Accelerating the next technology revolution

Copyright ©2013

SEMATECH, Inc. SEMATECH, and the SEMATECH logo are registered servicemarks of SEMATECH, Inc. International SEMATECH Manufacturing Initiative and ISMI are servicemarks of SEMATECH, Inc.

All other servicemarks and trademarks are the property of their respective owners.

Dan Armbrust

President and CEO, SEMATECH

April 4, 2013

The SEMATECH New York Experience

Growing the Semiconductor Industry in

New York: Challenges and Opportunities

Accelerating the next technology revolution

Semiconductor Industry Virtuous cycle

Lower cost/function

Expanding

applications

(more silicon)

More R&D (innovation)

Increasing

semiconductor

revenue

$’s

www.sematech.org 2

Moore’s Law

Microprocessor Transistor Counts

1971-2011 & Moore’s Law

26 April 2013 3

Semiconductor Industry Virtuous cycle

Lower cost/function

Expanding

applications

(more silicon)

More R&D (innovation)

Increasing

semiconductor

revenue

$’s

www.sematech.org 4

SEMATECH Context Semiconductor supply chain

Industry structure: then and now

Equipment and Materials

Systems

Design

Packaging and Assembly

Chip Technology

EDA Tools

www.sematech.org 5

System

EDA

Equipment

Materials

Memory

Logic

IDM

Package

and

Assembly

Fabless

Fablite

Foundries

Integrated Device Manufacturer (IDM)

Industry Challenges Key stakeholders

www.sematech.org 6

Too Many Challenges to Solve Alone

• Success in semiconductors is driven by technology

innovation and advances in manufacturing

• Success depends on comprehensive industry-wide

collaboration

– Challenges are global, and cut across industry ecosystem

– Solutions require significant investment, leveraged funding

www.sematech.org 7

Expanded membership to international companies

SEMATECH created

Formed subsidiary for 300 mm wafer conversion

Created subsidiary for manufacturing

Entered alliance with New York State (Phase I)

Expanded membership to include industry supply chain companies

Continued alliance with New York State (Phase II)

450 mm wafer conversion G450C

SEMATECH and CNSE launch PVMC

1987 1995 2000 2003 2007 2008 2010 2011

SEMATECH Overview History

www.sematech.org 8

Bridging Research, Development,

and Manufacturing

www.sematech.org 9

• A membership-driven global consortium

• Driving technical consensus for the industry

• Pulling research into the industry mainstream

• Leading major programs to address critical industry transitions

• Focus on manufacturability

www.sematech.org 10

SEMATECH Members

SEMATECH Programs Attract Growth

www.sematech.org

2007 2008 2009 2010 2011 2012 2013 (YTD)

TEL (3D) Accretech (3D) NEXX (3D) TEL (Litho) TSMC Invensas (3D) Advantest (Met)

Rudolph (Met) Asahi Glass (Litho) Atotech (3D) Dow (Litho) Qualcomm Inpria (Litho) Air Products (FEP)

Rudolph (3D) AMAT (ESH) Altera (3D) Centrotherm (FEP) Araca (ISMI)

TEL (FEP) ASML (Litho) ON Semiconductor (3D) SSEC (3D) Morgan Ceramics (ISMI)

Metrosol (FEP) JSR (Litho) LSI (3D, ISMI) Kumho (Litho) Poongsan (FEP)

Canon-Anelva (FEP) AZ Electric (Litho) SK Hynix (3D) Vishay (ISMI)

TOK (Litho) Qualcomm (3D) Fujifilm (3D) SK Hynix (Litho)

Shin-Etsu (Litho) Edwards (ESH) ADI (3D) Winbond (ISMI)

FEI Company (Met) Lasertec (3D) ASE (3D) LinTec (3D)

Core Wafer Sys. (FEP) DNP (Litho) 4DS (FEP) Hewlett-Packard (ISMI)

SUSS (FEP) Panasonic (ISMI) Matheson (ESH) Pall (ISMI)

ASML (FEP) Nanosys (FEP) NIST (3D) Renesas (ISMI)

AMD (ISMI) Sumitomo (Litho) SRC (3D) Spansion (ISMI)

Nissan Chem (Litho) KLA-Tencor (Litho) Cabot (FEP)

Freescale (ISMI) Applied Seals (Litho) Infineon (ISMI)

Infineon (ISMI) Micronix (ISMI) Micron (ISMI)

NXP (ISMI) Aixtron (FEP)

STMicro (ISMI) Soitec (FEP,Met)

Dai Nippon Screen (FEP)

Hoya (Litho)

Texas Instruments (ESH)

0

10

20

30

40

50

60

70

80

90

2007 2008 2009 2010 2011 2012 2013

Me

mb

ers

hip

Ag

ree

me

nts

New members since 2007

• A clear industry-led model and mission

• Leadership from industry champions

• Industry with adequate revenue and maturity

• Ideally, a crisis

• Leveraging of government and industry funds

• Member engagement

• Agility to adapt to changing needs

Consortium Success Factors

www.sematech.org 12

Industry/University/Government Collaboration in Albany

www.sematech.org 13

R&D Costs

www.sematech.org 14

Trends & Challenges

• Rising R&D costs; fewer funders

• Consolidation – device makers, supply chain

• Supply chain challenges

─ Insufficient early feedback

─ Affordable infrastructure

─ Broken business models

─ Greater share of the R&D burden

• Increasing need/pressure to collaborate

• A growing and compelling collaborative model in Albany

and clear pathway to 450 mm activities

www.sematech.org 15

SEMATECH Focused on Materials &

Nanostructures

2009 2011 2013 2015 2017 2019

Advanced Materials Advanced Structures

Beyond CMOS

Materials/Structures

LO

GIC

M

EM

OR

Y

www.sematech.org 16

Technology Gap Solution

Early learning and infrastructure

development

SEMATECH Center for

Next-Generation Devices

• Atomic-level chemistries

• <10 nm advanced structures

• Simulation

• Fabrication flows

• Nanoscale equipment

• R&D center that champions and enables

next-generation technologies

• Participation from universities,

equipment and materials makers, and

chip manufacturers

• Establishes complete pilot line for

research, development, manufacturing

enablement

Applied

Research Development Manufacturing

Systems

& Design

IDMs &

Foundries

Equipment

& Materials

www.sematech.org 17

Lithography Scaling

www.sematech.org 18

2003 2004 2005 2006 2007 2008 2009 2010 2011 2012

~10-20 W @IF

Overcome 30 nm resolution brick wall

<4% flare optics

Integrated reticle handling 0 defects

~10-50X defect

reduction

required for

HVM

>100 W @ IF

reliable source

required

LWR needs 2X

improvement for

MPU (OK for

Memory)

Commercial

reticle handling

solution

available

3300 optics

complete

EUV Progress Critical enablers

First EUV tools

installed in Albany

& Belgium

•

•

•

Source power

Defect-free mask

Resist resolution

Reticle protection

Optics quality

EUV Mask

Consortium

EMI

EUV is

REAL

Bacus/EUV

Symposium

3100’s in

the Field

EUV in

Dev @

IDMS

www.sematech.org 19

Technology Gap Solution

Underinvestment in EUV mask

metrology equipment

SEMATECH EUV Equipment

Manufacturing Initiative (EMI)

• Advanced defect metrology for EUV

• Large prototype investment

• Uncertainty in timing

• Common infrastructure

Applied

Research Development Manufacturing

Systems

& Design

IDMs &

Foundries

Equipment

& Materials Connects multiple

segments of the EUV

supply chain in a

partnership to

collectively fund the

development of needed

metrology tools by

equipment suppliers

www.sematech.org 20

Technology Gap Solution

Lack of affordable early access to

EUV imaging

SEMATECH Resist and Materials

Development Center (RMDC)

• Limited access to EUV tools for

research

• Need for early full-field exposures

Applied

Research Development Manufacturing

Systems

& Design

IDMs &

Foundries

Equipment

& Materials

0

1000

2000

3000

4000

5000

2008 2009 2010 2011 2012

Materials Processed by RMDC

www.sematech.org 21

Technology Gap Solution

Insufficient defect identification

and mitigation

SEMATECH Nanodefect Center

• As defect requirements become

more stringent, interdisciplinary

knowledge is needed to understand

defect generation processes

• Characterizing small-sized defects

is costly and time consuming

• Centralized facility providing a

critical mass of expensive

infrastructure with extensive

forensics and analytical capabilities

Applied

Research Development Manufacturing

Systems

& Design

IDMs &

Foundries

Equipment

& Materials

www.sematech.org 22

R&D Pilot Prototyping Manufacturing

Development Manufacturing

Lab Scale &

Testing

NREL, Sandia,

CNSE, Industry,

University

100 kW

PVMC,

Halfmoon, NY

10 MW

PVMC, NY

>100 MW

Industry Sites

Facilities and Equipment Scale-Up Strategy

New Solar Consortium – U.S. PVMC

• Launched the U.S. Photovoltaic Manufacturing Consortium (PVMC) in

September 2011 with CNSE

• Public/private investment of ~$300M over 5 years from U.S. Department of Energy ($62M from SunShot Initiative), industry, New York State

• Partnership with ~40 companies and organizations throughout the industry supply chain

www.sematech.org 23

Lessons Learned from SEMATECH’s

Proven Consortium Model

www.sematech.org 24

• Need an ambitious national and regional strategy to drive broad collaboration at sufficient scale to:

– Build R&D and manufacturing infrastructure

– Provide access to pilot facilities to demonstrate innovations at manufacturing scale

– Create technology roadmaps and standards

– Conduct both collaborative and proprietary technology programs

• SEMATECH has benefited enormously from the shared capabilities at CNSE in Albany, with consistent NY State government support

• Industry participation in NY will continue to expand across the semiconductor industry’s supply chain and into adjacent industries

• It’s all about shared public and private investments in infrastructure and ecosystems