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U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 1 Pulsed Power Plasma Experiment - Generation of Photons in EUV Region - Eiki Hotta K.Horioka, A.Okino, M.Watanabe, T.Kawamura, K.Yasuoka, M.Masnavi, S.R.Mohanty Department of Energy Sciences Tokyo Institute of Technology

Pulsed Power Plasma Experiment - Utsunomiya University・Preionization current : 10 A 0 50 100 30 60 Cur r e n t [k A] 0 0 1 1 Time [ns] XR D s i g n a l [V] Pinhole - XRD: 120 mm

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  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 1

    Pulsed Power Plasma Experiment- Generation of Photons in EUV Region -

    Eiki HottaK.Horioka, A.Okino, M.Watanabe, T.Kawamura, K.Yasuoka,

    M.Masnavi, S.R.Mohanty

    Department of Energy SciencesTokyo Institute of Technology

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 2

    Tokyo Institute of TechnologyOutline of Presentation

    Z-pinch Based Discharge

    Capillary Discharge Ne-like Ar Soft X-ray Laser– Background– Experimental Setup: Low Rep-Rate Operation– Characteristics of Ne-like Ar Soft X-ray Laser

    DPP EUV Light Source for Microlithography(This work is supported by NEDO and MEXT Grant-in-aid)– Background: Why EUV? Requirements– Experimental Setup– Characteristics of DPP EUV Source

    Summary

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 3

    Tokyo Institute of TechnologyApplication of Soft X-ray Laser

    X-ray diagnosticsX-ray microscopeX-ray holography

    Images of malaria infected red blood cells(c) 2.4nm soft X-ray microscopy(d) Visible light microscopy

    Water window (2.33-4.36nm)

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 4

    Tokyo Institute of TechnologyPrinciples of soft X-ray laser

    Schematic drawing of laser Characteristics of Soft X-ray Laser

    •Monochromaticity•Directivity•High intensity•CoherenceLaser Medium

    0I I

    L

    ( )GLexpII 0=

    One of operational principle of plasma X-ray laser: Collisional excitation scheme

    G ∝ Nu – NlEnergy = PL・∆t

    u

    g

    lPumpElectron

    Long Lived State

    Fastradiativedecay

    λλ Laser: Amplified Spontaneous Emission

    3p

    3s

    2p6

    P∝ 1/λ4

  • Tokyo Institute of Technology

    Soft X-ray Lasing by Fast Capillary Discharge(V.N.Shlyaptsev, et al., SPIE Vol.2012, pp.99-110, 1993)

    3p-3s Ne-like ArIX (λ~40-70 nm)rp~150-250 μm, Ne~(0.5-2)×1019 cm-3, Te~60-90 eVr0~2 mm, p0~0.1-0.2 Torr, Ip~10-12 kA, T/2~60-80 ns

    3p-3s Ne-like KrXXVII (λ~17-30 nm)rp~50-100 μm, Ne~(2-5)×1020 cm-3, Te~500-700 eVr0~1 mm, p0~2-4 Torr, Ip~150-180 kA, T/2~15-25 ns

    4d-4p Ni-like XeXXVII (λ~9.1-9.5 nm)rp~75-150 μm, Ne~(2-5)×1020 cm-3, Te~300-600 eVr0~1 mm, p0~2-4 Torr, Ip~200-270 kA, T/2~12-20 ns

    Radiative Collisional Model

    100 101 102 10310-2

    10-1

    100

    101

    102

    103

    Current (kA)

    nkT

    (GPa

    )Ne-like Ar

    Ne-like Kr

    Ni-like Xe

    Experiment

    Assuming rp=100μm

    J.J.Rocca et al.

    Theoretically predicted lasing windows

    Bennett’s Relation

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 6

    Tokyo Institute of TechnologyExperimental Setup

    Schematic Photograph

    SF6:1[atm]

      Reset Circuit

    Capillary

    H2OSF6:3[atm]

    H2O

    Gap SwitchWater Capacitor

    Pulse Transformer

    Marx Generator

    XRD

    Capillary

    X-ray

    High Speed Camera2 m

    SpecificationWater capacitor: 3nF, Max. 900 kV (1.2 kJ)Current: T/2=110 ns, 9-32 kA, dI/dt = 2-8×1011 A/sCapillary: Polyacetal, Pyrex or Alumina Ceramics, φ3mm, 60-350 mm longFilling gas: 100-1000 mTorr Ar

    SpecificationWater capacitor: 3nF, Max. 900 kV (1.2 kJ)Current: T/2=110 ns, 9-32 kA, dI/dt = 2-8×1011 A/sCapillary: Polyacetal, Pyrex or Alumina Ceramics, φ3mm, 60-350 mm longFilling gas: 100-1000 mTorr Ar

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 7

    Tokyo Institute of TechnologyStreak photograph

    Waveform of discharge current

    In order to obtain a laser amplification, it is necessary to produce thin plasma that has a laser gain. Side-on observations of plasma were made using Pyrex glass capillary.

    3mm

    Time[ns]0 50 100 150

    Side-on Streak photograph

    Pylex Capillary

    Pylex Capillary0 50 100-40

    -30-20-10

    010203040

    Curr

    ent[k

    A]

    Time[ns]

    Ar: 150 mTorrCapillary: φ = 3mm, l = 60 mmPredischarget: 10 A

    1st pinch 2nd pinch

    Framing

    Framing

    Discharge conditions•Pyrex Capillary: l = 60 mm, d = 3mm•Argon: 150 mTorr•Predischarge: 10 A

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 8

    Tokyo Institute of TechnologyEffect of Pre-Ionization

    With pre-ionizationcurrent of (10 A)

    With pre-ionizationcurrent of (10 A)

    Without pre-ionizationWithout pre-ionization0 50 100-40

    -30-20-10

    010203040

    Cur

    rent

    [kA

    ]

    Time[ns]

    Ar: 150 mTorrCapillary: φ = 3mm, Predischarge: 0 A

    l = 60 mm

    Pre-ionization is essential for production of stable plasma.

    (A) 20 - 30 ns

    (B) 30 - 40 ns

    (C) 40 - 50 ns

    (D) 50 - 60 ns

    l = 20 mm

    Plasma ColumnCapillary Tube

    φ = 3 mm

    (A) 10 - 20 ns

    (B) 20 - 30 ns

    (C) 30 - 40 ns

    (D) 40 - 50 ns

    l = 20 mm

    φ = 3 mm

    Plasma ColumnCapillary Tube

    •Helical instabilities are observed•Poor reproducibility

    •Stable•Highly reproducible•Diameter of pinched plasma:

    300µm

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 9

    Tokyo Institute of TechnologyDirectivity of Spike Output

    Discharge condition・ Capillary length : 150 mm,

    diameter : 3 mm・ Filling Ar pressure : 450 mTorr・ Preionization current : 10 A

    0 50 100

    30

    60

    Cur

    rent

    [kA

    ]

    0

    0

    1

    1

    Time [ns]

    XR

    D si

    gnal

    [V]

    Pinhole - XRD: 120 mm

    Pinhole - XRD: 600 mm

    Argon: 450mTorrCapillary: φ = 3 mm, l = 150 mmPredischarge: 10 A

    XRD output dependence on distance between capillary and detector

    Sharp peaks have directivity. It’s a characteristics of laser.

    To confirm the directivity of laser, the distance from the capillary to the XRD is changed from 120mm to 600mm

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 10

    Tokyo Institute of TechnologyGain-Length Product

    Maximum gain-length product gl of 12 (g = 0.8 cm-1) andLaser output energy of 5 - 6 µJ are obtained.

    Background at 80ns

    Laser

    XRD output dependence on capillary length

    0 50 100

    01020304050

    Time [ns]

    Cur

    rent

    [kA

    ]

    XR

    D si

    gnal

    [V]

    0

    0

    0

    3

    6

    3

    2

    Capillary: φ = 3mmAr: 500 mTorrPredischarge: 16 A

    l = 150 mm

    l = 120 mm

    l = 90 mm

    laser

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 11

    Tokyo Institute of TechnologySpectroscopic Measurement

    Laser 46.9 nm

    Measured spectrum

    Capillary

    Spectrometer

    Label Series Transition λ (Å)

    1 3s 3P1 – 3p 1S0 431.1232 3p 1P1 – 3d 1P1 450.660

    3 3p 1P1 – 3d 1P1 465.118

    4 3s 1P1 – 3p 1S0 468.7935 3s3p – 3s3d

    (J = 0-1)473.934

    6 3s3p – 3s3d (J = 1-2)

    475.654

    7 3s3p – 3s3d(J = 2-3)

    479.379

    Ar VII

    Ar IX

    Grazing Incidence Spectrometer(McPherson 248/310G)

    Discharge conditionCapillary : φ3, l =150 mmI = 22 kAp = 300 mTorr

    After P.S.Antsiferov et al., Physica Scripta, Vol.62, pp.127-131, 2000

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 12

    Tokyo Institute of TechnologyDouble-Slit Interference Fringes

    Discharge current pulse: ~23kA Ar pressure: ~340 mTorrCapillary length = 350 mm Capillary diameter = 3 mmL1 = 250 mm L2 = 1070 mm Detector: X-CCD

    Slit separation b = 100 μmExperimental λ = 45.9 ± 1.2 nm

    Slit separation b = 50 μmExperimental λ = 46.5 ± 0.9 nm

    Ne-like Ar laserλ = 46.9 nm

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 13

    Tokyo Institute of TechnologyMeasurement of the spatial coherence

    )2

    exp( 22

    cLd∆−=Coherence degree: where Lc is coherence length

    μ12(50 μm)=0.60±0.05 Measured coherence length is 50 µm

    Imax

    Imin

    Coherence length reported by other group is Lc= 190µm for 450 mm capillaryPHYSICAL REVIEW A 70, 023818 (2004)

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 14

    Tokyo Institute of TechnologyAnother Lasing?

    1

    2

    Experimental λ = 45.9 ± 1.2 nm

    Ne-like Ar laserλ1 = 46.9 nm(Ar8+ 3s – 3p)

    1Experimental λ = 44.1 ± 3.0 nm

    Be-like Ar laserλ2 = 42.6 nm ?(Ar14+ 2p – 2s)

    2

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 15

    Tokyo Institute of TechnologyMHD Simulation 1

    Plasma is compressed and heated

    Highly ionized plasma expandsto the capillary wall being cooled

    Space-Time development of Te

    Space-Time development of Ne     (P.Vrba, et al., CTU)

    At 33.2 ns : Ne=4.3x1018 cm-3, Te=100 eVAr8+ : Ne-like

    At 37.0 ns : Ne= 3.14x1018 cm-3, Te=105 eVAr14+ : Be-like

    34.8 ns

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 16

    Tokyo Institute of TechnologyMHD Simulation 2

    The evaluated spectrum predicts another strong lasing at the wavelength of

    λ= 42.6 nm at t = 37 ns, when Te = 105 eV, Ne = 3.14Χ1018 cm-3

    The lasing occurs by the transition 2p - 2s

    Be-like argon (Ar14+).

    20 ns/Div

    Current XRD

    Capillary length = 330 mm

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 17

    Tokyo Institute of TechnologyCurrent and Pressure Range of Lasing

    0 200 400 600 8000

    2

    4

    6

    Pressure [mTorr]

    Ener

    gy [µ

    J]32kA

    18kA

    9kA

    Capillary: φ = 3mm, l = 150 mm,Predischarge: 10 A

    Lasing may be obtained with a current of below 9kA and over 32 kA,with adequate gas pressure.

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 18

    Tokyo Institute of TechnologySummary (soft X-ray laser)

    Ne-like Ar (3p-3s) Soft X-ray Lasing was confirmedCurrent of 9-32kA and half period of 110nsCeramic capillary : φ=3mm, l = 150 – 350 mmArgon gas pressure: 150-800mTorrMaximum gl =12 (g=0.8cm-1) at 32kA, 500mTorrPre-discharge current: 5-15A

    Sufficient pre-discharge current is essential forProduction of uniform pre-ionized plasmaSuppression of instabilities of pinched plasmaIncrease of laser output and improvement of reproducibility

    Possibility of another lasing transition was shownBe-like Ar (2p-2s) ?

    Lasing at current of less than 10 kA may be possibleLower laser output energyCompact power supplyHigher rep-rate operation

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 19

    Tokyo Institute of TechnologyOutline of Presentation

    Z-pinch Based Discharge

    Capillary Discharge Ne-like Ar Soft X-ray Laser– Background– Experimental Setup: Low Rep-Rate Operation– Characteristics of Ne-like Ar Soft X-ray Laser

    DPP EUV Light Source for Microlithography(This work is supported by NEDO and MEXT Grant-in-aid)– Background: Why EUV? Requirements– Experimental Setup– Characteristics of DPP EUV Source

    Summary

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 20

    Tokyo Institute of TechnologyITRS Roadmap Potential AccelerationWhy EUV (13.5 nm) ?

    YearInternational Technology Roadmap for Semiconductor

    2002(New 2-year cycle to 45 nm)

    Hg-I (365 nm)

    KrF (248 nm)ArF (193 nm)

    F2 (157 nm)

    Moore’s law2-year cycle : 70 % reduction every 2 years

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 21

    Tokyo Institute of TechnologyRequirements for EUV Light Source

    Item RequirementWavelength 13.5 nm

    115 W(100 Wafers/hour)

    > 10-7 kHzIntegrated Energy Stability ±0.3 %

    (3σ over 50 pulses)Etendue 1-3.3 mm2srSource Cleanliness(lifetime of illuminator)

    ≧ 30,000 hours(after intermediate focus)

    EUV Power at IF(2% in-band @13.5 nm)

    Repetition Frequency

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 22

    Tokyo Institute of TechnologyDPP Light Sources

    Shock wave heating, magnetic confinement, position stability

    Xe or Sn Discharge

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 23

    Tokyo Institute of TechnologyDependence of Ion Fraction on Te in Steady State

    Optimum Xe plasma condition for EUV emission at 13.5 nmTe = 20 – 40 eVne = 1018 – 1019 cm-3 (optically thin)

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 24

    Tokyo Institute of TechnologyPinch Dynamics

    Pre-ionized Uniform Plasma

    J x B

    Implosion Phase

    Joule (Resistive) Heating

    Compression : Adiabatic Heating

    Shock Wave Heating

    Kinetic Energy to Thermal Energy

    Thin, high-temperature and High-densty plasma

    Te = 20 – 40 eVne = 1018 – 1019 cm-3

    TemperatureD

    ensi

    ty

    I

    B B

    IEUV

    Lorentz force

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 25

    Tokyo Institute of Technology

    Experimental Setup

    EUV Light

    Vacuum ChamberMagnetic Switch

    PFN

    Xe Gas

    BaratronGas Supply

    Valve

    Rotary Pump+

    Turbo molecularDischarge Head Vacuum

    SystemThyristor Stack

    Vacuum Chamber

    Magnetic Switch

    Coolant

    Capillary

    Anode

    Gas Flow Controller

    Power Supply

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 26

    Tokyo Institute of TechnologyPulse power supply system

    SI Thyristor Stack・3 thyristors connected in series・Blocking voltage : 12.0 kV・Conducting current : 400A・Surge On current : > 10 kA・di/dt : > 100 A/ns

    PFN (Pulse Forming Network)・ 4 nF, 20kV Ceramic capacitor・ Capacitors connected in parallel・ Total Capacitance : 403 nF・ Impedance : 0.44 Ω

    HV

    L L

    C C

    Anode Cathode

    430 nF

    Reset circuit

    Magnetic switch

    SI thyristor

    stack

    Capillary

    PFN

    DR

    Direct pulse method

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 27

    Tokyo Institute of TechnologyEffect of dI/dt on Pinch Time and Plasma Radius

    Wall

    Wall

    Axis

    1.0 mm

    0.0 mm

    Streak PhotographOutput of Photodiode

    0 1 2 3 40

    5

    10

    15

    0

    2

    4

    6

    8

    10

    Cur

    rent

    [kA

    ]

    Phot

    odio

    de [V

    ]Time [µs]

    Photodiode(5-18 nm)

    IL

    5 Torr Xe

    -0.2 0 0.2 0.40

    10

    20

    30

    0

    5

    10

    15

    Phot

    odio

    de [V

    ]

    Cur

    rent

    [kA

    ]Time [µs]

    Photodiode(5-18 nm)

    IL

    5 Torr Xe

    Magnetic Switch

    Current Pulse Width~ 1µs   300 nsMagnetic Pulse Compression

     (Reduction of Inductance)

    403 nF

    K

    A

    HVAnode Reactor

    HV 403 nF

    K

    A

    PT1:3

    40 nF

    SI Thy

    SI Thy

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 28

    Tokyo Institute of TechnologyAbsolute in-band EUV power

    EUV mini calorimeter

    Zr filter

    Mo/SiMultilayer

    Mirror

    Photodiode

    Low dI/dt pulse High dI/dt pulseEUV output energy [mJ/sr/2%BW/pulse] 2.5 3.3

    Conversion efficiency [%] 0.28 0.44

    Max. solid angle [sr] 2π 2πEUV energy at the source [mJ/pulse] 15.7 20.7Input energy [J/pulse] 5.6 4.7

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 29

    Tokyo Institute of TechnologyEffect of dI/dt on the visible spectra

    400 450 500 550 600 650 7000

    2000

    4000

    6000

    8000

    10000

    Wavelength [nm]

    Inten

    sity

    [a.u.

    ]Xe II

    Xe IIXe II

    Xe II

    Al IIIAl III

    Al III

    Al IIH I

    O II

    Xe IIIO III

    Al IIIO II

    Al III

    O IIO II

    O II

    O II

    High dI/dt pulse

    Low dI/dt pulse

    ♦ Visible emission lines are identified in the each pulse system♦ Impurities O and Al in low dI/dt pulse come mostly from the capillary : plasma - capillary wall interaction♦ Contact time between plasma and capillary in high dI/dt pulse is short enough to prevent impurities from being ablated

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 30

    Tokyo Institute of TechnologyEffect of dI/dt and pressure on EUV pinhole images

    Low dI/dt pulse High dI/dt pulse

    Pressure 0° 45° 0° 45°

    3 Torr

    4 Torr

    5 Torr

    6 Torr

    7 Torr

    8 Torr

    For higher dI/dtSource size is smallerPosition stability is better

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 31

    Tokyo Institute of TechnologyEffect of dI/dt on position stability

    low dI/dt pulse High dI/dt pulse

    X

    Y 2 mm

    Center position of individual shots

    X

    Y 2 mm

    X:±0.018mmY:±0.013mm

    X:±0.16 mmY:±0.13 mm

    Standard deviation σ

    ♦ Peak intensity positions of 20 pinhole image were recorded♦ Position stability of fast pulse is better than that of slow one

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 32

    Tokyo Institute of TechnologyFor the higher power and steady state operation

    Ordinary Z-pinch and Gas Curtain Tapered Pinch

    Gas Curtain

    K A

    Gas Curtain

    Radial collection of EUV

    Gas Curtain

    Diffuser

    Nozzle Diffuser

    Collector

    Normal incidence

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 33

    Tokyo Institute of TechnologyGas jet type Z-pinch discharge system

    ♦ Cathode (nozzle)- Xe nozzle diameter: 2 mm- He nozzle diameter

    Inner diameter: 11.6 mmOuter diameter: 12 mm

    ♦ Anode (diffuser)- Inner diameter: 6 mm- Outer diameter: 20 mm♦ Conditions- V charge = 9 kV- Xe gas supplying pressure

    = 10 Torr- Gap distance: d = 4 mm

    Xe

    Curtain Gas(Ar, He) EUV

    EUVCurtain Gas(Ar, He)

    AnodeCathode

    Front view

    Side view

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 34

    Tokyo Institute of TechnologyFraming photographs (10 ns resolution)

    - 0 .2 0 0 . 2 0 . 4

    0

    1

    2

    3

    0

    2

    4

    6

    8

    1 0

    T im e [ µ s ]

    Phot

    odio

    de [V

    ]

    Cur

    rent

    [kA

    ]

    Anode Cathode

    -180 ns -20 nsWithout DCpreionization

    With DCpreionization

    ♦ Conditions- V charge = 9 kV- Xe gas supplying pressure = 10 Torr- Gap distance: d = 4 mm- Without gas curtain

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 35

    Tokyo Institute of TechnologyEffect of gas curtain (EUV pinhole image)

    W/o Gas Curtain 10 kV, Xe 10 Torr

    He 12 sccmAr 12 sccm

    With Gas Curtain (w/o diffuser)

    Confinement by curtain gasis observed

    Pinch cannot be observed in case of Ar gas curtain

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 36

    Tokyo Institute of TechnologyAbsolute in-band EUV energy

    d

    θ

    Zr filterMo/Si mirror

    Photodiode

    ♦ Vcharge = 9 kV, Xe = 10 Torr, d = 4 mm, 100 Hz operation, without gas curtain♦ The EUV output in 2 % bandwidth at 13.5 nm is 5.1 mJ/pulse (at 2π sr)♦ The available observation angle (±8 degree) may lead to partial obscuration of the source♦ In spite of the low output energy, we believe that increasing the discharge current and improving the present nozzle design can achieve the high EUV yield

    -10 -5 0 5 100

    0.2

    0.4

    0.6

    0.8

    1

    Angle [degree]

    EUV

    ene

    rgy

    [mJ /

    sr /

    2% B

    W]

    Angular distribution of EUV

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 37

    Tokyo Institute of TechnologyVisible spectra

    ♦ The observed impurity lines of different ionization states of O and Al in capillary discharge come mostly from the alumina capillary wall♦ No significant impurity contribution from the electrode materials is marked in the gas jet type Z-pinch discharge

    Capillary Z-pinch Gas jet Z-pinch

    400 450 500 550 600 650 7000

    2000

    4000

    6000

    8000

    10000

    Wavelength [nm]

    Inte

    nsity

    [a.u

    .]

    Xe II

    Xe IIXe II

    Xe II

    Al IIIAl III

    Al III

    Al IIH I

    O II

    Xe IIIO III

    Al IIIO II

    Al III

    O IIO II

    O II

    O II

    Capillary Z pinch with slow pulse

    Capillary Z pinch with fast pulse

    Gas jet Z pinchwith fast pulse

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 38

    Tokyo Institute of TechnologySummary (EUV light source)

    Higher energy transfer efficiencyLower stray inductanceHigher dI/dt

    Debris mitigationTube less structure : radial collection Gas curtain, Debris shield

    Future planXenon Tin (higher efficiency)

  • U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 39

    Tokyo Institute of Technology

    Thank You for Your Attention

    Pulsed Power Plasma Experiment- Generation of Photons in EUV Region -Outline of PresentationApplication of Soft X-ray LaserPrinciples of soft X-ray laserSoft X-ray Lasing by Fast Capillary Discharge(V.N.Shlyaptsev, et al., SPIE Vol.2012, pp.99-110, 1993)Experimental SetupStreak photographEffect of Pre-IonizationGain-Length ProductSpectroscopic MeasurementDouble-Slit Interference FringesMeasurement of the spatial coherenceAnother Lasing?MHD Simulation 1MHD Simulation 2Current and Pressure Range of LasingSummary (soft X-ray laser)Outline of PresentationITRS Roadmap Potential AccelerationRequirements for EUV Light SourceDPP Light SourcesDependence of Ion Fraction on Te in Steady StatePinch DynamicsPulse power supply systemEffect of dI/dt on Pinch Time and Plasma RadiusAbsolute in-band EUV powerEffect of dI/dt on the visible spectraEffect of dI/dt and pressure on EUV pinhole imagesEffect of dI/dt on position stabilityFor the higher power and steady state operationGas jet type Z-pinch discharge systemFraming photographs (10 ns resolution)Effect of gas curtain (EUV pinhole image)Absolute in-band EUV energyVisible spectraSummary (EUV light source)