Plans for the Characterization Program at Argonne Igor Veryovkin, Alexander Zinovev and Slade Jokela

Plans for the Characterization Program at ArgonneIgor Veryovkin, Alexander Zinovev and Slade Jokela

The XPS/UPS surface analysis apparatus in MSD

Large Area Picosecond Photodetector Development Collaboration Meeting (Thursday, June 10, 2010 )

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Pros: Self-made, easy to customize and modify, operational and available for most of the time

Cons: Self-made, no fancy software, no state-of-the-art components such as scanning monochromatic microfocused X-ray probe…

Planned Upgrades: redesign of the sample holder carousel to enable photocathode characterization and in-situ radiative heating of samples


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Power SupplyPower Supply

target

collector

+

-

Light

MonochromatorLight source

Telescope

Planned Upgrades: redesign of the sample holder carousel to enable photocathode characterization and in-situ radiative heating of samples


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Planned Upgrades: Adding SIMS/SNMS/RGA analysis toolSIMS – Secondary Ion Mass SpectrometrySNMS – Secondary Neutral Mass SpectrometrySIMS/SNMS will enable • routine measurements of dopant profiles in photocathode materials• sensitive surface analysis of all detector materials.RGA – Residual Gas AnalyserRGA will enable studies of electron stimulated and temperature programmed desorption (ESD and TPD) from all detector materials.We propose to purchase this Hiden Analytical quadrupole mass analyzer with built-in electron impact ionization, which enables SNMS and RGA regimes, besides SIMS. Cost - $118K

Planned Upgrades: Adding SIMS/SNMS/RGA analysis tool


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This larger load lock chamber will serve for SIMS-SNMS characterization of all detector materials, and also for scrubbing studies for MCPs

Ion gun will go here

Electron gun will go here

New smaller load lock chamber (Kimball Physics spherical cross) will go here and will be compatible with sample transport container

Quadrupole mass analyzer will go here

XYZΘ sample manipulator will go here

Sealed sample transfer container


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New application for our sealed sample transfer container: in-situ CO2 snow jet cleaning of samples


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20 22.4 24.8 27.2 29.6 32 34.4 36.8 39.2 41.6 44 46.4 48.8 51.2 53.6 56 58.4 60.8 63.2 65.6 68 70.4 72.8 75.2 77.6 801

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100

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RIMS+suppr.SIMS suppr.SIMSRIMS

Sums of All SNMS and suppr.SIMS TOF Mass Spectra during depth profiling

mass (a.m.u.)

sig

nal

(co

un

ts/s

ho

t)

Here is WHY it is needed!



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Planned Upgrades: Adding a unified loadlock chamber for under-UHV transfer of fabricated / activated photocathodes for analyses

SARISA LPI-SNMS apparatus in MSD


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Pros: Super-sensitive despite self-made, easy to customize and modify, fancy state-of-the-art probes, high lateral and depth resolutionsCons: limited availability to this project (perhaps night shifts will work..)

SARISA LPI-SNMS apparatus in MSD


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Many fancy probes are looking at the sample in SARISA: ion, electron, photon and others

SARISA SEM probe can be upgraded with EDX detector option


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This will enable Scanning Electron Microscopy (10-15 nm resolution) with Energy Dispersive X-Ray Analysis – in SARISA instrument, with standartized UHV transfer of photocathode materialsCost – $60K

SARISA SEM probe can be upgraded with EDX detector option

What else can be done in SARISA


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Analysis SpotAnalysis Spot

Light Light (microscopy and (microscopy and interferometry, interferometry,

laser desorption)laser desorption)

Low Energy Ion Low Energy Ion Beam (Ion Milling)Beam (Ion Milling)

Probing Ion Beam

Probing Ion Beam

Probing

Probing

Electron Beam

Electron Beam

42 mm spherical mirror42 mm spherical mirror

200 mm spherical 200 mm spherical mirrormirror

Optical object Optical object (target)(target)

In-vacuum cathodoluminescence (CL) microscope based on Schwarzschild optics – is feasible

Some thoughts about future thin-films characterization facility at Argonne…


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This 6 in. flange has small opening and will be is the optimal place for attaching a long sample transfer arm, which will be able to pick up the samples loaded from the growth chamber in the middle and transfer them between four groups of flanges with characterization probes attached (characterization clusters).

This 6 in. flange in the middle is located very well (between the characterization clusters) to be connected with the growth chamber through a loadlock system. The presumed orientation of the sample in the growth chamber is facing down. It can be turned facing up for characterization be the transfer arm.

Connecting these two chambers through a loadlock will allow us to transfer the synthesized and characterized samples for assembly

CHARACTERIZATION CHAMBER DEVICE ASSEMBLY CHAMBER

This chamber can be laid on its side, such that the large 16 ½ in. flange will be on the top for easier assembly (including sealing) from the top



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• Includes three vacuum chambers for: (1) growth/activation of photocathode materials, (2) characterization of these materials, (3) assembly of imaging detectors• Growth chamber can be, in fact, a cluster of chambers connected through a loadlock with the rest of the facility• Characterization chamber has four groups of flanges where various equipment can be installed. Sample can be moved between these characterization clusters. We presently have in the group the following equipment to populate these clusters:

–SIMS (Secondary Ion Mass Spectrometry) components – ion guns and quadrupole mass analyzers–Hemispherical energy analyzer for performing energy analysis of photo- and Auger- electrons–X-ray source for enabling XPS (X-ray photoelectron spectrometry)–Electron source for enabling Auger electron spectrometry and low resolution (100 nm) Scanning Electron Microscopy (SEM) –In-vacuum X-ray fluorescence detector to enable EDX (energy dispersive X-ray fluorescence spectrormetry) in conjunction with SEM–LEED system (low energy electron diffraction), which can also be used for measurements of emissive properties (secondary electrons for MCP materials and photoelectrons for photocathodes)

• More equipment can be added according to the list (to be written by Argonne thin films growers). This list should be carefully composed. There is sufficient number of flanges available on the characterization chamber.• To build the facility, based on the components available (listed above), two highly skillful scientist are needed (not postdoc level but experienced), for approximately six month. We have two candidates, Dr. Jerry Moore (our former colleague, Massthink company in Naperville) and Prof. Sergey Chenakin (Institute of Metal Physics, Kiev, Ukraine), who very likely will be interested to do this. Cost, at least, one year of visiting scholar / STA effort ($200K), PLUS ≈ $2M for state-of-the-art equipment



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This is Orlando Auciello’s lab in Bldg.200 (room D156).It has sufficient floor space to build the facility there.

This is Orlando’s plasma deposition system

This is former Orlando’s physical vapour / magnetron sputtering deposition system,

which is being revived by Alex Martinson. It can be moved around the lab.

Documents

Plans for the Characterization Program at Argonne Igor Veryovkin, Alexander Zinovev and Slade Jokela