mal composition H2SO 4 from 30 to 150 g/L; Fe 3÷ at least 15 g/L; HF from 5 to 50 g/L; additives (emul- sifters, wetting agents, polishing agents) and acid attack inhibitors approximately 1 g/L; a bath pH not higher than 2.5; and an oxi- dizing agent suitable for main- taining the bath redox potential at values of at least 200 mV, said oxidizing agent being selected from oxidized chlorine acids and salts thereof, peroxidized acids, such as persulfuric acid and salts thereof or a lkal ine permanga- nares.
PROTECTIVE COATING FOR A L U M I N U M U.S. Patent 5,843,242. Dec. 1, 1998 S.E. Dolan, assignor to Henkel
Corp., Plymouth Meeting, Pa. A process for improving the corro- sion protection afforded to an un- derlying metal substrate selected from a group consisting of alumi- num or any aluminum alloy con- taining at least 45% aluminum by an adherent primary coating con- taining cobalt oxide and alumi- num oxide formed over the metal substrate comprising contacting with an aqueous sealing composi- tion consisting essentially of wa- ter, dissolved vanadate anions, and dissolved counterions for the vanadate anions, containing not more than 0.030 M in total of tungsten in any anionic form and containing at least 0.007 M of va- nadium atoms from the vanadate anions; discontinuing the contact-
ing and drying at a temperature not greater than 100°C.
ELECTROLYTIC POLISHING APPARATOS U.S. Patent 5,843,290. Dec. 1, 1998 Y. Tezuka et al., assignors to Sumitomo Metal Mining Co. Ltd., Tokyo A contactless apparatus for the electrolytic polishing of a blank for a lead frame, which comprises an electrolytic polishing tank hav- ing a first end and an opposite second end, a compartment con- taining a blank supply roll located adjacent the first end of the tank to convey a blank thereto, and a compartment containing a blank discharge roll located adjacent the second end of the tank to convey a treated blank away therefrom.
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