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2nd Workshop on Photonic Integrated CircuitsPhotonic Integrated Circuits
OFC 25 M 2015OFC, 25‐Mar‐2015
Agenda for the PIC workshop 6:00 PM – 6:10 PM: Welcome and Introduction 6:10 PM – 7:00 PM: Presentation on “Taking Advantage of Merchant Suppliers
to Create Your PIC Products Faster and Cheaper” by Twan Korthorstto C eate ou C oducts aste a d C eape by a o t o st 7:00 PM – 7:10 PM: Question & Answer Session
7:10 PM – 8:00 PM: Networking Break with Buffet and Sponsor Tabletops Enjoy the food and drinks and please roam around and talk to the individual sponsors
8:00 PM – 8:10 PM: Update by the OIDA on the Integrated Photonics Initiative Prepared by Tom Hausken from the OIDA
8:10 PM – 8:55 PM: Use Case Presentations by Pi K t f T h bi Pim Kat from Technobis
Chris Roeloffzen from Satrax Henk Bulthuis from Kaiam Chris Doerr from Acacia All presentations available on
7 i 8:55 PM – 9:00 PM: Closing
25‐mar‐15 p1OFC 2015 – 2nd PIC Workshop
www.7pennies.com
Why this workshop?
Aim is to bring together all the PIC service providers Yes, integrated optics is gaining momentum Yes, integrated optics is gaining momentum So where do you go, if you need to develop a PIC? If you are fabless, then you need at least an (MPW) foundry Also, design S/W, packaging, and/or a turn‐key design house Workshop brings all of these together We do so independent of material system
Adopt a unique format Introductory presentation detailing the PIC ecosystem Include an extended break for networking with providers
h h Have use case presentations who share experiences
25‐mar‐15 p2OFC 2015 – 2nd PIC Workshop
Sponsoring PIC service providers Foundries
InP
Silicon Photonics
TriPleX TriPleX
Design software
Packaging
Turn key design houses
Organizers Organizers
25‐mar‐15 p3OFC 2015 – 2nd PIC Workshop
Taking Advantage g gof Merchant Suppliers to Create
Your PIC Products Faster and CheaperYour PIC Products Faster and Cheaper
Presented by Twan Korthorst (CEO PhoeniX Software)Presented by Twan Korthorst (CEO PhoeniX Software)on Behalf of All Sponsoring Companies
Agenda for this presentation Why are PICs gaining momentum?
100G coherent and 100G datacom are leading the way But other areas are picking up (sensing, lifesciences, military…)
Introduction to foundry servicesy This includes generic processes and the pros & cons of MPW
Design softwareg Electronic and Photonic Design Automation (EDA & PDA) Specific attention to PDK (process design kit)
Overview of packaging services
Benefits of using a turn‐key PIC design house Benefits of using a turn key PIC design house
25‐mar‐15 p5OFC 2015 – 2nd PIC Workshop
What is a photonic IC?(de)multiplexers × 11
PIN × 100 Single Photonic Integrated Circuit
and routing
6 mm × 8 mmFBG sensor unit
A PIC combines several components within a single chip
Benefits are smaller size, lower cost, better manufacturability
25‐mar‐15 p6OFC 2015 – 2nd PIC Workshop
Some of the cons can be a trade off in performance and/or yield
So why are PICs gaining momentum? In the past, most of fiberoptics consisted of a LD, a fiber, and a PD
So there simply was little that could be integrated
WDM did not help because transmit lasers were all on different linecardsWDM did not help because transmit lasers were all on different linecards
But 100G telecom/datacom have completely changed the situation Now there is plenty optics in a small formfactor & size constraints require integration
Source: Jon Anderson (Opnext) , Nov.1, 2011 Lightwave
25‐mar‐15 p7OFC 2015 – 2nd PIC Workshop
PICs now also picking up in sensing, lifesciences, military, etc
So if you need a PIC, where do you go? You need an application specific PIC
Fiber to the Home Medical Datacom Sensor Wireless Bio‐imaging Switching Readouts
You need to decide on material and foundry You need to decide on material and foundry Options are InP, Silicon Photonics, or TriPleX (leaving PLC & LN)
l d d d Also need to decide on MPW vs. a custom run MPW reduces costs, but custom runs may be needed in the
d (f l f i f )end anyway (for volume or for unique performance)
25‐mar‐15 p8OFC 2015 – 2nd PIC Workshop
Deciding between material systems…Passives possible in InP, Silicon, and TriPlex
Switches & modulators possible in InP & Silicon
Active materials (lasers…) only possible in InP
MMI‐couplersMMI reflectorsPhase modulator
SOA
Phase modulator
A li d d l
Fabry‐Perot lasers
Tunable DBR lasers
AWG‐demuxAmplitude modulator
Ring filters
Thermo optic
WDM crossconnectWDM add‐drop
Multiwavelength lasers
OFC 2015 – 2nd PIC Workshop 25‐mar‐15 p9
Thermo optic phase modulatorPicosecond pulse laser
Comparison of MPW processes
Broker Process
Lasers
SOAs
TDBR
Modulators / Phase shifters Detectors Proploss
m)
Pp dB)
Hz) W)
Hz) nA)
mL S T
L (m
m
Vp‐P
Loss (d
B (GH
R(A/
W
B (GH
I dark(n
dB/c
JePPIX Oclaro TxRx 10G YES YES YES 1 3.5 < 2 > 10 0.8 10 2‐3JePPIX HHI Rx 40G 0 5 (25 mW) < 2 (kHz) 0 8 40 < 10 1‐2JePPIX HHI Rx 40G 0.5 (25 mW) < 2 (kHz) 0.8 40 < 10 1‐2JePPIX SMART TxRx 10G YES YES 2 7 < 2 10 0.8 10 < 20 3‐4JePPIX TriPleX (DS‐500‐170) 1‐2 (500 mW) < 0.1 (kHz) < 0.5ePIXfab VTT 3 µm SOI 1 < 0.1 (kHz) 0.1‐0.15PIXf b i ISIPP25G 1 5 8 5 5 11 0 5 50 50 1 5 2 5ePIXfab imec ISIPP25G 1.5 8.5 5 11 0.5 > 50 < 50 1.5‐2.5ePIXfab CEA‐LETI Full Platform 1‐4.7 10 10
TriPleX and VTT 3 µm SOI have the lowest losses. TriPleX is also suitable for i ibl li htvisible light apps
For active components with gain, only InP can be used
When looking at other components, such as modulators and detectors, InP and
OFC 2015 – 2nd PIC Workshop 25‐mar‐15 p10
When looking at other components, such as modulators and detectors, InP and Silicon Photonics can achieve fairly comparable performance
One can also combine two materials
carrier substrateTriPleX chip
TEC
For exampleLow‐loss waveguides & spot‐size
Vi ibl & NIRfiber feed through
InP Chip
convertersVisible & NIR ranges
InP ChipActive devicesLasers, SOAs, fast modulators + PDs
fiber array
wire bondselectricalconnections
Combine the best of both worlds
25‐mar‐15 p11OFC 2015 – 2nd PIC Workshop
Deciding on MPW or custom runs… Multi Project Wafer (MPW) shares cost between users
Photonics MOSIS started MPW now by JePPIX, ePIXfab, and
MOSIS started MPW in Electronics ICs in 1981
Lower cost is ideal for prototyping
b k id l
LioniXin 1981
MPW broker provides complete ecosystem
MPW uses a generic platform
C b b fi i l i l Custom runs may be beneficial in volume Can run more frequently
Can optimize process for better yield or unique performance
25‐mar‐15 p12OFC 2015 – 2nd PIC Workshop
MPW relies on generic foundry model MPW users all leverage the same process
This leads to the concept of a generic process Comes with a library of well documented building blocks
“Lego” building blocks allow for virtually all chips >350 PICs developed in generic fabs via MPW runs
There are 3 main MPW brokers: JePPIX for InP: Smart Photonics , Oclaro, and HHI, , ePIXfab for Silicon Photonics: IMEC, LETI, VTT, and IHP LioniX for TriPleX material (Si3N4/SiO2)
25‐mar‐15 p13OFC 2015 – 2nd PIC Workshop
3 4 2
Each MPW broker brings its own solution ecosystem
InP PICs: JePPIX MPW ecosystemDesign Fabrication Packaging
UsersApplications
BROKER
FoundriesPackaging
Photonic IC DesignDesign Tools
25‐mar‐15 p14OFC 2015 – 2nd PIC Workshop
MPW or custom runs in InP: JePPIX
l d Pure Play III‐V Foundry
Independent
10G Tx/Rx Platform 10G Tx/Rx Platform
SOAs, PIN detectors
Metal interconnects
SOAs
Metal interconnects
Electro‐optic phase shifters
Various passives, AWGs, MMIs
EOPMs
p , ,
C‐band wavelength range
L‐band on requestTunable laser: gas sensing
OFC 2015 – 2nd PIC Workshop 25‐mar‐15 p15
g g
MPW or custom runs in InP: JePPIX
PDs
40G Receiver Platform (3”, C‐band)
S i i l ti b t t
AWGs
Semi‐insulating substrates
40G pin‐PDs and balanced PDs
Thermo optic phase shifters Thermo‐optic phase shifters
Low‐loss passives, AWGs, MMIs
SSCs up to 10 μmSSCs up to 10 μm Tx/Rx platform (SOA, DFB, DBR,
EAM) under test
OFC 2015 – 2nd PIC Workshop 25‐mar‐15 p16
100‐channel spectrometer : sensing
MPW or custom runs in InP: JePPIX
12.5G Tx/Rx Platform
SOA t bl DBREOPMs
SOAs
SOAs, tunable DBRs
PIN detectors
Electro‐optic phase shifters
EOPMs
Electro‐optic phase shifters
Various passives, AWGs, MMIs
SSCs up to 3.5 μmp μ
C‐band wavelength range
OFC 2015 – 2nd PIC Workshop 25‐mar‐15 p17
Pulse compressor: bioimaging
ePIXfab Silicon Photonics MPW EcosystemCETC38, China
S d D i
USERS, TECH SUPPORT CENTERSDESIGN HOUSES
ACCESS PARTNERS
Mask
Send Design
UsersMask
Integration
WaferDistribution
Fabrication
Optional PackagingFABRICATIONPOST FAB
p g gFABRICATIONPOST FAB
SERVICE
OFC 2015 – 2nd PIC Workshop 25‐mar‐15 p18
Silicon Photonics @ LetiPassivesSi waveguidesLarge rib waveguides ~ 0.5 dB/cmSingle mode rib waveguides ~ 2 dB/cmg g /
Surface grating couplers 1D & 2D~ 2.5 to 3dB & 3.5 to 4 dB (resp. 1D & 2D) @ 1310 nm~ 3.5 & 5 dB (resp. 1D & 2D) @ 1550 nm
WDMMux & Dmux (4 channels)Actives
Si modulators PN junction‐waveguide in Ring Resonating or MZ structures:
e.g. 2.6V.cm & ‐1.6dB/mm @‐1V3 3V @ 4V & >25GH BW f 2
WDMMux & Dmux (4 channels)IL ~ 3.5dB & X‐Talk < ‐20dB
3.3V.cm@‐4V & >25GHz‐BW for 2mm
Ge on Si‐ photodetectors Surface‐illuminated or Waveguide‐coupled
Responsivity ~ 0.8 A/W, Dark current < 100nA @ 20°C & < 1µA @100°CBW up to 40GHzBW up to 40GHz
Heterogeneous III‐V on Si lasers (*) Tune‐able DBR, DFB, racetracks lasers
DFB @ 1310nm: P Si‐wg > 20mW@20°C, SMSR > 50dBDBR @ 1550nm: P Si‐wg > 20mW@20°C, SMSR > 30dB
OFC 2015 – 2nd PIC Workshop 25‐mar‐15 p19
@ g @ ,
*Not available yet on MPW
Silicon Photonics @ IMEC
Based on imec 130nm CMOS technology (200mm wafers)
GS
GS
G
25Gb/s, Vpp = 3.5V, Vbias=‐1.75V,
ER = 3.7dB( i l d d d i )
Electro‐Optical Bandwidth >50GHz @‐2.0VDark current <10@‐1 0V RT
OFC 2015 – 2nd PIC Workshop 25‐mar‐15 p2020
(single ended drive) Dark current <10@‐1.0V, RTResponsivity 0.7‐0.9A/W @‐1.0V
VTT’s 3 µm SOI platform Extremely high mode confinement into the Si core
→ Very dense integration (bend radius down to 1 µm)Low propagation loss (0 1 dB/cm)
2x2MMI
220 µmSpiral MZI
→ Low propagation loss (0.1 dB/cm)→ Small polarization and wavelength dependency
SM and low loss operation from 1.2 to 4 µm wavelength End fire coupling to lasers fibers etc with low loss
MMI
End‐fire coupling to lasers, fibers etc. with low loss Interposers and spot‐size converters Hybrid integration with excellent heat sinking
Modulators and PDs to be introduced soon5x10 mm
Modulators and PDs to be introduced soon... MPW runs and dedicated R&D runs in own fab Scalability to low‐cost mass production at VTT
1. Metal mirror2. Rib waveguide3. TIR mirror4 Rib‐strip4. Rib strip
converter5. Vertical taper
OFC 2015 – 2nd PIC Workshop 25‐mar‐15 p21
MPW or custom runs in TriPleX Photonic ASIC prototypes in TriPleX MPW fab (typically a
run every 4 months)
Low‐loss dielectric waveguides :– silicon nitride– silicon oxide
High Quality Passives (AWG, MZ, ring, ..) Low‐loss waveguides ≤ 0.5 dB/cmLow loss waveguides ≤ 0.5 dB/cm Bend radii 125 µm allow real VLSI Spotsize converters for low coupling loss Thermo Optic Phase modulators
Visible light to IR transparency (405 to 2350 nm) Packaging services for prototypes available via XiO Photonics
25‐mar‐15 p22OFC 2015 – 2nd PIC Workshop
Comparison of costs for MPW PICsBroker Process MPW die
size mm2Price EUR
MPWcost/mm2
Chips per wafer
Material
JePPIX SMART TxRx 10 2 x 4.6 4500 500 8 InP
JePPIX HHI Rx 40 3 x 6 5500 300 8 InP
JePPIX Oclaro TxRx 10 2 x 6 12000 1000 8 InP
JePPIX TriPleX 16 x 16 16000* 63 4 Si N /SiOJePPIX TriPleX 16 x 16 16000 63 4 Si3N4/SiO2
ePIXfab VTT 3 µm SOI 5 x 10 8000 160 8 Si
ePIXfab Imec ISIPP25G 2.5 x 2.5 10000 1600 10 Si
ePIXfab CEAL‐LETI Full 3.4 x 3.7 21750 1700 50 Si
InP MPWs: 2”‐ 3” wafers, 50 – 200 chips per waferSili Ph t i MPW 6” 8” f 300 5000 hi f
* 8500 for academia
Silicon Photonics MPWs: 6”‐8” wafers, 300 – 5000 chips per wafer Perception is that Silicon Photonics is more cost effective at high volume (e.g. datacom)
Table shows that InP is cost effective relative to Silicon Photonics
OFC 2015 – 2nd PIC Workshop 25‐mar‐15 p23
Question is what the high volume is at which cost metrics changes
Design Software and PDKs
PIC Design Software Fortunately, these days really good S/W is available
It goes w/o saying that EDA tools has been made for Electronic ICs Likewise Photonic Design S/W has been created for PICs
But there are in between situations: What if your chip has optical as well as electrical components? What if you plan to do the photonic simulations in PDA, but then use
EDA for the mask layout?EDA for the mask layout? Also, there are ongoing efforts between EDA and PDA providers to
make their S/W interoperable and support the industry to scale from R&D to (volume) manufacturing
Even though some functions (such as layout) can be done using both PDA as well as EDA, some care is needed…
25‐mar‐15 p25OFC 2015 – 2nd PIC Workshop
EDA and PDA: Photonics ≠ CMOS Integrated Photonics has “RF‐like” or “analog” behavior, which requires: Accurate and flexible definition of all angle shapes Control of phase (differences)
d d h l Dedicated photonics simulation routines Libraries with parametric photonics building blocks
Special features for verification (DRC LVS) Special features for verification (DRC, LVS)
25‐mar‐15 p26OFC 2015 – 2nd PIC Workshop
Why are PDKs so important? When working with a foundry (or your own fab), you do not
want to reinvent the wheel nor make unnecessary mistakesy So all relevant knowledge should be available when designing a PIC And the PDK should be automated (rather than in the form of docs) Without a PDK there are simply too many unneeded iterations Without a PDK, there are simply too many unneeded iterations
What does a PDK include?Design rules and mask layer information Design rules and mask layer information
Library of validated building blocks Simulation models and settings Die and package templates
Photonics PDK standardization by PDAFlow foundation Open standard for all players
25‐mar‐15OFC 2015 – 2nd PIC Workshop p27
A wide variety of PDKs are available Foundries:
Silicon: IMEC, CEA‐Leti, VTT, IHP and IME
InP: FhG/HHI, Oclaro and SMART Photonics
TriPleX (the silicon nitride platform): LioniX
Packaging: Technobis ipps, Chiral Photonics, Gooch and Housego, Linkra, XiO Photonics and Tyndall
Vendors of design S/W have PDKs available to a varying degree
PDKs are typically made available through MPW brokersyp y g
25‐mar‐15 p28OFC 2015 – 2nd PIC Workshop
PDKs support design at circuit level Photonic and electrical connections automatically detected
PDK supplied schematic checks for photonic connections PDK supplied schematic checks for photonic connections
Schematic connectivity drives layout directly
25‐mar‐15OFC 2015 – 2nd PIC Workshop p29
PDKs support circuit simulations Bidirectional, multimode and multichannel optical circuits
Frequency domain: scattering data analysisFrequency domain: scattering data analysis
Time domain: transient analysis
25‐mar‐15 p30OFC 2015 – 2nd PIC Workshop
PDKs support mask layout generation Design S/W can translate design intent into layout
Design S/W can automatically correct for process deviation Design S/W can automatically correct for process deviation
Use technology information to obtain design intent after fabrication
“ Photonics Synthesis” translates design intent into
DRC clean layout information
Simulating lithographyinfluence on design intent
25‐mar‐15 p31OFC 2015 – 2nd PIC Workshop
PDKs can allow for simple portability
25‐mar‐15 p32OFC 2015 – 2nd PIC Workshop
PDKs support design verification Functional verification, Design Rule Checking
(DRC) and Layout vs Schematic (LVS)
Built‐in photonics relevant design checks(like minimum bend radius)
Design rules targeting CMOS processes will Design rules targeting CMOS processes will flag thousands of false errors in photonic structures, Photonic specific DRC rules can i i i f lminimize false errors
Integrated design flows enable LVS
25‐mar‐15 p33OFC 2015 – 2nd PIC Workshop
PDK development @ IMEC
Device Models
Electrical
EM simulation
Electro‐Optical simulationExtractions:
Schematic / Parasitic
Schematic Driven Layout
Electrical simulation
Process variation simulation
Schematic / Parasitic
LayoutLVS LFD
GDSGDSDRCOptical
proximity correction
Available todayUnder Development
In collaboration with: Courtesy: Imec PDK roadmap
OFC 2015 – 2nd PIC Workshop 25‐mar‐15 p34
Copyrights reserved
Luceda Design S/W
25‐mar‐15 p35OFC 2015 – 2nd PIC Workshop
Why Mentor Graphics Pyxis
No OA database angle restrictionsSt i t ti t C lib Strong integration to Calibre
Flexible framework enables new design methodologiesExcellent custom design assembly Excellent custom design assembly capabilities
C lib Calibre Market and industry standard Equation DRC handles complex curves LVS of arbitrary devices and shapes Calibre LFD enables “short loop”
component analysis
25‐mar‐15OFC 2015 – 2nd PIC Workshop p36
Why PhoeniX Software PhoeniX Software
Has a history going back to 1991 in integrated photonicsy g g g p Focus on software solutions for manufacturability
OptoDesigner Is the dominant tool for photonics layout generation Provides simulations and layout in one user friendly environment to
enable real ‘photonics synthesis’p y Includes photonics verification Interfaces with world‐class 3rd party circuit simulators
Gives access to 8 photonic foundry PDKs Gives access to 8 photonic foundry PDKs
25‐mar‐15OFC 2015 – 2nd PIC Workshop p37
Why Lumerical Lumerical
Photonic design tool provider with 1,110 patent, publication & p ppresentation citations in 2014
INTERCONNECT PIC design environment for
l d l h lmultimode, multichannel bidirectional circuits and systems
Supports time and frequency‐domain circuit analysis 16QAM Transmitter
Extensive library of compact model circuit elements
Component modeling tools FDTD MODE d DEVICEFDTD, MODE and DEVICE Parameter extraction from
photonic component models support compact model generation
25‐mar‐15OFC 2015 – 2nd PIC Workshop p38
PDKs support integration of design flows
25‐mar‐15OFC 2015 – 2nd PIC Workshop p39
Photonics “Unified Design Flow”
25‐mar‐15OFC 2015 – 2nd PIC Workshop p40
Packaging
Packaging and Hybrid integration Packaging needs vary
For some R&D needs, PICs can be tested at the die level And for volume applications, the investment to start in
h k bl ( l k b ld f b)house packaging is manageable (unlike building a fab) But for many users, a good packaging facility is essential
Both optical and electrical (RF) connectionsp ( )
PDKs can also include packaging design rules
MPW foundries offer prototype packagingp yp p g g JePPIX => Linkra, G&H and Technobis ePIXfab => Tyndall LioniX => XiO Photonics Xio
In addition, several dedicated packaging services are available such as Chiral and Technobis
G ll it i iti l t thi k b t k i l Generally, it is critical to think about packaging early
25‐mar‐15 p42OFC 2015 – 2nd PIC Workshop
Packaging and Hybrid integration Heterogeneous integration is not simple
But chips for hybrid integration are easily accessible via MPWs
New applications will emerge based on hybrid combinations of platforms. Use the best of all worlds.
E.g. Create active functionality in low loss TriPleX platform => New FP7 initiative PHASTFlex (http://www.phastflex.eu)
25‐mar‐15 p43OFC 2015 – 2nd PIC Workshop
Chiral Photonics’ couplers and packaging/ h l h l bl k dminimize I/O chip real estate within scalable, packaging production processes
Single‐ and multi‐channel, high density, fiber array, optical couplers for die edge or surface probing and packagingp g p g p g g Up to 6 channels with spot size conversion to 2µm MFD for edge
coupling Up to 61 channels in single I/O port for surface coupling to VGCs,
VCSELs, PDs Accommodate different design/form factor needs, including:
– Integrated pigtails: SM (edge and surface coupling) or PM (edge coupling)– Pluggable: fiber stub
Packaging Services Packaging Services Development packages: open design for electrical probing Production packages: modified butterfly or other designs Full optoelectronics packaging with microelectronic partners
Ongoing Developments Working with design software houses and foundries: canned edge and
surface I/O fiber array solutions Multicore fiber I/O solutions with Chiral’s commercial fanouts
25‐mar‐15 p44OFC 2015 – 2nd PIC Workshop
Multicore fiber I/O solutions with Chiral s commercial fanouts
Technobis’ packaging services High‐end packaging solutions for
stability, reliability and performance, Technobis specializes in:Technobis specializes in: Thermal Management Low‐Noise front‐end electronics Low and medium volumes Low and medium volumes
Generic Test Package Easy accessibility, fast assessment, small pre‐series Few to many electrical and optical I/O (incl RF) Few‐to‐many electrical and optical I/O (incl.RF)
Custom Packaging Extreme performances, in‐package electronics
O ti i d i t f i fib li th l t bilit Optimized interfacing, fiber coupling, thermal stability, costs efficiency
Design rules are published on our website and integrated within the PhoeniX PDKs
25‐mar‐15OFC 2015 – 2nd PIC Workshop p45
within the PhoeniX PDKs
Scaling to Full Production andIntellectual PropertyIntellectual Property
Scaling production beyond prototypes For initial prototyping, MPWs are low cost For volume/optimized performance, custom runs may be best Sticking to the MPW process improves predictability MPW foundries also offer dedicated runs and they have
ti h t l t d tiexpertise how to scale to production Production
phaseRealization
phaseStabilization
phaseOptimization
phaseDemonstration
phaseKnow-how
phase
LioniX BV Strategy scheme © copyright 2002
* Fabrication monitoring
* Yield analysis* Process flow* Manufacturable design* Technical specifications
* Product design* Fabrication plan* Product specs* Quality criteria
* Feasibility* Preliminary design* Preliminary process* Shortloops
* Idea* Market Study* Preliminary product specs* Proof of principle
MASSFABRICATION
FABRICATIONPRODUCTDEVELOPMENT
RUNS
PRODUCTDEVELOPMENT
RUNSTESTRUNS
demonstrator prototype B product‘0' seriesprototype Aconcept
25‐mar‐15 p47OFC 2015 – 2nd PIC Workshop
Dealing with intellectual property
Processes are typically owned by the foundry
Chip design/layout is typically owned by the customerp g / y yp y y
Specific foundry design IP is shielded in confidential private building blocks (owned by the foundry)
Process validation is not done on specific device performance: building block validation only
IP rules are similar to electronics industry25‐mar‐15 p48OFC 2015 – 2nd PIC Workshop
Turn‐Key PIC Design HousesTurn‐Key PIC Design Houses
From application idea to PIC prototype
Analyze &
Select
Design & Fab
Test &
PackageSelect Fab Package
Turn‐key PIC design houses can be ideal: if you need specific design support or if you do not have the design capabilities yourself
In addition, they can provide a complete service This includes testing, packaging, and system level evaluation
25‐mar‐15 p50OFC 2015 – 2nd PIC Workshop
Design house support 3 phases in 7 steps
Analysis:A t PIC
Circuit & BB
Maskl t
Waferf b TestingSelect
S l ti Packaging
1 2 3 4 5 6 7I II III
App to PIC & BB design
layout fab gSolutions g g
1 2 43
specs
package SoI
5 6 7
InP
25‐mar‐15 p51OFC 2015 – 2nd PIC Workshop
Bright Photonics’ design services
25‐mar‐15OFC 2015 – 2nd PIC Workshop 25‐mar‐15OFC 2015 – 2nd PIC Workshop p52
Standard design servicesFabless design house, 12+ years designing PICs
lExcel in design to optimize and reduce risk of failure after fablFast times in consultancy and design turn-aroundlProtect results by confidentiality and IP transferlFull value-chain support: design services, turn-key projects, OEM chip supply
CUSTOMDESIGN
STANDARDDESIGN
DESIGNSUPPORT
lCreation of new IPlRedesign of existing building blockslVery large or complex
lUse only the foundry's PDKlSelect, adapt and layout ~50 standard building blocks
lPhotonic & design consultancylDRC & layout validation over customer's design
layouts
Fab & design prices on line @ www vlcphotonics com/mpw
25‐mar‐15 p53OFC 2015 – 2nd PIC Workshop
OFC2015 promo code for 10% discount 25% extra discount for academics
Fab & design prices on-line @ www.vlcphotonics.com/mpw
25‐mar‐15 p53OFC 2015 – 2nd PIC Workshop
In conclusionIn conclusion
Summary Integrated optics is gaining momentum
Especially for 100Gbps and above, but also in many other areas
l ll b Developing a PIC can still be expensive… MPW brings down the costs & simplifies the process to create a PIC
Use a detailed automated PDK plus the right design S/W Use a detailed automated PDK plus the right design S/W Choosing the right material is tricky, but MPW services are
available for the most important material systemsavailable for the most important material systems All MPW foundries can seamlessly scale from prototype to
dedicated (custom) production runs. There are a good number of packaging options And with all these efforts together, the field of integrated
optics will gain even more momentum25‐mar‐15 p55OFC 2015 – 2nd PIC Workshop
Agenda for the PIC workshop 6:00 PM – 6:10 PM: Welcome and Introduction 6:10 PM – 7:00 PM: Presentation on “Taking Advantage of Merchant Suppliers
to Create Your PIC Products Faster and Cheaper”to C eate ou C oducts aste a d C eape 7:00 PM – 7:10 PM: Question & Answer Session
7:10 PM – 8:00 PM: Networking Break with Buffet and Sponsor Tabletops Enjoy the food and drinks and please roam around and talk to the individual sponsors
8:00 PM – 8:10 PM: Update on the Integrated Photonics Initiative Tom Hausken from the OIDA
8:10 PM – 8:55 PM: Use Case Presentations by Pi K t f T h bi Pim Kat from Technobis
Chris Roeloffzen from Satrax Henk Bulthuis from Kaiam Chris Doerr from Acacia
8:55 PM – 9:00 PM: Closing
25‐mar‐15 p56OFC 2015 – 2nd PIC Workshop
h k !Thanks!www.7pennies.com