Upload
balin
View
21
Download
0
Embed Size (px)
DESCRIPTION
Outgassing Evaluation More Moore, SP3 WP6, for Task 3.6.1.6.1 and 3.6.2.3 Elettra and AZ Electronic Materials Athens 12.Mai 2005. Objectives for Outgassing Low or no Outgassing chemicals is a requirement for the EUV exposure tool shelf life - PowerPoint PPT Presentation
Citation preview
112&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Outgassing EvaluationMore Moore, SP3 WP6,
for Task 3.6.1.6.1 and 3.6.2.3
Elettra and AZ Electronic MaterialsAthens
12.Mai 2005
212&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Objectives for OutgassingLow or no Outgassing chemicals is a requirement for the EUV exposuretool shelf life
First specifications for outgassing are given byASML
Resist outgas specifications for Alpha tool:H20 4.7E15
(molec/s*cm2)CxHy (integr. > 44 AMU) 4.7E13F/Cl 4.7E14S/P 4.7E11Si 4.7E9
PAG fragments (S/P) most critical
Intel Outgassing 5*1010 [molecules/cm²] at Esize (only
internal)
312&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Intel and Sematech are working on outgassing• test procedure for outgassing• characterization of of outgassing behavior of EUV resists and related
materials:a) qualitativly
• b) quantitativly
Outgassing experiments within More Moore and ExCite
• are needed to have test equipment and to get experience
• are needed to characterize the EUV resist materials
• are needed for selection of appropriate EUV resist material.
412&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Intel
512&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Where More Moore stands
Outgassing test equipment set up at Elettra Synchrotron Trieste
612&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Difference Mass Spectra MMC6 exposed-unexposed
1E-17
1E-16
1E-15
1E-14
1E-13
1 7 13 19 25 31 37 43 49 55 61 67 73 79 85 91 97 103
amu
Ion
Cu
rran
t V
aria
tio
n (
A)
PHS-Methacrylate Polymer
m/e=28,CO, C2H4
m/e=44; CO2
m/e=15,CH3
m/e=12-18, Polymer
m/e=27-30, Polymer
m/e=43-45, Polymer
712&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Difference Mass Spectrum MMC10, exposed-unexposedlow flux
1E-17
1E-16
1E-15
1E-14
1E-13
1 6
11
16
21
26
31
36
41
46
51
56
61
66
71
76
81
86
91
96
10
1
amu
Ion
Cu
rran
t va
riat
ion
(A
)PHS-Methacrylate Polymer + PAG (TPS-Triflat)
m/e=48; SOm/e=64; SO2
m/e=12-18, Polymer
m/e=27-30, Polymer
m/e=44-45, Polymer
m/e=78; C6H6
m/e=69; CF3
m/e=31-40, PAG
m/e=20,HFm/e=26, PAG
812&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Difference Mass Spectrum MMC1, exposed-unexposed
1E-17
1E-16
1E-15
1E-14
1E-131 6
11
16
21
26
31
36
41
46
51
56
61
66
71
76
81
86
91
96
10
1
amu
Ion
Cu
rran
t va
riat
ion
(A
)
PHS-Methacrylate based EUV Photoresist
m/e=48; SO m/e=64; SO2
m/e=12-18, Polymer
m/e=28, Polymer
m/e=43-45, Polymer
m/e=31,38 PAG
m/e=78, C6H6,PAG
912&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
1012&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Difference Mass Spectra MMC10 exposed-unexposed,high flux
1E-17
1E-16
1E-15
1E-14
1E-13
1E-12
1 5 9 13 17 21 25 29 33 37 41 45 49 53 57 61 65 69 73 77
amu
Ion
Cu
rran
t V
aria
tio
n (
A)
m/e=48; SO m/e=64; SO2
PHS-Methacrylate Polymer + PAG (TPS-Triflat)
1112&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Difference Mass Spectrum MMC11, exposed-unexposed
1E-17
1E-16
1E-15
1E-14
1E-13
1E-12
1 7 13 19 25 31 37 43 49 55 61 67 73 79 85 91 97 103 109
amu
Ion
Cu
rran
t V
aria
tio
n (
A)
m/e=48; SO m/e=64; SO2
PHS-Methacrylate Polymer + PAG (TPS-Nonaflat)
1212&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Difference Mass Spectra MMC5 exposed-unexposed
1E-17
1E-16
1E-15
1E-14
1E-13
1 9 17 25 33 41 49 57 65 73 81 89 97 105 113 121 129 137
amu
Ion
Cu
rran
t V
aria
tio
n (
A)
Methacrylate Polymer Based Resist
1312&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Difference Mass Spectrum MMC3, exposed-unexposed
1E-17
1E-16
1E-15
1E-14
1E-13
1 9 17 25 33 41 49 57 65 73 81 89 97 105 113 121 129 137
amu
Ion
Cu
rran
t V
aria
tio
n (
A)
Methacrylate Polymer Based Resist
1412&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Conclusion
• PAGs, which create Perfluorsulfonic acids outgass under EUV with SO,SO2
• More data needed
• Confirmation of reliability and precicion of measurement
• Analyses of mass fragments
• Quantification of outgassing in relation to specification of exposure tool