Frascati_Sept2005.ppt1David Attwood

Soft X - Ray Optics:Fundamentals and Applications

David AttwoodUniversity of California, Berkeley

andCenter for X-Ray Optics

Lawrence Berkeley National Laboratory

Frascati_Sept2005.ppt2David Attwood

(1.1)

The Short Wavelength Regionof the Electromagnetic Spectrum

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Available Optical Techniques for Soft X-Rays and EUV

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Scattering and Refractive Index

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Glancing Incidence Optics

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A High Quality Mo/Si Multilayer Mirror

N = 40d = 6.7

Courtesy of Sasa Bajt (LLNL)ˇ

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Multilayer Mirrors Satisfy the Bragg Condition

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High Reflectivity, Thermally and Environmentally Robust Multilayers Coatings for High Throughput EUV Lithography

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Recent Progress in Multilayer Mirrors

1 100

10

20

30

40

50

60

70

80

H2Owindow

V

Au

Near-Normal Incidence Multilayer Mirrors

SiCScTi

Pea

k re

flect

ance

(%)

Wavelength (nm)

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Extreme Ultraviolet Telescope

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EUV Image of the Solar Corona Showing Loops Near the Solar Limb

λ = 17.3 nm(71.7 eV)

Courtesy of L. Golub, Harvard-Smithsonian and T. Barbee, LLNL.

http://vestige.Imsal.com/TRACE

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Fluorescent Microprobe Based on Crossed Cylinders

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Diffractive Optics for Soft X-Rays and EUV

Zone Plates Gratings Pinholes

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A Fresnel Zone Plate Lens

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A Fresnel Zone Plate Lens Used as a Diffractive Lens for Point to Point Imaging

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Zone Plates for Soft X-Ray Image Formation

Frascati_Sept2005.ppt17David AttwoodCourtesy of E. Anderson (LBNL)

A Fresnel Zone Plate Lens Used for X-Ray Microscopy

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E. Anderson, LBNL

Soft X-Ray Microscopy at the ALS

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• Well engineered• Sample indexing• Tiling for larger field

of view• Pre-focused• High sample throughput• Illumination important• Phase contrast

High Resolution Zone-Plate Microscope XM-1 at the ALS

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Applications of Soft X-Ray Microscopy

Fe L3 @ 707.5 eV

1 µm Nucleus

Cell border

NucleoliNucleoli

Cellborder

Cryo X-Ray Microscopyof 3T3 Fibroblast Cells

100 nmlines & spaces

Protein LabeledMicrotubule Network

FeTbCo Multilayerwith Al Capping Layer

Magnetic RecordingMaterials

Cryo Microscopy for the Life Sciences

Courtesy of P. Fischer (Max Planck)and G. Denbeaux (CXRO/LBNL)

Courtesy of C. Larabell (UCSF)and W. Meyer-Ilse (CXRO/LBNL)

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P. Fischer, T. Eimueller, M. Koehler (U. Wuerzberg)S. Tsunashima (U. Nagoya) and N. Tagaki (Sanyo)G. Denbeaux, L. Johnson, A. Pearson (CXRO-LBNL)

FeGd MultilayerContrastreversal

1 µm

hω = 720.5 eV

Fe L2-edge

hω = 707.5 eV

Fe L3-edge

hω = 704 eVbelow Fe L-edges

Magnetic Domains Imaged at Different Photons Energies

Frascati_Sept2005.ppt22David Attwood

Courtesy of C. Larabell (UCSF & LBNL) and M. LeGros (LBNL)

λ = 2.5 nm

Soft X-Ray Nanotomography of a Yeast Cell

Nanotomography ofCryogenic Fixed Cells

Courtesy of G. Schneider (BESSY)Surf. Rev. Lett. 9, 177 (2002)

QuickTime™ and a decompressor

are needed to see this picture.

Bio-Nanotomography for 3D Imaging of Cells

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λ = 2.5 nm

Soft X-Ray Nanotomography of a Yeast Cell

Nanotomography ofCryogenic Fixed Cells

C. Larabell and M. LeGros,Molec. Bio. Cell 15, 957 (2004)

QuickTime™ and a decompressor

are needed to see this picture.

Bio-Nanotomography for 3D Imaging of Cells

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Extreme Ultraviolet (EUV) LithographyBased on Multilayer Coated Optics

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Maskstage

Projectionoptics

Waferstage

Collectionoptic

EUV Plasmasource

Condenseroptics

The Engineering Test Stand (ETS):A Pre-Manufacturing EUV Stepper

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Condenser optic Projection optic

Courtesy of D. Sweeney (LLNL)

ETS Optics Meet Tight Specifications

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Mask

Illumination

Secondary

Wafer

Primary

Fold Flat

Bipods

Bipod

Button

Courtesy of J. Taylor (LLNL)

METNA = 0.3013.4 nm5X200 X 600 µm field

A 0.30 NA Micro-Exposure Tool (MET)has been Fabricated by Zeiss and LLNL

35 nm

Courtesy of Patrick Naulleau (LBNL)

Frascati_Sept2005.ppt28David Attwood

Intel EUV MET InstallationIntel EUV MET InstallationIntel EUV MET Installation

Jeanette Roberts SPIE March 1, 2005

16 crates17+ tons15 pumpsAll for . . . .

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International Technology Roadmap for Semiconductors*

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Possible Compact Sources for Soft X-Ray Microscopy and EUV Metrologies

• Laser produced plasmas [Berglund et al., J.Microscopy 197, 268 (2000)]

• Electrical discharge plasmas (www.energetiq.com)

• EUV lasers [Vaschenko et al., Opt. Lett. 30, 2095 (2005)]

• EUV High Harmonic Generation [Kapteyn et al., Phys. Today 58 (March 2005)]

Frascati_Sept2005.ppt31David Attwood

UC BerkeleyUC BerkeleyWebcastWebcast

www.coe.berkeley.edu/AST/sxreuv

AST 210 / EECS 213

(offered Fall 2005,starts Aug. 30, 2 pm PDT,

live over internet plus archived)

Lectures Available Over the Web Free