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First-principles Study of 2D van der Waals Heterojunctions Jinlong Yang Email: [email protected] Hefei National Laboratory for Physical Sciences at Microscale, University of Science and Technology of China

First-principles Study of 2D van der Waals Heterojunctionsth.fhi-berlin.mpg.de/meetings/faesm2016/uploads/... · C-N1 = 1.47 Å, d C-N2 = 1.33 ... ChemPhysChem, 10.1002/cpp(hc.201600209(2016)

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Page 1: First-principles Study of 2D van der Waals Heterojunctionsth.fhi-berlin.mpg.de/meetings/faesm2016/uploads/... · C-N1 = 1.47 Å, d C-N2 = 1.33 ... ChemPhysChem, 10.1002/cpp(hc.201600209(2016)

First-principles Study of 2D van der Waals Heterojunctions

Jinlong Yang

Email: [email protected]

Hefei National Laboratory for Physical Sciences at Microscale,University of Science and Technology of China

Page 2: First-principles Study of 2D van der Waals Heterojunctionsth.fhi-berlin.mpg.de/meetings/faesm2016/uploads/... · C-N1 = 1.47 Å, d C-N2 = 1.33 ... ChemPhysChem, 10.1002/cpp(hc.201600209(2016)

Outline

Introduction Our works

Graphene/Silicene g ZnO BP MoS Graphene/Silicene, g-ZnO, BP, MoS2

g-C3N4/MoS2, C2N Phosphorene nanoflake heterojunctions

Conclusions Conclusions

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Introduction From 3D to 2D materials

monocrystalline silicon graphene

Free electron DOS (per volume) in 2D and 3Dn(E) n(E)

E E0 0

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Superiority of graphene

Nature 2005, 438, 7065 Ph R L tt7065; Phys. Rev. Lett. 2006, 96, 136806; Nature 2007, 448, 571; Nature Mater. 5 ; atu e ate2007, 6, 183; Science 2008, 320, 5881; Science 2008, 321 385 N L tt321, 385; Nano Lett. 2008, 8, 902; Phys. Rev. B 2009, 80, 245406; Adv. Funct. ;Mater. 2009, 19, 3077; Science 2013, 340, 6139.

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Other 2D materials

1 Phys. Rev. Lett. y2012, 108, 155501;2 Nature Nanotech. 2014, 9, 372;3 Phys. Rev. Lett. 2007, 99, 026102;4 Phys. Rev. Lett. 2010, 105, 136805;5 Nature Mater. 2009, 8, 76;6 N t M t6 Nature Mater. 2004, 3, 404.

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Why 2D van der Waals heterojunctions?

Simplest junction. Interface is clean and controllable Junction -> element of devices

Extend properties of 2D materials Bandgap opening, electric field response

New phenomena and applications Schottky and ohmic contacts, tunable self-doping Water splitting, solar cells

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Classification

Metal/Metal Graphene/Silicene

Metal/Semiconductor Metal/Semiconductor Graphene/Phosphorene, Graphene/g-ZnO,

G h /M SGraphene/MoS2

Semiconductor/Semiconductor/ g-C3N4/MoS2, Bi-layer blue phosphorus Phosphorene Nanoflake Heterojunctions Phosphorene Nanoflake Heterojunctions

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Metal/Metal

E’FEF

Charge transfer Self-doping

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Metal/Semiconductor

CBMEF

VBM

S h k h iCh t f Schottky or ohmic contactCharge transfer

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Semiconductor/Semiconductor

CBMCBM

CBMCBM CBM

CBM

VBM

CBM

VBMCBM

VBM

Energy levelVBM

Type I

VBM

Type II

VBM

Type III

Energy level alignment

Type I Type II Type III

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Our works

Graphene/Silicene, g-ZnO, BP, MoS2Graphene/Silicene, g ZnO, BP, MoS2 Tuning properties of Graphene

C N /M S C N g-C3N4/MoS2, C2N Visible light-driven water splitting

Phosphorene nanoflake heterojunctionsHighly efficient solar cells Highly efficient solar cells

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I. Tuning properties of graphene

Graphene/SiliceneG phene/g ZnO Graphene/g-ZnO

Graphene/Black phosphorus Graphene/MoS2

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Graphene/Silicene

Silicene Graphene Silicene p type dopingSiliceneWf = 4.6 eV

GrapheneWf = 4.3 eV

Silicene p-type dopingGrpahene n-type doping

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Graphene/Silicene

Tunable self-dopingTunable self doping with the interfacial distance increases:

Silicenep-type -> n-typep yp yp

Graphenen type > p typen-type -> p-type

Doping charge carrier concentrations as a function of interfacial distance D (Å).

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Graphene/g-ZnO

Graphene/Pristine g-ZnO

Fermi level remains in Fermi level remains in the induced gap

No charge transfer

Graphene g-ZnO Graphene/g-ZnO

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Graphene/Al doped g-ZnO

Graphene/Al doped g-ZnO

Al doped n-type g-ZnO

Al d d G h /

Al doped n-type g-ZnO Dirac point below the

Fermi level Electron doping in

Graphene Al dopedg-ZnO

Graphene/Al doped g-ZnO

Electron doping in graphene

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Graphene/Li doped g-ZnO

Graphene/Li doped g-ZnO

Li d d t Z O

Li d d G h /

Li doped p-type g-ZnO Dirac point above the

Fermi levelGraphene Li doped

g-ZnOGraphene/

Li doped g-ZnO Hole doping in graphene

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Graphene/PhosphoreneTunable Schottky barriers with the interlayer distance increases:

ÅD < 3.5 Å, p-type Schottky contactD > 3.5 Å, n-type Schottky contact

S h k bΦBn: n-type Schottky barrierΦBp: p-type Schottky barrier

D = 2.8 3.0 3.5 4.0 4.5 (Å)

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Graphene/MoS2

Applying electric fields perpendicular to graphene/MoS2, tunable p-type doping ofp type doping of graphene is very easy to achieve.

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Graphene/MoS2/Graphene

Applying electric fields perpendicular toperpendicular to graphene/MoS2/graphene, tunable p-type doping of

h i tgraphene is very easy to achieve, while graphene on the other side is weak n-type doped.

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Summary Tunable self-doping can be obtained in

graphene/silicene bygraphene/silicene by Interlayer distance

Tuning properties of graphene can be achieved in graphene/semiconductor composites bygraphene/semiconductor composites by Doping type of semiconductor Interlayer distance Interlayer distance Vertical electric fields

R i H Y C M S i 112 518 (2016)Review: Hu-Yang, Comput. Mat. Sci. 112, 518 (2016)

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II. Visible light-driven water splitting

g-C3N4/MoS2

C N /C N g-C3N4/C2N

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BackgroundEnergy and

environment problemsClean energy

(H )environment problems (H2)

+ Co catalystsMetal-free + Co-catalystsg-C3N4

High H2 production activity

Poor H2 production activity

Challenge: Separation of electron and hole

yy

Wang, Maeda, Thomas, et al., Nat. Mater. 2008, 8, 76; Maeda, Wang, Nishihara, et al., J. Phys. Chem. C 2009, 113, 4940; Di, Wang, Thomas, Anonietti, ChemCatChem 2010, 2, 834; Hou, Laursen, Zhang, et al., Angew. Chem. Int. Ed. 2013, 52, 3621.

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Solution

CBM e-

g-C3N4 MoS2+

CBM

VBMh+

Could g-C3N4 and VBM

Type II

h+g 3 4

MoS2 form Type II alignment??

Type II

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Monolayer of g-C3N4

dC-N1 = 1.47 Å, dC-N2 = 1.33 Å

Direct band gap of 2.7 eV

VBM is dominated by N2 VBM is dominated by N2

CBM is contributed by C and N2

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Monolayer of MoS2

dMo-S = 2.42 Å, dS-S = 3.13 Å

Direct band gap of 2.0 eV

VBM and CBM are all mainly VBM and CBM are all mainly contributed by Mo 4d orbitals and S 3p

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Geometry and band structure

Interlayer distance is 2.97 Åy Direct band gap of 1.89 eV at the Γ points

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Total and partial DOS

VBM is mainly contributed by g-C3N4

CBM is dominated by MoS2

Type II heterostructure is

constructed.

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Charge transfer

Charge transfer from g C N to MoSg-C3N4 to MoS2

Red and blue regions represent charge accumulation andaccumulation and depletion, respectively.

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Optical absorption

g-C3N4/MoS2 nano-composite exhibits morecomposite exhibits more effective UV absorption and enhanced low-energy i ibl li htvisible light response

than g-C3N4 monolayer.

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Carrier transfer and separation

The VB offset is 0.15 eV

h C ff 0 83 The CB offset is 0.83 eV

Electrons transfer from CB of g-C3N4 to CB of MoS2

Holes transfer from VB of o es a s e o oMoS2 to VB of g-C3N4

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Monolayer of C2N

structure

Direct band gap of monolayer C2N is 2 47 eV

band structure

Direct band gap of monolayer C2N is 2.47 eV

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g-C3N4/C2N nanocomposite

g-C3N4

C2N

AA AB AC

AC stacking is the most stable The buckling of g C N The buckling of g-C3N4

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Charge redistribution & band alignment g-C3N4 layer induces electron-

rich and hole-rich regions in th C N lthe C2N layer

VBM is mainly contributed by g-C3N4

CBM is dominated by C2N

Type II band alignment

before contact after contact

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Charge separation & Optical absorption

Three paths of separation: 1) photo-generated electrons in CBM of g-C3N4 migrate to CBM of C2N, 2) photo-generated holes in VBM of C2N transfer to VBM of g-C3N4, 3) electrons in VBM of g-C3N4 can be directly excited to CBM of C2N due to interlayer coupling.

g-C3N4/C2N nanocomposite exhibits significantly enhanced UV and visible light absorption than g-C3N4 monolayer.

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Summary The g-C3N4/MoS2 (C2N) nanocomposite

t t t II b d li tconstructs type II band alignment heterojunction.

With the benefit of type II heterojunction the With the benefit of type II heterojunction, the separation of electron and hole will be more efficient.efficient.

Wang-Guan-Huang-Li-Yang, J. Mater. Chem. A 2, 7960 (2014)Wang-Li-Yang, ChemPhysChem, 10.1002/cphc.201600209(2016)g g, y , p ( )

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III. Highly efficient solar cells

Phosphorene nanoflake heterojunctions

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Edge-modified PNF heterobilayer

Type-II band alignmentEdge dipole induced potential shift

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Edge states and energy gaps

No edge states in HOMO/LUMO in PNFs Edge decoration has little effect on gaps

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HOMO/LUMO energy

Edge decoration has strong effect

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Hybrid molecular orbital diagram

P-H and P-F bonds are more stable

HOMO/LUMO states are from inner P atoms

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HPNF/FPNF heterobilayer

Small HOMO/LUMO energy gaps Separated HOMO/LUMO states Enhanced light absorptionEnhanced light absorption

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PNF heterojunction solar cells

Power conversion efficiency ~ 20%Energy gap (1.5 eV) and conduction band offset (0.15 eV)

Phosphorene/MoS2 (16-18%)Phosphorene/MoS2 (16 18%) PCBM/CBN (10-20%)

g SiC (12 20%) g-SiC2 (12-20%)

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Summary

Propose edge-modified PNFs as donor and acceptor heterojunction solar cells

No edge states in HOMO/LUMO in PNFsg / Edge decoration has little effect on gaps Small HOMO/LUMO energy gapsSmall HOMO/LUMO energy gaps Separated HOMO/LUMO states Enhanced light absorption Enhanced light absorption

Hu-Lin-Yang-Dai-Yang, Nano Lett. 16, 1675 (2016)

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Conclusions

Weak interlayer van der Waals interactions in 2D heterojunctions can induce new properties and phenomena:

Bandgap opening charge transfer and new optical absorption; Bandgap opening, charge transfer and new optical absorption;

Self-doping, Schottky and ohmic contacts and electric field response.

With excellent structural, electronic, electrical and optical properties combined, 2D van der Waals heterojunctions are p p , jexpected to be applied in efficient electronic, electrochemical, photocatalytic, photovoltaic, photoresponsive and memory devices.

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AcknowledgementCollaborators:

W Hu T Wang J Wang Z Guan L Hu W. Hu, T. Wang, J. Wang, Z. Guan, L. Hu, H. Wang

f h h Profs. Zhenyu Li, Jin Zhao, Qunxiang Li

Supports: NSFC MOST MOE CAS NSFC, MOST, MOE, CAS USTCSCC, SCCAS, Tianjin and Shanghai

Supercomputer CentersSupercomputer Centers

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THANK YOU!