Upload
hugh-singleton
View
221
Download
2
Tags:
Embed Size (px)
Citation preview
Synchrotron X-Ray Topography for Laser-Drilled
ViasKevin Wang, March 9, 2009
Through Silicon Via
Via connecting one side of silicon wafer to another
Reduce connection length
Drilling options Mechanical Deep Reactive Ion Etching (DRIE) Laser pulses
DRIE Vias, Source: Albany Nanotech
Paper
Laser Drilled Through Silicon Vias: Crystal Defect Analysis by Synchrotron X-ray Topography Landgraf, R., Rieske, R., Danielewsky, A., Wolter, K. Technische Universtät Dresden, Germany
Synchrotron Source: ANKA (Karlsruhe, Germany) 2.5 GeV,current 80-180 mA: white radiation 2Å
Presented at: 2nd Electronics System-Integration Technology
Conference, Greenwich, UK (2009-09-01)
DRIE vs. Laser Drilling
DRIE Vias, Source: Lam Research
Laser Via, Source: Landgraf
Sidewall Scalloping, Source: Aviza Technology
Laser Via Fabrication
525μm thick Si wafer (100) 4in. (100mm)
Target via diam: 50 μm
Laser Drilling Methods
Single Pulse
Trepanning (cut an annulus)
Percussion (high power pulsing)
Conventional drilling patterns, Source: Verhoeven, K.
X-ray Diffraction Setup
Section Transmission (15μm slit), Lang Method
Results – Strain Imaging
ns laser: 540 μm strain zone
ps laser: 290 μm strain zone
Trend with Laser Pulse Width
Strain affected region: Distance from via edge to
strain edge
fs laser: 220 μm strain zone
Conclusion
Transmission topography by synchrotron source successfully imaged strain near vias, nondestructively
Strain affected zone decreased with pulse width Electron-phonon relaxation time in Si, 400fs
Femtosecond lasers should be considered for commercial production Depth remains to be improved
Motivation: Multi-Chip Packages
Wirebonding Longer paths Failure due to fatigue,
bond lifting
Flipchip bumps Reduce path length Still require redistribution layer (RDL) Thermal cycling failure
Flipchip Die, Source: IMEC
Wirebonded Die, Source: Aspen Tech.