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Engineering and Development of a Transportable ALD Reactor/ Measuring Growth of CeO 2. Adam Kueltzo Thornton Fractional North High School August 2nd, 2012 University of Illinois at Chicago Advanced Materials Research Laboratory ( AMReL ) - PowerPoint PPT Presentation
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Engineering and Development of a Transportable ALD Reactor/ Measuring
Growth of CeO2
Adam KueltzoThornton Fractional North High School
August 2nd, 2012
University of Illinois at ChicagoAdvanced Materials Research Laboratory (AMReL)
Mentors: Sathess Selvaraj, Jorge Rossero, Dr. C.G. Takoudis, and Dr. G. Jursich
Departments of Bioengineering and Chemical Engineering
PurposeDevelop a plan for construction of an
transportable atomic layer deposition (ALD) reactor
ALD reactor will be transported to Argonne National Laboratory
In-situ X-ray analysis at the Advanced Photon Source (APS)
Experimental Station at APS
GoalsAssess the current status of the ALD system
in placeVacuum pump
completed …pressure…temperature…Configuration
completed…valves…gaskets…tubing Flow meter control
completed
Other goals to will be met soon
Vacuum PumpWasn’t pumping
down to low enough pressure -30mTorr
Tested at machine shop and singled out problems in lab
Now pumping down to 10 mTorr
Called company and verified parameters
Mass-flow meter calibration
Found that the flow rate measured was double that found on flowmeter controller.
Compared controller to bubble test.
Flowmeter 1 – 144-148 cc/min
Flowmeter 2 – 148-156 cc/min
Flowmeter 3 – 180-190 cc/min
Flow Bubble Test
Mass Flow Meter
From gas cylinder
Soap solution
Work still in progress
Must be designed for transportation Precursor and water
bubbler design Metal framing for
reactor Exhaust pipe
modification Module and solenoid
placement Movable reactor Finalize water delivery
Precursor Bubbler
Precursor Bubbler- Conflat-lid type
Volume ~ 150 ccT ~ 200 0CP ~ 300 mTorr
Water Bubbler
Water Delivery Line
MKSP
3-way valve
To reactor
Water bath
Flow meter
From cylinder
Exhaust pipe modification
Proposed modification
System Schematic
PurposeVerify growth rate of Cerium Oxide using
precursor- Tris(i-propylcyclopentadienyl)cerium
Possible use as electrolyte when Yttrium doped in Solid Oxide Fuel Cells (SOFC)
High ionic conductivity and lower operating temperature (700oC)
Allows for use of more readily available and cheaper materials
Current ALD Status
ALD Process“One Cycle”PrecursorPurge (N2)Oxidizer (H2O)Purge (N2)
http://www.cambridgenanotech.com/
Results
0 50 100 150 200 250 300 350 400 4500
50
100
150
200
250
300
350
400
450
500
f(x) = 1.21617787034626 x − 13.3725337151783
Growth Rate of Cerium Oxide (CeO2)
Cycle number
Thic
knes
s (A
ngst
rom
s)
Reactor Temp 250oC
Current Testing TEM imaging taking place 400 cycle sampleAnnealed 600oC and 800oC As deposited
AcknowledgmentsCBET-NSF Grant #1142255
Mentors - Dr. Takoudis and Dr. Jursich
Doctoral Students - Sathess Selvaraj and Jorge Rossero
Air Liquide