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EE586 EE586 VLSI Design VLSI Design Partha Pande School of EECS Washington State University [email protected]

EE586 VLSI Design Partha Pande School of EECS Washington State University [email protected]

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Page 1: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

EE586EE586VLSI DesignVLSI Design

Partha PandeSchool of EECS

Washington State [email protected]

Page 2: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Lecture 1 (Introduction) Lecture 1 (Introduction)

Why is designing digital ICs different today than it was before?

Will it change in future?

Page 3: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

The First ComputerThe First Computer

The BabbageDifference Engine(1832)

25,000 partscost: £17,470

Page 4: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

ENIAC - The first electronic computer (1946)ENIAC - The first electronic computer (1946)

Page 5: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

The Transistor RevolutionThe Transistor Revolution

First transistorBell Labs, 1948

Page 6: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

The First Integrated Circuits The First Integrated Circuits

Bipolar logic1960’s

ECL 3-input GateMotorola 1966

Page 7: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Intel 4004 Micro-ProcessorIntel 4004 Micro-Processor

19711000 transistors1 MHz operation

Page 8: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Intel Pentium (IV) microprocessorIntel Pentium (IV) microprocessor

Page 9: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Moore’s LawMoore’s Law

In 1965, Gordon Moore noted that the number of transistors on a chip doubled every 18 to 24 months. He made a prediction that semiconductor technology will double its effectiveness every 18 months

Page 10: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Moore’s LawMoore’s Law

161514131211109876543210

195

9

196

0

196

1

196

2

196

3

196

4

196

5

196

6

196

7

196

8

196

9

197

0

197

1

197

2

197

3

197

4

197

5

LO

G 2 O

F T

HE

NU

MB

ER

OF

CO

MP

ON

EN

TS

PE

R I

NT

EG

RA

TE

D F

UN

CT

ION

Electronics, April 19, 1965.

Page 11: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Evolution in ComplexityEvolution in Complexity

Page 12: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Transistor CountsTransistor Counts

1,000,000

100,000

10,000

1,000

10

100

11975 1980 1985 1990 1995 2000 2005 2010

8086

80286i386

i486Pentium®

Pentium® Pro

K1 Billion 1 Billion

TransistorsTransistors

Source: IntelSource: Intel

ProjectedProjected

Pentium® IIPentium® III

Courtesy, Intel

Page 13: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Moore’s law in MicroprocessorsMoore’s law in Microprocessors

40048008

80808085 8086

286386

486Pentium® proc

P6

0.001

0.01

0.1

1

10

100

1000

1970 1980 1990 2000 2010Year

Tra

nsi

sto

rs (

MT

)

2X growth in 1.96 years!

Transistors on Lead Microprocessors double every 2 yearsTransistors on Lead Microprocessors double every 2 years

Courtesy, Intel

Page 14: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Die Size GrowthDie Size Growth

40048008

80808085

8086286

386486 Pentium ® proc

P6

1

10

100

1970 1980 1990 2000 2010Year

Die

siz

e (m

m)

~7% growth per year~2X growth in 10 years

Die size grows by 14% to satisfy Moore’s LawDie size grows by 14% to satisfy Moore’s Law

Courtesy, Intel

Page 15: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

FrequencyFrequency

P6Pentium ® proc

486386

28680868085

8080

80084004

0.1

1

10

100

1000

10000

1970 1980 1990 2000 2010Year

Fre

qu

ency

(M

hz)

Lead Microprocessors frequency doubles every 2 yearsLead Microprocessors frequency doubles every 2 years

Doubles every2 years

Courtesy, Intel

Page 16: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Power DissipationPower Dissipation

P6Pentium ® proc

486

3862868086

80858080

80084004

0.1

1

10

100

1971 1974 1978 1985 1992 2000Year

Po

wer

(W

atts

)

Lead Microprocessors power continues to increaseLead Microprocessors power continues to increase

Courtesy, Intel

Page 17: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Power will be a major problemPower will be a major problem

5KW 18KW

1.5KW 500W

40048008

80808085

8086286

386486

Pentium® proc

0.1

1

10

100

1000

10000

100000

1971 1974 1978 1985 1992 2000 2004 2008Year

Po

wer

(W

atts

)

Power delivery and dissipation will be prohibitivePower delivery and dissipation will be prohibitive

Courtesy, Intel

Page 18: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Power densityPower density

400480088080

8085

8086

286386

486Pentium® proc

P6

1

10

100

1000

10000

1970 1980 1990 2000 2010Year

Po

wer

Den

sity

(W

/cm

2)

Hot Plate

NuclearReactor

RocketNozzle

Power density too high to keep junctions at low tempPower density too high to keep junctions at low temp

Courtesy, Intel

Page 19: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Not Only MicroprocessorsNot Only Microprocessors

Digital Cellular Market(Phones Shipped)

1996 1997 1998 1999 2000

Units 48M 86M 162M 260M 435M Analog Baseband

Digital Baseband

(DSP + MCU)

PowerManagement

Small Signal RF

PowerRF

(data from Texas Instruments)(data from Texas Instruments)

CellPhone

Page 20: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

MOS Transistor ScalingMOS Transistor Scaling(1974 to present)(1974 to present)

Scaling factor s=0.7 per node (0.5x per 2 nodes)

Metal pitch Technology Nodeset by 1/2 pitch(interconnect)

Gate length(transistor)

Poly width

Page 21: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Ideal Technology Scaling (constant fieldIdeal Technology Scaling (constant field))

Quantity Before Scaling After Scaling

Channel Length L L’ = L * s

Channel Width W W’ = W * s

Gate Oxide thickness tox t’ox = tox * s

Junction depth xj x’j = xj * s

Power Supply Vdd Vdd’ = Vdd * s

Threshold Voltage Vth V’th = Vth * s

Doping Density, p n+

NA ND

NA’ = NA / s ND’ = ND / s

Page 22: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Challenges in Digital DesignChallenges in Digital Design

“Microscopic Problems”• Ultra-high speed design• Interconnect• Noise, Crosstalk• Reliability, Manufacturability• Power Dissipation• Clock distribution.

Everything Looks a Little Different

“Macroscopic Issues”• Time-to-Market• Millions of Gates• High-Level Abstractions• Reuse & IP: Portability• Predictability• etc.

…and There’s a Lot of Them!

DSM 1/DSM

?

Page 23: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Productivity TrendsProductivity Trends

1

10

100

1,000

10,000

100,000

1,000,000

10,000,000

200

3

198

1

198

3

198

5

198

7

198

9

199

1

199

3

199

5

199

7

199

9

200

1

200

5

200

7

200

9

10

100

1,000

10,000

100,000

1,000,000

10,000,000

100,000,000

Logic Tr./ChipTr./Staff Month.

xxx

xxx

x

21%/Yr. compoundProductivity growth rate

x

58%/Yr. compoundedComplexity growth rate

10,000

1,000

100

10

1

0.1

0.01

0.001

Lo

gic

Tra

nsi

sto

r p

er C

hip

(M)

0.01

0.1

1

10

100

1,000

10,000

100,000

Pro

du

ctiv

ity

(K)

Tra

ns.

/Sta

ff -

Mo

.

Source: Sematech

Complexity outpaces design productivity

Co

mp

lexi

ty

Courtesy, ITRS Roadmap

Page 24: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Why Scaling?Why Scaling? Technology shrinks by 0.7/generation With every generation can integrate 2x more

functions per chip; chip cost does not increase significantly

Cost of a function decreases by 2x But …

How to design chips with more and more functions? Design engineering population does not double every

two years… Hence, a need for more efficient design methods

Exploit different levels of abstraction

Page 25: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Design Abstraction LevelsDesign Abstraction Levels

n+n+S

GD

+

DEVICE

CIRCUIT

GATE

MODULE

SYSTEM

Page 26: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Design MetricsDesign Metrics

How to evaluate performance of a digital circuit (gate, block, …)? Cost Reliability Scalability Speed (delay, operating frequency) Power dissipation Energy to perform a function

Page 27: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Cost of Integrated CircuitsCost of Integrated Circuits

NRE (non-recurrent engineering) costs design time and effort, mask generation one-time cost factor

Recurrent costs silicon processing, packaging, test proportional to volume proportional to chip area

Page 28: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

NRE Cost is IncreasingNRE Cost is Increasing

Page 29: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Die CostDie Cost

Single die

Wafer

From http://www.amd.com

Going up to 12” (30cm)

Page 30: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Cost per TransistorCost per Transistor

0.00000010.0000001

0.0000010.000001

0.000010.00001

0.00010.0001

0.0010.001

0.010.01

0.10.111

19821982 19851985 19881988 19911991 19941994 19971997 20002000 20032003 20062006 20092009 20122012

cost: cost: ¢-per-¢-per-transistortransistor

Fabrication capital cost per transistor (Moore’s law)

Page 31: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

What about InterconnectWhat about Interconnect

Global wires Non-scalable delay Delay exceeds one clock cycle

Non-scalable interconnects Excessive power dissipation Non reliability in signal transmission

Page 32: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Lower Latency and Energy Dissipation

Three Dimensional Integration

Optical Interconnects Wireless/RF Interconnects

Emerging Interconnect TechnologiesEmerging Interconnect Technologies

Page 33: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

SummarySummary Digital integrated circuits have come a long

way and still have quite some potential left for the coming decades

Some interesting challenges ahead Getting a clear perspective on the challenges and

potential solutions is the purpose of this course Understanding the design metrics that govern

digital design is crucial Cost, reliability, speed, power and energy

dissipation

Page 34: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Course StructureCourse Structure MOS Transistors MOS Inverter Circuits Static MOS Gate Circuits High-Speed CMOS Logic Design Transfer Gate and Dynamic Logic Design Semiconductor Memory Design Advanced Devices beyond CMOS

Page 35: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Course StructureCourse Structure

Extensive use of CAD tools Homework assignments One to two midterm exams and one

final exam Course Project

Page 36: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

Suite of two courses EE 466/586 and EE587 will cover various aspects starting from circuits to systems

Page 37: EE586 VLSI Design Partha Pande School of EECS Washington State University pande@eecs.wsu.edu

ReferencesReferences Textbook:

CMOS VLSI Design, Weste and Harris, Fourth Edition Additional Reference:

Analysis and Design of Digital Integrated Circuits - In Deep Submicron Technology, Hodges, Jackson and Saleh, McGraw-Hill, Third Edition, 2004.

J. M. Rabaey, A. Chandrakasan, and B. Nikolic, Digital Integrated Circuits: A Design Perspective. Second Edition, Prentice Hall, 2003.

Important announcements will be posted in the course website www.eecs.wsu.edu/~ee586