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ramani-chandran documents
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OES in Ar and N- Determination of Electron T and Density by Line-ratio Method
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Anomalous Current and Voltage Fluctuations in High Power Impulse Magnetron
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DAAD UA MOU December 2014
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Damon Self‐Understanding
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1 Hf Based High-k Dieelctrics
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High Power density of deposition system
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Effect of Intrinsic Stress
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Palmucci 2013 Journal of Physics D Applied Physics
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Damon Stages of Friendship
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Micro structure engineering
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Damon - Infancy to Adelocance
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Titanium Oxide Thin Films
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Deposition of Rutile (TiO2) With Preferred Orientation by Assisted High Power Impulse Magnetron Sputtering
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Encoding Active Device Elements at Nanowire Tips
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Self-Diffusion in Amorphous Silicon
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Design Optimization of Cryptography
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06525366
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Memristor concept with basic introductory physics
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Plasma Electronegativity
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Ion Composition in HiPIMS
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Inquiry Based Teaching Test Schores
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