Latest Results and Advancements with HIPIMS Coatings
G. Terenziani, S.Calatroni, A. P. Ehiasarian, T. Junginger
Outline
• Dc Magnetron Sputtering – The Origins
• From Dc Magnetron Sputtering to HiPIMS
• HIPIMS Samples Analysis:
XRDRRROESMS
• HIPIMS Cavity Results
Outline
• Dc Magnetron Sputtering – The Origins
• From Dc Magnetron Sputtering to HiPIMS
• HIPIMS Samples Analysis:
XRDRRROESMS
• HIPIMS Cavity Results
DC Magnetron Sputtering (DCMS)
DCMS FeaturesPros:
• High deposition rate
• Good film adherence to the substrate
Cons:
• Difficulty to coat complex geometry
• Columnar growth of the film
• Porosity of the film
Outline
• Dc Magnetron Sputtering – The Origins
• From Dc Magnetron Sputtering to HiPIMS
• HIPIMS Samples Analysis:
XRDRRROESMS
• HIPIMS Cavity Results
From DCMS To HIPIMS
© Andre Anders, 2010 11
Generalized Structure Zone Diagram
A. Anders, Thin Solid Films 518, 4087 (2010).
derived from Thornton’s diagram, 1974
Based on “Structure Zone Model” - Thornton, J.Vac. Sci. Technol. 11 (1974) 666
From DCMS To HIPIMS
To enhance Ions production
Higher power
Higher Plasma density and higher cathode current
Overheating and possible melting of the cathode
HIPIMS (High Power Impulse Magnetron Sputtering)
HPIMS
Typical voltage and current trace from a high power pulsed magnetron discharge.
Example of a duty cycle.
HIPIMS – Characteristics
Pros:
• Smoother thin film surface
• Very good film adherence to the substrate
• Possibility to coat complex geometries
• Possibility of self-sputtering and resulting removal of defects and impurities
Cons:
• Low deposition rate
Outline• Dc Magnetron Sputtering – The Origins
• From Dc Magnetron Sputtering to HiPIMS
• HIPIMS Samples Analysis:
OESMSXRDRRR
• HIPIMS Cavity Results
HIPIMS Samples – Optical Emission Spectroscopy (OES)
50 88 125 165 180 270 340 410 480 550
21
37
53
69
85
Pulse Duration (µs)
Pea
k C
urre
nt (A
)
0.05000
0.1250
0.2000
0.2750
0.3500
0.4250
0.5000
0.5750
0.6500
Nb II / Nb I Ratio
HIPIMS Samples – Optical Emission Spectroscopy (OES)
Outline
• Dc Magnetron Sputtering – The Origins
• From Dc Magnetron Sputtering to HiPIMS
• HIPIMS Samples Analysis:
OESMSXRDRRR
• HIPIMS Cavity Results
0 5 10
0.1
1
10
100
1000
10000
100000
1000000
1E7
Intensity Linear Fit of Sheet1 B
Inte
nsity
Energy
Equation y = a + b*x
Weight No Weighting
Residual Sum of Squares
0.02028
Pearson's r -0.99077
Adj. R-Square 0.97957Value Standard Error
IntensityIntercept 6.08974 0.01431Slope -0.99225 0.04526
0 10 20 30
0.01
0.1
1
10
100
1000
10000
100000
1000000
1E7
Inte
nsity
Energy
Intensity Linear Fit of Sheet1 B
Equation y = a + b*x
Weight No Weighting
Residual Sum of Squares
0.26334
Pearson's r -0.99737
Adj. R-Square 0.99471Value Standard Error
IntensityIntercept 5.37594 0.00808Slope -0.14611 9.00585E-4
0 20 40 60
0.1
1
10
100
1000
10000
100000
1000000
1E7
Inte
nsity
Energy
Intensity Linear Fit of Sheet1 B
Equation y = a + b*x
Weight No Weighting
Residual Sum of Squares
1.65281
Pearson's r -0.97238
Adj. R-Square 0.94526Value Standard Error
IntensityIntercept 4.16017 0.02843Slope -0.06511 0.00111
Low Energy zoneMedium Energy zone
High Energy zone
HIPIMS Samples – Mass Spectrometer (MS) – Nb+ case
HIPIMS Samples – Mass Spectrometer (MS) – Nb+ case
0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2 2.2
-1.2
-1
-0.8
-0.6
-0.4
-0.2
0
Zone Slope Vs Peak Current Density
Zone ILinear (Zone I)Zone IILinear (Zone II)Zone IIILinear (Zone III)Sl
ope
0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2 2.20.00E+00
2.00E+05
4.00E+05
6.00E+05
8.00E+05
1.00E+06
1.20E+06
IEDF Area Vs Peak Current Density
AreaLinear (Area)
Peak Current Density
IEDF
Are
a
HIPIMS Samples – Mass Spectrometer (MS) – Nb+ case
0 20 40 60 80 100 1201
10
100
1000
10000
100000
1000000
10000000Nb+ energy density function
NbI 0.55 A/cm2NbI 1.3 A/cm2NbI 2 A/cm2
Energy (eV)
Arbi
trar
y Un
itHIPIMS Samples – Mass
Spectrometer (MS) – Nb+ case
HIPIMS Samples – Mass Spectrometer (MS)
0 0.5 1 1.5 2 2.5 30.00E+00
2.00E+00
4.00E+00
6.00E+00
8.00E+00
1.00E+01
1.20E+01
0
0.05
0.1
0.15
0.2
0.25
0.3
0.35
IEDF Area and Nb+/Nb0 Ratio Vs Peak Current Density
AreaRatio I
Peak Current Density
IEDF
Are
a
Arbi
trar
y Un
it
Outline
• Dc Magnetron Sputtering – The Origins
• From Dc Magnetron Sputtering to HiPIMS
• HIPIMS Samples Analysis:
OESMSXRDRRR
• HIPIMS Cavity Results
HIPIMS Samples – X-Ray Diffraction
Cu <200>
Cu <200>
Cu <200>
Nb <110>
Nb <110>
Nb <110>
HIPIMS Samples – X-Ray Diffraction
0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2 2.20
2000
4000
6000
8000
10000
12000
Crystallographic Orientation Vs Peak Current Density
Cu <200> IntensityLinear (Cu <200> Intensity)Nb <110> IntensityLinear (Nb <110> Intensity)
Peak Current Density
Coun
ts
0 0.5 1 1.5 2 2.5 30
0.050.1
0.150.2
0.250.3
0.350.4
Nb+ and Nb0 vs Peak Current Density
Ratio ILinear (Ratio I)Ratio IILinear (Ratio II)
Peak Current Density
Coun
ts
Outline
• Dc Magnetron Sputtering – The Origins
• From Dc Magnetron Sputtering to HiPIMS
• HIPIMS Samples Analysis:
OESMSXRDRRR
• HIPIMS Cavity Results
HIPIMS Samples – Residual Resistance Ratio (RRR)
0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2 2.20
2000
4000
6000
8000
10000
12000
Crystallographic Orientation Vs Peak Current Density
Cu <200> IntensityLinear (Cu <200> Intensity)Nb <110> IntensityLinear (Nb <110> Intensity)
Peak Current Density
Coun
ts
40 60 80 100 120 140 160 180 200 2200
2
4
6
8
10
12
14
RRR Vs Peak Current
200 usLinear (200 us)
Peak Current
RRR
HIPIMS Samples – Residual Resistance Ratio (RRR)
40 60 80 100 120 140 160 180 200 2200
2
4
6
8
10
12
14
RRR Vs Peak Current
200
Peak Current
RRR
0 0.5 1 1.5 2 2.5 30
0.050.1
0.150.2
0.250.3
0.350.4
Nb+ and Nb0 vs Peak Current Density
Ratio ILinear (Ratio I)Ratio IILinear (Ratio II)
Peak Current Density
Coun
ts
Outline
• Dc Magnetron Sputtering – The Origins
• From Dc Magnetron Sputtering to HiPIMS
• HIPIMS Samples Analysis:
XRDRRROESMS
• HIPIMS Cavity Results
HIPIMS on 1.3 GHz Cavity – Deposition System
1.3 GHz Cavity
Magnet
Central Cathode
413 mm
HIPIMS on 1.3 GHz Cavity
Before coating After coating
HIPIMS on 1.3 GHz Cavity - Results
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