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U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 1
Pulsed Power Plasma Experiment- Generation of Photons in EUV Region -
Eiki HottaK.Horioka, A.Okino, M.Watanabe, T.Kawamura, K.Yasuoka,
M.Masnavi, S.R.Mohanty
Department of Energy SciencesTokyo Institute of Technology
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 2
Tokyo Institute of TechnologyOutline of Presentation
Z-pinch Based Discharge
Capillary Discharge Ne-like Ar Soft X-ray Laser– Background– Experimental Setup: Low Rep-Rate Operation– Characteristics of Ne-like Ar Soft X-ray Laser
DPP EUV Light Source for Microlithography(This work is supported by NEDO and MEXT Grant-in-aid)– Background: Why EUV? Requirements– Experimental Setup– Characteristics of DPP EUV Source
Summary
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 3
Tokyo Institute of TechnologyApplication of Soft X-ray Laser
X-ray diagnosticsX-ray microscopeX-ray holography
Images of malaria infected red blood cells(c) 2.4nm soft X-ray microscopy(d) Visible light microscopy
Water window (2.33-4.36nm)
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 4
Tokyo Institute of TechnologyPrinciples of soft X-ray laser
Schematic drawing of laser Characteristics of Soft X-ray Laser
•Monochromaticity•Directivity•High intensity•CoherenceLaser Medium
0I I
L
( )GLexpII 0=
One of operational principle of plasma X-ray laser: Collisional excitation scheme
G ∝ Nu – NlEnergy = PL・∆t
u
g
lPumpElectron
Long Lived State
Fastradiativedecay
λλ Laser: Amplified Spontaneous Emission
3p
3s
2p6
P∝ 1/λ4
Tokyo Institute of Technology
Soft X-ray Lasing by Fast Capillary Discharge(V.N.Shlyaptsev, et al., SPIE Vol.2012, pp.99-110, 1993)
3p-3s Ne-like ArIX (λ~40-70 nm)rp~150-250 μm, Ne~(0.5-2)×1019 cm-3, Te~60-90 eVr0~2 mm, p0~0.1-0.2 Torr, Ip~10-12 kA, T/2~60-80 ns
3p-3s Ne-like KrXXVII (λ~17-30 nm)rp~50-100 μm, Ne~(2-5)×1020 cm-3, Te~500-700 eVr0~1 mm, p0~2-4 Torr, Ip~150-180 kA, T/2~15-25 ns
4d-4p Ni-like XeXXVII (λ~9.1-9.5 nm)rp~75-150 μm, Ne~(2-5)×1020 cm-3, Te~300-600 eVr0~1 mm, p0~2-4 Torr, Ip~200-270 kA, T/2~12-20 ns
Radiative Collisional Model
100 101 102 10310-2
10-1
100
101
102
103
Current (kA)
nkT
(GPa
)Ne-like Ar
Ne-like Kr
Ni-like Xe
Experiment
Assuming rp=100μm
J.J.Rocca et al.
Theoretically predicted lasing windows
Bennett’s Relation
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 6
Tokyo Institute of TechnologyExperimental Setup
Schematic Photograph
SF6:1[atm]
Reset Circuit
Capillary
H2OSF6:3[atm]
H2O
Gap SwitchWater Capacitor
Pulse Transformer
Marx Generator
XRD
Capillary
X-ray
High Speed Camera2 m
SpecificationWater capacitor: 3nF, Max. 900 kV (1.2 kJ)Current: T/2=110 ns, 9-32 kA, dI/dt = 2-8×1011 A/sCapillary: Polyacetal, Pyrex or Alumina Ceramics, φ3mm, 60-350 mm longFilling gas: 100-1000 mTorr Ar
SpecificationWater capacitor: 3nF, Max. 900 kV (1.2 kJ)Current: T/2=110 ns, 9-32 kA, dI/dt = 2-8×1011 A/sCapillary: Polyacetal, Pyrex or Alumina Ceramics, φ3mm, 60-350 mm longFilling gas: 100-1000 mTorr Ar
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 7
Tokyo Institute of TechnologyStreak photograph
Waveform of discharge current
In order to obtain a laser amplification, it is necessary to produce thin plasma that has a laser gain. Side-on observations of plasma were made using Pyrex glass capillary.
3mm
Time[ns]0 50 100 150
Side-on Streak photograph
Pylex Capillary
Pylex Capillary0 50 100-40
-30-20-10
010203040
Curr
ent[k
A]
Time[ns]
Ar: 150 mTorrCapillary: φ = 3mm, l = 60 mmPredischarget: 10 A
1st pinch 2nd pinch
Framing
Framing
Discharge conditions•Pyrex Capillary: l = 60 mm, d = 3mm•Argon: 150 mTorr•Predischarge: 10 A
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 8
Tokyo Institute of TechnologyEffect of Pre-Ionization
With pre-ionizationcurrent of (10 A)
With pre-ionizationcurrent of (10 A)
Without pre-ionizationWithout pre-ionization0 50 100-40
-30-20-10
010203040
Cur
rent
[kA
]
Time[ns]
Ar: 150 mTorrCapillary: φ = 3mm, Predischarge: 0 A
l = 60 mm
Pre-ionization is essential for production of stable plasma.
(A) 20 - 30 ns
(B) 30 - 40 ns
(C) 40 - 50 ns
(D) 50 - 60 ns
l = 20 mm
Plasma ColumnCapillary Tube
φ = 3 mm
(A) 10 - 20 ns
(B) 20 - 30 ns
(C) 30 - 40 ns
(D) 40 - 50 ns
l = 20 mm
φ = 3 mm
Plasma ColumnCapillary Tube
•Helical instabilities are observed•Poor reproducibility
•Stable•Highly reproducible•Diameter of pinched plasma:
300µm
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 9
Tokyo Institute of TechnologyDirectivity of Spike Output
Discharge condition・ Capillary length : 150 mm,
diameter : 3 mm・ Filling Ar pressure : 450 mTorr・ Preionization current : 10 A
0 50 100
30
60
Cur
rent
[kA
]
0
0
1
1
Time [ns]
XR
D si
gnal
[V]
Pinhole - XRD: 120 mm
Pinhole - XRD: 600 mm
Argon: 450mTorrCapillary: φ = 3 mm, l = 150 mmPredischarge: 10 A
XRD output dependence on distance between capillary and detector
Sharp peaks have directivity. It’s a characteristics of laser.
To confirm the directivity of laser, the distance from the capillary to the XRD is changed from 120mm to 600mm
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 10
Tokyo Institute of TechnologyGain-Length Product
Maximum gain-length product gl of 12 (g = 0.8 cm-1) andLaser output energy of 5 - 6 µJ are obtained.
Background at 80ns
Laser
XRD output dependence on capillary length
0 50 100
01020304050
Time [ns]
Cur
rent
[kA
]
XR
D si
gnal
[V]
0
0
0
3
6
3
2
Capillary: φ = 3mmAr: 500 mTorrPredischarge: 16 A
l = 150 mm
l = 120 mm
l = 90 mm
laser
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 11
Tokyo Institute of TechnologySpectroscopic Measurement
Laser 46.9 nm
Measured spectrum
Capillary
Spectrometer
Label Series Transition λ (Å)
1 3s 3P1 – 3p 1S0 431.1232 3p 1P1 – 3d 1P1 450.660
3 3p 1P1 – 3d 1P1 465.118
4 3s 1P1 – 3p 1S0 468.7935 3s3p – 3s3d
(J = 0-1)473.934
6 3s3p – 3s3d (J = 1-2)
475.654
7 3s3p – 3s3d(J = 2-3)
479.379
Ar VII
Ar IX
Grazing Incidence Spectrometer(McPherson 248/310G)
Discharge conditionCapillary : φ3, l =150 mmI = 22 kAp = 300 mTorr
After P.S.Antsiferov et al., Physica Scripta, Vol.62, pp.127-131, 2000
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 12
Tokyo Institute of TechnologyDouble-Slit Interference Fringes
Discharge current pulse: ~23kA Ar pressure: ~340 mTorrCapillary length = 350 mm Capillary diameter = 3 mmL1 = 250 mm L2 = 1070 mm Detector: X-CCD
Slit separation b = 100 μmExperimental λ = 45.9 ± 1.2 nm
Slit separation b = 50 μmExperimental λ = 46.5 ± 0.9 nm
Ne-like Ar laserλ = 46.9 nm
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 13
Tokyo Institute of TechnologyMeasurement of the spatial coherence
)2
exp( 22
cLd∆−=Coherence degree: where Lc is coherence length
μ12(50 μm)=0.60±0.05 Measured coherence length is 50 µm
Imax
Imin
Coherence length reported by other group is Lc= 190µm for 450 mm capillaryPHYSICAL REVIEW A 70, 023818 (2004)
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 14
Tokyo Institute of TechnologyAnother Lasing?
1
2
Experimental λ = 45.9 ± 1.2 nm
Ne-like Ar laserλ1 = 46.9 nm(Ar8+ 3s – 3p)
1Experimental λ = 44.1 ± 3.0 nm
Be-like Ar laserλ2 = 42.6 nm ?(Ar14+ 2p – 2s)
2
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 15
Tokyo Institute of TechnologyMHD Simulation 1
Plasma is compressed and heated
Highly ionized plasma expandsto the capillary wall being cooled
Space-Time development of Te
Space-Time development of Ne (P.Vrba, et al., CTU)
At 33.2 ns : Ne=4.3x1018 cm-3, Te=100 eVAr8+ : Ne-like
At 37.0 ns : Ne= 3.14x1018 cm-3, Te=105 eVAr14+ : Be-like
34.8 ns
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 16
Tokyo Institute of TechnologyMHD Simulation 2
The evaluated spectrum predicts another strong lasing at the wavelength of
λ= 42.6 nm at t = 37 ns, when Te = 105 eV, Ne = 3.14Χ1018 cm-3
The lasing occurs by the transition 2p - 2s
Be-like argon (Ar14+).
20 ns/Div
Current XRD
Capillary length = 330 mm
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 17
Tokyo Institute of TechnologyCurrent and Pressure Range of Lasing
0 200 400 600 8000
2
4
6
Pressure [mTorr]
Ener
gy [µ
J]32kA
18kA
9kA
Capillary: φ = 3mm, l = 150 mm,Predischarge: 10 A
Lasing may be obtained with a current of below 9kA and over 32 kA,with adequate gas pressure.
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 18
Tokyo Institute of TechnologySummary (soft X-ray laser)
Ne-like Ar (3p-3s) Soft X-ray Lasing was confirmedCurrent of 9-32kA and half period of 110nsCeramic capillary : φ=3mm, l = 150 – 350 mmArgon gas pressure: 150-800mTorrMaximum gl =12 (g=0.8cm-1) at 32kA, 500mTorrPre-discharge current: 5-15A
Sufficient pre-discharge current is essential forProduction of uniform pre-ionized plasmaSuppression of instabilities of pinched plasmaIncrease of laser output and improvement of reproducibility
Possibility of another lasing transition was shownBe-like Ar (2p-2s) ?
Lasing at current of less than 10 kA may be possibleLower laser output energyCompact power supplyHigher rep-rate operation
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 19
Tokyo Institute of TechnologyOutline of Presentation
Z-pinch Based Discharge
Capillary Discharge Ne-like Ar Soft X-ray Laser– Background– Experimental Setup: Low Rep-Rate Operation– Characteristics of Ne-like Ar Soft X-ray Laser
DPP EUV Light Source for Microlithography(This work is supported by NEDO and MEXT Grant-in-aid)– Background: Why EUV? Requirements– Experimental Setup– Characteristics of DPP EUV Source
Summary
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 20
Tokyo Institute of TechnologyITRS Roadmap Potential AccelerationWhy EUV (13.5 nm) ?
YearInternational Technology Roadmap for Semiconductor
2002(New 2-year cycle to 45 nm)
Hg-I (365 nm)
KrF (248 nm)ArF (193 nm)
F2 (157 nm)
Moore’s law2-year cycle : 70 % reduction every 2 years
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 21
Tokyo Institute of TechnologyRequirements for EUV Light Source
Item RequirementWavelength 13.5 nm
115 W(100 Wafers/hour)
> 10-7 kHzIntegrated Energy Stability ±0.3 %
(3σ over 50 pulses)Etendue 1-3.3 mm2srSource Cleanliness(lifetime of illuminator)
≧ 30,000 hours(after intermediate focus)
EUV Power at IF(2% in-band @13.5 nm)
Repetition Frequency
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 22
Tokyo Institute of TechnologyDPP Light Sources
Shock wave heating, magnetic confinement, position stability
Xe or Sn Discharge
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 23
Tokyo Institute of TechnologyDependence of Ion Fraction on Te in Steady State
Optimum Xe plasma condition for EUV emission at 13.5 nmTe = 20 – 40 eVne = 1018 – 1019 cm-3 (optically thin)
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 24
Tokyo Institute of TechnologyPinch Dynamics
Pre-ionized Uniform Plasma
J x B
Implosion Phase
Joule (Resistive) Heating
Compression : Adiabatic Heating
Shock Wave Heating
Kinetic Energy to Thermal Energy
Thin, high-temperature and High-densty plasma
Te = 20 – 40 eVne = 1018 – 1019 cm-3
TemperatureD
ensi
ty
I
B B
IEUV
Lorentz force
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 25
Tokyo Institute of Technology
Experimental Setup
EUV Light
Vacuum ChamberMagnetic Switch
PFN
Xe Gas
BaratronGas Supply
Valve
Rotary Pump+
Turbo molecularDischarge Head Vacuum
SystemThyristor Stack
Vacuum Chamber
Magnetic Switch
Coolant
Capillary
Anode
Gas Flow Controller
Power Supply
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 26
Tokyo Institute of TechnologyPulse power supply system
SI Thyristor Stack・3 thyristors connected in series・Blocking voltage : 12.0 kV・Conducting current : 400A・Surge On current : > 10 kA・di/dt : > 100 A/ns
PFN (Pulse Forming Network)・ 4 nF, 20kV Ceramic capacitor・ Capacitors connected in parallel・ Total Capacitance : 403 nF・ Impedance : 0.44 Ω
HV
L L
C C
Anode Cathode
430 nF
Reset circuit
Magnetic switch
SI thyristor
stack
Capillary
PFN
DR
Direct pulse method
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 27
Tokyo Institute of TechnologyEffect of dI/dt on Pinch Time and Plasma Radius
Wall
Wall
Axis
1.0 mm
0.0 mm
Streak PhotographOutput of Photodiode
0 1 2 3 40
5
10
15
0
2
4
6
8
10
Cur
rent
[kA
]
Phot
odio
de [V
]Time [µs]
Photodiode(5-18 nm)
IL
5 Torr Xe
-0.2 0 0.2 0.40
10
20
30
0
5
10
15
Phot
odio
de [V
]
Cur
rent
[kA
]Time [µs]
Photodiode(5-18 nm)
IL
5 Torr Xe
Magnetic Switch
Current Pulse Width~ 1µs 300 nsMagnetic Pulse Compression
(Reduction of Inductance)
403 nF
K
A
HVAnode Reactor
HV 403 nF
K
A
PT1:3
40 nF
SI Thy
SI Thy
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 28
Tokyo Institute of TechnologyAbsolute in-band EUV power
EUV mini calorimeter
Zr filter
Mo/SiMultilayer
Mirror
Photodiode
Low dI/dt pulse High dI/dt pulseEUV output energy [mJ/sr/2%BW/pulse] 2.5 3.3
Conversion efficiency [%] 0.28 0.44
Max. solid angle [sr] 2π 2πEUV energy at the source [mJ/pulse] 15.7 20.7Input energy [J/pulse] 5.6 4.7
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 29
Tokyo Institute of TechnologyEffect of dI/dt on the visible spectra
400 450 500 550 600 650 7000
2000
4000
6000
8000
10000
Wavelength [nm]
Inten
sity
[a.u.
]Xe II
Xe IIXe II
Xe II
Al IIIAl III
Al III
Al IIH I
O II
Xe IIIO III
Al IIIO II
Al III
O IIO II
O II
O II
High dI/dt pulse
Low dI/dt pulse
♦ Visible emission lines are identified in the each pulse system♦ Impurities O and Al in low dI/dt pulse come mostly from the capillary : plasma - capillary wall interaction♦ Contact time between plasma and capillary in high dI/dt pulse is short enough to prevent impurities from being ablated
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 30
Tokyo Institute of TechnologyEffect of dI/dt and pressure on EUV pinhole images
Low dI/dt pulse High dI/dt pulse
Pressure 0° 45° 0° 45°
3 Torr
4 Torr
5 Torr
6 Torr
7 Torr
8 Torr
For higher dI/dtSource size is smallerPosition stability is better
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 31
Tokyo Institute of TechnologyEffect of dI/dt on position stability
low dI/dt pulse High dI/dt pulse
X
Y 2 mm
Center position of individual shots
X
Y 2 mm
X:±0.018mmY:±0.013mm
X:±0.16 mmY:±0.13 mm
Standard deviation σ
♦ Peak intensity positions of 20 pinhole image were recorded♦ Position stability of fast pulse is better than that of slow one
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 32
Tokyo Institute of TechnologyFor the higher power and steady state operation
Ordinary Z-pinch and Gas Curtain Tapered Pinch
Gas Curtain
K A
Gas Curtain
Radial collection of EUV
Gas Curtain
Diffuser
Nozzle Diffuser
Collector
Normal incidence
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 33
Tokyo Institute of TechnologyGas jet type Z-pinch discharge system
♦ Cathode (nozzle)- Xe nozzle diameter: 2 mm- He nozzle diameter
Inner diameter: 11.6 mmOuter diameter: 12 mm
♦ Anode (diffuser)- Inner diameter: 6 mm- Outer diameter: 20 mm♦ Conditions- V charge = 9 kV- Xe gas supplying pressure
= 10 Torr- Gap distance: d = 4 mm
Xe
Curtain Gas(Ar, He) EUV
EUVCurtain Gas(Ar, He)
AnodeCathode
Front view
Side view
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 34
Tokyo Institute of TechnologyFraming photographs (10 ns resolution)
- 0 .2 0 0 . 2 0 . 4
0
1
2
3
0
2
4
6
8
1 0
T im e [ µ s ]
Phot
odio
de [V
]
Cur
rent
[kA
]
Anode Cathode
-180 ns -20 nsWithout DCpreionization
With DCpreionization
♦ Conditions- V charge = 9 kV- Xe gas supplying pressure = 10 Torr- Gap distance: d = 4 mm- Without gas curtain
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 35
Tokyo Institute of TechnologyEffect of gas curtain (EUV pinhole image)
W/o Gas Curtain 10 kV, Xe 10 Torr
He 12 sccmAr 12 sccm
With Gas Curtain (w/o diffuser)
Confinement by curtain gasis observed
Pinch cannot be observed in case of Ar gas curtain
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 36
Tokyo Institute of TechnologyAbsolute in-band EUV energy
d
θ
Zr filterMo/Si mirror
Photodiode
♦ Vcharge = 9 kV, Xe = 10 Torr, d = 4 mm, 100 Hz operation, without gas curtain♦ The EUV output in 2 % bandwidth at 13.5 nm is 5.1 mJ/pulse (at 2π sr)♦ The available observation angle (±8 degree) may lead to partial obscuration of the source♦ In spite of the low output energy, we believe that increasing the discharge current and improving the present nozzle design can achieve the high EUV yield
-10 -5 0 5 100
0.2
0.4
0.6
0.8
1
Angle [degree]
EUV
ene
rgy
[mJ /
sr /
2% B
W]
Angular distribution of EUV
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 37
Tokyo Institute of TechnologyVisible spectra
♦ The observed impurity lines of different ionization states of O and Al in capillary discharge come mostly from the alumina capillary wall♦ No significant impurity contribution from the electrode materials is marked in the gas jet type Z-pinch discharge
Capillary Z-pinch Gas jet Z-pinch
400 450 500 550 600 650 7000
2000
4000
6000
8000
10000
Wavelength [nm]
Inte
nsity
[a.u
.]
Xe II
Xe IIXe II
Xe II
Al IIIAl III
Al III
Al IIH I
O II
Xe IIIO III
Al IIIO II
Al III
O IIO II
O II
O II
Capillary Z pinch with slow pulse
Capillary Z pinch with fast pulse
Gas jet Z pinchwith fast pulse
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 38
Tokyo Institute of TechnologySummary (EUV light source)
Higher energy transfer efficiencyLower stray inductanceHigher dI/dt
Debris mitigationTube less structure : radial collection Gas curtain, Debris shield
Future planXenon Tin (higher efficiency)
U.S.-Japan Workshop on Heavy Ion Fusion and High Energy Density Physics, Sep. 28-30, 2005 at Utsunomiya University 39
Tokyo Institute of Technology
Thank You for Your Attention
Pulsed Power Plasma Experiment- Generation of Photons in EUV Region -Outline of PresentationApplication of Soft X-ray LaserPrinciples of soft X-ray laserSoft X-ray Lasing by Fast Capillary Discharge(V.N.Shlyaptsev, et al., SPIE Vol.2012, pp.99-110, 1993)Experimental SetupStreak photographEffect of Pre-IonizationGain-Length ProductSpectroscopic MeasurementDouble-Slit Interference FringesMeasurement of the spatial coherenceAnother Lasing?MHD Simulation 1MHD Simulation 2Current and Pressure Range of LasingSummary (soft X-ray laser)Outline of PresentationITRS Roadmap Potential AccelerationRequirements for EUV Light SourceDPP Light SourcesDependence of Ion Fraction on Te in Steady StatePinch DynamicsPulse power supply systemEffect of dI/dt on Pinch Time and Plasma RadiusAbsolute in-band EUV powerEffect of dI/dt on the visible spectraEffect of dI/dt and pressure on EUV pinhole imagesEffect of dI/dt on position stabilityFor the higher power and steady state operationGas jet type Z-pinch discharge systemFraming photographs (10 ns resolution)Effect of gas curtain (EUV pinhole image)Absolute in-band EUV energyVisible spectraSummary (EUV light source)