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C2c.slides v1 - pdf
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Very low defect remote hydrogen plasma clean of Si (100) for homoepitaxy
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Remote plasma-enhanced CVD of silicon: Reaction kinetics as a function of growth parameters
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The use of langmuir probe measurements to investigate the reaction mechanisms of remote plasma-enhanced chemical vapor deposition
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Patient safety and image transfer between referring hospitals and neuroscience centres: could we do better?
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The true value of C-reactive protein measurement in neurosurgical patients