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Panel Level Embedded Technology System in a Package Global Summit 2013 Dr. Dyi-Chung Hu Sr. VP. Unimicron

Panel Level Embedded Technology - SEMI.ORG Global Summit 2013... · 4.Compactiblewith current PCB Process 1.Cu Terminal needed ... Design Inner 2L;1/2/1 Coreless 1/0/1 ... 1. Panel

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Panel Level Embedded Technology

System in a Package Global Summit 2013

Dr. Dyi-Chung HuSr. VP. Unimicron

DC Hu09062013

Outline

• Introduction to panel level embedded technology• Panel level embedded technology

– Line embedded– Passive components embedded– Active devices embedded– Many components Embedded

• Summary and conclusions

DC Hu09062013

Mobile Device Everywhere

�Everyone has mobile device(smart phone or tablet) and can use it everywhere.

�Everyone can be connected and interact with each other anytime anywhere.

DC Hu09062013

Mobile Applications Drive the Package Development

� System packaging needs �Small form factor

�High performance

�High bandwidth

�Low power consumption

�Low cost Small form factor

Lower CostHigh

Bandwidth

Lower power consumption

DC Hu09062013

WLP and PLP

Wafer Level Package (WLP)

Panel Level Package (PLP)

Processing Size 12” 20”or larger

Material Base Major is silicon, but glass and organic are possible

Major organic but glass or a-silicon are possible

Equipment Semiconductor centric;Stepper, coater, sputter..

Organic substrate centric;Laser via, e-less, lamination of dielectric..

Density Capabilities Down to 1 um L/S, via 5 um

Down to 5 um L/S, via 30 um

Cost down Potential Baseline Better

DC Hu09062013

Line Embedded Technology

Line First PLP Line Last PLP

Copper Line Formation

Copper line formed before dielectric

Copper line formed after dielectric

Cavity/line formation SAP copper Photo sensitive Dielectric,Laser trench

Structure Formation Lamination Copper plating + Planaration

Density capabilities Down to 5 um, via 30 um

Down to 5 um, via 30 um

Cost down Potential Better Basic

DC Hu09062013

Line Last Embedded Technology

� Laser or photosensitive dielectric trench formation

� L/S < 8/8 um fine pitch trench can be formed

� Better adhesion than SAP process

� Challenges:

� Materials availability

� Copper line revealing process

10/10 um10/10 um10/10 um10/10 um8/8 um8/8 um8/8 um8/8 um6/6 um6/6 um6/6 um6/6 um

DC Hu09062013

Line First Embedded Technology

� SAP copper trace formation

� L/S < 8/8 um can be formed

� Better copper trace adhesion than SAP process

� Challenges:

� More than one LE layer

� Packaging industry acceptance

DC Hu09062013

Prepreg

SR

SR

Embedded Trace Pattern

Total Thickness :130±30um

Unimicron UTS-EP (Ultra Thin Substrate – Embedded Pattern)

� Benefits:

� Z height reduction, low profile

� Better copper trace adhesion

� Good BOL assembly reliability

� Proven 15/15 um reliability

� Challenges

� Warpage control

� Packaging Industry acceptance

DC Hu09062013

Advantages of Embedded Passive/Active Substrate

� Form factor reduction

� Enhance electrical performance*

Normal Embedded

Packaging area reduction PoP thickness reduction

SMT MLCC Noise Embedded MLCC Noise reduction*

*: Murata

DC Hu09062013

Embedded Passive Panel Level Process

Method I Method II

Component fixing method

Solder Joint & PPG Filling

PPG Resin Filling

Via connection Method

Solder JointVia Connection by Cu Plating

CompanyDNP, Clover, ATS, etc. Unimicron, Semco, etc

Structure

Features

1. Sn solder terminal 2. Bigger embedded area required3. Single side connection.4. Compactible with current PCB Process

1. Cu Terminal needed2. Dual side connection possible3. Compactible with current PCB Process 4. Smaller cavity Size

DC Hu09062013

Embedded Passive Substrate Process Key Items

� Components placement accuracy

� Interface Adhesion with Dielectric Layer

� Warpage Control

MLCCMLCCMLCCMLCC

MLCCMLCCMLCCMLCC MLCCMLCCMLCCMLCC

DC Hu09062013

MLCC Cross Section

MLCC Information:

Size: 0402

Thickness: 0.11mm

Capacitance: 100nF

Pitch between electrode:

2.0 um

DC Hu09062013

Embedded Component Substrate Process

ConfidentialConfidentialConfidentialConfidential

14

Through hole Drilling

Core Layer

Patterning

MLCC Embedding

Taping

MLCC Placement

Cavity Formation

Lamination side 1

Build upSolder Mask

Surface Finishing

MLCC

MLCC

MLCCLamination side

2

Strip Forming

Shipping

DC Hu09062013

Roadmap of Embedded Passive Substrate

2012 2013 2014 2015 2016

Year

Embedded Component M

LC

C

Res

isto

r

Ind

uct

or

Mu

lti-

Co

mp

on

ents

R C C RType

Size 0402 0201 01005

Discrete numbers per cavity

StructureDesign

Inner 2L;1/2/1 Coreless1/0/1

100um 60um W/O coreCore Thk.

DC Hu09062013

Comparison of Embedded Active & Passive Components

Active Passive

Embedded Component Size Large Small

Thickness < 100 um 100 um min.

I/Q Counts Many Few

Embedded Quantities One, Few Many

Material Base Silicon Ceramic/glass

Surface Base PI Ceramic/glass

Electrode Base Plated Cu Plated Cu

Component Package Wafer / Tray / Tape & Reel Tape & Reel

Placement Equipment Chip Shooter / Die Bonder Chip Shooter

DC Hu09062013

FOWLP and PLP Process Comparison

FOWLP PLP

Structure

Substrate Size ∆ O

Symmetrical Build No Yes*

L/S-Routing Density O ∆Thickness O ∆Equipment Cost ∆ O3D Extendibility O OCost Down Potential ∆ O

O: Good ; ∆:OK*: Single side possible

DC Hu09062013

Structure Roadmap of Embedded Active Substrate

PoP

Module

EmbeddedPackage

Multi-Chip Embedded Package

Dual Die

Active +Passive

PLP Package

FOWLP Package

FOWLP PoP

2012 2013 2014 2015 2016

DC Hu09062013

� Features:� Combine interposer and organic substrate.� Eliminates the solder joints between interposer and organic

substrate.

� Benefits:� Layer reduction compare with conventional organic substrate.� Alternative solution for high density SiP.� Cost reduction by interposer/carrier integration.

Embedded Interposer Carrier (EIC)

Interposer

Embedded Interposer Carrier (EIC)

Organic Laminated Substrate

D

IPD P

CAP

DC Hu09062013

ChipChip

Chip on Interposer on Substratevs. FC-EIC

� Chip on Interposer on Substrate: (CoIoS)� Interposer need double side RDL/Bumping and assembly process.� Four testing steps are used: Interposer, carrier, Interposer+carrier,� chip+interposer +carrier.

� FC-EIC: Flip Chip – Embedded Interposer Carrier� Interposer needs to be embedded into the substrate.� Only two testing steps are used: interposer, and interposer+carrier.

� Risk of thin wafer handling process is reduced..

CoIoS FC-EIC

DC Hu09062013

FC-EIC Benefits

� FC-EIC has low profile and cost benefit than ColoS.� This structure eliminates the solder joining between the interposer and

the laminated organic substrate.� The connections of interposer to carrier in EIC structure are copper to

copper which have less resistance and inductance compare to the conventional solder joints; better electrical performance.

� Know good EIC substrate, reduce chip assemble loss.� Interposer is protected by the carrier in EIC structure.� Large interposer sizes are possible.� Thin interposers (30 or 50 um thickness) can be included in

EIC structure. Thin interposers have a lower processing cost in via forming and via plating.

� EIC structure has a lower profile than CoIoS.� EIC structure is compatible with current backend

infrastructure.

DC Hu09062013

I0I0I0I0Silicon Interposer

I1I1I1I1V 0V 0V 0V 0

ABF ABF ABF ABF 2222

ABF 1 ABF 1 ABF 1 ABF 1

ABF ABF ABF ABF 3333

ABF ABF ABF ABF 4444

C1C1C1C1

C3C3C3C3

C4C4C4C4

C2C2C2C2

Via

97T / B (um) 49.6 /48.8

I 0 CD (um) 59I 0 Metal Thk. (um) 1PBO 1 Thk. (um) 5PBO 1 CD (um) 39

I 1 Metal Thk. (um) 4ABF 1 Thk. (um) 31V0 T CD (um) 69V0 B CD (um) 36 C1 Thk. (um) 23

C2 Layer* ABF 2 Thk. (um) 59ABF 3 Thk. (um) 58

C3 Thk. (um) 14ABF 4 Thk. (um) 60

C4 Thk. (um) 19C4 Layer

Interposer Die

Build Up Layer

Die Thk. (um)

I 1 Layer

C1 Layer

C3 Layer

TSV Via CD

Unit: µm

EIC Structure Cross Section View

EIC

Silicon Interposer

*: DC Hu, TJ Tseng, YH Chen, WJ LoECTC 2013

ABF

TSV Si

DC Hu09062013

The Changing Role of Substrate

New Role of Substrate in 3D ERA

- Panel Level Module Integration -

Now Future

Optical Fiber

DC Hu09062013

Summary and Conclusions

1. Panel level embedded technology is becoming a fast growing technology to achieve the packaging requirement of; small form factor, high performance and low cost.

2. Currently embedded passive components is in mass production, and embeding active device is emerging.

3. Panel Level Packing has potential cost advantage over FOWLP due to her PCB centric production infrastructure.

4. Equipment and material improvement will expend the scope of panel level embedded technology.

5. New concept such as embedded interposer or other components into the substrate is emerging.

6. The role of laminate substrate is emerging as a system integrator based on panel level embedding technology.

DC Hu09062013

Thank you for your Attention!