Www.lesker.com + 44 (0) 1424 458100 [email protected]

www.lesker.com + 44 (0) 1424 458100 [email protected]

www.lesker.com + 44 (0) 1424 458100 [email protected] J LeskerKurt J LeskerIs a global supplier and manufacturer of high & ultra high vacuum solutions

Established in 1954 Kurt J Lesker Company

www.lesker.com + 44 (0) 1424 458100 [email protected] Customer Support6 Global distribution centres

8 Strategic Sales Offices

www.lesker.com + 44 (0) 1424 458100 [email protected] J LeskerKurt J Lesker Company LTD

European HeadquartersEstablished in 1991New facility 2008

Centre for European operationsSales support officeDesign officeTest & Assembly Clean RoomExtensive warehouse facilities

Strategic Business Segmentswww.lesker.com + 44 (0) 1424 458100 [email protected]

www.lesker.com + 44 (0) 1424 458100 [email protected] J LeskerVacuum Components

www.lesker.com + 44 (0) 1424 458100 [email protected] J LeskerManufacturingVacuum Chamber Manufacturing Pittsburgh- USAHastings UK

CapabilitiesStandard vacuum chambersComplete bespoke Solutions

Quality Management3D Inspection facilitiesISO Certification

www.lesker.com + 44 (0) 1424 458100 [email protected] J LeskerMaterials GroupKurt J Lesker support a wide range of production groups

Solar panel manufactureSemiconductorElectronic devicesOptical coatingsAutomotive lightingR&DComplete custom solutions available

MaterialsBacking platesFilaments

www.lesker.com + 44 (0) 1424 458100 [email protected] J LeskerProcess Equipment DivisionPVD Tools21 Standard vacuum platforms

Custom PVD ToolsBespoke design and process solutions

Thin Film Deposition Expertise:ThermalE-BeamOLEDsputteringMetal /Organic chemical vapour depositionAtomic layer deposition

www.lesker.com + 44 (0) 1424 458100 [email protected] J LeskerProcess Equipment DivisionSputtering /OLED SourcesSputtering Linear CathodesWe develop & manufacture our own range of sputtering/ OLED sourcesIn addition we are able to offer a wide selection of linear cathodes

FeaturesSystem DesignersManufacturersExperts Manufacturing systems since 1974

Chamber manufacturers

Extensive application knowledge

USA & UK clean room assembly areas

KJL designed and built Magnetron Torus sputter guns

KJL designed and built OLED sources

8 standard system platforms

Custom solutions available

Magnetron sputtering

Thermal evaporation

Atomic layer deposition

E-beam evaporation

Organic evaporation

Kurt J Lesker SystemsDeposition Techniques:NANO 36PVD SeriesPVD 75PVD 225PVD 250PVD 500CMS SeriesCMS-18CMS-24LAB-18SPECTROS SeriesMini-SPECTROSSPETROS 100/150Super-SPECTROS 150/200LUMINOSOCTOSALD SeriesAXXISwww.lesker.com + 44 (0) 1424 458100 [email protected]

NANO36Adaptable chamber options

Compact integrated design

High speed diffusion pump

Single wide range gauge

PLC control with touch screen interface

Film thickness monitor with thermal sourcesMulti-technique options: Up to 3 metal thermal sources Torus circular magnetron sputtering sources 1-4 optionsOptions: SS bell jar SS chamber Dry roughing pump 300l/s Turbo Substrate rotation Heating to either 150 C or 350 Cwww.lesker.com + 44 (0) 1424 458100 [email protected]

NANO36 The Nano36 is the newest and most economical deposition system

It showcases our ability to provide the versatility and reliability that the Kurt J. Lesker Company has become known for around the world

The Nano36 is our most affordable deposition platform available designed with the entry to mid level user in mind

The Nano36 will accommodate most evaporation processes as well as magnetron sputtering

The Nano36 has a small footprintwww.lesker.com + 44 (0) 1424 458100 [email protected]

PLC control

This affordable, full feature system offers reliable PLC control with a color touch screen interface

Single button commands and manual operation are accessed from the touch screen

This offers a simple and convenient user interface with the Nano36Process controlwww.lesker.com + 44 (0) 1424 458100 [email protected]

Chamber options

The Nano36 has standard configurations to suit most users

Chamber choices are either a simple 12Diameter x 18 High glass bell jar or a 16 x 16 stainless steel box chamber

The box chamber door opens wide for easy chamber access

Maintenance of the chamber, source replenishment, and source change out can be performed in a matter of minutesProcess Chamber16 x 16 Box Chamber as shown. Also a 12 Diameter x 18 high glass bell jar available.www.lesker.com + 44 (0) 1424 458100 [email protected]

VacuumPumps

The Nano 36 has 3 standard High Vacuum pumping options: 300L/S Turbo, 685 L/S Turbo, or a 700 L/S Diffusion PumpHigh Vacuum pump choices include 300 L/S Turbo, 685 L/S Turbo, or 700 L/S Diffusion PumpDry Foreline/Roughing pumps available (as pictured) as well as oil sealed rotary vane pumpswww.lesker.com + 44 (0) 1424 458100 [email protected]

PlatenFlat plate substrate fixture

Substrate options include primary rotation and heating up to 350 C with dual quartz lamp heatersDual Quartz Lamp HeatersSubstrate Plate on central twist lock hub. Substrate can be held in a fixed position or rotated about the central shaft.www.lesker.com + 44 (0) 1424 458100 [email protected]

PlatenFlat plate substrate fixture

The Nano36 can accommodate up to an 8 diameter substrate mounting plate

One single 8 wafer or multiple smaller wafers can be held in place

The substrate plate can be easily removed or placed into the system with either a lift up and out hub mount or a twist-lock mountingPin/Hub mounted platen can easily be lifted and removed with one hand.www.lesker.com + 44 (0) 1424 458100 [email protected]

Film thickness control

Evaporation methods are controlled via a quartz crystal sensor in conjunction with a thin film controller

The controller offers ease of use and reliability that is necessary to control the most demanding evaporation processesTwist-Lock platen with quartz crystal monitor head.Front Panel Film Thickness ControllerFilm Thicknesswww.lesker.com + 44 (0) 1424 458100 [email protected]

Thermal Evaporation Source

The Nan36 can be configured with three thermal evaporation sources on the base plate

The evaporation sources are sufficiently isolated from each other by shields to prevent cross contamination

The sources also are stood off of the base plate of the chamber and are mounted on water cooled posts to limit excess heating of the chamber

Thermal sources can be filament, basket heaters, box heaters, boats (coated and uncoated), rods, and screens

Easy access to the boats and the mounting posts makes these sources very user friendly

The Kurt J. Lesker Company is a global supplier of a large range of deposition sources and deposition materials

EvaporationUp to Three thermal evaporation sources can be accommodated. The thermal sources are well shielded from each other and the chamber by the use of shielding.www.lesker.com + 44 (0) 1424 458100 [email protected]

www.lesker.com + 44 (0) 1424 458100 [email protected] Sputtering Source

The Nan36 can be configured with two thermal evaporation sources on the base plate

Pneumatic shutters

DC, RF or Pulsed DC

Easy access for target change

UtilitiesUtilites

The Nano36 has a small footprint and comes with heavy duty wheels and retractable mounting pads. This makes the system very easy to wheel into place, set up, and level

Utilities are accessed from central point on the back of the system so utilities hook up is easy and straight forward

This makes the Nano36 very portable. It is easy to move and set up anywhereUtilities located across the back panel of the systems framewww.lesker.com + 44 (0) 1424 458100 [email protected]

Service and warrantyYearly service package One day Two days Three days Four days Five days

Package includes:

Service/preventative maintenance and/or Training Excludes:

Parts, Travel and subsistence

Warranty

12 months on all systems

Options within warranty period: 1 year extended warranty 2 years extended warrantywww.lesker.com + 44 (0) 1424 458100 [email protected]

NANO 36 benefitsDesigned for:UniversitiesIndustrial and Government laboratories R&D applications Compact footprint design Multiple chamber options Easy to use Plug & Play Installation Quick Deliver Cost Effective Price A professional and attractive system that is self contained and ready to work, the Nano36 is manufactured with quality components supplied and stocked by the Kurt J. Lesker Company. We provide the quality, availability, and economy that our customers have come to expect from uswww.lesker.com + 44 (0) 1424 458100 [email protected]

PVD 75D-shaped 304 stainless steel chamberAluminium door with rectangular viewportTurbomolecular or cryogenic pumpingManual touch-screenSingle, multiple or custom substrate fixturesFully enclosed zero clean room footprint designMulti-technique options: up to 3 Torus circular magnetron sputtering sources

multi-pocket electron beam evaporation source

multiple thermal evaporation sourcesOptions:Recipe-controlled PC based process automation

Glow discharge / RF BiasFeatureswww.lesker.com + 44 (0) 1424 458100 [email protected]

FrameworkFully enclosed system cabinet

Can be flush mounted in clean room wall

Utilities: Single service drop (220VAC, 50Hz, single phase, 30 Amps-- based on configuration). Dedicated earth ground required

E-beam power supply: 400V AC/ 3phase/ 50Hz/ 40amps

Compressed air Swagelok @ 80 psi

Dry Nitrogen Vent Gas Swagelok @ 10 psi

Water: Typically 2 to 3 gpm, 25 C @ 50 psi

Process Gas Swagelok @ 5 to 7 psi (if applicable)

Leveling pads

Options:

400VAC, 50/60Hz, 3 phase, 5-wire, 30 Amps power distribution


Process ChamberD-shaped

304 SS chamber

14" x 24" D-shaped

ISO-250 top-plate & base plate ports

Aluminum Door with 5.25x 3.25 viewing area

ISO 100 & 160 gauging & pumping portswww.lesker.com + 44 (0) 1424 458100 [email protected]

SputteringUp to 3 Torus Magnetron sources

1- 4 diameter

Axial, right angle, flex and custom mounts

Integral flip or swing shutters

RF, DC, pulsed DC power

Mass flow controlled gas inlet

Manual or automatic upstream pressure control

Compression fittings to adjust source to substrate distance

VHV compatibleOptions: High strength magnet upgrade for use when depositing magnetic materials Gas injection ring and deposition chimney


E-BeamElectron Beam Evaporation Source

KJLC 4 pocket (8cc) E-Beam gun

5kW solid state power supply with programmable sweep and automatic crucible indexing

High voltage discharge hook

Includes all electrical and water feedthroughs and shielding

One pneumatically actuated source shutter

14 throw distance


EvaporationThermal Evaporation Source Module Up to 3 Thermal Source assembly with water cooled high current feedthroughs (for sequential deposition)

2 kW Power Supply

Computer controlled 3-Position Source Selection Switch

1 pneumatically actuated shutter covers all sources

Cross contamination shielding

Options: Additional 2 kW power supply and transformer to allow co-deposition

Upgrade to 4kW power supply and transformer in place of 2 kWwww.lesker.com + 44 (0) 1424 458100 [email protected]

Low temperature organic evaporation source

KJLC 10cc LTE organic material evaporation source with integrated pneumatic flip shutter (Up to 6 sources may be configured in the system)

KJLC LTE evaporation source power supply

Options:

LTE sources

- 1cc

- 30ccOrganicwww.lesker.com + 44 (0) 1424 458100 [email protected]

PlatenSubstrate holder Non-rotating, top mounted substrate platen (12) using KJLC multi-site substrate fixture

Single or multiple substrates

Options: Rotary drive (up to 20rpm) for platen, variable speed

Pneumatically actuated flip style substrate shutter (compatible with substrates up to 8)

Pneumatically actuated swing style substrate shutter (compatible with substrates up to 4)

Custom configurations are available

Substrate heating options: 150 C - 350 C (quartz lamp) Up to 600 C (resistive element, compatible with only substrates up to 4)


VacuumPumps

260 l/s Pfeiffer turbomolecular pump standard

Backing/roughing pump

Rotary vane mechanical pump

Options: 685 l/s Pfeiffer turbomolecular

1500 l/s CTI cryogenic pump

Oil free Scroll Pump

Base Pressure 5 x 10-7 mbar or less with 260 l/s turbo

2 x 10-7 mbar or less with 685 l/s turbo

5 x 10-8 mbar or less with 1500 l/s cryo pumpwww.lesker.com + 44 (0) 1424 458100 [email protected]

PressureGauges

Wide range vacuum gauge reads from atmosphere to 10-10 mbar (Ion gauge and Pirani)

Pirani gauge in Cryo / foreline (when applicable)

Readout is displayed on system control panel

Options:

Capacitance manometer for sputtering applicationswww.lesker.com + 44 (0) 1424 458100 [email protected]

Pumping260 l/s turbomolecular pump (standard)5 x 10-6 in 18 minutes5 x 10-7 OvernightBase Pressure 3 x 10-7 mbar685 l/s turbomolecular pump (option)5 x 10-6 in 16 minutes2 x 10-7 in 35 minutesBase pressure 1 x 10-7 mbar1500 l/s cryogenic pump (option)5 x 10-6 in 4 minutes5 x 10-7 in 10 minutes5 x 10-8 in 65 minutesBase pressure 2 x 10-8 mbar

Pump down times based on clean and dryproperly conditioned chamberwww.lesker.com + 44 (0) 1424 458100 [email protected]

Process controlProcess PC based with optional Recipe-Control

Touch screen controller

Film thickness monitor/controller

Automatic pump down and vent

Integrated power distribution

Mass flow controlled gas inlet

Options: Heating

Cooling

Substrate bias

Ion Source www.lesker.com + 44 (0) 1424 458100 [email protected]

Computer controlPC-based control system

KJLC C-Ware Visual Basic based software (Windows XP)

Screen layouts follow the guidelines of SEMI E95-0200

Includes Graphical User Interface (When applicable):

Vacuum Deposition Gas Motion Cooling HeatingOptions:Recipe driven computer control Creation and storage using Microsoft Access database Selection of pre-written recipe Edit, copy of existing recipeswww.lesker.com + 44 (0) 1424 458100 [email protected]

Service and warrantyYearly service package One day Two days Three days Four days Five days

Package includes: Service/preventative maintenance and/or Training

Excludes: Parts, Travel and subsistence

Warranty 12 months on all systems

Options within warranty period:

1 year extended warranty 2 years extended warrantywww.lesker.com + 44 (0) 1424 458100 [email protected]

PVD 75 benefitsDesigned for:

Universities

Industrial, Government laboratories

R&D applications

Small batch production

zero clean room footprint design

Plug & play installation

Quick delivery

Cost effective price:

Thermal $65K - $120Sputter $90K - $180KE-beam $150K - $220KOrganic on requestwww.lesker.com + 44 (0) 1424 458100 [email protected]

www.lesker.com + 44 (0) 1424 458100 [email protected] J LeskerKurt J Lesker website and catalogueOver 14,000 standard products are found in our catalogueOur website offers real time information on all our products & services

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