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A High-Density 45nm SRAM Using Small-Signal Non-
Strobed Regenerative Sensing
Naveen Verma and Anantha ChandrakasanMassachusetts Institute of Technology
ISSCC 2008
21.3
2
High-Density SRAM Limiting Factors
Counter severe variability through sense-amp
MC
MC
MC
MC
WL[0]
WL[255]
WLE STRB
Severe variation degrades worst-case
1) Cell current (IREAD)2) Read SNM
3) Offset limits min. BL discharge, area scaling
4) Strobe signal tracks array read-path poorly
0.25µm2
6T bit-cell
3
Outline
• High Density 45nm SRAM challenges• Single-ended read architectures• Non-strobed regenerative sense-amp
(NSR-SA) operation• Prototype measurements• Conclusions
4
IREAD Degradation
Variation causes larger fractional
degradation
Mean
5σMC
MC
MC“1”
“0”
“0”
IREAD
Upto
256
cells
per
c olu
mn
f orm
ax.d
ensi
ty
5
Read SNM-IREAD Degradation
Read SNM of 0.25µm2 cell is too low and must be
improved at the cost of IREAD
Strong for IREAD
Weak for RSNM
WL WL
5σ
Mean
6
SA Strobe Timing Uncertainty
Array and strobe paths track poorly; required timing margin increases worst-case access time by ~20%
Del
ay (n
s)
PVT Corner
Array Path Strobe Path
Worst-case array delay: 820psWorst-case strobe delay: 980ps
980ps
820ps MC
MC
MC
MC
WLESTRB
Array read path
Strobe path
7
Single-Ended Sensing - TechniquesAsymmetric cells can have wider operating margins
e.g. 8T [Morita, Chang, Joshi, etc. VLSI’07]Full-Swing Sensing Pseudo-Differential Sensing
• Need to minimize CBL/IREAD limits density
[Zhang, VLSI’00]
• Need to generate reference that tracks IREAD,MIN
MC“1”
“0”
(Use large cell to maximize)
Min
imiz
ece
llson
loca
lRD
BL
(e.g
.8)
Logic gate SA (CMOS, domino)
for min. area
IREAD
MC[Tzartzanis, ISSCC’04]
Ref
Ref
“1”
“0”
“0”
“1”
MC
MC
IREAD
IREF ≈IREAD/2
8
Single-Ended Sensing – Trade-off
Single-ended sensing introduces trade-off between sensitivity and noise-rejection
Differential SA Single-Ended SASingle-ended SA has no common-mode rejection…
MC
MC
BLBLB
SA rejects CM noise
MC
MC
BL
SA should respond to
min. BL discharge
MC
MC
BL
SA should reject noise
9
Non-Strobed Regenerative (NSR) SA
RST RST
RSTB
RSTB
RSTB
QB
RSTB
Regenerative feedback
device
Inverter amplifiersBL<A>BL<B>BL<C>BL<D>
Col
.mux Sense-
amp
10
NSR-SA Operation: Reset Phase
Want X≈Y(takes <100ps)
Time (ns)
Bit-
lines
(V)
NSR
-SA
(V)
PREBL
XY RST
“0”“0”
M1
M2
M3
M4
Precharge
Precharge
X YBL
11
NSR-SA Operation: Sense “1”
VGS5,7 remains 0 (or negative)
Time (ns)
Bit-
lines
(V)
NSR
-SA
(V)
WLBL
YX QB
RST
QB
“1”“1”
M1
M2
M3
M4
X Y
M5
M7
VGS≈0
VGS≈0
BL
12
NSR-SA Operation: Sense “0”
VGS7 >> 0, triggering
regeneration
Time (ns)
Bit-
lines
(V)
NSR
-SA
(V)
WLBL
YX QBRST
QB
“1”“1”
M1
M2
M3
M4
X Y
M5
M7
VGS >> 0
VGS >> 0Actively pulled low
by M7
BL
13
NSR-SA Output Clocking
NSR-SA latches data, so output can be clocked
after PRE begins
NSR
-SA
(V)
PRE/
RST
(V)
BL/
WL
(V)
Time (ns)
PRERST
BLWL
Y
X
QB
SRAM ARRAY
STRB
CLK
QB valid until RST (not PRE)
14
NSR-SA Offset Compensation - I
Negative of offset voltages are stored on C1/C2; VTCs from IN-X and X-Y are offset free
Nodes A & B get charged to ≈VM-VOS
VOS1,2
Offset voltages
VOS3,4
VOS7
XY
M7
Ideal inverter (with trip-point VM)
IN
C1
C2A B
RST RST
IN
OU
T
VOS
VM≈VM –VOS
15
NSR-SA Offset Compensation - IIFirst
inverter’s offset
dominates
All offsets are diminished by at least gmro(i.e. inverter gain) when input referred
VOS1,2 VOS3,4
VOS7
XY
M7
INC1 C2
A B
VM + VOS1,2/gmro VM + VOS3,4/gmro
(gmro + (gmro)2)VOS7
VOS3,4/(gmro)2
16
SA Access Time Distribution
• Mean bit-cell• Nominal process corner
• Variation applied to all SA devices
NSR-SA offset compensation yields superior sigma
STRB
QB
INBIN
RSTBRSTB
Conventional SAMean: 500psSigma: 37ps
NSR-SAMean: 418psSigma: 18ps
172.5 3 3.5 4 4.5 50
0.5
1
Charge Injection Error Immunity
Charge injection errors oppose regeneration
NSR
-SA
(V)
Time (ns)
RSTX
Y
Charge-injection opposes regeneration
XY
M7
IN
C1
C2A B
False regeneration
RSTB
PMOS (positive charge injection)
NMOS (negative charge injection)
RST
18
Regeneration Trip Point
Adjust reset value of X & Y to set
desired BL discharge required
for regeneration
Requires small device (0.2µm x0.2µm)
M1
M2
M3
M4
X Y
Injected current trims
reset value of X
VGS (at reset) sets BL discharge required
M7
19
Test-Chip ArchitectureConventional SA
NSR-SA
64x64
8
64kb Array(256 x 256
0 ..25µm2 cells)
64 8
64kb Array(256 x 256
0 ..25µm2 cells)
4:1
x64
8:18:1
4:1
2:1
ADDR[7:0] CSEL[1:0] STRB GSEL[2:0]
WLE CLKIN BSEL
8
Q[7:0]
Conventional SA
NSR-SA
WLE
CLKIN
STRB1
2
WLE
CLKIN
20
Noise Injection Circuit
MC
MC
CBL CBL
50 Ohm
TrimInv1 TrimInv2
M8-9 adjust reset point of inverters
to trim VGS,M7
CNOISE
M8
M9
CNOISE
M7NSR-SA
Noise estimated from ratio of CNOISE to CBL
21
Prototype SRAM
• 45nm low-powerCMOS
• 2, 256x256 arrays(compare SA performance)
• 0.25µm2 bit-cells
1.80mm
1.25
mm
64kbArray
64kbArray
Decoders/WL drivers
Decoders/WL drivers
Conv. SA NSR-SA
Col.periph.
22
Measured Access Times
-2 -1 0 1 2 30
10
20
30
Occ
urre
nces
Access Time (ns)
Conventional SAMean: 1.59nsSigma: 401psMax.: 2.46nsNSR-SA – Conv.
(difference)
NSR-SAMean: 1.27nsSigma: 103psMax.: 1.63ns
Measured 53 chips; NSR-SA gives 34% speed-up in worst-case
access-time
23
Noise Rejection
1 1.05 1.1 1.15 1.2-10
0
10
20
30
40
50
Access Time from Sample Bit-Cell (ns)
BL
Noi
se R
ejec
tion
(mV)
Reduce regeneration trip-point
Increase coupling noise
50mV of bit-line noise margin can be reduced for up to 20% performance increase
24
Performance Summary
7%2%% of array power (at 100MHz)
1.67ns2.46nsMax. access-time1.27ns1.59nsMean access-time
103ps401psAccess-time sigma
23µW-Power in reset19µm2 *12µm2Area
64kbCapacity256 x 256Array configuration0.25µm2Cell size
45nm low-power CMOSTechnologyNSR-SAConventional SA
*NSR-SA includes testability features
25
Conclusions
• Bit-cell design for high-density SRAM is highly constrained, leading to low IREAD
• NSR-SA improves sensing stability with offset compensation and overcomes strobe uncertainty, enhancing speed up to 34%
• Single-ended small-signal sensing improves trade-offs for asymmetric bit-cells
Acknowledgements: Funding by Intel Foundation Ph.D. Fellowship Program. IC fabrication by TI.