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Lawrence Livermore National Laboratory, P. O. Box 808, Livermore, CA 94551
Thiswork
performed
under
the
auspices
of
the
U.S.
Department
of
Energy
by
LawrenceLivermoreNationalLaboratoryunderContractDEAC5207NA27344
Crystal Growth andCrystal Growing
Santander Spain, July 20-24, 2009
Lawrence Livermore National Laboratory
SurfacePhenomena
and
Parameters
ofCrystalGrowth:SimpleBasics
ISSCG14, DailanChina,August172010
LLNL-PRES-445231
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Outline Interface:SmoothversusRoughState
Nucleation
GrowthKinetics:
SmoothInterface
RoughInterface
Growthmodes
and
as
grown
defects
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Bibliography
Monographs A.A.Chernov. CrystallizationProcesses. ModernCrystallographyIII.
SpringerSer.SolidState,vol36,1984(basicmolecularandmacroscopicphenomena)
F.Rozenberger.FundamentalsofCrystalGrowth. Springer,1976(phase
diagrams,transport,
convection)
A.Pimpinelli,J.Villain. PhysicsofCrystalGrowth.CambridgeUnivPress,1998(generalphysicalapproach)
K.A.Jackson.KineticProcesses.CrystalGrowth,Diffusion,andPhaseTransitioninMaterials. WileyVCH,Weinheim,2004
J.W.Mullin.Crystallization.
Butterworths,
2001
(4
dedition)
(growth
from
solution,industrialcrystallization)
D.Kashciev. Nucleation.BasicTheoryWithApplications.Butterworth/Heinemann,2000
I.Gutzov,J.Schmelzer.TheVitreousState. Thermodynamics,Structure,Rheology,
and
Crystallization.
Springer,
1995
I.Markov. CrystalGrowthforBeginners.WorldScientific,1996
J.A.Venables.SurfaceandThinFilmProcesses.CambridgeUnivPress,2000
8/13/2019 Chernov ISSCG 14
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J.N.Israelachvili.Intermolecularandsurfaceforces.Academicpress,1992
A.Zangwill.PhysicsatSurfaces. CambridgeUnivPress.1988
MonograpicReviewes
CurrentTopicsidMaterialsScience. Ed.E.Kaldis.NorthHolland,Vols110,1976
1982.
Crystals.Growth.Properties.Applications.Ed.H.C.Freihardt.Springer,Vols113,19781991.
HandbookofCrystalGrowth.EdD.T.J.Hurle,vols1A,B,2A,B,3A,B.NorthHolland,199394
SolidsFar
From
Equilibrium.
Ed
C.Godreche.
Cambridge
Univ
press,
1992
BulkCrystalGrowthofElectronic,OpticalandOptoelectronicMaterials.Ed.P.Capper.J.Wiley&Sons,2005
8/13/2019 Chernov ISSCG 14
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InternationalSummerSchoolsonCrystalGrowth
Crystal Growth AnIntroduction. EdP.Hartman.NorthHolland
1973
CrystalgrowthandCharacterization. Ed.R.Ueda,J.B.Mullin.North
Holland.1974
CrystalgrowthofElectronicMaterials.Ed. E.Kaldis.NorthHolland,
1985
ScienceandTechnologyofCrystalGrowth. Ed.J.P.vanderEerden,
O.S.L.Bruinsma.
Kluwer
1995TheoreticalandTechnologicalAspectsofCrystalGrowth. Ed.
R.Fornari,C.Paorichi. TransTechPublications1998
AdvancesinCrystalGrowthResearch. Ed.K.Sato,Y.Furukawa,
K.Nakajima. Elsevier,2001
CrystalGrowth
From
Fundamentals
to
Technology.
Ed.
G.Muller,
J.J.Metois,P.Rudolf. Elsevier2004
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Smooth and Rough Interface
cubicle approximation
H.J.Leamy,G.Gilmer, K.A.Jackson. In: Surfaces of Materials vol 1 p.121 (1975)
/2kT
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Non-Kossel crystalwi
i = 3
31
2
w
w+
b
c
w-
Kossel CrystalKink
positions of
a molecule
InterfaceGeometry. KinkPosition.
Smooth interface
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S.Toshev,inCrystalgrowthAnIntoduction,EdP.Hartman,NH,1973p.1
m=NA2/3 molar
surface
free
energy
cal/gatom
Enthalpyofmelting,H, cal/gatom
Slope=0.30.5
Fromhomogeneousnucleationinmelts(D.Turnbull):
Interfaceenergy: SL /22/3 h/62/30.17h/2/3
LVLSLVSLSV 3/23/2 )/(13.1)/(13.1
Empirical rule for the crystal melt surface energy
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SurfaceReconstruction,
Si
(001)
Surface energy, Si, crystal vacuum: /22/3 2,600 erg/cm2, saturation oftwo bonds releases 1,000 erg/cm2 (40%) , thus 1,600 erg/cm2.
Experiment, computations: 1,490 1,623 erg/cm2.
M.Lagally et alTypically, no reconstruction in condensed surrounding or in adsorbing gases.
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Chemically Complex Solutions: both h < 0 and h > 0.
Melting and evaporation always require heat supply.
Dissolution:Na2SO4 in water generatesh = 0.28kcal/mol (= 1.9.10
-14erg per molecule)
Na2SO4.10H2O requires h = 18.7kcal/mol.
Mn(NO3)2 generatesh = 12.7kcal/mol,
Mn(NO3)2.7H2O requires h = 6.1kcal/mol.
MgI2, K2CO3, CaBr2 generates 50.2, 6.9, 26.3kcal/mol
The reason hydration (solvation) of ions.
Hydration enthalpy, (ion-dipole electrostatic attraction) x (N of H2O molecules)
Experiment: Na+ 101 kcal/mol, Ca2+ 386 kcal/mol,
SO42- 265 kcal/mol, NO3 74 kcal/mol
Nafor1155.9.225.).(
2 mol
kcal
mol
kcal
r
elZe
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TTm
uL
uS
sLsS
Melt
Solid
T
uL
uS
Liquid,C2>C1
C1 C2
T2T1
Liquid,C2>C1
C1C2
uL1
uL2
uS
TT1T2
Solutions retrograde solubility
Regular melting
Regular solubility Retrograde solubility
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/2kT -0.272 lnCe (mol/m3) + 2.82.
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Step meandering fluctuations by attachments -detachments
2
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( )
Roughening transition: Gstep = UstepTSstep = 0
kTw
e
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Roughening transition viewed by Monte Carlo simulation
meandering rises as /2kT decreases
H.J.Leamy,G.Gilmer, K.A.Jackson in Surfaces of Materials vol 1 p.121 (1975)
/2kT =
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4He Crystal in its melt
1.4K
1K
0.4K
0.1K
S.Balibar, H.Alles, A.Ya. Parshin.
Rev Mod. Phys. 77(2005)317-370
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KH2PO4, KDP CaCO3, Calcite Lysozyme
Step fluctuation viewed by AFM: meanderingincreases together with solubility and decreasing step energy
J.J.DeYoreo, L.N.Rashkovich, R Friddle
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Nucleation:
3Dimensional,
2Dimensional
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Critical
radius:
G
/r
=
0:
rc=
2/Gc=(16/3)
23/2 3Dimensions,sphere
Nucleationis
solids
elastic
stress:
G=(4r3/3)[9(1)(P)2/16E]+4r2Ifelasticstressissignificanttheequilibriumshapeisaflatdisc
orablade
Nucleation rate: J (1/cm3s) = Bexp(- Gc/kT)Nucleation work is minimal for equilibrium shape. Sphere:
G = - (4r3/3) + 4r2
r
srf
3D Homogeneous Nucleation
M -S = kTlnC/Ce - solution = ST = H(T/T) - melt
G
rc=2/
Gc
Classical
Quantum
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Pre-exponent, B
Homogeneous nucleation:B = 4rc2an2exp(E/kT)Z= 4rc2n2Z,
Zeldovich factor: = - (1/nc)(2G(n)/n2)nc,
Z = (/2kT)1/2 = (1/nc)(Gc/3kT)1/2~ 10-2
Heterogeneous nucleation .
Equilibrium shape on a substrate is a part of the free equilibrium shapebecause of the Gibbs-Thomson law:
Estimated B:
vapor B ~ 10281/cm3s; melt B ~1035 1038 1/cm3s, solution B ~ 1027 1/cm3s
Ghet = Gc/
h
L
h/L = /2
hc = 2/
+ s -is
i
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Non steady state nucleation - time lag
G = - n + bn2/3
nc = (32/3)23/()3
n
Gc
Number of nuclei
time
0
n
0 1 2 3 .
N = (Nucleation rate J).Volume.t
Diffusion along the n-axis:
D* = +
+ -
Time to reach maximum of the
nucleation barrier:
~ nc2/D*
(Nucleation Rate J).Volume
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G
rc= /
r
Gc
2D Nucleation
G = - (r2h/) + 2rh
rc= /
Gc = h2
/
New atomic layer, one atomic size or lattice
spacing high, h:
Homogeneous 2D nucleation rate:
J(1/cm2s) = 2rcanexp(-E/kT)nZexp(-Gc/kT) = 2rcn2exp(-Gc/kT)
Heterogeneous 2D nucleation rate: n2 nn*, Gc Gc*
rc+a
rc
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Growth Kinetics
Smooth Interface Layer-byLayer GrowthGeneration of steps:
3D nucleationScrew dislocation
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Nucleation rate, J (nuclei/cm2s = 1/cm2s)
Step expansion rate, v cm/s
Low nucleation rate, small face of the area S: R = JSh
High nucleation rate, large area S: R = h(v2J/3)1/3
h
R rate of the face propagation
SActivenucleation site
v
2 Dimensional nucleation
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M = 14,000 Da, effective
molecular diameter ~ 2.5nm
2D nucleation on lysozyme
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Step Sources: Screw Dislocations
D
R = pv=hv/
h/=p
Face growth rate R:
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(0001) SiC
St P ti Ferritin M = 450 000 Da spheres 13nm
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P.G.Vekilov et al
Step Propagation High Kink Density.
Ferritin, M = 450,000 Da, spheres 13nm,
FCC lattice.
Supply of species to steps and incorporation
into kinks.
1. Surface/at-surface diffusion: vapor, MBE,CVD, etc
2. Bulk diffusion: solution
steps
kinks
(111)
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Incorporation into a kink
,iu
kTi
p Ae
1, sum over medium or solid, except top of the barrier,iu
kTi
i
Ae u E
,ln)(lnlnlnT
uAk
kT
uAAekppkpks ikT
u
iii
i
.,ln kT
Tsu
eAuAkTTs
kT
E
kT
u
ikT
uTsu
i eepepii
pressure,constantator,,
:
Activated complex includes:
The still hydrated molecule/ion to be incorporated, the hydrated kink and their
surrounding,
or
The molecule/atom/ion to be incorporated still bound within the species that havecarried it to the kink and the kink occupied by other species, if any.
Probability of having the activated complex at the energy level ui :
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Kinetic coefficient
kT
Eu
k
ekkTkT
E
kT
E
kT
E
M
SMSSM
ea
CCeeaeeawwa
),()1()()(vk
MeS uCkT ln
aCw
C
CCe
w
wek
e
ekT /fluxexchangetheand
Attachment and detachment frequencies of species to a kink:
kT
E
kT
E SM
ewew
,
kT
uE
kstestst
M
eaCC
2 )/(),(v
Kink velocity:
Step velocity:
Face velocity: )(vst est CCppR
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J.Q.Broughton,A.Bonisent,F.F.Abraham.J.ChemPhys74(1981)4029
Delocalizedinterface
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J.Q.Broughton,A.Bonisnt,F.F.Abraham.J.ChemPhys74(1981)4029
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Meltnearsoidwall densitywaves
Several atomic planes are
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Severalatomicplanesare
beingpacked
simultaneouslyMikheev,Chernov,JCG112(1991)591
Normalgrowthrate:
V=bT
=A(kT/m)
1/2
(T/T),
A1; b=A(k/mT)1/2
Lead:
m=207.1.67.1024g,
T=600K,
(kT/m)1/2 =155m/s
b=26
cm/Sk
Experiment:
b=288cm/sK
Rodway,Hunt
JCG
112(1991)554
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Growth modes andas grown defects
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See K.F.Hulme, J.B.Mullin. Phil Mag 22(1959)1286
K = 0.5
K = 4
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Sectoriality and Striation
Vicinal Sectoriality
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Vicinal Sectoriality
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Bottom Lines
Crystal interface may be either smooth or rough
at high or low energy, respectively.
Surface energy may be estimated from phase transformation
enthalpy for vapor and melt and from solubility for solution.
Growth of a smooth interface is impossible without kinks atsteps and is thus slower than growth of the rough interface full
of kinks or is fully disordered
Growth rate of a smooth interface is controlled by stepgeneration by 2D nucleation or by screw dislocations and by
incorporation of growth units at kinks.
Growth mode controls crystal perfection