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Finnish-Japanese Workshop on Functional Materials Espoo and Helsinki, Finland 25-25.5.2009 Utsunomiya Univesity Center for Optical Research and Education SURFACE RELIEF GRATING AND RETARDAGRAPHY : Center for Optical Research and Education Toyohiko Yatagai SURFACE RELIEF GRATING AND RETARDAGRAPHY : OPTICAL MANIPULATION OF AZOBENZENE POLYMER FILMS AND ITS APPLICATIONS FILMS AND ITS APPLICATIONS

SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

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Page 1: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

Finnish-Japanese Workshop on Functional MaterialsEspoo and Helsinki, Finland25-25.5.2009

Utsunomiya UnivesityCenter for Optical Research and Education

SURFACE RELIEF GRATING AND RETARDAGRAPHY:

Center for Optical Research and EducationToyohiko Yatagai

SURFACE RELIEF GRATING AND RETARDAGRAPHY: OPTICAL MANIPULATION OF AZOBENZENE POLYMER FILMS AND ITS APPLICATIONSFILMS AND ITS APPLICATIONS

Page 2: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

OPTICAL FUNCTIONAL DEVICESUSING AZOBENZENE POLYMER FILM

Photoisomerization Photoisomerization

Surface relief grating Surface relief grating

R t d h di f ti l l i ti d Retardagraphy: recording of optical polarization and reconstruction of complex amplitude

Functional devices based on multilayer polymer thin filmfilm

Page 3: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

PHOTOINDUCED MASS TRANSPORT

N nof b i tion photo me h ni l Nanofabrication, photo-mechanical devices

R

RLightTwo beaminterference

NN

R'

N N

C fLight orthermal

R'

Trans form

Cys form

Azobenzene

Photoinduced surface relief (PSR) formationP. Rochon et al., Appl. Phys. Lett., 66, 136 (1995)

Page 4: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

POLARIZATION DEPENDENTPOLARIZATION DEPENDENT

50 μm 10 μm

Page 5: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

MULTIPLE RECORDING GRATINGSMULTIPLE RECORDING GRATINGS

Orthogonal grating structureSurface relief grating

Hexagonal structure Blazed grating structure

Page 6: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

RELEIF DEPTH CONTROLBY ELECTRIC FIELD

H iHomogeniousIllumination or heating

Heating +electric field applied

substrate

Heater

Page 7: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

COMPUTER SIMULATION BASED ON VISCOUS FLUID MODEL

Navier-Stokes equation

Inertialt

Pressuret

Outer forceterm

Viscoustermterm term termterm

Continuity equationContinuity equation u: velocity vector

Page 8: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

COMPUTER SIMULATION OF MASS TRANSFERCOMPUTER SIMULATION OF MASS TRANSFER

Nd:YAG Laser(532 nm)

Intensity:50 mW/cm2 :Electric Field

:Wave number:Wave number

1 μm

Page 9: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

SUMMARY IN SURFACE RELIEF GRATING

Origin of mass transfer:・Origin of mass transfer:gradient of light intensitygradient of light pressuresurface tensionsurface tension

・SRG generation is mainly due toelectric dipole interaction with outer pelectric field.

Page 10: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

PHOTOINDUCED BIREFRINGENCE

Opti l to ge medi pol i tion Optical storage media, polarization controllable devices

Optical recording technique forth t d f bi f i t bj t

Retardagraphythe retardance of a birefringent object

Liquid crystalspatial light modulatorMultivalued phase recordingwith a single laser beam

Large amount information recordingLarge amount information recording

Page 11: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

PHOTOTRIGGEREDMOLECULAR REORIENTATION

Polarizationaxis

Molecular axis

axis

trans-azobenzeneAbsorption

AbsorptionRelaxation

cis-azobenzene Absorption

Page 12: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

PHOTOINDUCED BIREFRINGENCEPHOTOINDUCED BIREFRINGENCEIrradiationareaarea

Polarization axis

Azobenzene-containing material

Page 13: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

POLARIZATION HOLOGRAPHY:RECORDING

FF Signal beam (Right-circular pol.)

Reference beam(Left-circular pol )(Left-circular pol.)

Azobenzene film

Page 14: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

POLARIZATION HOLOGRAPHY: RECONSTRUCTION

FFReference beam(Left-circular pol ) 0 order beam(Left-circular pol.) 0 order beam

(Left-circular pol.)Polarizationhologram

+1 order diffracted beam(Right-circular pol.)

hologram

(Right circular pol.)

Page 15: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

POLARIZATION HOLOGRAPHY: RECONSTRUCTION

FF-1 order diffracted beam(Left circular pol )

Reference beam(Right-circular pol.)

(Left-circular pol.)

FPolarizationhologram F

0 order beam(Right-circular pol )(Right circular pol.)

Page 16: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

JONES CALCULUSJONES CALCULUS

Page 17: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

PRINCIPLE OF RECONSTRUCTIONPRINCIPLE OF RECONSTRUCTION

Page 18: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

PRINCIPLE OF RETARDAGRAPHYPRINCIPLE OF RETARDAGRAPHY

yx

yx

zz

45 degree linear polarization45 degree-linear polarization

x-componenty-component

RecordingRecordinglaser

Page 19: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

PRINCIPLE OF RETARDAGRAPHYPRINCIPLE OF RETARDAGRAPHY

yy

z

x

z

x

z

Phase difference

z

Phase difference(Polarization retardance)Elliptical polarization

x-componenty-componenty p

Recordinglaser

Page 20: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

EXPERIMENTAL SETUPEXPERIMENTAL SETUP

Page 21: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

OPTICAL RECORDINGBY RATARDAGRAPHY

Page 22: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

SUMMARY IN RETARDAGRAPYSUMMARY IN RETARDAGRAPY

E l i f l i i h l hi h i i iExplanation of polarization holographic characteristics in photoinduced birefringent films

Complex amplitude of signal beam from an objectAmplitude: Retardance of photoinduced birefringencePhase: Principal axis of photoinduced birefringence

Complex amplitude of signal beam from an object

Application to phase-type optical recording by retardagraphy

Features of retardagraphyFeatures of retardagraphyRecording absolute retardance values using a single laser beamHigh robustness

Page 23: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

MULTILAYER STRUCTURE BY SIPN COARTING

R. Katouf, T. Yatagai and S. Umegaki: Photonics & Nanostructure, 3, 116(2005).

Page 24: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

MULTILAYER STRUCTURE BY SIPN COARTING

R. Katouf, T. Yatagai and S. Umegaki: Photonics & Nanostructure, 3, 116(2005).

Page 25: SURFACE RELIEF GRATING AND RETARDAGRAPHY ......Photoinduced surface relief (PSR) formation P. Rochon et al., Appl. Phys. Lett., 66, 136 (1995) POLARIZATION DEPENDENT 50 μm 10 μm

SUMMARY & PROPOSALSSUMMARY & PROPOSALSFunctional photo material:

A b lAzobenzene polumers

Photoisomerization

Surface relief grating: hologaphy & functional gratings

Photo induced bifringence: retardagrapy optical memory &Photo-induced bifringence: retardagrapy, optical memory &polarization devices ( polarization grating for LS devices)

Optical multi-layer structure: functional modulator

Collaboration: Joensuu University (Design of functional devices)