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Pressure sensor. 2.008-spring-2003. Surface Micromachining. Pattern anchors. Deposit sacrificial layer. Deposit/pattern structural layer. Etch sacrificial layer. 2.008-spring-2003. Surface micromachining. Structure sacrificial etchant. - PowerPoint PPT Presentation
Citation preview
Pressure sensor
2008-spring-2003
Surface Micromachining
2008-spring-2003
Deposit sacrificial layer Pattern anchors
Depositpattern structural layer Etch sacrificial layer
Surface micromachining
Structure sacrificial etchant
Polysilicon Silicon dioxide HF1048708 SiNx PSG HF1048708 Silicon dioxide polysilicon XeF21048708 SiNx polysilicon XeF21048708 Aluminum photoresist oxygen plasma
2008-spring-2003
Residual stress gradients
2008-spring-2003
More tensile on top
More compressive on top
Just right
Clean Room
1048708 Gowning with bunny suit1048708 Class 1 10 100
A salt grain on a chip
2008-spring-2003
Class of clean rooms
1048708 Class 1 means one speckle of 05 μ partical in one ft31048708 Class 10 100 10001048708 HEPA filter AHU
2008-spring-2003
Air Filters
1048708 HEPA (High Efficiency Particulate Air) filters1048708 High efficiency low Δp good loading characteristics1048708 Glass fibers in a paper like medium1048708 97 retainment of incident particles of 03 μm or larger
2008-spring-2003
Class of clean rooms
2008-spring-2003
Class Temptolerance tolerance
Particles
2008-spring-2003
Class
Federal Standard 209 Number of particles per cubic foot
Toxicity
1048708 TLV (Threshold Limit Value)1048708 Upper limit material concentration that an average healthy person can be exposed without adverse effects ppm or mgm3
1048708 Notorious Poisons1048708 CO (100 ppm) CO2 (5000 ppm) HCN (110 ppm) H2S (10 ppm)1048708 SO2 (5 ppm) NH3 (50 ppm) 1048708 Arsenic trioxide AS2O3 (01g fatal)1048708 Hg (01 ppm via skin contact)1048708 All material are toxic in sufficient quantity 5g caffein is fatal
2008-spring-2003
MEMS Applications
2008-spring-2003
Display Technologies
MarketLeader
Ramp DIssues
ScreenSize
2008-spring-2003
HDTV for 60rdquo ~ 80rdquo Home Theater1048698 Digital Presentation for 100 rdquo ~ 300rdquo Projector1048698 Key Factor Brightness
Brightness of ProjectionDisplays
lux = lumen m2
96365-39 CORPORATE RESEARCH amp DEVELOPMENT
1st Optical MEMS devicePHOTONICS AND MICROMACHINING
DIGITAL MICROMIRROR DEVICE amp DLP TM
PROJECTOR
DMD Optical Switching Principle
DMD Mirror onoff plusmn 10o
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
DMD Cell Structure
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
TMA
2008-spring-2003
Light Modulation of TMAThinfilm Micromirror Array
2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Surface Micromachining
2008-spring-2003
Deposit sacrificial layer Pattern anchors
Depositpattern structural layer Etch sacrificial layer
Surface micromachining
Structure sacrificial etchant
Polysilicon Silicon dioxide HF1048708 SiNx PSG HF1048708 Silicon dioxide polysilicon XeF21048708 SiNx polysilicon XeF21048708 Aluminum photoresist oxygen plasma
2008-spring-2003
Residual stress gradients
2008-spring-2003
More tensile on top
More compressive on top
Just right
Clean Room
1048708 Gowning with bunny suit1048708 Class 1 10 100
A salt grain on a chip
2008-spring-2003
Class of clean rooms
1048708 Class 1 means one speckle of 05 μ partical in one ft31048708 Class 10 100 10001048708 HEPA filter AHU
2008-spring-2003
Air Filters
1048708 HEPA (High Efficiency Particulate Air) filters1048708 High efficiency low Δp good loading characteristics1048708 Glass fibers in a paper like medium1048708 97 retainment of incident particles of 03 μm or larger
2008-spring-2003
Class of clean rooms
2008-spring-2003
Class Temptolerance tolerance
Particles
2008-spring-2003
Class
Federal Standard 209 Number of particles per cubic foot
Toxicity
1048708 TLV (Threshold Limit Value)1048708 Upper limit material concentration that an average healthy person can be exposed without adverse effects ppm or mgm3
1048708 Notorious Poisons1048708 CO (100 ppm) CO2 (5000 ppm) HCN (110 ppm) H2S (10 ppm)1048708 SO2 (5 ppm) NH3 (50 ppm) 1048708 Arsenic trioxide AS2O3 (01g fatal)1048708 Hg (01 ppm via skin contact)1048708 All material are toxic in sufficient quantity 5g caffein is fatal
2008-spring-2003
MEMS Applications
2008-spring-2003
Display Technologies
MarketLeader
Ramp DIssues
ScreenSize
2008-spring-2003
HDTV for 60rdquo ~ 80rdquo Home Theater1048698 Digital Presentation for 100 rdquo ~ 300rdquo Projector1048698 Key Factor Brightness
Brightness of ProjectionDisplays
lux = lumen m2
96365-39 CORPORATE RESEARCH amp DEVELOPMENT
1st Optical MEMS devicePHOTONICS AND MICROMACHINING
DIGITAL MICROMIRROR DEVICE amp DLP TM
PROJECTOR
DMD Optical Switching Principle
DMD Mirror onoff plusmn 10o
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
DMD Cell Structure
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
TMA
2008-spring-2003
Light Modulation of TMAThinfilm Micromirror Array
2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Surface micromachining
Structure sacrificial etchant
Polysilicon Silicon dioxide HF1048708 SiNx PSG HF1048708 Silicon dioxide polysilicon XeF21048708 SiNx polysilicon XeF21048708 Aluminum photoresist oxygen plasma
2008-spring-2003
Residual stress gradients
2008-spring-2003
More tensile on top
More compressive on top
Just right
Clean Room
1048708 Gowning with bunny suit1048708 Class 1 10 100
A salt grain on a chip
2008-spring-2003
Class of clean rooms
1048708 Class 1 means one speckle of 05 μ partical in one ft31048708 Class 10 100 10001048708 HEPA filter AHU
2008-spring-2003
Air Filters
1048708 HEPA (High Efficiency Particulate Air) filters1048708 High efficiency low Δp good loading characteristics1048708 Glass fibers in a paper like medium1048708 97 retainment of incident particles of 03 μm or larger
2008-spring-2003
Class of clean rooms
2008-spring-2003
Class Temptolerance tolerance
Particles
2008-spring-2003
Class
Federal Standard 209 Number of particles per cubic foot
Toxicity
1048708 TLV (Threshold Limit Value)1048708 Upper limit material concentration that an average healthy person can be exposed without adverse effects ppm or mgm3
1048708 Notorious Poisons1048708 CO (100 ppm) CO2 (5000 ppm) HCN (110 ppm) H2S (10 ppm)1048708 SO2 (5 ppm) NH3 (50 ppm) 1048708 Arsenic trioxide AS2O3 (01g fatal)1048708 Hg (01 ppm via skin contact)1048708 All material are toxic in sufficient quantity 5g caffein is fatal
2008-spring-2003
MEMS Applications
2008-spring-2003
Display Technologies
MarketLeader
Ramp DIssues
ScreenSize
2008-spring-2003
HDTV for 60rdquo ~ 80rdquo Home Theater1048698 Digital Presentation for 100 rdquo ~ 300rdquo Projector1048698 Key Factor Brightness
Brightness of ProjectionDisplays
lux = lumen m2
96365-39 CORPORATE RESEARCH amp DEVELOPMENT
1st Optical MEMS devicePHOTONICS AND MICROMACHINING
DIGITAL MICROMIRROR DEVICE amp DLP TM
PROJECTOR
DMD Optical Switching Principle
DMD Mirror onoff plusmn 10o
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
DMD Cell Structure
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
TMA
2008-spring-2003
Light Modulation of TMAThinfilm Micromirror Array
2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Residual stress gradients
2008-spring-2003
More tensile on top
More compressive on top
Just right
Clean Room
1048708 Gowning with bunny suit1048708 Class 1 10 100
A salt grain on a chip
2008-spring-2003
Class of clean rooms
1048708 Class 1 means one speckle of 05 μ partical in one ft31048708 Class 10 100 10001048708 HEPA filter AHU
2008-spring-2003
Air Filters
1048708 HEPA (High Efficiency Particulate Air) filters1048708 High efficiency low Δp good loading characteristics1048708 Glass fibers in a paper like medium1048708 97 retainment of incident particles of 03 μm or larger
2008-spring-2003
Class of clean rooms
2008-spring-2003
Class Temptolerance tolerance
Particles
2008-spring-2003
Class
Federal Standard 209 Number of particles per cubic foot
Toxicity
1048708 TLV (Threshold Limit Value)1048708 Upper limit material concentration that an average healthy person can be exposed without adverse effects ppm or mgm3
1048708 Notorious Poisons1048708 CO (100 ppm) CO2 (5000 ppm) HCN (110 ppm) H2S (10 ppm)1048708 SO2 (5 ppm) NH3 (50 ppm) 1048708 Arsenic trioxide AS2O3 (01g fatal)1048708 Hg (01 ppm via skin contact)1048708 All material are toxic in sufficient quantity 5g caffein is fatal
2008-spring-2003
MEMS Applications
2008-spring-2003
Display Technologies
MarketLeader
Ramp DIssues
ScreenSize
2008-spring-2003
HDTV for 60rdquo ~ 80rdquo Home Theater1048698 Digital Presentation for 100 rdquo ~ 300rdquo Projector1048698 Key Factor Brightness
Brightness of ProjectionDisplays
lux = lumen m2
96365-39 CORPORATE RESEARCH amp DEVELOPMENT
1st Optical MEMS devicePHOTONICS AND MICROMACHINING
DIGITAL MICROMIRROR DEVICE amp DLP TM
PROJECTOR
DMD Optical Switching Principle
DMD Mirror onoff plusmn 10o
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
DMD Cell Structure
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
TMA
2008-spring-2003
Light Modulation of TMAThinfilm Micromirror Array
2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Clean Room
1048708 Gowning with bunny suit1048708 Class 1 10 100
A salt grain on a chip
2008-spring-2003
Class of clean rooms
1048708 Class 1 means one speckle of 05 μ partical in one ft31048708 Class 10 100 10001048708 HEPA filter AHU
2008-spring-2003
Air Filters
1048708 HEPA (High Efficiency Particulate Air) filters1048708 High efficiency low Δp good loading characteristics1048708 Glass fibers in a paper like medium1048708 97 retainment of incident particles of 03 μm or larger
2008-spring-2003
Class of clean rooms
2008-spring-2003
Class Temptolerance tolerance
Particles
2008-spring-2003
Class
Federal Standard 209 Number of particles per cubic foot
Toxicity
1048708 TLV (Threshold Limit Value)1048708 Upper limit material concentration that an average healthy person can be exposed without adverse effects ppm or mgm3
1048708 Notorious Poisons1048708 CO (100 ppm) CO2 (5000 ppm) HCN (110 ppm) H2S (10 ppm)1048708 SO2 (5 ppm) NH3 (50 ppm) 1048708 Arsenic trioxide AS2O3 (01g fatal)1048708 Hg (01 ppm via skin contact)1048708 All material are toxic in sufficient quantity 5g caffein is fatal
2008-spring-2003
MEMS Applications
2008-spring-2003
Display Technologies
MarketLeader
Ramp DIssues
ScreenSize
2008-spring-2003
HDTV for 60rdquo ~ 80rdquo Home Theater1048698 Digital Presentation for 100 rdquo ~ 300rdquo Projector1048698 Key Factor Brightness
Brightness of ProjectionDisplays
lux = lumen m2
96365-39 CORPORATE RESEARCH amp DEVELOPMENT
1st Optical MEMS devicePHOTONICS AND MICROMACHINING
DIGITAL MICROMIRROR DEVICE amp DLP TM
PROJECTOR
DMD Optical Switching Principle
DMD Mirror onoff plusmn 10o
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
DMD Cell Structure
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
TMA
2008-spring-2003
Light Modulation of TMAThinfilm Micromirror Array
2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Class of clean rooms
1048708 Class 1 means one speckle of 05 μ partical in one ft31048708 Class 10 100 10001048708 HEPA filter AHU
2008-spring-2003
Air Filters
1048708 HEPA (High Efficiency Particulate Air) filters1048708 High efficiency low Δp good loading characteristics1048708 Glass fibers in a paper like medium1048708 97 retainment of incident particles of 03 μm or larger
2008-spring-2003
Class of clean rooms
2008-spring-2003
Class Temptolerance tolerance
Particles
2008-spring-2003
Class
Federal Standard 209 Number of particles per cubic foot
Toxicity
1048708 TLV (Threshold Limit Value)1048708 Upper limit material concentration that an average healthy person can be exposed without adverse effects ppm or mgm3
1048708 Notorious Poisons1048708 CO (100 ppm) CO2 (5000 ppm) HCN (110 ppm) H2S (10 ppm)1048708 SO2 (5 ppm) NH3 (50 ppm) 1048708 Arsenic trioxide AS2O3 (01g fatal)1048708 Hg (01 ppm via skin contact)1048708 All material are toxic in sufficient quantity 5g caffein is fatal
2008-spring-2003
MEMS Applications
2008-spring-2003
Display Technologies
MarketLeader
Ramp DIssues
ScreenSize
2008-spring-2003
HDTV for 60rdquo ~ 80rdquo Home Theater1048698 Digital Presentation for 100 rdquo ~ 300rdquo Projector1048698 Key Factor Brightness
Brightness of ProjectionDisplays
lux = lumen m2
96365-39 CORPORATE RESEARCH amp DEVELOPMENT
1st Optical MEMS devicePHOTONICS AND MICROMACHINING
DIGITAL MICROMIRROR DEVICE amp DLP TM
PROJECTOR
DMD Optical Switching Principle
DMD Mirror onoff plusmn 10o
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
DMD Cell Structure
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
TMA
2008-spring-2003
Light Modulation of TMAThinfilm Micromirror Array
2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Air Filters
1048708 HEPA (High Efficiency Particulate Air) filters1048708 High efficiency low Δp good loading characteristics1048708 Glass fibers in a paper like medium1048708 97 retainment of incident particles of 03 μm or larger
2008-spring-2003
Class of clean rooms
2008-spring-2003
Class Temptolerance tolerance
Particles
2008-spring-2003
Class
Federal Standard 209 Number of particles per cubic foot
Toxicity
1048708 TLV (Threshold Limit Value)1048708 Upper limit material concentration that an average healthy person can be exposed without adverse effects ppm or mgm3
1048708 Notorious Poisons1048708 CO (100 ppm) CO2 (5000 ppm) HCN (110 ppm) H2S (10 ppm)1048708 SO2 (5 ppm) NH3 (50 ppm) 1048708 Arsenic trioxide AS2O3 (01g fatal)1048708 Hg (01 ppm via skin contact)1048708 All material are toxic in sufficient quantity 5g caffein is fatal
2008-spring-2003
MEMS Applications
2008-spring-2003
Display Technologies
MarketLeader
Ramp DIssues
ScreenSize
2008-spring-2003
HDTV for 60rdquo ~ 80rdquo Home Theater1048698 Digital Presentation for 100 rdquo ~ 300rdquo Projector1048698 Key Factor Brightness
Brightness of ProjectionDisplays
lux = lumen m2
96365-39 CORPORATE RESEARCH amp DEVELOPMENT
1st Optical MEMS devicePHOTONICS AND MICROMACHINING
DIGITAL MICROMIRROR DEVICE amp DLP TM
PROJECTOR
DMD Optical Switching Principle
DMD Mirror onoff plusmn 10o
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
DMD Cell Structure
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
TMA
2008-spring-2003
Light Modulation of TMAThinfilm Micromirror Array
2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Class of clean rooms
2008-spring-2003
Class Temptolerance tolerance
Particles
2008-spring-2003
Class
Federal Standard 209 Number of particles per cubic foot
Toxicity
1048708 TLV (Threshold Limit Value)1048708 Upper limit material concentration that an average healthy person can be exposed without adverse effects ppm or mgm3
1048708 Notorious Poisons1048708 CO (100 ppm) CO2 (5000 ppm) HCN (110 ppm) H2S (10 ppm)1048708 SO2 (5 ppm) NH3 (50 ppm) 1048708 Arsenic trioxide AS2O3 (01g fatal)1048708 Hg (01 ppm via skin contact)1048708 All material are toxic in sufficient quantity 5g caffein is fatal
2008-spring-2003
MEMS Applications
2008-spring-2003
Display Technologies
MarketLeader
Ramp DIssues
ScreenSize
2008-spring-2003
HDTV for 60rdquo ~ 80rdquo Home Theater1048698 Digital Presentation for 100 rdquo ~ 300rdquo Projector1048698 Key Factor Brightness
Brightness of ProjectionDisplays
lux = lumen m2
96365-39 CORPORATE RESEARCH amp DEVELOPMENT
1st Optical MEMS devicePHOTONICS AND MICROMACHINING
DIGITAL MICROMIRROR DEVICE amp DLP TM
PROJECTOR
DMD Optical Switching Principle
DMD Mirror onoff plusmn 10o
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
DMD Cell Structure
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
TMA
2008-spring-2003
Light Modulation of TMAThinfilm Micromirror Array
2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Particles
2008-spring-2003
Class
Federal Standard 209 Number of particles per cubic foot
Toxicity
1048708 TLV (Threshold Limit Value)1048708 Upper limit material concentration that an average healthy person can be exposed without adverse effects ppm or mgm3
1048708 Notorious Poisons1048708 CO (100 ppm) CO2 (5000 ppm) HCN (110 ppm) H2S (10 ppm)1048708 SO2 (5 ppm) NH3 (50 ppm) 1048708 Arsenic trioxide AS2O3 (01g fatal)1048708 Hg (01 ppm via skin contact)1048708 All material are toxic in sufficient quantity 5g caffein is fatal
2008-spring-2003
MEMS Applications
2008-spring-2003
Display Technologies
MarketLeader
Ramp DIssues
ScreenSize
2008-spring-2003
HDTV for 60rdquo ~ 80rdquo Home Theater1048698 Digital Presentation for 100 rdquo ~ 300rdquo Projector1048698 Key Factor Brightness
Brightness of ProjectionDisplays
lux = lumen m2
96365-39 CORPORATE RESEARCH amp DEVELOPMENT
1st Optical MEMS devicePHOTONICS AND MICROMACHINING
DIGITAL MICROMIRROR DEVICE amp DLP TM
PROJECTOR
DMD Optical Switching Principle
DMD Mirror onoff plusmn 10o
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
DMD Cell Structure
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
TMA
2008-spring-2003
Light Modulation of TMAThinfilm Micromirror Array
2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Toxicity
1048708 TLV (Threshold Limit Value)1048708 Upper limit material concentration that an average healthy person can be exposed without adverse effects ppm or mgm3
1048708 Notorious Poisons1048708 CO (100 ppm) CO2 (5000 ppm) HCN (110 ppm) H2S (10 ppm)1048708 SO2 (5 ppm) NH3 (50 ppm) 1048708 Arsenic trioxide AS2O3 (01g fatal)1048708 Hg (01 ppm via skin contact)1048708 All material are toxic in sufficient quantity 5g caffein is fatal
2008-spring-2003
MEMS Applications
2008-spring-2003
Display Technologies
MarketLeader
Ramp DIssues
ScreenSize
2008-spring-2003
HDTV for 60rdquo ~ 80rdquo Home Theater1048698 Digital Presentation for 100 rdquo ~ 300rdquo Projector1048698 Key Factor Brightness
Brightness of ProjectionDisplays
lux = lumen m2
96365-39 CORPORATE RESEARCH amp DEVELOPMENT
1st Optical MEMS devicePHOTONICS AND MICROMACHINING
DIGITAL MICROMIRROR DEVICE amp DLP TM
PROJECTOR
DMD Optical Switching Principle
DMD Mirror onoff plusmn 10o
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
DMD Cell Structure
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
TMA
2008-spring-2003
Light Modulation of TMAThinfilm Micromirror Array
2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
MEMS Applications
2008-spring-2003
Display Technologies
MarketLeader
Ramp DIssues
ScreenSize
2008-spring-2003
HDTV for 60rdquo ~ 80rdquo Home Theater1048698 Digital Presentation for 100 rdquo ~ 300rdquo Projector1048698 Key Factor Brightness
Brightness of ProjectionDisplays
lux = lumen m2
96365-39 CORPORATE RESEARCH amp DEVELOPMENT
1st Optical MEMS devicePHOTONICS AND MICROMACHINING
DIGITAL MICROMIRROR DEVICE amp DLP TM
PROJECTOR
DMD Optical Switching Principle
DMD Mirror onoff plusmn 10o
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
DMD Cell Structure
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
TMA
2008-spring-2003
Light Modulation of TMAThinfilm Micromirror Array
2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Display Technologies
MarketLeader
Ramp DIssues
ScreenSize
2008-spring-2003
HDTV for 60rdquo ~ 80rdquo Home Theater1048698 Digital Presentation for 100 rdquo ~ 300rdquo Projector1048698 Key Factor Brightness
Brightness of ProjectionDisplays
lux = lumen m2
96365-39 CORPORATE RESEARCH amp DEVELOPMENT
1st Optical MEMS devicePHOTONICS AND MICROMACHINING
DIGITAL MICROMIRROR DEVICE amp DLP TM
PROJECTOR
DMD Optical Switching Principle
DMD Mirror onoff plusmn 10o
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
DMD Cell Structure
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
TMA
2008-spring-2003
Light Modulation of TMAThinfilm Micromirror Array
2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Brightness of ProjectionDisplays
lux = lumen m2
96365-39 CORPORATE RESEARCH amp DEVELOPMENT
1st Optical MEMS devicePHOTONICS AND MICROMACHINING
DIGITAL MICROMIRROR DEVICE amp DLP TM
PROJECTOR
DMD Optical Switching Principle
DMD Mirror onoff plusmn 10o
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
DMD Cell Structure
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
TMA
2008-spring-2003
Light Modulation of TMAThinfilm Micromirror Array
2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
96365-39 CORPORATE RESEARCH amp DEVELOPMENT
1st Optical MEMS devicePHOTONICS AND MICROMACHINING
DIGITAL MICROMIRROR DEVICE amp DLP TM
PROJECTOR
DMD Optical Switching Principle
DMD Mirror onoff plusmn 10o
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
DMD Cell Structure
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
TMA
2008-spring-2003
Light Modulation of TMAThinfilm Micromirror Array
2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
DMD Optical Switching Principle
DMD Mirror onoff plusmn 10o
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
DMD Cell Structure
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
TMA
2008-spring-2003
Light Modulation of TMAThinfilm Micromirror Array
2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
DMD Cell Structure
Texas Instrumentsrsquos Technical Journal Vol 15 No 3 July-Sept 1998
2008-spring-2003
TMA
2008-spring-2003
Light Modulation of TMAThinfilm Micromirror Array
2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
TMA
2008-spring-2003
Light Modulation of TMAThinfilm Micromirror Array
2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Light Modulation of TMAThinfilm Micromirror Array
2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Pixel Architecture
Via contact to MOS
Common Electrode
Drain Pad Gate Line Source Line
Anchor
Post contactto actuator
Mirror
Top Electrode
PZT
Bottom Electrode
Supporting Layer
2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
TMA vs DMD
Actuation
TiltingAngle
Gray ScaleControl
Drawbacks
DMDTM
(TexasInstrument) Electrostatic
-10o 0o +10o
OnOffComplex
bull Fatiguebull Stickingbull High Cost
TMATM
(DaewooElectronics) Piezoelectric
0o ~ 3o(continuous)
LinearSimple
bull Uniformity
2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Micromirror Arrays
VGA640 X 480307200 pixels
XGA1024 X 768
786432 pixels
2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Mirror Flatness (VGA)
2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Coupled Natures of Thin FilmProcesses
1048708 Forward coupling
1048708 Step coverage confromality
1048708 Backward coupling
1048708 Temperature dependent microstructural degradation
1048708 Overunder etch etch stop control
1048708 Side attack Passivation breakage
2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Evolution of TMA Pixels
2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
MIT Bow-actuator Nick Conway MS 2003
2008-spring-2003
PiezoelectricAmplifiers
4-bar linkage design
End effector
Released
Fixed substrate
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Design of nanopipette (2)In-line array of nanopipettes
1048698 Massive Parallel Nanopipette Array by In- plane Scanning Probe Systems1048698 Integration with Microfluidic channels1048698 Integration of nanopipettes in AFM in an 100 x 100 array
Single nanopipette2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Photonic crystal modeling
Microcavity waveguide finite-difference time-domain 1 mesh
2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Photonic band gap microcavity waveguide processing
1048708 design matrix of various geometries defect lengths waveguide width da number of holes1048708 Nanofabrication1048708 SiNx mask1 w electron-beam1048708 Proximity pattern transfer to resist1048708 130 nm minimum features
1048708 Hard mask from Cr lift-off 2
1048708 Optimized Si RIE
1 J Ferrera NanoStructures Laboratory MIT 2 J Foresi Kimerling group MIT2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003
Design Domains
1048698 Design is a mapping process1048698 From ldquoWhatrdquo to ldquoHowrdquo1048698 Small scale systems design
What How
N P Suh Axiomatic Design Oxford2008-spring-2003