- αRth = 0 and ζRth > 0 recovers the previous formulation- αRth > 0 and ζRth = 0 gives the new formulation
• Planned: no further support for previous implementation (and parameterζRth) but requires to add prevention of negative Rth
Rth T( ) Rth T0( ) TT0----- ζRth= Rth T( ) Rth T0( ) 1 αRthΔT+( )=
Rth T( ) Rth T0( ) 1 αRthΔT+( ) TT0----- ζRth=
Thermal and emitter resistance
Thermal and emitter resistance... from a joint extraction
• Scaling of thermal resistance was changed from
to
to give better results for width scaled devices
• Emitter resistance scaling almost ideally linear
Rth4lE bE⁄( )lnlE
----------------------------rth= RthRth0
1 arthbbE arthllE+ +-------------------------------------------------=
0 2 4 6 80
5
10
15
20
25
1/AE0
(µm−2)
RE (
Ω)
0 2 4 60
2
4
6
8
1/AE (µm2)
Rth
(K/m
W)
ExtractionOrig modelGeneral model
lE
bE
lE
bE
© M. Schroter 1
© M. Schroter 16
HICUM/Level2 extensions
Correlated noise• New formulation for correlated noise modeling
• modeling at the transistor input, not output• flag flcono turns correl. noise on (1) and off (0)• conditional statement for calculation of square root
IF =>
otherwise =>
• no use of nested ddt operators anymore• default values of αQf (alqf) & αiT (alit) have been
changed to physically meaningful values• Range of alqf & alit modified from [0:1] to (0:1]
• Generic method for constructing corre-lated noise networks see:• J. Herricht et al., "Systematic compact modeling
of correlated noise in bipolar transistor", acceptedin IEEE Trans. MTT, 2012.
2αQf αiT> τb1 1 jωτf 2αQf αiT2–+=
τb1 1=
InC= 2qIT InB= 2qIjBEi1S*VnC
VnC
1S*VnB
VnB
noiseless
intrinsic
transistor
τB1VnB τB2VnC VnC
τB1=1+jωτf Bf(2αQf-αiT)2
τB2=jωτfαIT
InC= 2qIT InB= 2qIjBEi1S*VnC
VnC
1S*VnB
VnB
noiseless
intrinsic
transistor
VnB τC2VnB
τC2=-jωβfτfαIT
τC1VnB
τC1=1-0.5*ω2τf2 BfαiT
2
© M. Schroter 17
Model verification
Model verification• standard characteristics: DC, small-signal y-parameters
occasionally noise (often limited 26 GHz), sometimes load-pull & harmonics
=> typically in (foundry) characterization labs=> issues for mm-wave & THz technologies
• need (large) arrays for achieving suitable impedances => impact of interconnect parasitics• distortion/harmonics, load-pull: coupler & passive tuners limit frequency to below 50...75GHz• on-wafer S-parameter measurement: limited to 110GHz in foundries, rarely 220GHz, none at
higher frequencies; pulsed AC difficult (bias Tees, meas. interval)• severe self-heating limits usable bias region for parameter extraction
=> how to verify compact models beyond equipment limitations?• device simulation: small-signal, noise, large-signal characteristics
=> limited to basic 1D or 2D device structure without major parasitic regions• use in-band distortion from two-tone load-pull => limited to magnitude
=> use physics-based models for extrapolating beyond equipment limits=> Really needed:
pulsed mag & phase (or time domain) measurement capability up to 1THz
© M. Schroter 18
Model verification
High-performance SiGe HBT (cont’d)B7HF500 (IFX) high-performance BEC transistor with AE0=2x0.1x4.88μm²
transit frequency output vs. input power
=> excellent agreement up to high input power and third harmonics
VCB\V = -0.5, -0.3, 0, 0.3, 0.5
10−1
100
101
1020
50
100
150
200
250
JC
(mA/µm2)
f T (
GH
z)
measmodel
−50 −40 −30 −20 −10 0−100
−80
−60
−40
−20
0
Pin
(dBm)P
ou
t (dB
m)
measmodel
(VBE, VCE) = (0.8, 0.8) V
10
f/GHz
30
50peak JCat Pin=-10dBm
self-biasing (even harmon.)
© M. Schroter 19
Summary
Summary
• Need for pushing process limits => accurate compact HBT modeling
• HBT compact modeling approaches (physics-based vs. behavioral models)
• HICUM/L2 latest developments• released as CMC model v2.33• available in all commercial circuit simulators and many industry PDKs
• Experimental examples for small and large-signal behavior• high-performance (low breakdown voltage) HBTs• similar results were obtained also for high-voltage (low speed) HBTs• used in industry (e.g. WCDMS, OFDMA, CD/DVD laser drivers, OC192, GSM and GPS
receiver front ends, wireless entry systems, UWB, DBS(SAT), radar, OC768...)
© M. Schroter 20
Summary
Planned extensions and improvements
• improved substrate coupling network (incl. compact geometry scaling)
• BTB, TAT in BC SCR and BTB in forward-biased BE SCR
• reliability model
• additional model verification on benchmark circuits
• CPU time reduction
© M. Schroter 21
Summary
Acknowledgments
Compact modeling• EU FP7 IP DOTFIVE (financial support; SiGe HBT technology)
• EU Catrene RF2THz(SiSoC) (financial support; SiGe HBT technology)
• German Science Foundation SFB 912 (financial support; SiGe HBT technology)
• German Science Foundation SCHR695-3 (financial support; InP HBT research)
Users and user support• IHP, Infineon, GCS, Skyworks, ST Microelectronics, TowerJazz (wafer supply)
• AWR, Cadence, Mentor Graphics (software)
• Agilent, AIST, Analog Devices, Atmel, IBM, ProPlus Solutions, Qualcomm, Renesas Electronics, RFMD, Samsung, Silvaco, SK Hynix, Synopsys, Texas Instru-ments (National), TelefunkenSemi, Toshiba, TSMC, UMC
© M. Schroter 22
Appendix
Appendix• SG13 (IHP) CBE transistor with AE0= 8 x 0.12 x 1.1μm²: DC, fT, fmax
10−1
100
101
1020
100
200
300
400
500
JC
(mA/µm2)
f max
(GH
z)
measmodel
0 0.5 1 1.5 20
5
10
15
VCE
(V)
J C (m
A/µ
m2 )
measmodel
0.8 0.9 110
−4
10−3
10−2
10−1
100
101
102
VBE
(V)
J C, J
B (m
A/µ
m2 )
measmodel
0.4 0.5 0.6 0.710
−10
10−8
10−6
10−4
10−2
100
VBE
(V)
J C, J
B (m
A/µ
m2 )
10−1
100
101
1020
50
100
150
200
250
300
JC
(mA/µm2)
f T (GH
z)
measmodel
© M. Schroter 23
Appendix
Model verification (cont’d)• SG13 (IHP) CBE HBT, AE0= 8x0.12x1.1μm²: y-parameters at peak fT
10−1
100
101
10265
70
75
80
85
90
f (GHz)
Pha
se{y
11} (
°)
measmodel
10−1
100
101
10210
−2
10−1
100
101
102
f (GHz)
Abs{
y11}
(mS/
µm2 )
measmodel
10−1
100
101
102−25
−20
−15
−10
−5
0
5
f (GHz)
Phas
e{y2
1} (°
)
measmodel
10−1
100
101
10210
1
102
f (GHz)
Abs{
y21}
(mS/
µm2 )
measmodel
© M. Schroter 24
Appendix
Model verification (cont’d)• SG13 (IHP) CBE HBT, AE0=8x0.12x1.1μm²: y-parameters at peak fT
10−1
100
101
102−100
−50
0
50
100
f (GHz)
Phas
e{y2
2} (°
)
measmodel
10−1
100
101
102−100
−95
−90
−85
−80
f (GHz)
Phas
e{y1
2} (°
)
measmodel
10−1
100
101
10210
−2
10−1
100
101
f (GHz)
Abs{
y12}
(mS/
µm2 )
measmodel
10−1
100
101
10210
−2
10−1
100
101
102
f (GHz)
Abs{
y22}
(mS/
µm2 )
measmodel