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1
Power Electronics System
A Joint Course taught byVirginia Polytechnic Institute and State University
University of Wisconsin – MadisonRensselaer Polytechnic Institute
University of Puerto Rico – MayaguezNorth Carolina A&T State University
2
Required course work —Attendance of all lectures and discussion sessions.
Active participation in discussion sessions, including preparation of at least one question prior to each discussion session.
2
3
Power Electronics System
by
Fred C. Lee
Virginia Tech
Introduction
4
Energy and Power Electronics
Computers4%
1800 1900 2000 210020 40 60 80 20 40 60 80 20 40 60 80
Electrical Energy
Total Energy
02
468
10
121416
1820
30% savings withimproved powerelectronics
Year
Total Energy
1997: 40%
* Output of 840power plants
* EPRI
2010: 80%
60% 20%
Lighting21%40%
ElectricalEnergy
Other25%
Motor55%
Electrical Energy
3
5
PowerElectronics
is an EnablingTechnology
Equipment Sales: $60B
Hardware Electronics$1,000B
Total Electronics Market $2,000B
The Worldwide Electronics Marketplace
Source: Microtech / IEEE
6
1985 1990 1995
50%
100%
Year
Mad
e in
US Power Supplies
Darnell Research
2000
Issues• Long design cycle• Non standard circuits and parts• High labor content• Poor reliability• High cost
State-of-the-Art of Power Electronics Technology
Losing Manufacture Base
4
7
IPEM
CPESMore
Integration
CPES Approach via IPEM
Research Goal: Improve the quality, reliability and cost effectiveness of power electronics systems
Research Goal: Improve the quality, reliability and cost effectiveness of power electronics systems
8
Product specifications
Expected outcome –a paradigm shift in industry
Automatic Assembly LineAutomatic Assembly Line
5
9
A Parallel between VLSI and IPEM
• Standardization
• Modularization
• Integration
• Manufacturability
• Volume Production
• Cost Reduction
1960 1970 1980 1990 2000 year
Market ($)1 T
Signal Processing
IC
1960 1970 1980 1990 2000 year
MarketPower Processing
IPEM 100X
1X
?
Moore’s Law
10
The IPEM Vision and Challenges
6
11
Microelectronics vs. Power Electronics
PowerProcessing
InformationProcessingInput Signals Output Signals
Control Signal
12
Paradigm Shift #1: Standardization
Most of Information Processing has been reduced to arithmetic and logic manipulation of binary numbers!
High Frequency Synthesis (“PWM”)
Control Signal
Digital Revolution
NumberCrunching
InputDevices Output
DevicesAnalog Input
A-to-DConv. D-to-A
Conv. Analog Output
A-to-D D-to-A
7
13
Paradigm Shift #2: Modularization
CMOSInverter
DRAMCellAll of “number crunching” is
implemented by 2 cells types• The cell design is optimized
through technology development• System design is reduced to
“combinatorics” and geometry
CMOS Technology BL
WL
SPMTVoltage
UnidirectionalSwitches +
–
+AC
Topology Convergence?
Energy-storageCell
Switch (PWM)Cells
14Possible Partitioning of Converters– a hypothesis –
C o n t r o l & S e n s o r S i g n a l s
T h e r m a l E n e r g y
Active IPEM(CMOS Inverter)
Passive IPEM(DRAM)
Filter IPEM
Low-frequency Storage(SRAM)
8
15Paradigm Shift #3: Integration of Information Processing
Volume Production
Product Quality, Reliability, and Cost Factors:
Manufacturing
Design&
DevelopmentMaterials
• Small number of different materials
• Rule-based
• Standard interfaces
• Hierarchical design
Cost Reduction
• Batch processing
• Small number of steps
16“Paradigm Shift #3:” NO Integration for Power Processing!
Low Volume Production
Product Quality, Reliability, and Cost Factors:
High Cost
Manufacturing
Design&
DevelopmentMaterials
• Small number of different materials
• Rule-based
• Standard interfaces
• Hierarchical design
• Batch processing
• Small number of steps
9
17
Pooling Core Expertise from 5 Universities and 80 Industries
CPES Approach -Industry/University Partnership
PowerElectronicsPackaging6 VT, RPI High-Freq.
PowerConversion
25 VT,UW-M
SystemIntegration
andDesign Tools
9 VT, RPI,UW-M
PowerElectronicControls3 UW-M,NC A&T
AdjustableSpeedDrives
19 UW-M,NC A&T,UPRM
ElectricMachines,
2 UW-M, RPI,UPRM
AdvancedMaterials4 RPI, VT
PowerIntegratedCircuits
6 RPI, VT
PowerSemicond.
Devices6 RPI, VT
IPEMS&
SystemIntegration
18
59 – USA
12 – Europe
7 – Asia
CPESIndustry Partners Worldwide
10
19
App
lied
Res
earc
h 20
%B
asic
Res
earc
h80
%
CPES Research Structure
IPEM-Based PowerConversion Systems
(IPEM-PCS)D. Boroyevich, VTE
ngin
eere
dS
yste
ms
Electro-Magneto-Thermo-Mechanical Integration Technology (EMTMIT)T. M. Jahns, UW-M
Ena
blin
gT
ech
no
log
y
Microprocessorand Converter
Integration
Standard-CellActive IPEMs
Standard-CellPassive IPEMs
Motor andConverterIntegration
IntegratableMaterials
(IM)G. Q. Lu, VT
Advanced Power Semiconductors
(APS)T. P. Chow, RPI
Control & SensorIntegration
(CSI)R. D. Lorenz, UW-M
High-DensityIntegration
(HDI)J. D. van Wyk, VT
Thermal-MechanicalIntegration
(TMI)E. P. Scott, VT
Fund
amen
tal
Kn
ow
led
ge
20
Fundamental Knowledge
11
21
YEAR 1 4 532 7 8 9 100 6
Silicon Carbide, GaAs PossibleDARPA / ONR / C-PES
Gen I IPEMs Gen II IPEMs Gen III IPEMs Gen IV IPEMs
Silicon ProcessTrench technology, low temperature
processing, new power devices
III-Nitride and DiamondWide-bandgap materials
Advanced Materials forPower Devices and IC
22
Why SiC?
Cap
acity
(VA
)
Operation Frequency (Hz)
12
23Advanced Power Semiconductor Devices (APSD)
(Year 1-5)Silicon Processing
N +
S o u r c e D r a i n S o u r c e
G a t e
N +
N +
N - e p i
P - b a s e
P - s u b s t r a t e
P - b a s e
P + P +
Lateral TrenchMOSFET
p+n+
p+n+
High-VoltageDevices
SiC Processing
CATHODE
N epitaxial Layer-
N Substrate+
P+
Schottky BarrierMetal
P+ P+ JTE JTEW S
High-Voltage Devices
source
drain
gate
EQUIVALENT CIRCUIT
p+n+
source
drain
gate
EQUIVALENT CIRCUIT
p+n+
DMOSFET with fast Diode
24Advanced Power Semiconductors (APS)
(Yr 6-10)
JBS diode
p+ n+p-
n-
n+ p+n-
p-
NMOS
PMOS
GND VG
.MOS-Gated Bi-DirectionalSwitch (GaN or SiC)
CATHODE
N Substrate+
P
Schottky BarrierMetal
W S
P PN N
PPN N
. Superjunction devices (Si & SiC)
N +
S o u r c e D r a i n S o u r c e
G a t e
N +
N +
N - e p i
P - b a s e
P - s u b s t r a t e
P - b a s e
P + P +
Novel Power IC Processes
DC
Substrate
DielectricSubstrate
Multi-level on-chip interconnects
Pro
cess
orw
afer
DC
-DC
Con
vert
erw
afer
Signal, I/O Ground
13
25High Density Integration:
Embedded Power Exploded View
Heat Spreader:
Base Substrate:DBCCeramic/copper
Chip Carrier:Ceramic
Interlayer:
Gate drives
Fabrication Process
Copper Trace
26Complete DC-DC Phase-Leg in Embedded Power: First Generation
Embedded Power
Packaging Module:MOSFET Chip:XXX24N50,
24A/500V;Gate Driver: Hybrid Circuitry
14
27
Cu
Al2O3Ni
NiBaTiO
3
Al2O3
Cu
+
_Integrated Power Electronic Module
IPEMLOAD_
+SOURC
E
RF-EMI
Filter
Integrated RF-EMI Filter (DM)
-15
-10
-5
0
1 10 100 1000 10000
Gai
n[D
B]
Frequency [kHz]
1 MHz: -3 dB10 MHz:-14 dB
LF: Conducting
f
|Z|
fo
RF
|ZB|
f
|Z|
fo
RF
|ZB|
HF: High Attenuation
28Embedded Power Packagingwith the Integration of an RF EMI Filters (DM)
Fitted to Embedded Power Structure:
Measurements show good attenuation at high frequencies
1 MHz10 kHz 100 MHz~22 MHz
0 dB
0 °
- 180 °
- 50 dB
Slope: 40 dB/decade
1 MHz10 kHz 100 MHz~22 MHz
0 dB
0 °
- 180 °
- 50 dB
Slope: 40 dB/decade
15
29
Heat Spreader
C-ChipS-ChipS-Chip
Component
I/O Pins
ComponentComponent
Base Substrate
R-CoilStruc. Ceramic
IntelligenceCurrent / Temperature
Sensing
fluxflux
Current
EMI Containment
P
NI
P
NI
Double sided Cooling
Increasing Functionality of IPEM
High-density Interconnect
30Integrated Electromagnetic Power Passive (IEPP) -- Principle
ab cdcDielectric
Metal
Metal
a
d
Magnitude
Phase
Magnitude
Phase
b
16
31Integration of Passive Components: Passive IPEM vs. Discrete Components
Discrete Components
Passive IPEM
Comparison
168
7
2.3
2
45
1.0
Discrete
82
1
2.5
1.8
45
1.0
Passive IPEM
C (uF)
Power (kVA)
Lm1,2 (uH)
Ls (uH)
Total Volume (cm3)
No. of Components
Parameter
+-
+
Gat
e d
rive
rs,
pro
tect
ion
an
dse
nsor
s
Active IPEM
Passive IPEM
E core
primaryhybrid winding
secondaryplanar winding
I coreprimary
& secondaryplanar windings
E core
32
400kHz PFC 200kHz AHB11.7W/in3
1.5X
Version IIntegrated converter
400kHz PFC 200kHz AHB7.5W/in3
1X
Integrated DPS Test-bed
•Integrated EMI filter
•Active IPEM•Passive IPEM
Discrete converter
400kHz PFC 400kHz LLC14.6W/in3
2X
Version IIIntegrated converter
17
33
Control & Sensor Integration (CSI)
IPEM Integratable Current Sensing (UWM)• Shunt Resistor
GateDrive
Gate
Drive
GateDrive
GateDrive
PHASE CURRENTRECONSTRUCTION
ELEMENT
PHASE CURRENT
RECONSTRUCTIONELEMENT
MICROCONTROLLER
A B
GateDrive
Gate
Drive
PHASE CURRENTRECONSTRUCTION
ELEMENT
C
34Magnetoresistive (MR) Current Sensorsin Cooperation with CSI Subthrust
MR BridgeField (Temperature) Detector
Power Module Test VehicleDetector A
Detector BMeasured Current Waveforms
Current Probe
MR Sensor
• MR current sensors offer opportunity to integrate galvanically-isolated current sensors directly into IPEM
18
35
Control and Sensor Integration (CSI)
Pilot Current Sensing
GMR Sensor Shunt with isolation
DielectricMain
conductor
Substrate
Embedded Rogowski CoilFor Current Sensing
Temperature Feed back
MotionController
θ ω*, * PWMInverter
P lossT measF s
w
v.i
&.
R a Motor
ThermalModel
3ϕ 2 ϕto
θ ω^, ^ θ ω^, ^
,T̂ j T̂ j
i abc
i abc^i q d
^
iqd** vqd*iqd*
swF-nor
mal
swF-in lim
itsRegion Based Thermal Controller
jT -normal
jT -high
jT -low
jT -high
jT -lowaxis 2 axis 3
axis
1I l imit
*
I limit
F sw*
v.
i&.*
Active Thermal feedback control
36
Synthesis and fabrication of nanomaterial with high permittivityand permeability into integrated passives (L and C)
MagneticCore
DielectricShell
I. Synthesis of dielectric coated Nano-magnetic particles.
II. Low-T powder processing à multi-functional substrate.
III. Metallization à integration of passives on the substrate.
Magnetic core à ferrite (MgZn, NiZn ferrite)Dielectric shell à barium titanate-based
Integratable Materials:Multifunctional Material for Integrated
Passives
19
37Integratable Materials (IM):
Novel Interconnect Technology for Si-Die
Solder Die-Attach
void
• Thermal conductivity: 2X
• Electrical conductivity: 6~20X
• Connection Strength: 2.5X
Nanoscale Process Die-Attach
uniform structure
Substrate
Silicon DieInterconnect
Higher reliability
38
Top of Heat Sink
Top of Heat Spreader
Top of Metallization 2
Top of Metallization 1
Beneath Gate Driver
44°C
42°C
Test Results with Infrared Image
Thermal-Mechanical Integration (TMI)
Modeling for multi-layer structure of a IPEM
45°C
35
43
37
39
4146°C
44°C
temperature of MOSFET 2
temperature of MOSFET 1
Simulation Results
20
39
Thermal-Mechanical Stress Simulation for Planar Layers in Embedded Power
593 MPa
0.692 MPa
Top copper
Bottom copper
solder
silicon
polyimide
Copper
Epoxy
Polyimide
Cross Section
ChipCeramic
Solder
40
Thermo-mechanical Analysisfor an Integrated Passive Module
Heatsink : 32~34.5 Celsius
Ferrite Core: 52~60 Celsius
§IR Camera Thermal Image from Experiment
Ceramic Substrate MetalizedWith Copper: 38.8~44.4 Celsius
§Finite-Element Thermal Modeling
§Thermal Result Using FEM
Ferrite Core: around 55.7~61.9 Celsius
Ceramic substrate metalizedwith copper: around 41.9~47.5 Celsius
Heatsink : around 36.9~38.1 Celsius
Stress
21
41
Enabling Technology
Electro-Magneto-Thermo-MechanicalIntegration Technology (EMTMIT)
- Standard-Cell IPEMs- Integration of IPEMs with Specific Loads
42
Vac
Co
• •
Passive IPEM
Vac
Co
• •
Discrete Components
Passive IPEM
EMI Filter IPEM
Exploded View of EMI Filter IPEM
Discrete EMI Filter
EMI Filter IPEM
Passive IPEMs:Integrated Passive Components
22
43Active IPEMIntegrated Active components:
Active Gate Drive
Active Gate Drive
AGD
AGD
AGD
AGD
Active IPEM
Flip-ChipOn Flex
44
Motor and Drives Integration
~
~
~fL
fC
sbV
saV
scV
aS bS cS
upS vpS wpS
wnSvnSunS
p
n
dci
Machine
Pole UnitControllers
ModularPhase DriveUnit
Induction MotorCage Rotor
Integrated MD-IPEM and Motor
23
45Integration of Power Supplies with
Microprocessor
SiliconDevices
GHz Linear Regulator
ProcessorCore Die
CeramicCapacitors
Inductors
MHzVRM
Controller
Motherboard
C o R L
Q2Q1 io1
Q4Q3 io2
Q6Q5 io3
io
VRM
46
Engineered Systems:IPEM based Power Conversion Systems
24
47
IPEM-PCS – Functions and Goals
IPEMSpecifications
System Requirements
TechnologyRequirements
IPEM-Based Power Conversion Systems (IPEMPCS)
IPEMs
Processes&
Algorithms
Components&
Materials
IntegratableMaterials
(IM)
Advanced Power Semiconductors
(APS)
Control & SensorIntegration
(CSI)
High-DensityIntegration
(HDI)
Thermal-MechanicalIntegration
(TMI)
Fundamental Knowledge
DPS
Motor Drive
Test Bed
Electro-Magneto-Thermo-MechanicalIntegration Technology (EMIMIT)
Enabling TechnologyProcessor
Motherboard
Test Bed Test Bed
Integrated Motor
extend
Space Power Station
Future Electrical Vehicle
extend
Future Home
IT
48
Engineered Systems: A Representative Testbed
Possible Testbed
AC/DC
DC/ACBattery
UPS
AC/DC DC/AC
Battery
Server
120 V1F AC
120 V1F AC
PFCRectifier
208 V3F AC
PFCRectifier
Battery
ASICs
MemIsolated POL
Converter
Fan
DigitalICs
LED
AnalogICs
– 48 V, DC
DC/DCConverter
120 V, 1F AC
Emergency Lighting
Telecom Power System Computer Power System
480 V, 3F AC
AC/DC
DC/ACBattery
24 V, 1F AC
Fire Alarm System
StandbyGenerator
120 V, 1F AC
Lighting
ElectronicBal last
ElectronicBal last
ElectronicBal last
ASD+
Motor
Com-pressor
ASD+
Motor
CentralFan
120 V, 1F AC
480 V, 3F AC
HVAC System Pumps and Fans
TransferSwitch
VSCFConverter
RenewableEnergy Source
SourceConverter
Utility
ASICs
Mem
DC/DCConverter
Isolated POLConverter
Fan
DigitalICs
LED
AnalogICs
AC/DCFront -End
Server
48 VDC
+ µPNon-IsolatedPOL ConverterµP +
Non-IsolatedPOL Converter
PowerDistributionConverter
IntegratedConverter
+ Load
EnergyStorage
Legend:
•••
Modeling, simulation, and scaled-down testingRule-based, IPEM-based, system integration, and concept demonstration
25
49
Some Success StoriesIn
The First Five Years
50
Intelligent Power Modules (IPM)
Toshiba Fuji Semikron
Powerex Eupec/Infineon
• Standard modules• Low labor content• Improved reliability• Reduced cost
26
51Commercialization of New Packaging Concept:
Wire-Bond
First time powerFirst time powerMOSFET devices MOSFET devices
are packaged are packaged without wire bondwithout wire bond
Non-Wire Bond
IR Direct FET
52Commercialization of New Packaging Concept
Non-Wire Bond
Fairchild BGA
RenesasLead Free
ST MicroelectronicsPower FLAT
27
53
Commercial Power Modules: Dr. MOS
Intersil
Philips
On Semi
IR
54
VRM
Decoupling cap in the cavity
VRM
Every Intel processor is powered with CPES proposed multiphase voltage regulation module.
A success story: CPES researchers leading the VRM development
Intel desktop board D850MV for Pentium 4
28
55
Development of Multi-Phase Buck VRM
National Analog
On Semiconductor
Semitec Linear
Intersil
Pentium III1.5V30A
1GHz
320nH
320nH
320nH
320nH
1.2mF
CB
Controller
Controller
Controller
Controller
56TI’s Monolithically Integrated Power IC
for DC/DC Converter
Stop1
PWM controller
Sbottom1
L
Driver
29
57
ONRNSWCThalesNorthrop Grumman,Rockwell Automation,
General DynamicscvABB
Bettis
DOEONRAlstomACIPEMCOTVA
TITISRCSRCVolterraVolterraPrimarionPrimarion
FujiFujiFairchild STMicro.eupeceupecPowerexPowerex
CelesticaHitachiIRToshibaToshibaSemikronSemikronIXYSIXYS
10 MW IPEM
20 cm
4.5 kV, 4 kA ETO
10 W IPEM
4 mm
1.2V, 8A Monolithic VRM
EconoEcono 33
1 kW IPEM
5cm
400 V, 2.5 A ZVS phase-leg
Universal Controller
30 kW IPEM
10 cm
800 V, 40 A ZCT phase-leg
100 kW IPEM
20 cm
1.8 kV, 60 A, 3-level ZCT phase-leg
Support of IPEM Concept
58Emerging Technologies and Applications
Automation
Space Power Station
IT
Telecon
ElectricVehicle
Future Home
Solar
Wind