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jong-seok-kim documents
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A comparative study on the properties of TiN films prepared by chemical vapor deposition enhanced by r.f. plasma and by electron cyclotron resonance plasma
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Effects of deposition parameters on composition, structure, resistivity and step coverage of TiN thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor
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Topological properties of folded hyper-star networks
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Comments on “A Class of Fault-Tolerant Multiprocessor Networks”
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A multi-level multi-phase charge-recycling method for low-power AMLCD column drivers
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