PMMA Resist - Developers & Removers
IntroductionPMMA (polymethyl methacrylate) is a widely used,
versatile, positive tone electron beam resist. It is used in many
micro and nano-electronic applications. EM Resist can supply PMMA
in Anisole with a range of dilutions and molecular weights.
DevelopersA range of developers can be used with PMMA, these are
typically a varying mixture of MIBK and IPA depending on what
resolution and throughput is requried. We can also supply a
developer based on IPA:water. It has been found to improve
sensitivity, contrast and exposure latitude when compared to
MIBK:IPA mixtures [1].
RemoversPMMA resist that has been soft-baked can be removed
using standard laboratory solvents that we can provide (acetone).
For hard baked resist, a stronger solution of KOH yields excellent
results.
SupplyAll our developers and removers can be supplied in
multiples of 1 litre. If there is a specific developer or remover
that you require, please inquire.
1. Shazia Yasin, et al., ‘Comparison of MIBK/IPA and water/IPA
as PMMA developers for electron beam lithography’, Microelectron,
Eng, July 2002.
For more information or to enquire about products, please call
or email us.
+44 (0)1625 704465 [email protected] www.emresist.com EM Resist,
Alderley Park, Alderley Edge, Cheshire, SK10 4TG
Product Resolution Sensitivity/Throughput
PMMA-Dev1 Medium High
PMMA-Dev2 High Medium
PMMA-Dev3 Very High Low
MIBK (Pure) Low High
IPA:Water Very High Very High
