109
Padua University, 16 September 2013 Sputtered thin films for corrosion protection of targets for radiopharmaceutical production Anna Skliarova

Sputtering for radiopharmaceutical application

Embed Size (px)

Citation preview

Page 1: Sputtering for radiopharmaceutical application

Padua University, 16 September 2013

Sputtered thin films for corrosion

protection of targets for

radiopharmaceutical production

Anna Skliarova

Page 2: Sputtering for radiopharmaceutical application

Radioisotope=radionuclide is an

atom with an unstable nucleus.

Can undergo radioactive decay, resulting in the

emission of γ-ray(s) and/or α- or β-particles.

2

Page 3: Sputtering for radiopharmaceutical application

PET- positron

emission tomography

3

Radionuclides have wide medical applications:

Page 4: Sputtering for radiopharmaceutical application

SPECT- single photon emission computed tomography

4

Radionuclides have wide medical applications:

Page 5: Sputtering for radiopharmaceutical application

Diagnostic

imaging

Therapeutic

applications

5

SPECT/PET-CT

Page 6: Sputtering for radiopharmaceutical application

Amount of radionuclides produced by

cyclotrons increases year by year

6

Monthly [18F]FDG activities from January 2003 to August 2011;there is a >5 fold increase in produced activities over this period.

Page 7: Sputtering for radiopharmaceutical application

7

Cyclotron

Page 8: Sputtering for radiopharmaceutical application

8

The most used radionuclide in PET [18F]F¯

is produced almost exclusively via

proton irradiation of [18O]H2O

18Op

18F

n

g

Page 9: Sputtering for radiopharmaceutical application

9

Proton irradiation cause water radiolysis

H2O H2, O2, H2O2, ∙OH, H, e-aq,

HO2∙, O2-, HO2

-, OH-, H+, …

Page 10: Sputtering for radiopharmaceutical application

10

Proton irradiated water

is extremely corrosive!

Page 11: Sputtering for radiopharmaceutical application

11

Liquid target structure

Havar®

(Co, Cr, Fe, Ni, W, Mo, Mn, C)

Nb bulk

Page 12: Sputtering for radiopharmaceutical application

12

Need of corrosion resistant top-coating

onto the Havar® beam window

Havar® foil corroded on beam spot

Page 13: Sputtering for radiopharmaceutical application

Problem 1:

Proton irradiated Water corrosion

13

Problem 2:

Liquid metal embrittlement

in liquid metal cooling systems

Page 14: Sputtering for radiopharmaceutical application

14

Liquid metal embrittlement

Page 15: Sputtering for radiopharmaceutical application

Problem 1:

Proton irradiated Water corrosion

15

Problem 2:

Liquid metal embrittlement

Page 16: Sputtering for radiopharmaceutical application

16

Can be solved by appropriate

protective coatings

Page 17: Sputtering for radiopharmaceutical application

17

Refractory metals Nb, Ta, Pt, Zr

have extreme chemical resistance

Page 18: Sputtering for radiopharmaceutical application

Chemical inertness is mandatory,

but not enough

18

Page 19: Sputtering for radiopharmaceutical application

Microstructure has a great influence

on corrosion process

19

Page 20: Sputtering for radiopharmaceutical application

Which film deposition techniques

do you know?

Which one can provide the

microstructure control?

20

Page 21: Sputtering for radiopharmaceutical application

SPUTTERING

21

Page 22: Sputtering for radiopharmaceutical application

22

Page 23: Sputtering for radiopharmaceutical application

23

Page 24: Sputtering for radiopharmaceutical application

24

Page 25: Sputtering for radiopharmaceutical application

25

Page 26: Sputtering for radiopharmaceutical application

26

Experimental

technique

Page 27: Sputtering for radiopharmaceutical application

27

Sputtering system

Page 28: Sputtering for radiopharmaceutical application

28

Control panel

Page 29: Sputtering for radiopharmaceutical application

29

Sputtering chamber

Page 30: Sputtering for radiopharmaceutical application

30

Distance from target to sample – 6 cm

• grounded

• No temperature control

• No heating

• No bias

• No plasma cleaning

• liquid nitrogen-cooled

• Cooling by liquid N2

• Possible temperature control

• Possible bias

• Possible plasma cleaning

• No heating

• heated

• Heated

• Temperature control

• No bias

• No plasma cleaning

• water-cooled

• Cooling by water

• Stated temperature

• No bias

• No plasma cleaning

• No heating

Substrate holders

Page 31: Sputtering for radiopharmaceutical application

31

Requirement for corrosion protective coatings:

Uniform thickness

Absence of pin-holes

Low porosity

Low diffusion across grain boundaries

Page 32: Sputtering for radiopharmaceutical application

32

Analyzing technique

Page 33: Sputtering for radiopharmaceutical application

33

Acid porosity test:

Page 34: Sputtering for radiopharmaceutical application

34

Acid porosity test: 10% HCl , 30°C, 10 min

1 2 3 4 5

Page 35: Sputtering for radiopharmaceutical application

35

Liquid Gallium test: 200 °C, 30 h

a) corrosion b) resistance

Page 36: Sputtering for radiopharmaceutical application

36

X-ray diffractometry

2dsinθ=nλ

Page 37: Sputtering for radiopharmaceutical application

37

X-ray diffractometry

Page 38: Sputtering for radiopharmaceutical application

38

Scanning Electron Microscopie

Page 39: Sputtering for radiopharmaceutical application

39

Scanning Electron Microscopie

Page 40: Sputtering for radiopharmaceutical application

40

FIB SEM

Page 41: Sputtering for radiopharmaceutical application

41

SEM, FIB SEM

SEM SEM

FIB SEM FIB SEM

Page 42: Sputtering for radiopharmaceutical application

Approach to corrosion

resistance

42

Page 43: Sputtering for radiopharmaceutical application

43

Coating must be dense with minimal distance between grain boundaries

The best possible Diffusion Barriers are Amorphous!

Microstructure requirements:

Page 44: Sputtering for radiopharmaceutical application

44

Amorphous films have no typical

structural defects of the crystalline state

(dislocations and grain boundaries)

Literature search for corrosion resistance

Page 45: Sputtering for radiopharmaceutical application

45

Diffusion through the amorphous layers is very

difficult due to the irregularity of the atomic

structure

crystalline amorphous

long-range order structure lack of long-range order characteristic

Page 46: Sputtering for radiopharmaceutical application

How to obtain an

amorphous film?

46

Page 47: Sputtering for radiopharmaceutical application

47

Approaches to obtain an amorphous metal film

Substrate Cooling

Alloying with other elements

Page 48: Sputtering for radiopharmaceutical application

48

Experimental results

Page 49: Sputtering for radiopharmaceutical application

49

Coating systems investigated:

Nb

Nb2O5

Nb/Nb2O5 multilayers

Nb-Ta, Nb-Zr, Ta-Zr

Page 50: Sputtering for radiopharmaceutical application

Nb

50

Page 51: Sputtering for radiopharmaceutical application

51

Parameters investigated for Nb coatings:

substrate temperature

• -100°C ÷ 500°C

applied bias

• -150 V ÷ +80 V

sputtering gas pressure

• 310-3 mbar ÷ 310-2 mbar

deposition rate

• 0.5 nm/sec ÷ 5 nm/sec

Page 52: Sputtering for radiopharmaceutical application

Temperature influence

52

Page 53: Sputtering for radiopharmaceutical application

53

Thornton’s Structure Zone Model

Page 54: Sputtering for radiopharmaceutical application

44

44

33

3

54

Temperature influence: acid test

Floating (~250°C)

400°C

500°C

0°C

-100°C

-50°C

300°C

Page 55: Sputtering for radiopharmaceutical application

55

4 0.5 %

-100 °C

4 0.4 %

0 °C

4 1 %

Floating

3 0.04 %

500 °C

- 0 %

800 °C

Temperature influence: SEM

Acid test (1÷5)

Optical profilometry

(%)

Page 56: Sputtering for radiopharmaceutical application

56

4 0.5 %

-100 °C

4 0.4 %

0 °C

4 1 %

Floating

3 0.04 %

500 °C

- 0 %

800 °C

Temperature influence: FIB SEM

Page 57: Sputtering for radiopharmaceutical application

Substrate bias influence

57

Page 58: Sputtering for radiopharmaceutical application

58

What happens if substrate is at

negative potential?

Page 59: Sputtering for radiopharmaceutical application

59

-80 V DC

-400 V DC

grounded

Page 60: Sputtering for radiopharmaceutical application

DC bias -80 V -50 V -80 V -80 V -150 V

Arpressure,

mbar310-2 510-3 510-2 310-3 310-3

Porosity acid test 3 2 1 1 2

60

DC-biased MS

Page 61: Sputtering for radiopharmaceutical application

DC-biased MS of Nb:

61

SEM SEM

FIB SEM

Page 62: Sputtering for radiopharmaceutical application

62

All Nb coatings are columnar!

Page 63: Sputtering for radiopharmaceutical application

Nb2O5

63

Page 64: Sputtering for radiopharmaceutical application

64

Reactive sputtering of Nb2O5 :

Sputtering gas pressure

• 810-3 mbar ÷ 710-2 mbar

Stoichiometry: Ar/O2

• Ar/O2

Applied bias

• -80 V ÷ 0 V

Page 65: Sputtering for radiopharmaceutical application

65

Right Stoichiometry:

25 sccm Ar : 19 sccm O2

Nb2O5 stoichiometry

Page 66: Sputtering for radiopharmaceutical application

66

Liquid Ga test

43

1 2

6 7

1

3

2

4

The less porous

6 7

Acid test

▬ stoichiometric

Page 67: Sputtering for radiopharmaceutical application

67

XRD of amorphous Nb2O5:

Page 68: Sputtering for radiopharmaceutical application

Amorphous Nb2O5 deposition recipe:

68

Ar flux:

3 sccm

O2 flux:

7 sccm

Sputtering pressure:

110-2

mbar

IDC:

0.5 A

Page 69: Sputtering for radiopharmaceutical application

Amorphous Nb2O5:

69

SEM FIB SEM

Page 70: Sputtering for radiopharmaceutical application

Nb2O5 has superior corrosion protection

but..

oxides are used to be brittle

70

Page 71: Sputtering for radiopharmaceutical application

Multilayer Nb/Nb2O5 coatings

combine:

high ductility & thermal conductivity of Nb with

excellent barrier properties of Nb2O5

71

Page 72: Sputtering for radiopharmaceutical application

Nb/Nb2O5 multilayers

72

Page 73: Sputtering for radiopharmaceutical application

thin thick thermal layers layers oxidation

73

M 10

M 10

M 9

M 9

M 8

M 8

M 9M 10M 8

Page 74: Sputtering for radiopharmaceutical application

Multilayered Nb/Nb2O5

(60 nm double-layer) coatings

showed high corrosion resistance

74

Page 75: Sputtering for radiopharmaceutical application

Best Nb/Nb2O5 multilayer recipe:

75

Ar flux:

3 sccm

O2 flux:

0/7 sccm

Sputtering pressure:

310-3/ 110-2

mbar

Layer thickness:

40/20 nm

Page 76: Sputtering for radiopharmaceutical application

76

FIB SEM FIB SEM

SEM

Thin Nb/Nb2O5 multilayer:

Page 77: Sputtering for radiopharmaceutical application

Nb-Ta, Nb-Zr, Ta-Zr

77

Page 78: Sputtering for radiopharmaceutical application

Nb-Ta, Nb-Zr and Ta-Zr

were co-deposited in different ratios in

order to find amorphous metallic coating

78

Page 79: Sputtering for radiopharmaceutical application

Sample holder

79

Page 80: Sputtering for radiopharmaceutical application

80

Page 81: Sputtering for radiopharmaceutical application

Sample-holder for co-deposition

81

Page 82: Sputtering for radiopharmaceutical application

82

Stress in thin film

Page 83: Sputtering for radiopharmaceutical application

83

Page 84: Sputtering for radiopharmaceutical application

84

Page 85: Sputtering for radiopharmaceutical application

85

Nb Ta

Page 86: Sputtering for radiopharmaceutical application

86

Nb Ta

After deposition ~1 μm film

3E-03 mbar

Page 87: Sputtering for radiopharmaceutical application

87

Nb Ta

Compressive stress High compressive stress

3E-03 mbar

Page 88: Sputtering for radiopharmaceutical application

88

Nb Ta

7E-03 mbar

Page 89: Sputtering for radiopharmaceutical application

89

Nb Ta

Tensile stress Compressive stress

Nb Ta

7E-03 mbar

Page 90: Sputtering for radiopharmaceutical application

Most suitable sputtering pressure:

90

Nb-Ta

• 7E-03 mbar

Nb-Zr

• 5E-03 mbar

Ta-Zr

• 8E-03 mbar

Page 91: Sputtering for radiopharmaceutical application

Nb-Ta

91

Page 92: Sputtering for radiopharmaceutical application

92

17% Ta

84% Ta

93% Ta

0% Ta

97% Ta

100% TaSingle target sputtering

Single target sputtering

Co-sputtering

9% Ta

11% Ta

26% Ta

44% Ta

64% Ta

91% Ta

Amorphous-like

110 211200

Nb-Ta

Page 93: Sputtering for radiopharmaceutical application

10-85 % atomic Ta in Nb-Ta alloy

coating lead to amorphous-like structures

93

Page 94: Sputtering for radiopharmaceutical application

94

Acid test

Page 95: Sputtering for radiopharmaceutical application

95

1 2 3 4 5 6 7 8 9 10Nb↑ Ta↑Nb Ta

1 2 3

4

7

5

8 9

6

Nb-Ta

Page 96: Sputtering for radiopharmaceutical application

Films with higher Ta content

are less porous

96

Nb-Ta

Page 97: Sputtering for radiopharmaceutical application

Nb-Zr

97

Page 98: Sputtering for radiopharmaceutical application

98

XRD analysis

Page 99: Sputtering for radiopharmaceutical application

Acid test

99

Page 100: Sputtering for radiopharmaceutical application

100

Sample position 1 2 3 4 5 6 7 8 9 10

Nb content, % 93 89 85 79 65 46 29 - 16 7

Acid test (1÷5) 4 1 4 4 3 2 2 2 2 2

1 2 3 4 5 6 7 8 9 10Nb↑ Zr↑

1 2

6

3

7 8

4 5

9 10

Nb-Zr 5E-03 mbar

Page 101: Sputtering for radiopharmaceutical application

Porosity is decreasing with

decrease of Nb content

101

Page 102: Sputtering for radiopharmaceutical application

Ta-Zr

102

Page 103: Sputtering for radiopharmaceutical application

103

XRD Ta-Zr:

Page 104: Sputtering for radiopharmaceutical application

Acid test

104

Page 105: Sputtering for radiopharmaceutical application

105

Sample position 1 2 3 4 5 6 7 8 9 10

Ta content, weight % 99 98 97 95 90 74 58 32 40 25

Acid test (1 ÷5) 1 2 1 2 2 1 1 2 1 5

1 2

6

3

7

4 5

8 9 10

All samples besides Ta-Zr 10, behave quiet good in acid test!

1 2 3 4 5 6 7 8 9 10Ta↑ Zr↑

Page 106: Sputtering for radiopharmaceutical application

106

SEM of cross-section amorphous Ta-Zr:

Ta50Zr50

Page 107: Sputtering for radiopharmaceutical application

107Not sputtered Havar® substrate Havar® sputtered with Ta-Zr

Page 108: Sputtering for radiopharmaceutical application

108

The best recipes for corrosion protection:

DC-biased or heated sputtering of Nb

Reactive sputtering of amorphous Nb2O5

Nb/Nb2O5 thin multilayers

Amorphous Ta-Zr

Page 109: Sputtering for radiopharmaceutical application

Thank you

for your attention!

109