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Monolithic CMOS Active Pixel Sensors are obvious for Transmission Electron Microscopy Why? Challenges Possibilities. Pixel Pitch. SiO 2. Diode. Transistor. epi silicon. (Thinned) silicon substrate. T epi. Active Pixel Sensors for Electron Microscopy. - PowerPoint PPT Presentation
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P. Denes STD6 Sep. 2006 1
Active Pixel Sensors for Electron Microscopy
Active Pixel Sensors for Electron Microscopy
Monolithic CMOS Active Pixel Sensors are obvious for Transmission Electron Microscopy
Why? Challenges Possibilities (T
hinn
ed) s
ilico
n su
bstra
te
Tepi
Diode
Transistor
SiO2
PixelPitch
epi s
ilico
n
P. Denes, JM Bussat – Engineering DivisionZ. Lee, V. Radmilovic – National Center for Electron Microscopy
Lawrence Berkeley National Lab
P. Denes STD6 Sep. 2006 2
Scanning EM
Scanning EM
e– Gun
Anode
CondenserLens and Aperture
Sample
ObjectiveLens
Detector
<30 keV Secondary or backscattered
electrons Analogous to metallurgical
light microscope
Scan coils
P. Denes STD6 Sep. 2006 3
Back-scattered electrons
Back-scattered electrons
10
m
S
i
20 keV e–
At energies used for microscopy, electrons really scatter!
P. Denes STD6 Sep. 2006 4
Transmission EM
Transmission EM
100 - 400 keV Transparent (thin) sample Analogous to biological
light microscope
e– Gun
Anode
Condenser Lenses
Condenser Aperture
SampleObjective Lens
Apertures
MagnificationandProjection
Detector
P. Denes STD6 Sep. 2006 5
Energy vs. …
Energy vs. …
Simple approximation:
Pe(>) ~ (t) (Z2/A) / E22
Pi(>) ~ (t) (Z/A) / E22
Pi(>)/ Pe(>) = 1/Z
A/Z ~2 for all elements
Pe(>) ~ tZ / E2
Higher Z more scattering Thinner samples or higher
energies
After Egerton
Biological samples:Z~6 – stain (e.g. UO2(CH3COO)2·2H2O) to increase contrast Materials: higher E, butdisplacement damage (e.g. ~150 keV in Si)
1 pA/nm2 6x1020 e–/cm2/s
P. Denes STD6 Sep. 2006 6
Traditional High-Performance EM Detectors
Traditional High-Performance EM Detectors
backingAgX + gelatin (emulsion)
sub-micron to sub-micron to few micron grainsfew micron grains
photo-sensitivephoto-sensitivephosphor grainsphosphor grains~5 ~5 mm
“Reuseable film”Scanned by laserLinear, eraseable
P. Denes STD6 Sep. 2006 7
Traditional “Digital” EM Imaging Detector
Traditional “Digital” EM Imaging Detector
e Phosphor must be thin to minimize e multiple scattering
Photons scatter Electrons scatter e CCD QE
Phosphor
Fiber Coupling
CCD
P. Denes STD6 Sep. 2006 8
The Problem
The Problem20 keV e– 100 keV e–
200 keV e– 300 keV e–
20
m
S
i
100
m
S
i
20
0
m
Si
30
0
m
Si
P. Denes STD6 Sep. 2006 9
Lens-coupled CCD
Lens-coupled CCD
UCSD
PhosphorCCD
P. Denes STD6 Sep. 2006 10
0
50
100
150
200
250
300
350
400
450
0 100 200 300
Incident Energy [keV]
Ran
ge [ m
]
In the Past 10+ Years
In the Past 10+ Years
Direct detection in CCDs – radiation damage Hybrid pixels
Fan et al. - 1998 Faruqi et al.
Medipix at 120 keVPixel size ~ “blob”size
CMOS APS
“Direct detection in silicon”
P. Denes STD6 Sep. 2006 11
Why APS?Why APS?
0
500
1000
1500
2000
2500
100200300400
Incident Energy [keV]
e/h
pai
rs g
ener
ated
per
in
cid
ent
e2 um Si8 um Si
SiO2 + metal
Si epi
300 keV e
40 µm
P. Denes STD6 Sep. 2006 12
An Example
An Example
Faruqi IWORID 2004
525 x 52525 m pixels0.5 m CMOSfrom RAL
Diffraction pattern from vermiculite
P. Denes STD6 Sep. 2006 13
Pros and Cons
Pros and Cons
Processing Linearity
Resolution Dynamic
range
MTF
MTF x S/N
“Digital” [Si]
Electronic
“ideal” n(e–) = QE x n()
Larger [smaller] pixels
CCDs – 16 bits
[APS – speed]
Regular pattern – aliasing
Better
Film [or I.P.]
Chemical
non-linear – n required to flip a grain; thermal fluctuations vs grain size;
linear
Smaller grains
Locally, ~4 bits; [16 bits]
Given by smallest grains, no aliasing
Worse; [best – at low rate]
P. Denes STD6 Sep. 2006 14
Who Wins?Who
Wins?“Silicon” Film
Regular array of pixelspitch p
Random collection ofdifferent grain sizes
For now film grains smaller than silicon pixels
Analog Digital
P. Denes STD6 Sep. 2006 15
Some Thinning Helps
Some Thinning Helps
1.E-07
1.E-06
1.E-05
1.E-04
1.E-03
1.E-02
1.E-01
0 50 100 150 200 250 300
Radius [m]
En
erg
y D
epo
siti
on
[ke
V/
m2]
Active
Active
8 mActive
50
µm
Tota
l
Active
35
0 µ
mTota
l
300 keV (Front-Illuminated)
P. Denes STD6 Sep. 2006 16
Tests on 200CX at NCEM
Tests on 200CX at NCEM
Assembly jig
HybridPlug
Modified GATAN bright field STEM detector housing at the bottom of the JEOL 200CX TEM
P. Denes STD6 Sep. 2006 17
An Example
An Example
Beamstop on 200CX
(imaged at 200 keV)
12x3640 µm Pixels
24x7220 µm Pixels
48x14410 µm Pixels
APS in0.35 m
Film
P. Denes STD6 Sep. 2006 18
Small Features Visible
Small Features Visible
~20 m features visible with 10 m pixels
PSF ~15 m (equiv. MTF at 40-
50 mm-1 ~ 20% - not as good as film, but close*)
S/N ~8.3 single e– sensitivity
Si Film 25
m
200 keV
*Zuo 2000
P. Denes STD6 Sep. 2006 19
vs. Prediction
vs. Prediction
PSF due to e– multiple scattering at 200 keV ~6 m
Diffusion dominant
Central pixel uniformlyilluminated at 200 keV
P. Denes STD6 Sep. 2006 20
“Specifications”
“Specifications”
Parameter Spec. Units CommentIncident energy 100-300 keVRadiation hardness 300 images/day min.
105 images/day desired~1 year lifetime
e-/pixel/image 500 “imaging”105 “diffraction”
Elements 12002 pixels 200Å field-of-view with pixel size
0.5/3 Å PSF 25% (value at ½ Nyquist)Resolution N i.e. “shot noise limited”Full scale (given by frame rate) e-/pixel/s x frame rateFrame rate <10 ms
Next-generation materials microscope
Biology not so different, except desire to have pixels
P. Denes STD6 Sep. 2006 21
Challenges
Challenges
High S/N is desirable, but need to accommodate 100 (bio) 500 (materials) 105 (diffraction) primary e– per pixel per image (readout rate dependent)
“Resolution” is not the issue (optics set field of view), just number of pixels
Readout speed helps in all applications Radiation damage!
Region of interest:1 – few x M.I. Fr
om
H. S
pie
ler
SEMTEM
P. Denes STD6 Sep. 2006 22
Radiation Damage
Radiation Damage
Displacement damage not significant Ionizing dose not negligible
1.E-01
1.E+00
1.E+01
1.E+02
1.E+03
1.E+04
1.E+05
0 10 20 30 40 50
Pixel Pitch [m]
Rad
s
Average doseper pixel forimaging
Peak doseper pixel fordiffraction
One image
P. Denes STD6 Sep. 2006 23
What We’ve Been Up To
What We’ve Been Up To
Two 0.25 m CMOS Prototypes (2005)
19 m pixelsin-pixel CDS
6 m pixels
on-chipdigitizers
Readout System
5 mm
P. Denes STD6 Sep. 2006 24
Now in Fab
Now in Fab
9 m pixels 512 x 512 Adjustable gain Same backend
(digitizers and readout)
Prototype for 2k x 2k
P. Denes STD6 Sep. 2006 25
What This Achieves
What This Achieves
Unprecedented speed Visualize catalysis Reduce beam-induced motion of
biological samples
High DQE Good single e– sensitivity and good
PSF DQE = 1 if variance of input signal
faithfully transmitted
Spatial resolution better than fiber-coupled phosphor + CCD Eventually approach film
Uniformity and linearity
Radiation hardness requirement not negligible
Atomic resolution image ofstacking faults in Gold
P. Denes STD6 Sep. 2006 26
(An) Ultimate Goal
(An) Ultimate Goal