INDUSTRIAL PVD POWER-DELIVERY SOLUTIONSProcess Control and Film Quality for Reactive Sputtering, Metallic Sputtering, and Cathodic Arc Deposition

Precise Film-Property Control

Select the ideal power supply and features for your film-property and cost requirements

from AE’s wide product portfolio. Tight performance parameters, customizable power

delivery, precision pulsing, and multi-level arc management enable the process stability

and control required to create customized film density, uniformity, refraction, transmission,

and morphology.

Pulsed DC units, including the Ascent® DMS, Solvix by AE, and Pinnacle® Plus+ series, reduce

arcing, while improving deposition rate, film flatness, and film density. Ascent DMS units

also offer unique power-delivery options, including selectable frequency; power, current, or

voltage regulation; independent power-ratio regulation for each magnetron;

and unipolar and bipolar operation.

Solvix by AE bias units enable advanced control of ion energy, for even greater precision

of film characteristics such as stress, packing density, and degree of implantation.

20 kHz

Ascent® DMS Series

Ascent® AMS Series

Optimized power delivery for dual-

magnetron sputtering

A controlled voltage overshoot at the beginning of each pulse enables faster current

rise time and greater control of ion energy compared to conventional systems.

The optimized waveform of Ascent® power supplies enables precise control

of film properties such as stress, refraction, density, uniformity, and morphology.

ASCENT® DMS and AMS SERIES

CONTROLLED PULSE RISE PRECISE FILM PROPERTY CONTROL

2 kHz

DC

End Boost

Turn-O�

ProcessVoltage

Current:Fast slew rate and higher startup threshold are desired

V Boost

Turn-On

v (V)l (A)

T (µs)

Benefits

• Precise film-property control

• Higher yield and film quality

• Cost savings

• Worldwide support network

Features

• Complete coverage of DC, pulsed DC, and low-frequency AC

• Best-in-class arc management

• Arc synch

• Pulse synch

• Set point compensation

• Unipolar and bipolar pulsing

• Controlled pulse rise

• Voltage reversal

• High-frequency operation

• Bias and process-power solutions

PROCESS CONTROL FOR REACTIVE SPUTTERING, METALLIC SPUTTERING, AND CATHODIC ARC DEPOSITION

Durable coatings and customizable film properties are key benefits of today’s

PVD processes. From advanced devices, such as cell phones, solar panels,

and flat-panel T.V.s, to more traditional products, such as watches and drill bits,

Advanced Energy® delivers product performance, variety, and value

to meet the needs of any application.

We offer complete coverage of DC, pulsed DC, and low-frequency AC, with

field-proven performance, unique control of power-delivery parameters, and

a range of options to optimize cost over the lifetime of your product. With the

most comprehensive, high-performing power-supply portfolio in the industry,

decades of expertise, and a vast network of support sites across the globe,

Advanced Energy® heightens the possibilities for PVD process control and

product quality.

2

Precise Film-Property Control

Select the ideal power supply and features for your film-property and cost requirements

from AE’s wide product portfolio. Tight performance parameters, customizable power

delivery, precision pulsing, and multi-level arc management enable the process stability

and control required to create customized film density, uniformity, refraction, transmission,

and morphology.

Pulsed DC units, including the Ascent® DMS, Solvix by AE, and Pinnacle® Plus+ series, reduce

arcing, while improving deposition rate, film flatness, and film density. Ascent DMS units

also offer unique power-delivery options, including selectable frequency; power, current, or

voltage regulation; independent power-ratio regulation for each magnetron;

and unipolar and bipolar operation.

Solvix by AE bias units enable advanced control of ion energy, for even greater precision

of film characteristics such as stress, packing density, and degree of implantation.

20 kHz

Ascent® DMS Series

Ascent® AMS Series

Optimized power delivery for dual-

magnetron sputtering

A controlled voltage overshoot at the beginning of each pulse enables faster current

rise time and greater control of ion energy compared to conventional systems.

The optimized waveform of Ascent® power supplies enables precise control

of film properties such as stress, refraction, density, uniformity, and morphology.

ASCENT® DMS and AMS SERIES

CONTROLLED PULSE RISE PRECISE FILM PROPERTY CONTROL

2 kHz

DC

End Boost

Turn-O�

ProcessVoltage

Current:Fast slew rate and higher startup threshold are desired

V Boost

Turn-On

v (V)l (A)

T (µs)

Benefits

• Precise film-property control

• Higher yield and film quality

• Cost savings

• Worldwide support network

Features

• Complete coverage of DC, pulsed DC, and low-frequency AC

• Best-in-class arc management

• Arc synch

• Pulse synch

• Set point compensation

• Unipolar and bipolar pulsing

• Controlled pulse rise

• Voltage reversal

• High-frequency operation

• Bias and process-power solutions

PROCESS CONTROL FOR REACTIVE SPUTTERING, METALLIC SPUTTERING, AND CATHODIC ARC DEPOSITION

Durable coatings and customizable film properties are key benefits of today’s

PVD processes. From advanced devices, such as cell phones, solar panels,

and flat-panel T.V.s, to more traditional products, such as watches and drill bits,

Advanced Energy® delivers product performance, variety, and value

to meet the needs of any application.

We offer complete coverage of DC, pulsed DC, and low-frequency AC, with

field-proven performance, unique control of power-delivery parameters, and

a range of options to optimize cost over the lifetime of your product. With the

most comprehensive, high-performing power-supply portfolio in the industry,

decades of expertise, and a vast network of support sites across the globe,

Advanced Energy® heightens the possibilities for PVD process control and

product quality.

2 43 5

With the most comprehensive PVD product portfolio in the industry, AE provides your ideal power-delivery solution, backed by a vast network of support sites across the globe.

DC AC Pulsed DC RF Pulsed DC with RF DC with RF

Sputtering Type Magnetron only Magnetron only Magnetron only Magnetron or Diode Magnetron only Magnetron only

Appropriate Target Materials Conductive only Conductive only Conductive only All targets Conductive only Conductive only

Typical Sputtering Rate (% of DC) 100% 70 to 85% 70 to 85% 20% 70 to 90% 70 to 95%

Cost and Complexity

Campaign Length

Film Quality

Optical Transmission

Resistivity

Pinholes

Packing Density

* No loss of anode even when using only one cathode LEGEND Best Excellent Very Good Good

Process Type Applications AE Solutions

Low and Mid Power High Power

Reactive Sputtering

Single Cathode Anti-reflective coating Passivation layers

Pinnacle® Series Pinnacle® Plus+ Series

Solvix by AE Series

Dual Cathode Functional, decorative, and hard coatings TCO layers

PEII Series Crystal® Series Ascent® DMS Series

Metallic Sputtering, Single Cathode Functional, decorative, and hard coatings TCO layers

Pinnacle® Series Ascent® AMS Series

Cathodic Arc Deposition Functional, decorative, and hard coatings (TiN, TiCN, ALTiN, ALCrSiN, TiB

2, CrN, and more)

Solvix by AE Series Solvix by AE Series

MaterialCathode Configuration

Process Requirements

AE SolutionArc Management Arc Synch

Set Point Compensation

Unipolar Pulsing Pulse Synch Voltage Reversal Bipolar Operation High Frequency

Metal

SingleAscent® AMS Series

Pinnacle Series

Dual

Ascent® DMS Series

PEII Series Crystal® Series

TCO

Single

Ascent® AMS Series

Pinnacle Series

Pinnacle® Plus+ Series

Dual

Ascent® DMS Series

PEII Series

Crystal® Series

Insulator

Single Pinnacle® Plus+ Series

Dual

PEII Series

Crystal® Series

Ascent® DMS Series

Required Possibly required

Higher Yield and Film Quality

AE arc management maintains process

stability and throughput even with the

most arc-prone materials, such as AZO,

IGZO, IZO, Al2O

3, and SiO

2. Sophisticated

arc inhibition, detection, and response

reduce arc rate and quickly extinguish arcs.

Engineered to remove power quickly, store

extremely low energy, dissipate energy

stored in output cabling, and gradually ramp

power after an arc event, AE power supplies

reduce arc-caused film defects and process

interruptions.

In any PVD sputtering process, arcing forms near insulative regions that are either inclusions in the target or debris on the target surface. These insulative regions will develop a charge buildup until sufficient to cause an electrical breakdown.

Reduced Defects and Higher Throughput for the Most Arc-Prone Processes

Available Feature Description

Low stored energy AE power supplies reduce arc energy and resulting film defects by offering the lowest stored-energy levels in the industry.

Voltage reversal Power supplies inhibit arc formation, quench arcs that do occur, and dissipate energy stored in output cabling by reversing voltage periodically or in response to an arc event.

User-selectable arc handling parameters Customize arc handling to suit your target material and film-property requirements by adjusting voltage trip level, delay to shutdown, and shutdown time.

Progressive off-time Actual arc rate and energy determines off time, reducing persistent arcs, preserving power levels, and increasing throughput.

Controlled arc-response recovery Power supplies minimize arc re-ignition and persistent arcs by gradually ramping power after arc handling.

Set point compensation To maintain set point over time and increase throughput, power supplies regulate delivered power to compensate for cumulative arc-response off-time.

Arc Synch Achieve higher power levels and throughput by connecting multiple units and synchronizing their arc responses.

Reduced Arc Rate and Energy: Voltage Reversal

Inhibits arc formation

+ + +

–––

Discharging the dielectric surfaces

0

Trev T

onT

cycle

Time

Vo

ltag

e

Sputter-deposition of dielectric layers and charging up dielectric surfaces

The first technology that proactively inhibits arc formation, quenches arcs that do occur, and dissipates energy stored in output cabling, voltage reversal is field-proven over two decades of use in AE power supplies. It clears charge buildup periodically or in response to an arc event. With pulsed power, a reversal occurs during each pulse.

Quenches existing arcs

Dissipates energy stored in output cabling

Voltage reversal reduces arc rate by periodically clearing charge buildup.

It reduces arc energy to less than 1 mJ/kW by dissipating energy stored

in output cabling.

5

Higher Yield and Film Quality

AE arc management maintains process

stability and throughput even with the

most arc-prone materials, such as AZO,

IGZO, IZO, Al2O

3, and SiO

2. Sophisticated

arc inhibition, detection, and response

reduce arc rate and quickly extinguish arcs.

Engineered to remove power quickly, store

extremely low energy, dissipate energy

stored in output cabling, and gradually ramp

power after an arc event, AE power supplies

reduce arc-caused film defects and process

interruptions.

In any PVD sputtering process, arcing forms near insulative regions that are either inclusions in the target or debris on the target surface. These insulative regions will develop a charge buildup until sufficient to cause an electrical breakdown.

Reduced Defects and Higher Throughput for the Most Arc-Prone Processes

Available Feature Description

Low stored energy AE power supplies reduce arc energy and resulting film defects by offering the lowest stored-energy levels in the industry.

Voltage reversal Power supplies inhibit arc formation, quench arcs that do occur, and dissipate energy stored in output cabling by reversing voltage periodically or in response to an arc event.

User-selectable arc handling parameters Customize arc handling to suit your target material and film-property requirements by adjusting voltage trip level, delay to shutdown, and shutdown time.

Progressive off-time Actual arc rate and energy determines off time, reducing persistent arcs, preserving power levels, and increasing throughput.

Controlled arc-response recovery Power supplies minimize arc re-ignition and persistent arcs by gradually ramping power after arc handling.

Set point compensation To maintain set point over time and increase throughput, power supplies regulate delivered power to compensate for cumulative arc-response off-time.

Arc Synch Achieve higher power levels and throughput by connecting multiple units and synchronizing their arc responses.

Reduced Arc Rate and Energy: Voltage Reversal

Inhibits arc formation

+ + +

–––

Discharging the dielectric surfaces

0

Trev T

onT

cycle

Time

Vo

ltag

e

Sputter-deposition of dielectric layers and charging up dielectric surfaces

The first technology that proactively inhibits arc formation, quenches arcs that do occur, and dissipates energy stored in output cabling, voltage reversal is field-proven over two decades of use in AE power supplies. It clears charge buildup periodically or in response to an arc event. With pulsed power, a reversal occurs during each pulse.

Quenches existing arcs

Dissipates energy stored in output cabling

Voltage reversal reduces arc rate by periodically clearing charge buildup.

It reduces arc energy to less than 1 mJ/kW by dissipating energy stored

in output cabling.

The Pulsed-DC Advantage

AE pulsed-DC power supplies reduce arcing while improving deposition rate, film flatness, and packing density. Pulsing lowers the effective

electronic voltage of the whole plasma while maintaining the actual delivered voltage of individual electrons. AE units enable you to create

a customized pulse profile, and to coordinate bias with process-power pulsing.

Film quality produced by straight-DC power (left) vs. pulsed-DC power (right) Source: Centre for Advanced Materials and Surface Engineering, University of Salford, U.K.

Comparison of the impact of arcs using a power supply with pulsing and without pulsing

2500

2250

2000

1750

1500

1250

1000

750

500

250

00 10 20 30 40 50 60 70 80

Time (sec)

Pulsed DC - Hard Arcs

Pulsed DC - Total Arcs

DC - Hard Arcs

DC - Total Arcs

Arc

Co

un

ts

Unipolar Pulsed DC

Ascent® DMS Series

Ascent® AMS Series

Solvix by AE Series

Pinnacle® Plus+ Series

Solvix by AE Series

Bipolar Pulsed DC

Ascent® DMS Series

Ascent® AMS Series

C3

MeasureValueStatus

P1:rpwr(C1,C) P2:rpwr(C3,C)14.81 KV2

P3:mean(C1) P4:mean(C2) P5:max(C3) P6:rms(C4) P7:freq(C3)20.00102kHz

P8:max(C4)

6

Cost Savings

Target Utilization—Excellent arc management reduces target damage, extends target lifetime, and minimizes process interruption for target

replacement. The Ascent DMS series’ individual control of the power delivered to each magnetron allows duty cycle to be customized to the wear

profile of any target material. This enables increased target-wear uniformity and better utilization. Fixed-frequency output also decreases target

damage and nodule formation, further extending target lifetime. Longer runs between maintenance also increase yield and overall profit.

Reliability and Serviceability—Field-proven reliability and compact, streamlined designs lower maintenance costs and enable easy service.

Enhanced Film-Property Control: Solvix by AE Bias Systems

Solvix byAE

Bias Unit

-

-

+

+Solvix by

AEArc Unit

Solvix by AE process power and bias units enable a remarkable degree of process and film-

property control by modulating ion energy as it impacts the substrate. They easily integrate

and allow users to determine film stress, packing density, and degree of implantation,

with high precision.

The Solvix by AE arc-bias solution brings

a new level of precision and productivity

to cathodic arc processes. Powerful arc

discharges, rapid vaporization of target

material, and high-energy ions make cathodic

arc deposition both powerful and potentially

unstable. Available at a range of current levels

up to 400 A, Solvix by AE arc supplies deliver

excellent plasma ionization, ion energy, and

throughput—with remarkable power and

process control. Solvix by AE bias supplies

add an even greater degree of control over

film properties, for remarkably hard, dense,

durable, adherent films. Backed by Advanced

Energy, the world leader in power conversion

technology, the Solvix by AE arc-bias solution

is high-performing, rugged, and cost effective

for your advanced cathodic arc processes.

Proven Reliability

The Solvix by AE arc-bias system features

highly developed DC and pulsed-DC

technology. Units are streamlined to eliminate

potential points of failure. Constructed at a

world-class manufacturing facility that has

received the highest scores from the most

discerning OEM auditors, these rugged power

supplies are highly reliable, with > 10 years of

proven field operation.

7

2013 Advanced Energy Industries, Inc. All rights reserved. Advanced Energy®, A Powerful Advantage™, Ascent®, Crystal®,

and Pinnacle® are U.S. trademarks of Advanced Energy Industries, Inc

ENG-PVD-230-01 0M 4.13

Advanced Energy Industries, Inc. 1625 Sharp Point Drive Fort Collins, Colorado 80525 U.S.A.

T: 800.446.9167F: +1.970.221.4670 www.advanced-energy.com

For more information on AE’s complete product portfolio, visit www.advanced-energy.com/en/Products.html

Specifications are subject to change without notice.

Worldwide Support Network

More than 200 professionals are available around the clock—in dozens of locations around the world—to provide highly responsive sales,

service, and technical support. Our comprehensive network of AE offices and regional partners provides insight into your product, process,

and application, from a location near you.

Thermal Product Manufacturing:Vancouver, WA, USA

Design, Sales, and Service:San Jose, CA, USA

World Headquarters:Fort Collins, CO, USA

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Sales, Service, and Regional Manufacturing:Seoul, Korea

Sales and Service:Fujisawa, Japan

Sales and Service:Filderstadt, Germany

Sales, Service, and Regional Manufacturing:Shanghai, China

Design Center:Villaz-St-Pierre, Switzerland

High-Volume Manufacturing: Shenzhen, China

Sales and Service:Hsinchu, Taiwan

Sales and Service:SingaporeDesign and launch

Manufacturing

Sales and service

World Headquarters