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PSE-Programme-2004.doc/t Ninth International Conference on Plasma Surface Engineering Conference and Exhibition Final Programme September 13 – 17, 2004 Garmisch-Partenkirchen (Germany) Organised by the European Joint Committee on Plasma and Ion Surface Engineering (EJC/PISE)

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Page 1: Ninth International Conference on Plasma Surface Engineering€¦ · PSE-Programme-2004.doc/t Ninth International Conference on Plasma Surface Engineering Conference and Exhibition

PSE-Programme-2004.doc/t

Ninth International Conference on Plasma Surface Engineering

Conference and Exhibition

Final Programme

September 13 – 17, 2004

Garmisch-Partenkirchen (Germany)

Organised by the European Joint Committee on Plasma and Ion Surface

Engineering (EJC/PISE)

Page 2: Ninth International Conference on Plasma Surface Engineering€¦ · PSE-Programme-2004.doc/t Ninth International Conference on Plasma Surface Engineering Conference and Exhibition

PSE 2004, Garmisch-Partenkirchen (Germany) September 13 – 17, 2004

PSE-Programme-2004.doc

Scope of the PSE Conference: Applications of Plasma and Ion Beam Techniques in Surface Engineering and their Fundamentals The Ninth International Conference on Plasma Surface Engineering will be held from Monday, September 13 to Friday, September 17, 2004,in Garmisch-Partenkirchen. The conference is organised by the European Joint Committee on Plasma and Ion Surface Engineering. In view of the strong interest in the eight preceding PSE conferences with more than 600 delegates from Europe and overseas countries, these biennial conferences have become a well-established and prominent forum in the field of plasma and ion/particle beam assisted surface and thin film technology. It is the aim of the PSE conferences to provide an opportunity for the presentation of recent progress in research, development and applications of plasma and ion/particle beam surface modification and engineering, and of plasma and ion/particle beam assisted deposition of coatings and thin films. The presentations will contribute to the clarification of the relationships between the process parameters, the structural properties and the functional properties of the modified surface coatings and thin films, so as to bridge the gap between those involved in basic research and those who have to meet the rapidly increasing demands of industrial applications. Conference Chairman: H. Störi, Vienna (A) Conference Co-Chairman: H. Holleck, Karlsruhe (D) K. Rim, Suwon (ROK) International Scientific Committee S. Berg, Uppsala (S) W. Fleischer, Venlo (NL) J.I. Onate, San Sebastian, (E) J. Bottiger, Aarhus (DK) M. Hecq, Mons (B) P. Panjan, Ljubljana (SL) I. Braceras, San Sebastian (E) A.S. Korhonen, Hut (SF) H.K. Pulker, Innsbruck (A) E. Broszeit, Darmstadt (D) A. Matthews, Sheffield (UK) A. Ricard, Toulouse (F) D. Cameron, Dublin (IRL) H. Michel, Nancy (F) P. Rödhammer, Reutte (A) A. Cavaleiro, Coimbra (P) T. Müller, Wels (A) M.C.M. V. d.Sanden, Eindhoven (NL) R. D`Agostino, Bari (I) J. Musil, Plzen (CZ) K. Zdunek, Warsaw (PL) Advisory Board H. Bolt, Garching (D) P.J. Kelly, Salfort (UK) Y. Segui, Toulouse (F) A. Bouchoule, Orleans (F) S. C. Kwon, Changwon (ROK) R.P. Shimshock, Mountain View (USA) G.A. Collins, Menai (AUS) J. J. Lee, Seoul (ROK) M. Sjöstrand, Stockholm (S) F. Cui, Beijing (CHINA) G.R. Lucovsky, Raleigh (USA) J. van Stebut, Nancy (F) H. Dimigen, Braunschweig (D) R. Messier, Pennsylvania (USA) O. Takai, Nagoya (J) H. Fujiyama, Nagasaki (J) S. Miyake, Osaka (J) M.R. Wertheimer, Montreal (CDN) R. Grün, Siegen (D) W. Möller, Dresden (D) R. Wilhelm, Garching (D) J.G. Han, Suwon (ROK) W.-D. Münz, Sheffield (UK) G.K. Wolf, Heidelberg (D) J. Heberlein, Minneapolis (USA) H. Oechsner, Kaiserslautern (D) T. Yoshida, Tokyo (J) S. Hogmark, Uppsala (S) A. Ohl, Greifswald (D) R. Kassing, Kassel (D) R.J. Peters, Duesseldorf (D) Editorial Board U. Helmersson, Linköping (S) C. Oehr, Stuttgart (D) H. Störi, Vienna (A) H. Holleck, Karlsruhe (D) V. Rigato, Legnaro (I) R. Suchentrunk, Egmating (D) Honorary Founding Chairman K.-T. Rie, Braunschweig (D) Conference Management and Secretary VDI Technologiezentrum GmbH Dr. Karin Reichel Marion Böckmann Graf-Recke-Str. 84 D-40239 Duesseldorf (Germany) http://www.akplasma.org/pse2004.php3 e-mail: [email protected] Tel: +49 211 6214 -567 Fax: +49 211 6214 - 484 European Joint Committee on Plasma and Ion Surface Engineering (EJC/PISE) TU Braunschweig Prof. Dr.-Ing. K.-T. Rie (Chairman) Bienroder Weg 53 D-38108 Braunschweig (Germany) Tel: +49 531 391 9402 / 9406 Fax: +49 531 391 9400

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Saturday / Sunday, September 11 – 12, 2004 Room Zugspitze

PSE 2004 1

Tutorial “Fundamentals and Trends in Plasma Surface Processing”

in connection with 9th International Conference on Plasma Surface Engineering (PSE 2004) Time Saturday, September 11 13:30 – 14:45 FUNDAMENTALS OF PLASMAS FOR THIN FILM DEPOSITION

H. Kersten Institute of Low-Temperature Plasma Physics, Greifswald (Germany)

14:45 – 16:00 PLASMA-SURFACE INTERACTION AND ION BOMBARDMENT

W. Möller Forschungszentrum Rossendorf, Dresden (Germany)

16:00 – 16.30 coffee break 16:30 – 17:45 FUNDAMENTALS OF REACTIVE SPUTTERING

S. Berg Ångstrom Laboratory, University of Uppsala (Sweden)

17:45 – 19:00 HIGH-POWER PULSED MAGNETRON SPUTTERING

U. Helmersson University of Linköping (Sweden)

19:30 Dinner and Social Get-Together Sunday, September 12

8:45 – 10:00 ADVANCED PLASMA DIAGNOSTICS FOR THIN FILM DEPOSITION

M.C.M. van de Sanden Dept. of Applied Physics, Eindhoven University of Technology (The Netherlands)

10:00 – 11:15 PROCESS CONTROL FOR LARGE AREA MAGNETRON SPUTTERING

J. Strümpfel Von Ardenne Anlagentechnik GmbH, Dresden (Germany)

11:15 – 12:30 THIN FILM STRESS AND TEXTURE CONTROL

J. Bøttiger Institute of Physics and Astronomy, University of Århus (Denmark)

12:30 – 14:00 Lunch 14:00 – 15:15 CARBON-BASED HARD COATINGS

B. Schultrich Fraunhofer Institute for Material and Beam Technology, Dresden (Germany))

15:15 – 16:30 PLASMA TREATMENT OF POLYMERS

Chr. Oehr Fraunhofer Institute of Interfacial Engineering and Biotechnology, Stuttgart (Germany

Please note that an additional registration for the tutorial is necessary. An early registration is recommended because the number of participants is limited. The registration form is also available at www.akplasma.org/pse2004.php3

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PSE 2004, Garmisch-Partenkirchen September 13 – 17, 2004

PSE 2004 2

Tutorial Saturday / Sunday, September 11 – 12, 2004 Tutorial ”Fundamentals and Trends in Plasma Surface Processing” Room Zugspitze, see page 1 Social Events / Opening Ceremony For delegates and accompanying persons the Welcome Reception and the combined Industrial/Bavarian Evening on Tuesday evening are included in the registration fee. For organisational reasons it is indispensable to mark the respective box on the registration form. Monday, September 13, 2004 11:00 – 14:00 Opening Ceremony and Welcome Reception Room Richard Strauss Tuesday / Wednesday, September 14 - 15, 2004 Industrial Exhibition Room Werdenfels and Foyer Tuesday September 14, 2004 18:30 – 23:00 Combined Industrial and Bavarian Evening in combination with the poster session in the Congress Center Room Werdenfels and Foyer, First Floor, Restaurant Tuesday September 14, 2004 15:10 – 18:20 Workshop: Successful Applications of Plasma and Ion-based Processes The Workshop is organised by Arbeitskreis Plasmaoberflächentechnologie (PISE Germany), VDI Technologiezentrum GmbH and the Society of Vacuum Coaters (SVC). Room Olympia Wednesday, September 15, 2004 16:00 – 18:50 Workshop: Thin Film Quality - Standardisation of Test Methods & Supporting Measures The workshop is organised by BAM (Germany), NPL (UK), VITO (Belgium) and CEN/TC 184/WG5 Room Zugspitze Special Events (only for invited members) Monday, September 13, 2004 19:30 – 22:00 Meeting EJC/PISE Thursday, September 16, 2004 18:30 – 19:30 Meeting DGPT Job Placement Center / Technology Placement Center During the conference an information board is placed in the foyer as ”job placement center”. Companies which would like to offer a job or participants who are looking for a new job will find respective forms for completion. The „technology placement center“ will act as an intermediary for scientific/technological queries and will support cooperative ventures and proposals for problem-solving. Contacts can be arranged on request at the conference office. Visiting Tours Garmisch–Partenkirchen is a well-known resort in the foothills of the Bavarian Alps, embedded in an enchanting landscape of mountains, lakes, villages, baroque churches, and famous castles of the Bavarian kings. Several bus tours are offered by the tourist-office which is located next to the Kongresshaus in Garmisch-Partenkirchen.

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Monday, September 13th, 2004 Room Richard Strauss

PSE 2004 3

11:00 – 12:30 Opening

Opening Ceremony H. Störi, Conference Chairman

Welcome Address Mayor of Garmisch-Partenkirchen

Materials Research in the 6th Framework Programme J. L. Vallés European Commission, Brussels (Belgium)

Welcome Reception 14:15 – 14:55 Chairman: A. Ricard, Toulouse (France) Plenary Lecture P1

REAL TIME IN SITU DIAGNOSTICS OF PVD GROWTH USING SYNCHROTRON RADIATION Jørgen Bøttiger Institute of Physics and Astronomy, Aarhus University (Denmark)

15:10 – 16:40 Poster Session (Foyer and First Floor) Oral Session MoA (afternoon session): Large Area Coatings Chairman: G. Bräuer, Braunschweig (Germany) 16:40 – 17:10 Keynote Lecture K1

MICROWAVE PECVD FOR LARGE AREA COATING" M. Liehr, M. Diegues-Campo Applied Films GmbH, Alzenau (Germany)

17:10 – 17:30 MoA1

PLASMA ACTIVATED ELECTRON BEAM EVAPORATION FOR LARGE AREA HARD COATING J.-P. Heinss, Ch. Metzner, B. Scheffel, O. Zywitzki Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik (FEP), Dresden (Germany)

17:30 – 17:50 MoA2

LINEAR RADIO FREQUENCY PLASMA SOURCES FOR LARGE SCALE INDUSTRIAL APPLICATIONS IN PHOTOVOLTAICS H. Schlemm, M. Fritzsche, D. Roth Roth & Rau Oberflächentechnik AG, Hohenstein-Ernstthal (Germany)

17:50 – 18:10 MoA3

INVESTIGATION OF THE PRACTICABILTY OF LOW-PRESSURE MICROWAVE PLASMAS IN THE STERILISATION OF FOOD PACKAGING MATERIALS AT INDUSTRIAL LEVEL J. Schneider1, K. M. Baumgärtner2, J. Feichtinger3, J. Krüger1, P. Muranyi4, A. Schulz1, M. Walker1, J. Wunderlich4, U. Schumacher1 1 Institut für Plasmaforschung, University of Stuttgart, Stuttgart (Germany) 2 Muegge Electronic GmbH, Reichelsheim (Germany) 3 Robert Bosch GmbH, Gerlingen-Schillerhöhe (Germany) 4 Fraunhofer Institut für Verfahrenstechnik und Verpackung, Freising (Germany)

18:10 – 18:30 MoA4

DEVELOPMENT OF A NEW METER-SCALE LARGE-AREA RF PLASMA SOURCE WITH CONTROL CAPABILITIES OF POWER DEPOSITION PROFILES BY INDEPENDENTLY-OPERATED MULTIPLE LOW-INDUCTANCE ANTENNA UNITS Y. Setsuhara1, A. Ebe2, T. Shoji3, K. Takahashi1 and K. Ono1 1 Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University (Japan) 2 EMD Corporation, Kyoto (Japan) 3 Department of Energy Engineering and Science, Graduate School of Engineering, Nagoya University (Japan)

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Monday, September 13th, 2004 Room Richard Strauss

PSE 2004 4

18:30 – 18:50 MoA5

REACTIVE MAGNETRON SPUTTERING OF LARGE AREA Nb2O5 FILMS DEPOSITED FROM BOTH CERAMIC AND METAL TARGETS IN MF AND DC MODE J. Struempfel1, F. Milde1, Ch. Koeckert1, D. Wurczinger2, A. Schintlmeister3 1 VON ARDENNE GmbH, Dresden (Germany), 2 SenVac GmbH, Friedberg (Germany) 3 PLANSEE AG, Reutte (Austria)

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Monday, September 13th, 2004 Room Olympia

PSE 2004 5

14:15 – 14:55 Plenary Lecture P1 (see page 3, Room Richard Strauss) 15:10 – 16:40 Poster Session (Foyer and First Floor) Oral Session MoB (afternoon session): Plasma-CVD Chairman: Th. Müller, Wels (Austria) 16:40 – 17:10 Keynote Lecture K2

PLASMA PRODUCTION OF SILICON CLUSTERS AND NANOCRYSTALLINE SILICON PARTICLES: A NEW WAY FOR NANOSTRUCTURED SILICON THIN FILMS P. Roca i Cabarrocas Laboratoire de Physique des Interfaces et des Couches Minces (UMR 7647 CNRS), Ecole Polytechnique, Palaiseau (France)

17:10 – 17:30 MoB1

NANOCRYSTALLINE OXIDE COATINGS BY THERMAL AND PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION S. Mathur and P. Kuhn Institute of New Materials, Saarbrücken (Germany)

17:30 – 17:50 MoB2

RF POWER EFFECT ON TEOS/O2 PECVD OF SiO2 THIN FILMS Ch. Voulgaris, E. Amanatides, D. Mataras Plasma Technology Laboratory, Dept. Chem. Engineering, University of Patras (Greece)

17:50 – 18:10 MoB3

MULTIFUNCTIONAL FILMS FOR TEMPERATURE SENSITIVE MATERIALS PREPARED BY PACVD USING ORGANOMETALLIC PRECURSORS J. Mahrholz1, T. Hosenfeldt2, K.-T. Rie3 1,3 Institut für Oberflächentechnik und Plasmatechnische Werkstoffentwicklung Technische Universität Braunschweig (Germany) 2 INA-SCHAEFFLER KG, Herzogenaurach (Germany)

18:10 – 18:30 MoB4

DEVELOPMENT OF PE-CVD Si/C/N:H-FILMS FOR TRIBOLOGICAL UND CORROSIVE COMPLEX-LOAD CONDITIONS D. Probst1, H. Hoche1, Y. Zhou2, R. Hauser2, T. Stelzner3, H. Scheerer1, E. Broszeit1, C. Berger1, R. Riedel2, H. Stafast3 1 Institute of Materials Technology, Darmstadt University of Technology (Germany) 2 Department for Disperse Solids, Darmstadt University of Technology (Germany) 3 Institute for Physical High Technology, Jena (Germany)

18:30 – 18:50 MoB5

CHEMICAL VAPOR DEPOSITION OF ORGANOSILICON COMPOSITE FILMS FOR POROUS LOW-K DIELECTRICS A. D. Ross and K. K. Gleason Department of Chemical Engineering, Massachusetts Institute of Technology Cambridge ( USA)

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Monday, September 13th, 2004 Room Zugspitze

PSE 2004 6

14:15 – 14:55 Plenary Lecture P1 (see page 3, Room Richard Strauss) 15:10 – 16:40 Poster Session (Foyer and First Floor) Oral Session MoC (afternoon session): Characterization and Diagnostics Chairman: J. Engemann, Wuppertal (Germany) 16:40 – 17:10 Keynote Lecture K3

PLASMA SURFACE INTERACTIONS IN TREATMENTS OF ORGANIC MATERIALS T. Belmonte, T. Czerwiec, G. Henrion, V. Hody, J.M. Thiebaut Laboratoire de Science et Génie des Surfaces - Ecole des Mines - Nancy (France)

17:10 – 17:30 MoC1

COMPARISON OF THE IONISATION EFFICIENCY OF TWO IONISED PHYSICAL VAPOUR DEPOSITION PROCESSES : MAGNETRON DISCHARGE ASSISTED BY MICROWAVE PLASMA OR RADIO-FREQUENCY PLASMA. L. De Poucques, J. C. Imbert, P. Vasina1, C. Boisse-Laporte, L. Teulé-Gay, M. Touzeau. Lab. de Phys. des Gaz et des Plasmas, Université Paris-Sud (France) 1 Department of Physical Electronics, Brno (Czech Republic)

17:30 – 17:50 MoC2

DIAGNOSTIC OF AN ELECTROLYTIC MICROARC PROCESS FOR ALUMINIUM ALLOYS OXIDATION F. Mecuson1,2,3, T. Czerwiec2, T. Belmonte2, L. Dujardin3, A. Viola3 , G. Henrion1 1 Laboratoire de physique des Milieux Ionisés et Applications, Université Henri Poincaré, Vandoeuvre (France) 2 Laboratoire de Science et Génie des surfaces, Ecole des Mines, Nancy (France) 3 Messier-Bugatti, Laboratoire DS/T/UA, Molsheim (France)

17:50 – 18:10 MoC3

PLASMA AND ION BEAM CHARACTERIZATION BY NON-CONVENTIONAL METHODS H. Kersten, R. Wiese, M. Hannemann, A. Kapitov, F. Scholze1, H. Neumann1 INP e. V. Greifswald (Germany), 1 IOM e. V. Leipzig (Germany)

18:10 – 18:30 MoC4

DENSITIES OF N AND O-ATOMS IN N2-O2 FLOWING GLOW DISCHARGES AND POST-DISCHARGES BY ACTINOMETRY AND NO TITRATION J. Henriques1,2 , S. Villeger1, J. Levaton3, J. Nagai4 , S.I.V. Santana4, J. Amorim3,4 and A. Ricard1 1 CPAT- Toulouse (France) 2 IST- Lisboa (Portugal) 3 Laboratório Interdisciplinar de Materiais (LABMAT) - Universidade Federal de Santa Catarina, Florianópolis (Brazil) 4 Departamento de Física, Instituto Tecnológico de Aeronáutica, Centro Técnico Aeroespacial, São José dos Campos (Brazil)

18:30 – 18:50 MoC5

ELECTRON DENSITY MEASUREMENTS IN A MICROWAVE-EXCITED DEPOSITION PLASMA G. F. Leu, A. Brockhaus, J. Engemann Forschungszentrum für Mikrostrukturtechnik – fmt, University of Wuppertal (Germany)

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Tuesday, September 14th, 2004 Room Richard Strauss

PSE 2004 7

08:30 – 9:10 Chairman: W. Möller, Dresden (Germany) Plenary Lecture P2

STRESS GENERATION AND RELIEF PROCESSES IN THIN FILMS DEPOSITED WITH ENERGETIC IONS M.M.M. Bilek, L. Ryves, T. Oates, G. Pearce, D.R. McKenzie

School of Physics, University of Sydney (Australia) Oral Session TuA (morning session): PVD I Chairmen: P. Eh. Hovsepian, Sheffield (United Kingdom)

R. Tietema, Venlo (The Netherlands) 09:20 – 09:50 Keynote Lecture K4

APPLICATION OF INDUCTIVELY COUPLED PLASMA TO CVD AND PVD Jung-Joong Lee School of Materials Science & Engineering, Seoul National University, Seoul (Korea)

09:50 – 10:10 TuA1

PEMFC ELECTRODE PROCESSING BY PLASMA SPUTTERING A. Caillard1, P. Brault1, C. Charles2, R. Boswell2, J. Durand3, S. Roualdes3 1 Groupe de Recherches sur l’Energétique des Milieux Ionisés, Université d’Orléans (France) 2 Plasma Research Laboratory, Research School of Physical Science and Engineering, Australian National University CANBERRA (Australia) 3 IEMM, Université Montpellier II, Montpellier (France)

10:10 – 10:30 TuA2

INFLUENCE OF TARGETS CONFIGURATION ON THE STRUCTURE AND HARDNESS OF MAGNETRON SPUTTERED TiAl THIN FILMS. A. Manaia, J.C. Oliveira and A. Cavaleiro ICEMS, Departamento de Engenharia Mecanica, Universidade de Coimbra (Portugal)

10:30 – 10:50 TuA3

GOOD TiN FILMS ON COLD SUBSTRATES BY ENERGETIC CLUSTER IMPACT (ECI) A. Haefele, O. Fiess and H. Haberland 1 Department of Physics and Freiburg Materials Research Center, Freiburg (Germany)

10:50 – 11:10 coffee break 11:10 – 11:30 TuA4

WEAR AND CORROSION RESISTANT PVD-COATINGS FOR MAGNESIUM ALLOYS: DEVELOPMENT, CHARACTERISATION AND EXPERIMENTAL RESULTS H. Hoche1, C. Blawert2, E. Broszeit1, C. Berger1 1 Institute of Materials Technology & State Testing Institute for Materials Darmstadt, Technical University Darmstadt (Germany) 2 GKSS Research Center, Geesthacht (Germany)

11:30 – 11:50 TuA5

FORMATION OF NANOSTRUCTURED Re-Ni-Cr DIFFUSION BARRIER COATINGS ON Nb SUPERALLOYS BY THERMIONIC VACUUM ARC (TVA) METHOD C. P. Lungu1, I. Mustata1, G. Musa1, A.M. Lungu1, V. Zaroschi1, K. Iwasaki2, Y. Matsumura2, R. Tanaka2, I. Iwanaga2, H. Tanaka2, T. Oi2, K. Fujita2 1 Japan Ultra-high Temperature Materials Institute, Ube, Yamaguchi (Japan)

2 National Institute for Lasers, Plasma and Radiation Physics, Magurele-Bucharest (Romania)

11:50 – 12:10 TuA6

TRIBOLOGICAL AND CORROSION RESISTANCE PROPERTIES OF Cr-N AND Cr-Si-N COATINGS REACTIVELY SPUTTER DEPOSITED D. Mercs, S. Naamane, N. Bonasso, C. Coddet Laboratoire d'Etudes et de Recherche sur les Matériaux, les Procédés et les Surfaces (LERMPS) / Université de Technologie de Belfort – Montbéliard (UTBM) - BELFORT Cedex (France)

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Tuesday, September 14th, 2004 Room Richard Strauss

PSE 2004 8

12:10 – 12:30 TuA7

Zr-BASED METALLIC GLASS THIN FILMS SYNTHESIZED BY PLASMA SPUTTERING A.L. Thomann1, M. Pavius1, P. Brault1, A. Caillard1, P. Gillon2 1 GREMI CNRS/Université d’Orléans (France) 2 LCSR CNRS, Orléans (France)

12:30 – 12:50 TuA8

GROWTH PHENOMENA IN ROOM-TEMPERATURE PULSED LASER DEPOSITED CHROMIUM AND CHROMIUM NITRIDE COATINGS J.M. Lackner1, W. Waldhauser1, R. Berghauser1, R. Ebner1, G. Kothleitner2 1 Laser Center Leoben, JOANNEUM RESEARCH Forschungsgesellschaft mbH, Niklasdorf (Austria) 2 Research Institute for Electron Microscopy (ZfE), Graz (Austria)

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Tuesday, September 14th, 2004 Room Olympia

PSE 2004 9

08:30 – 9:10 Plenary Lecture P2 (see page 7, Room Richard Strauss) Oral Session TuB (morning session): Surface Modification (Etching, Cleaning,

Functionalisation) Chairman: Y. Segui, Toulouse (France) 09:20 – 09:50 Keynote Lecture K5

INTERACTION OF LOW DENSITY FULLY DISSOCIATED OXYGEN PLASMA WITH POLYMER-MATRIX COMPOSITES M. Mozetic Institute Jozef Stefan, Ljubljana (Slovenia)

09:50 – 10:10 TuB1

FILM PROPERTY ENHANCEMENT THROUGH LINEAR ION SOURCE SUBSTRATE PRE-TREATMENT J.W. Bradley1, G.T. West2, P.J. Kelly2 and I. Swindells1 1 Dept of Physics, UMIST, Manchester (United Kingdom) 2 Surface Engineering Group, University of Salford (United Kingdom)

10:10 – 10:30 TuB2

IMPROVEMENT OF AMINO GROUP FUNCTIONALIZATION OF POLYMERS BY NON-DEPOSITING LOW-PRESSURE PLASMAS B. Finke, K. Schröder, A. Ohl Institut für Niedertemperatur-Plasmaphysik, Greifswald (Germany)

10:30 – 10:50 TuB3

SURFACE OXIDATION INSIDE OF MACROSCOPIC POROUS POLYMERIC MATERIALS Andreas Holländer Fraunhofer-Institut für Angewandte Polymerforschung, Potsdam (Germany)

10:50 – 11:10 coffee break 11:10 – 11:30 TuB4

ADHESION OF METALS TO PLASMA-INTRODUCED FUNCTIONAL GROUPS AT POLMER SURFACES R. Mix, G. Kühn, J. Friedrich Bundesanstalt für Materialforschung und –prüfung, Berlin (Germany)

11:30 – 11:50 TuB5

THE FTIR SPECTROSCOPY AND THE MICRO-CALORIMETRY OF POLYMER SAMPLES IMMERSED IN LOW TEMPERATURE PLASMA J. Schafer, J. Meichsner University of Greifswald (Germany)

11:50 – 12:10 TuB6

A NEW PLASMA PROCESS FOR GENERATION OF MONOFUNCTIONAL SURFACES B. Jacoby1, M. v. Gradowski1, C. Bram1, R. Foerch2, C. Oehr3, H. Hilgers1

1 IBM Deutschland GmbH E&TS EMEA, Mainz (Germany) 2 Max Planck Institute for Polymer Research, Mainz (Germany) 3 Fraunhofer Institute for Interfacial Engineering and Biotechnology, Stuttgart (Germany)

12:10 – 12:30 TuB7

SITE SPECIFIC PLASMACHEMICAL AMINO FUNCTIONALISATION OF POLYMERIC HEMOPERFUSION MEMBRANES M. Mueller1, M. Storr2, C. Oehr1 1 Fraunhofer Institute for Interfacial Engineering and Biotechnology, Stuttgart (Germany) 2 Gambro Dialysatoren GmbH & Co KG, Hechingen (Germany)

12:30 – 12:50 TuB8

PET AND PTFE MODIFICATION BY DIELECTRIC BARRIER DISCHARGE L. Aubrecht, J. Koller, H. Koshelyev, J. Pichal Department of Physics, Faculty of Electrical Engineering, Czech Technical University, Prague (Czech Republic)

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Tuesday, September 14th, 2004 Room Zugspitze

PSE 2004 10

08:30 – 9:10 Plenary Lecture P2 (see page 7, Room Richard Strauss) Oral Session TuC (morning session): Corrosion Protection, Stress Control, Adhesion Chairman: Ch. Mitterer, Leoben (Austria) 09:20 – 09:50 Keynote Lecture K6

INFLUENCE OF ION ENERGY AND SUBSTRATE TEMPERATURE DURING PRETREATMENT ON SUBSTRATE-COATING INTERFACES PREPARED BY FILTERED CATHODIC ARC EVAPORATION Arutiun P. Ehiasarian1, P. Eh. Hovsepian1, A. Anders2, I. Petrov3 1 Materials Research Institute, Sheffield Hallam University (United Kingdom) 2 Plasma Applications Group, Lawrence Berkeley National Laboratory (USA) 3 Materials Research Laboratory, University of Illinois at Urbana-Champaign (USA)

09:50 – 10:10 TuC1

STUDY OF THE MOISTURE AND THERMAL RESISTANCE OF AlN / ZrN / AlN MULTILAYERS COATING M. Del Re, R. Gouttebaron, J.P. Dauchot and M. Hecq Laboratoire de Chimie Inorganique et Analytique, Mons (Belgium)

10:10 – 10:30 TuC2

TAILORED ADHESION PROMOTING AND CORROSION RESISTANT THIN PLASMA POLYMER FILMS AT ADHESIVE/METAL INTERFACES G. Grundmeier, K. Wapner, M. Stratmann Max-Planck-Institute for Iron Research, Düsseldorf (Germany)

10:30 – 10:50 TuC3

CORRELATION BETWEEN PIII NITRIDING PARAMETERS AND CORROSION BEHAVIOUR OF AUSTENITIC STAINLESS STEELS S. Mändl1, D. Manova1, H. Neumann1, M.T. Pham2, E. Richter2, B. Rauschenbach1, 1 Leibniz-Institut für Oberflächenmodifizierung, Leipzig (Germany) 2 Institut für Ionenstrahlphysik und Materialforschung, Dresden (Germany)

10:50 – 11:10 coffee break 11:10 – 11:30 TuC4

ON THE SEMICONDUCTIVE EFFECT OF PASSIVE FILMS FORMED ON NANOMULTILAYERED TiN/CrN COATINGS DEPOSITED ONTO STEEL Christophe Mendibide, Philippe Steyer, Jean-Pierre Millet Laboratoire de Physico-Chimie Industrielle, INSA de Lyon, Villeurbanne (France)

11:30 – 11:50 TuC5

INFLUENCE OF BIAS VARIATION ON RESIDUAL STRESS AND TEXTURE IN TiAlN PVD COATINGS Helen Blomqvist, Mats Ahlgren AB Sandvik Coromant, Stockholm (Sweden)

11:50 – 12:10 TuC6

INTERFACE MODIFICATION OF SiC FIBRE – COPPER MATRIX COMPOSITES BY APPLYING A TITANIUM INTERLAYER A. Brendel1, C. Popescu1, H. Schurmann2, H. Bolt1 1 Max-Planck-Institute for Plasma Physics, EURATOM Association, Garching (Germany) 2 German Aerospace Center (DLR), Koeln (Germany)

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12:10 – 12:30 TuC7

X-RAY DIFFRACTION ANALYSIS OF THE RESIDUAL STRESS STATE IN PVD TiN/CrN MULTILAYER COATINGS DEPOSITED ON TOOL STEEL, AND ITS CORRELATION WITH WEAR RESISTANCE. C. Mendibide1, P. Steyer1, C. Esnouf2, P. Goudeau3, D. Thiaudiere4, M. Gailhanou4, J. Fontaine5

1 LPCI, INSA, Lyon (France) 2 CECM, INSA, Lyon (France) 3 LMP, University of Poitiers (France) 4 LURE, University of Paris-Sud, Orsay (France) 5 LTDS, Ecole Centrale, Lyon (France)

12:30 – 12:50 TuC8

INFLUENCE OF SPECIAL MECHANICAL PRE-TREATMENTS ON ADHESION OF DIAMOND COATINGS FOR HARDMETAL CUTTING TOOLS Friederike Deuerler 1, Volker Buck 2, Michael Pohl 3, Christian Heßing3

1 Universität Wuppertal, Fachgebiet Materialkunde, Wuppertal (Germany) 2 Universität Duisburg-Essen, AG Dünnschichttechnologie, Essen (Germany) 3 Ruhr-Universität Bochum, Institut für Werkstoffe, Bochum (Germany)

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14:15 – 14:55 Chairman: R. D' Agostino, Bari (Italy) Plenary Lecture P3

SURFACE MODIFICATION OF METALS FOR IMPLANTS TO IMPROVE BIOCOMPATIBILITY AND LONGTERM STABILITY R. Thull, W. Braun, U. Gbureck, P. Drechsler University of Würzburg (Germany)

Oral Session TuA (afternoon session): Biological and Medical Applications Chairman: Ch. Oehr, Stuttgart (Germany) 15:10 – 15:40 Keynote Lecture K7

CONTEMPORARY OPPORTUNITIES IN PLASMA SURFACE ENGINEERING OF IMPLANT DEVICES Marco Morra and Clara Cassinelli Nobil Bio Ricerche, Villafranca d’Asti (Italy)

15:40 – 16:00 TuA9

BIOMEDICAL COATINGS BASED ON DLC AND C-N F. Z. Cui, X. L. Qing Biomaterials Lab, Department of Material Science and Engineering, Tsinghua University, Beijing (China)

16:00 – 16:20 TuA10

AMINO-FUNCTIONALISED PLASMA POLYMER FILMS FOR DNA IMMOBILIZATION AND HYBRIDISATION R. Förch, Z. Zhang, W. Knoll MPI für Polymerforschung, Mainz (Germany)

16:20 – 16:40 TuA11

PLASMA-BASED ION IMPLANTATION OF RADIOISOTOPES (32P) FOR BIOMEDICAL APPLICATIONS M.A. Fortin1, B. Stansfield1, R. Paynter1, F. Marion1, A. Sarkissian2, B. Terreault1 1 INRS-ÉMT, Varennes, Québec (Canada) 2 Plasmionique Inc., Varennes, Québec (Canada)

16:40 – 17:10 coffee break 17:10 – 17:30 TuA12

IMMOBILIZATION OF RGD-CONTAINING PEPTIDES AND CARBOHYDRATES ON PLASMA-DEPOSITED ACRYLIC ACID COATINGS FOR BIOMEDICAL DEVICES L. C. Lopez1, Loredana Detomaso1, Roberto Gristina2, Riccardo d’Agostino1,2, Pietro Favia1,2 1 Department of Chemistry, University of Bari (Italy) 2 Institute of Inorg. Methodology of Plasma (IMIP) CNR (Italy)

17:30 – 17:40 TuA13

CaTiO3 FILMS SPUTTER-DEPOSITED UNDER SIMULTANEOUS Ti-ION IMPLANTATION ON Ti-SUBSTRATE K. Asami, N. Ohtsu, K. Saito and T. Hanawa* Institute for Materials Research, Tohoku University, Sendai (Japan) *Biomaterials Center, National Institute for Materials Science, Tsukuba (Japan)

17:50 – 18:10 TuA14

MICROFABRICATION OF BIOCOMPATIBLE METALLIC STENT Y. P. Kathuria Faculty of Science and Engineering, Ritsumeikan University, Kusatsu-shi (Japan)

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18:10 – 18:30 TuA15

PE-CVD OF AG/TEFLON-LIKE COATINGS ON MEDICAL-GRADE PVC TO CONTROL BACTERIAL ADHESION D.J. Balazs1, B. Strahm1, K. Triandafillu2, J.-L. Dorier3, C. Hollenstein3 and H.J. Mathieu1 1 Materials Science Department, Swiss Federal Institute of Technology, Lausanne (Switzerland) 2 Department of Environmental Science and Technology, Swiss Federal Institute of Technology, Lausanne (Switzerland) 3 Plasma Physics Research Center, Swiss Federal Institute of Technology, Lausanne (Switzerland)

18:30 – 23:00 Poster Session (Foyer and First Floor) and

Industrial and Bavarian Evening (Room Werdenfels, Foyer, Restaurant)

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14:15 – 14:55 Plenary Lecture P3 (see page 12, Room Richard Strauss) Oral Session Workshop: Successful Applications of Plasma and Ion-based Processes

organised by Arbeitskreis Plasmaoberflächentechnologie (PISE Germany), VDI Technologiezentrum GmbH (Germany) and the Society of Vacuum Coaters (SVC), (USA) The aim of the workshop is to present successful industrial applications of plasma and ion-based processes. This premises an effective transfer of these technologies from research to industry. Speakers from industrial companies will discuss specific practical use. Applications like those for the automotive industry and medical technology will be presented. Another subject are plasma-based coatings for optics i.e. interference filters. Special attention will be paid to the performance and cost benefits obtained.

Chairmen: R. Grün, Siegen (Germany) R. Shimshock, Society of Vacuum Coaters (USA)

15:10 – 15:20 Introduction

TRANSFER OF PLASMA TECHNOLOGIES FROM RESEARCH TO INDUSTRIAL APPLICATION R. Grün Plasma Technik Grün GmbH, Siegen (Germany)

15:20 – 15:40 IW1

EXPECTED DEVELOPMENTS IN AUTOMOTIVE APPLICATIONS OF COATINGS G. J. van der Kolk Bodycote PVD Coatings, Venlo (The Netherlands)

15:40 – 16:00 IW2

SYNTHESES OF MULTIFUNCIONAL LAYER SYSTEMS USING THE PACVD DUPLEX PROCESS FOR AUTOMOBILE INDUSTRY K. S. Klimek1, A. Gebauer-Teichmann2, K.-T. Rie1 1 Institut für Oberflächentechnik und Plasmatechnische Werkstoffentwicklung, Technische Universität Braunschweig (Germany) 2 Volkswagen AG Werk Kassel, Baunatal (Germany)

16:00 – 16:20 IW3

ADHESION PROMOTION ON CATHEDERS FOR LUBRICOUS COATING F. Hild PVA Tepla America Inc., Corona (USA)

16:20 – 16:40 IW4

APPLICATIONS FOR FUNCTIONALIZATION OF MICROSTRUCTURE SURFACES H. Reinecke, O. Lippold STEAG microParts GmbH, Dortmund (Germany)

16:40 – 17:10 coffee break 17:10 – 17:30 IW5

PLASMA ENHANCED COATINGS FOR OPTICAL APPLICATIONS R. Shimshock Society of Vacuum Coaters, MLD Technologies LLC, Mountain View (USA)

17:30 – 17:50 IW6

PLASMA-INDUCED DEPOSITON FOR OPTICAL INTERFERENCE FILTERS U. Schallenberg, S. Jakobs mso jena Mikroschichtoptik GmbH, Jena (Germany)

17:50 – 18:10 IW7

LINEAR PLASMA SOURCE FOR INLINE PRE-TREATMENT OF VACUUMBASED ROLL-TO-ROLL COATING Torsten Lindner, Rolf Rank* Unitec Helmsdorf GmbH, Stolpen (Germany) *Fraunhofer Institute for Electron Beam and Plasma Technology (FEP), Dresden (Germany)

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18:10 – 18:30 IW8

IN-LINE COATING OF OPTICAL SUBSTRATES S. Runkel, O. Hohn Singulus Technologies AG, Kahl/Main (Germany)

18:30 – 23:00 Poster Session (Foyer and First Floor) and

Industrial and Bavarian Evening (Room Werdenfels, Foyer, Restaurant)

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14:15 – 14:55 Plenary Lecture P3 (see page 12, Room Richard Strauss) Oral Session TuC (afternoon session): Plasma Generation, New Plasma and Ion

Sources Chairman: Y. Setsuhara, Kyoto (Japan) 15:10 – 15:40 Keynote Lecture K8

TECHNICAL PHYSICS OF THE CATHODIC VACUUM ARC EVAPORATION B. Schultrich1, J. Vetter2, O. Zimmer1, P. Siemroth3 1 Fraunhofer Institute for Material and Beam Technology (IWS), Dresden (Germany) 2 Sulzer- Metaplas Ionon GmbH, Bergisch Gladbach (Germany) 3 Arc Precision GmbH, Dresden (Germany)

15:40 – 16:00 TuC9

ION CURRENT DENSITY PROFILE CONTROL OF SCABALE BROAD BEAM SOURCES AND ITS APPLICATION H. Neumann1, F. Scholze1, M. Tartz1, S. Mändl1, M. Nestler2, R. Weller3, T. Blum4, H. Kersten5, R. Wiesee, M. Schulze6, H. Schlemm7, B. Rauschenbach1 1 IOM e.V., Leipzig (Germany) 2 Roth Rau Oberflächentechnik AG, Hohenstein Ernstthal (Germany) 3 SenVac GmbH, Friedberg (Germany) 4 OSTEC Oberflächen-und Schichttechnologie GmbH, Meißen (Germany) 5 INP e.V., Greifswald (Germany) 6 AIS Automation GmbH, Dresden (Germany) 7 JENION, Jena (Germany)

16:00 – 16:20 TuC10

ENHANCED SURFACE-WAVE PROPAGATION ALONG A CORRUGATED PLASMA-DIELECTRIC INTERFACE Ivan P. Ganachev1, Yasuhiro Nojiri2 and Hideo Sugai2 1 Shibaura Mechatronics Corporation (Japan) 2 Nagoya University (Japan)

16:20 – 16:40 TuC11

POWER FLOW IN A MICROWAVE DISCHARGE FOR OPTICAL FIBER PREFORM PCVD: PLASMA CHARACTERIZATION D. Korzec, S. Kytzia, J. Engemann Microstructure Research Centre-fmt, University of Wuppertal (Germany)

16:40 – 17:10 coffee break 17:10 – 17:30 TuC12

INTERNAL OSCILLATING CURRENT-SUSTAINED RF PLASMAS: PARAMETERS, STABILITY, AND POTENTIAL FOR SURFACE ENGINEERING K. Ostrikov1,2, E. Tsakadze3, Z. Tsakadze1 and S. Xu1

1 Plasma Sources and Applications Center, NIE, Nanyang Technological University, Singapore (Singapore) 2 School of Physics, The University of Sydney (Australia) 3 RISOE National Laboratory, Roskilde (Denmark)

17:30 – 17:50 TuC13

INFLUENCE OF EFFECT OF PLASMA “SHIELDING” BY SOLID SURFACE AT LASER IRRADIATION M.R. Bedilov, R.M. Bedilov, E.N. Tajihanov, A.R. Matnazarov Research Institute of Applied Physics, Tashkent (Uzbekistan)

17:50 – 18:10 TuC14

EFFECTIVE SEPARATOR FOR EXTRACTION OF HEAVY DROPS FROM PLASMA FLOW V.I. Maslov, I.I. Aksenov, S.V. Barchuk, A.M. Egorov, D.Yu. Frolova*, N.M. Maslova, I.N. Onishchenko NSC Kharkov Institute of Physics and Technology, Kharkov (Ukraine) *Karazin Kharkov National University, Kharkov (Ukraine)

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18:10 – 18:30 TuC15

PRODUCTION OF ION BEAM BY 1064, 532, 355 AND 266 NM LASER–INDUCED SURFACE ELEMENT UNDER APPLIED ELECTRIC FIELD Ahmed Asaad I. Khalil Laser Applications in Industry, Communications and Fiber optics department, National Institute of Laser Enhanced Science (NILES), Cairo University, Giza (Egypt)

18:30 – 23:00 Poster Session (Foyer and First Floor) and

Industrial and Bavarian Evening (Room Werdenfels, Foyer, Restaurant)

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08:30 – 9:10 Chairman: A. Matthews, Sheffield (United Kingdom) Plenary Lecture P4

PLASMA SIMULATION OF MAGNETRON SPUTTERING Eiji Shidoji, Takahiro Mashimo Asahi Glass co., ltd., Research Center, Yokohama (Japan)

Oral Session WeA (morning session): Thin Film and Surface Characterization and

Analysis Chairman: V. Rigato, Legnaro (Italy) 09:20 – 09:50 Keynote Lecture K9

ELECTRON MICROSCOPY: DOES IT SOLVE MATERIALS PROBLEMS OF NANO-STRUCTURED COATINGS? Jeff Th.M. De Hosson, Nuno J.M. Carvalho, Yutao Pei, Damiano Galvan Department of Applied Physics, Materials Science Center and Netherlands Institute for Metals Research, University of Groningen (The Netherlands)

09:50 – 10:10 WeA1

LATERAL FORCE-DISPLACEMENT MEASUREMENTS - A NEW TECHNIQUE FOR THE INVESTIGATION OF MECHANICAL SURFACE PROPERTIES T. Chudoba1, M. Karniychuk2, F. Richter2 1 ASMEC GmbH, Radeberg (Germany) 2 Technische Universität Chemnitz, Institut für Physik, Chemnitz (Germany)

10:10 – 10:30 WeA2

STRUCTURAL AND MECHANICAL PROPERTIES OF PVD TiAlCrN COATINGS DEDICATED TO HIGH SPEED MACHINING A.S. Dehlinger1, F. Lapostolle1, J. von Stebut2, D. Mercs1, C. Coddet1

1 Laboratoire d'Etudes et de Recherche sur les Matériaux, les Procédés et les Surfaces (LERMPS) / Université de Technologie de Belfort – Montbéliard (UTBM) BELFORT Cedex (France) 2 Laboratoire de Science et Génie des Surfaces, Nancy (France)

10:30 – 10:50 WeA3

PROPERTIES OF REACTIVELY SPUTTERED W-Si-N FILMS J. Musil1,2, R. Daniel1, J. Soldán1, P. Dub1, K. Fadenberger3, G. Hawranek3, P. H. Mayrhofer3 1 Department of Physics, University of West Bohemia, Plzen (Czech Republic) 2 Institute of Physics, The Academy of Sciences of the Czech Republic, Praha (Czech Republic) 3 Department of Physical Metallurgy and Materials Testing, University of Leoben (Austria)

10:50 – 11:10 coffee break 11:10 – 11:30 WeA4

ON THE EVALUATION OF STRESSES FOR COATED MATERIALS DURING NANOINDENTATION WITH SHARP INDENTERS N. Schwarzer1, T. Chudoba2, G. M. Pharr3 1 Technical University of Chemnitz, Institute of Physics, Chemnitz (Germany) 2 Advanced Surface Mechanics (ASMEC), Rossendorf (Germany) 3 University of Tennessee and Oak Ridge National Laboratory, Department of Materials Science and Engineering, Knoxville (USA)

11:30 – 11:50 WeA5

KINETICS OF THE THIN FILMS TRANSFORMATION Ti/Al MULTILAYER → ?-TiAl A. S. Ramos1, M. T. Vieira1, M. F. Vieira2 1 ICEMS, Departamento de Engenharia Mecânica, Faculdade de Ciências e Tecnologia, Universidade de Coimbra (Portugal) 2 GMM/IMAT, Departamento de Engenharia Metalúrgica, Faculdade de Engenharia, Universidade do Porto (Portugal)

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11:50 – 12:10 WeA6

STRUCTURAL AND OPTICAL INVESTIGATIONS OF SiOXNY THIN FILMS DEPOSITED BY R.F. SPUTTERING F. Rebib1, E. Tomasella1, M. Dubois1, J. Cellier1, T. Sauvage2, M. Jacquet1. 1 Laboratoire des Matériaux Inorganiques, UMR CNRS 6002, Université Clermont-Ferrand (Blaise Pascal), Aubière (France) 2 CERI-CNRS, Orléans (France)

12:10 – 12:30 WeA7

STRUCTURE AND PROPERTIES OF HYBRID COATINGS A.D. Pogrebnjak1, Yu.N. Tyurin2, D.L. Alontseva3, Sh.M. Ruzimov4, V.V. Ponaryadov3, V.V. Vasilyuk1, Yu.A. Kravchenko1 1 Sumy Institute for Surface Modification, Sumy (Ukraine) 2 O.E.Paton Electric Welding Institute, NAS of Ukraine, Kiev (Ukraine) 3 Belarus State University, Minsk (Belarus) 4 National University of Uzbekistan, Tashkent (Uzbekistan)

12:30 – 12:50 WeA8

PHYSICAL AND MECHANICAL PROPERTY EVOLUTION IN ZrNxOy THIN FILMS AS A FUNCTION OF THERMAL TREATMENTS F. Vaz1, L. Rebouta1, P. Carvalho1, L. Cunha2, E. Alves3, Ph. Goudeau4, J. P. Rivière4 1 Universidade do Minho, Dept. Física, Azurém, Guimarães (Portugal)

2 Universidade do Minho, Dept. Física, Gualtar, Braga (Portugal) 3 ITN, Departamento de Física, E.N.10, Sacavém (Portugal) 4 Laboratoire de Métallurgie Physique, Université de Poitiers, Futuroscope (France)

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08:30 – 9:10 Plenary Lecture P4 (see page 18, Room Richard-Strauss) Oral Session WeB (morning session): PVD II, Ion Beam and Plasma Immersion

Techniques Chairman: V. Magula; Bratislava (Slovakia) 09:20 – 09:50 Keynote Lecture K10

ANNEALING-RELATED PHENOMENA IN HARD COATINGS P.H. Mayrhofer, C. Löcker, C. Mitterer Department of Physical Metallurgy and Materials Testing, University of Leoben (Austria)

09:50 – 10:10 WeB1

ADVANCEMENT IN LOWMELTING SOLDER DEPOSITION BY PULSED MAGNETRON SPUTTER-PVD-PROCESS FOR MICROSYSTEMTECHNOLOGY K. Bobzin, E. Lugscheider, A. Erdle Materials Science Institute, RWTH Aachen (Germany)

10:10 – 10:30 WeB2

INCREASING THE DEPOSITION RATE OF OXIDES FILMS BY INCREASING THE PLASMA REACTIVITY R. Snyders*, R. Gouttebaron, J.P. Dauchot and M. Hecq Laboratoire de Chimie Inorganique et Analytique, Université de Mons-Hainaut, Bâtiment Materia Nova, Mons (Belgium)

10:30 – 10:50 WeB3

VANADIUM NITRIDE COATINGS PRODUCED USING PLASMA ASSISTED E-BEAM PVD Nils Stavlid, Urban Wiklund Department of Materials Science, Uppsala University (Sweden)

10:50 – 11:10 coffee break 11:10 – 11:30 WeB4

STUDIES OF THE TEMPORAL BEHAVIOUR OF A PULSED MAGNETRON DEPOSITION DISCHARGE Thomas Welzel, Thoralf Dunger, Stefan Welzel, Hartmut Kupfer, Frank Richter Technische Universität Chemnitz, Institut für Physik, Chemnitz (Germany)

11:30 – 11:50 WeB5

TRIBOLOGICAL IMPROVEMENTS OF ION IMPLANTED TECHNOLOGICAL ALLOYS: PI3 VERSUS CONVENTIONAL ION IMPLANTATION J.A. García, R. Martínez, R.J. Rodríguez, B. Lerga, A. Medrano AIN Centro de Ingeniería Avanzada de Superficies, Cordovilla – Pamplona (Spain)

11:50 – 12:10 WeB6

PROSPECTS OF COMBINED TECHNOLOGIES ON THE BASIS OF PLASMA - ION DEPOSITION, ION IMPLANTATION, ION ALLOYING, AND LASER STRENGTHENING G.I. Kostyuk, ?.?. Voliak National Airspace University, Kharkov (Ukraine)

12:10 – 12:30 WeB7

DEVELOPMENT OF Ti BASED COATINGS USING PLASMA IMMERSION ION IMPLANTATION ASSISTED DEPOSITION S. Mukherjee1, F. Prokert2, E. Richter2, W. Möller2 1 FCIPT, Institute for Plasma Research, Gandhinagar (India) 2 FWII, Forschungszentrum Rossendorf, Dresden (Germany)

12:30 – 12:50 WeB8

METAL PLASMA IMMERSION ION IMPLANTATION & DEPOSITION METAL PLASMA IMMERSION ION IMPLANTATION & DEPOSITION (MPIII&D) USING A METAL PLASMA SOURCERonghua Wei, Tom Booker, Chris Rincon, Jim ArpsSouthwest Research Institute, San Antonio, Texas (USA)

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08:30 – 9:10 Plenary Lecture P4 (see page 18, Room Richard Strauss) Oral Session WeC (morning session): Plasma Diffusion Treatment, Thermal Spraying Chairmen: M. Remy, Nancy (France)

R. Suchentrunk, Egmating (Germany) 09:20 – 09:50 Keynote Lecture K11

SURFACE MODIFICATION OF ALUMINUM USING ION NITRIDING AND BARREL NITRIDING M. Okumiya1, Y. Tsunekawa1, H. Sugiyama2, Y. Tanaka2, N. Takano2, M. Tomimoto2 1 Toyota Technological Institute, Nagoya (Japan) 2 Student of Toyota Technological Institute, Nagoya (Japan)

09:50 – 10:10 WeC1

NEW PATHWAYS IN PLASMA NITRIDING METAL ALLOYS C. A. Figueroa, and F. Alvarez Instituto de Física “Gleb Wataghin”, Unicamp, Campinas (Brazil)

10:10 – 10:30 WeC2

RF PLASMA NITRIDING OF IRON-BASED ALLOYS PRE-TREATED BY SHOT PEENING Hans Ferkel and Lothar Wagner Institut für Werkstoffkunde und Werkstofftechnik der TU Clausthal, Clausthal-Zellerfeld (Germany)

10:30 – 10:50 WeC3

ASSESSMENT OF THE APPLICATION POTENTIAL OF THE INTENSIFIED GLOW DISCHARGE FOR INDUSTRIAL PLASMA NITRIDING OF TI-6Al-4V N. Kashaev, H.-R. Stock, P. Mayr Foundation Institute for Materials Science, Bremen (Germany)

10:50 – 11:10 coffee break 11:10 – 11:30 WeC4

PULSE PLASMA TREATMENT OF ALUMINIUM ALLOY EXTRUSION DIES M. Zlatnovic1, V. Zlatanovic2

1 Faculty of Electrical Engineering, Belgrade (Serbia) 2 Batalab, Belgrade (Serbia)

11:30 – 11:50 WeC5

SURFACE MATERIAL DESIGN OF 316 STAINLESS STEEL BY COMBINATION OF LOW TEMPERATURE PLASMA CARBURIZING AND NITRIDING M. Tsujikawa, Daisuke Yoshida, Naohiko Yamauchi, Nobuhiro Ueda, Takumi Sone, Shinichi Tanaka Osaka Prefecture University (Japan)

11:50 – 12:10 WeC6

IN SITU FORMATION OF Al-Si-Mg BASED COMPOSITE COATING BY DIFFERENT REACTIVE THERMAL SPRAY PROCESSES I Ozdemir1,2, I. Hamanaka1, M. Hirose1, Y. Tsunekawa1 and M. Okumiya1

1 Toyota Technological Institute, Nagoya (Japan) 2 Dokuz Eylul Univ. Faculty of Eng. Dept. of Metallurgical and Materials Eng. Izmir (Turkey)

12:10 – 12:30 WeC7

SURFACE PROTECTION OF LIGHT ALLOYS BY LASER ASSISTED ATMOSPHERIC PLASMA SPRAYING (LAAPS) Steffen Nowotny, Roman Zieris, Eckhard Beyer Fraunhofer-Institut für Werkstoff- und Strahltechnik, Dresden (Germany)

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12:30 – 12:50 WeC8

CORROSION PERFORMANCE OF CAST IRON THERMAL SPRAY COATINGS ON AL ALLOY FOR AUTOMOTIVE COMPONENTS S.H. Ahn1, H.G. Kim1, J.G. Kim1, Ismail Ozdemir2,3, Y. Tsunekawa2

1 Department of Advanced Materials Engineering, Sungkyunkwan University Suwon (Korea) 2 Material Processing Lab, Toyota Technological Institute, Nagoya (Japan) 3 Dokuz Eylul Univ. Dept. of Metallurgical and Materials Eng., Bornova-Izmir (Turkey)

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14:15 – 14:55 Chairman: J. Musil, Plzen (Czech Republic) Plenary Lecture P5

NANO-SCALE, MULTI-FUNCTIONAL COATINGS IN THE MATERIAL SYSTEM B-C-N-H S. Ulrich Forschungszentrum Karlsruhe, Institut für Materialforschung I, Karlsruhe (Germany)

15:10 – 16:40 Poster Session (Foyer and First Floor) Oral Session WeA (afternoon session): Thin Film and Surface Characterization II Chairman: J. Th.M. De Hosson, Groningen (The Netherlands) 16:40 – 17:10 Keynote Lecture K12

BONDING STRUCTURE OF FULLERENE-LIKE CARBON NITRIDE THIN FILMS R. Gago1, I. Jiménez2, M. Vinnichenko1, J. Neidhardt3, L. Hultman3, W. Möller1 1 Forschungszentrum Rossendorf, Dresden (Germany) 2 ICTP-Consejo Superior de Investigaciones Científicas, Madrid (Spain) 3 Linköping University, Linköping (Sweden)

17:10 – 17:30 WeA9

TOF-SIMS ANALYSIS OF ULTRA-THIN PLASMA POLYMER FILMS BY MEANS OF MULTIVARIATE TECHNIQUES M. v. Gradowski1, M. Wahl2, B. Jacoby1, H. Hilgers1 1 IBM Engineering & Technology Services (E&TS) EMEA Laboratory, Mainz (Germany) 2 Institut für Oberflächen und Schichtanalytik IFOS GmbH, Kaiserlautern (Germany)

17:30 – 17:50 WeA10

PHASE TRANSITION IN TUNGSTEN CARBIDE FILMS ANALYZED WITH BRILLOUIN LIGHT SCATTERING SPECTROSCOPY T. Wittkowski, G. Distler, K. Jung, B. Hillebrands, J.D. Comins* Fachbereich Physik and Forschungsschwerpunkt MINAS, Technische Universität Kaiserslautern (Germany) *Material Physics Research Institute, School of Physics, University of the Witwatersrand, Johannesburg (South Africa)

17:50 – 18:10 WeA11

EFFECT OF THERMAL ANNEALING ON PHASE TRANSITION AND MICRO-HARDNESS OF TixCryAlzN FILMS Tomonari Yamamoto1, Hiroyuki Hasegawa1, Kenji Yamamoto2 and Tetsuya Suzuki1 1 Center for Materials Science, Keio University, Hiyoshi, Kohoku-ku, Yokohama (Japan) 2 Materials Research Laboratory, Kobe Steel Ltd, Kobe, Hyogo (Japan)

18:10 – 18:30 WeA12

CHARACTERIZATION OF NANOSTRUCTURED Zr(O, C) / Cu / a-C:H COATINGS: CORRELATION OF THE MECHANICAL PROPERTIES WITH THE FILM STRUCTURE S. Lang1, T. Beck1, V. Briancon1, U. May1, A. Schattke1, A. Dinia2

1 Robert Bosch GmbH, Stuttgart (Germany) 2 Institut de Physique et Chimie des Matériaux de Strasbourg (France)

18:30 – 18:50 WeA13

GROWTH MECHANISM OF SiOx FILMS DEPOSITED ON PARTICLES BY PECVD B. Borer, Ph. Rudolf von Rohr Institute of process engineering, ETH Zurich (Switzerland)

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14:15 – 14:55 Plenary Lecture P5 (see page 23, Room Richard-Strauss) 15:10 – 16:40 Poster Session (Foyer and First Floor) Oral Session WeB (afternoon session):

Superhard Coatings, Low Friction Coatings, Nano Structures Chairman: J.-J. Lee, Seoul (Korea) 16:40 – 17:10 Keynote Lecture K13

BORON-BASED HARD COATINGS – STATE OF THE ART K. Bewilogua, M. Keunecke Fraunhofer-Institut für Schicht- und Oberflächentechnik, Braunschweig (Germany)

17:10 – 17:30 WeB9

THE INFLUENCE OF ALLOYING ELEMENTS ON THE PHASE STABILITY AND MECHANICAL PROPERTIES OF AlCrN COATINGS Jose L. Endrino, Volker Derflinger Balzers AG, General Coatings, Balzers (Liechtenstein)

17:30 – 17:50 WeB10

NEW MULTIFUNCTIONAL PVD-HARDCOATING FOR STEEL SHEET FORMING P. Pesch1, S. Sattel1, S. Woestmann2, S. Ulrich3 1 TZO GmbH, Rheinbreitbach (Germany) 2 TKS AG, Dortmund (Germany) 3 Forschungszentrum Karlsruhe, Institut für Materialforschung I (Germany)

17:50 – 18:10 WeB11

LASER ELECTRODISPERSION OF SOLIDS – A NOVEL METHOD OF MONODISPERSE NANOSTRUCTURE FABRICATION V.M. Kozhevin, D.A. Yavsin, S.A. Gurevich A.F. Ioffe Physico-Technical Institute, Russian Academy of Sciences, St. Petersburg (Russia)

18:10 – 18:30 WeB12

SINGLE CHAMBER PVD/PECVD PROCESS FOR CARBON NANOTUBES GROWTH T.M. Minea, S. Point, C. Godon, A. Gohier, A. Granier, F. Alvarez* LPCM- IMN, Universite de Nantes, CNRS – UMR, Nantes Cedex (France) *Instituto de Física "Gleb Wataghin", Universidade Estadual de Campinas, Unicamp, São Paulo (Brazil)

18:30 – 18:50 WeB13

STRUCTURE-PROPERTY RELATIONS IN CrC/a-C:H COATINGS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING G. Gassner1, P.H. Mayrhofer1, C. Mitterer1, J. Kiefer2

1 Department of Physical Metallurgy and Materials Testing, University of Leoben (Austria) 2 TCE Technical Coatings Engineering GmbH, Kapfenberg (Austria)

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14:15 – 14:55 Plenary Lecture P5 (see page 23, Room Richard-Strauss) 15:10 – 16:40 Poster Session (Foyer and First Floor) Workshop Thin Film Quality – Standardisation of Test Methods & Supporting

Measures organised by BAM (Germany), NPL (UK), VITO (Belgium) and CEN/TC 184/WG5 The purpose of this workshop is to review recent activity in the field of standardisation of test methods for characterising thin film coatings and to provide an update on the situation since the previous workshop on the subject, held at PSE 2000. In a series of short presentations the workshop will review the activity at the international (CEN and ISO), National (AFNOR, BSI, DIN, etc) and industry (e.g. VDI) level. Presentations will cover different aspects of the standardisation process – prenormative research, the development of written standards and the preparation of standards support measures, such as certified reference materials. The workshop will conclude with an expert panel discussion on the standardisation needs of industry and how these can be addressed by future standards projects.

Chairmen:

P. Hatto, Convenor of CEN/TC 184/WG5, Durham (UK) M. Griepentrog, Berlin (Germany)

16:00 – 16:10 Introduction

OPENING OF THE WORKSHOP AND OVERVIEW OF INTERNATIONAL STANDARDISATION ACTIVITIES FOR THIN FILMS Peter Hatto Convenor of CEN/TC 184/WG5, IonBond Ltd. Durham (United Kingdom)

16:10 – 16:30 SW1

PREPARATION, CHARACTERISATION AND CERTIFICATION OF REFERENCE COATINGS FOR SURFACE AND THIN FILM TECHNOLOGY: BAM CERTIFIED REFERENCE MATERIALS Uwe Beck, Michael Griepentrog, Alexander Dück, Mathias Procop, Wolfgang Österle Bundesanstalt für Materialforschung und –prüfung, Berlin (Germany)

16:30 – 16:50 SW2

A CERTIFIED REFERENCE MATERIAL AND ITS USE FOR EVALUATING THE PERFORMANCE OF SCRATCH TESTERS Jan Meneve Flemish Institute for Technical Research VITO, Mol (Belgium)

16:50 – 17:10 SW3

DEVELOPMENT OF CERTIFIED REFERENCE MATERIALS FOR DEPTH SENSING INDENTATION TESTING Nigel Jennett National Physical Laboratory (NPL), Teddington (United Kingdom)

17:10 – 17:30 SW4

USING THE ROCKWELL INDENTATION TECHNIQUE FOR EVALUATING THE ADHESION OF THIN COATINGS Kris De Bruyn Wetenschappelijk en Technisch Centrum van de Metaalverwerkende Nijverheid WTCM Diepenbeck (Belgium)

17:30 – 17:50 SW5

MULTI-MODE SCRATCH TESTING – A EUROPEAN STANDARDS, MEASUREMENTS AND TESTING STUDY Jürgen von Stebut Ecoles des Mines Nancy (France)

17:50 – 18:10 SW6

ON THE EVALUATION OF THIN FILM DUCTILITY Albano Cavaleiro University of Coimbra (Portugal)

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18:10 – 18:30 SW7

MICROSCALE ABRASION TESTING OF COATINGS Mark Gee National Physical Laboratory (NPL), Teddington (United Kingdom)

18:30 – 18:50 Discussion

ROUND TABLE DISCUSSION ON ASPECTS OF STANDARDISATION OF TEST METHODS FOR COATINGS AND NEEDS FOR NEW ACTIVITIES IN THE AREA

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08:30 – 9:10 Chairman: O. Takai, Nagoya (Japan) Plenary Lecture P6

THE USE OF HIGH POWER PULSED MAGNETRON SPUTTERING FOR THE REACTIVE DEPOSITION OF OXIDE FILMS W. D. Sproul, D. J. Christie, D. C. Carter, and F. G. Tomasel Advanced Energy Industries, Inc., Fort Collins (USA)

Oral Session ThA (morning session): Carbon Coatings I Chairman: D. Cameron, Dublin (Ireland) 09:20 – 09:50 Keynote Lecture K14

A NANOSCALE APPROACH FOR THE CHARACTERIZATION OF AMORPHOUS CARBON-BASED LUBRICANT COATINGS J.C. Sánchez-López, D. Martínez-Martínez, C. Fernández-Ramos, A. Fernández Instituto de Ciencia de Materiales de Sevilla, centro mixto CSIC-Univ. Sevilla (Spain)

09:50 – 10:10 ThA1

PROPERTIES OF DLC THIN FILMS PRODUCED BY RF PE-CVD FROM PYRROLE MONOMER O.Takai1,3, V. Anita1,2 and N. Saito3

1 Center for Integrated Research in Science and Engineering, Nagoya University (Japan) 2 “AL.I.Cuza” University, Dep. of Plasma Physics, Iasi (Romania) 3 Department of Material Engineering Processing, Graduate School of Engineering, Nagoya University (Japan)

10:10 – 10:30 ThA2

RAMAN SPECTROSCOPY STUDY OF C/Cr COATINGS DEPOSITED BY THE COMBINED STEERED CATHODIC ARC/UNBALANCED MAGNETRON SPUTTERING TECHNIQUE Y. N. Kok1, P. Eh. Hovsepian1, J. G. Wen2, I. Petrov2 1 Materials Research Institute, Sheffield Hallam University (UK) 2 Materials Science Department and Frederick Seitz Materials Research Laboratory, University of Illinois, Urbana, (USA)

10:30 – 10:50 ThA3

DIAMOND-LIKE CARBON FILMS AS COATINGS FOR A REDUCED SURFACE ADSORPTIVITY OF IMPURITIES U. Müller1, R. Hauert1, P. Gröning2, J. Gobrecht3, C. Kleinlogel4 1 EMPA Dübendorf - Abt.125, Dübendorf (Switzerland) 2 EMPA Thun - Abt.126, Thun (Switzerland) 3 Laboratory for Micro- and Nanotechnology, Paul Scherrer Institute (PSI), Villigen (Switzerland) 4 Sensirion AG, Zürich (Switzerland)

10:50 – 11:10 coffee break 11:10 – 11:30 ThA4

PULSED LASER DEPOSITION OF SUPERHARD AMORPHOUS CARBON FILMS WITH LOW INTERNAL STRESS Steffen Weißmantel, Günter Reiße, Dirk Rost Hochschule Mittweida, University of Applied Sciences (Germany)

11:30 – 11:50 ThA5

ULTRA HYDROPHOBIC WETTING BEHAVIOUR OF AMORPHOUS CARBON FILMS H. Schulz, M. Leonhardt(*), H.-J. Scheibe(*), B. Schultrich Fraunhofer-Institut für Werkstoff- und Strahltechnik, Dresden (Germany) (*) Fraunhofer USA, Center for Coatings and Laser Applications, Michigan State University, East Lansing (USA)

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11:50 – 12:10 ThA6

INFLUENCE OF DIFFERENT INTERLAYERS AND BIAS VOLTAGE ON THE PROPERTIES OF A-C:H COATINGS PREPARED BY REACTIVE DC MAGNETRON SPUTTERING M. Weber, K. Bewilogua, H. Thomsen, R. Wittorf, M. Keunecke Fraunhofer Institute for Surface Engineering and Thin Films, Braunschweig, (Germany)

12:10 – 12:30 ThA7

IMPACT OF A TaC:C LOW-FRICTION COATING ON TOOL LIFE WHEN THREAD ROLLING SILICON-CONTAINING CAST ALUMINIUM D. Nilsson1, M. Larsson2, U. Wiklund1, S. Hogmark1 1 Dept. of Materials Science, The Ångström Laboratory, Uppsala University (Sweden) 2 Balzers Sandvik Coating AB, Stockholm (Sweden)

12:30 – 12:50 ThA8

CHARACTERIZATION OF INTERFACES IN STEPWISE GRADED DLC FILMS BY NANOINDENTATION AND FFM C. Ziebert, M. Stüber, S. Ulrich, H. Holleck Forschungszentrum Karlsruhe, Institut für Materialforschung I (Germany)

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08:30 – 9:10 Plenary Lecture P6 (see page 27, Room Richard-Strauss) Oral Session ThB (morning session): Atmospheric Pressure Processes Chairman: L. Bardos, Uppsala (Sweden) 09:20 – 09:50 Keynote Lecture K15

ATMOSPHERIC GLOW STABILIZATION. DO WE NEED PRE-IONIZATION ? E. Aldea, H. de Vries*, P.Peeters , M.C.M van de Sanden Eindhoven University of Technology, Dept. of Applied Physics (The Netherlands)

09:50 – 10:10 ThB1

NON THERMAL PLASMAS AS STERILISATION AND COATING TECHNIQUE Christian Schrader1, Phillip Sichler2, Lutz Baars-Hiibbe1, Karl-Heinz Gericke1, Stephanus Büttgenbach2 1 Institut für Physikalische und Theoretische Chemie,, Technische Universität Braunschweig (Germany) 2 Institut für Mikrotechnik,, Technische Universität Braunschweig (Germany)

10:10 – 10:30 ThB2

PLASMA ENHANCED CVD AT ATMOSPHERIC PRESSURE FOR WIDE AREA COATING ON TEMPERATURE SENSITIVE MATERIALS Ines Dani, Volkmar Hopfe, Daniela Rogler, Liliana Roch, Gerrit Mäder Fraunhofer Institute Material and Beam Technology, IWS, Dresden (Germany)

10:30 – 10:50 ThB3

THE EFFECT OF PLASMA GAS MIXTURES ON THE ATMOSPHERIC PRESSURE GLOW-DISCHARGE DEPOSITION OF THIN FILM MATERIALS Martin J. Davis, David W. Sheel, Martyn E. Pemble Institute for Materials Research, University of Salford (United Kingdom)

10:50 – 11:10 coffee break 11:10 – 11:30 ThB4

SURFACE MODIFICATION OF PET FILM BY A DBD DEVICE AT ATMOSPHERIC PRESSURE P. Esena1,C. Riccardi1, S. Zanini1, M. Tontini1, Poletti2, F. Orsini2

1 Dipartimento di Fisica G. Occhialini, Università degli Studi di Milano-Bicocca, Milano (Italy) 2 Istituto di fisiologia generale e chimica biologica, Università degli Studidi Milano (Italy)

11:30 – 11:50 ThB5

PLASMA TREATMENT ON FINGER AND TOE NAILS PRIOR TO COATING WITH A VARNISH C. Kaemling, S. von Nostitz-Wallwitz, A. Kaemling, W. Viöl University of Applied Sciences and Arts, Department of Science and Technology, Göttingen (Germany)

11:50 – 12:10 ThB6

PLASMA POLYMERISATION OF HYBRID ORGANIC-INORGANIC MONOMERS IN AN ATMOSPHERIC PRESSURE DIELECTRIC BARRIER DISCHARGE Sabine Paulussen, Robby Rego, Olivier Goossens, Dirk Vangeneugden VITO - Flemish Institute for Technological Research, Mol (Belgium)

12:10 – 12:30 ThB7

PATTERNED DBD TREATMENT FOR AREA-SELECTIVE METALLIZATION OF POLYMERS - PLASMA PRINTING S. Kreitz, C. Geßner, C. Penache, C.-P. Klages Fraunhofer Institute for Surface Engineering and Thin Films (IST), Braunschweig (Germany)

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12:30 – 12:50 ThB8

STRUCTURAL EVOLUTION OF ALUMINA COATING DURING PLASMA ELECTROLYTIC OXIDATION OF AL IN ALKALINE SOLUTIONS A.L. Yerokhin1, T. Pilkington1, M. Moncus2, L.O. Snizhko3, A. Leyland1, M. Baker2 and A. Matthews1 1 Department of Engineering Materials, University of Sheffield (United Kingdom) 2 University of Surrey, Guildford (United Kingdom) 3 State University of Chemical Technology, Dnepropetrovsk (Ukraine)

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08:30 – 9:10 Plenary Lecture P6 (see page 27, Room Richard-Strauss) Oral Session ThC (morning session): High Rate Deposition, Pulsed Plasmas Chairman: J. Bradley, Manchester (United Kingdom) 09:20 – 09:50 Keynote Lecture K16

POSSIBILITIES AND CHALLENGES ASSOCIATED WITH HIGH POWER PULSED MAGNETRON SPUTTERING Ulf Helmersson, Jones Alami, Johan Bohlmark, Martina Lattemann and Arutiun P. Ehiasarian* Department of Physics, Linköping University (Sweden) *Materials Research Institute, Sheffield Hallam University (United Kingdom)

09:50 – 10:10 ThC1

REACTIVE LASER PLASMA COATING FORMATION P. Schaaf, M. Kahle, E. Carpene Universität Göttingen, Zweites Physikalisches Institut (Germany)

10:10 – 10:30 ThC2

DC TPCVD SYNTHESIS OF THE COATINGS FROM LIQUID SINGLE SOURCE Si-B-C-N AND Si-C-N-Ti PRECURSORS Johannes Wilden1, Andreas Wank2, Alena Bykava2 1 Institute of Production Engineering, Ilmenau Technical University (Germany) 2 Institute of Composite Materials, Chemnitz University of Technology (Germany)

10:30 – 10:50 ThC3

DEPOSITION OF TiXAl1-XN USING BIPOLAR PULSED DUAL MAGNETRON SPUTTERING M. Åstrand, T. I. Selinder and M. E. Sjöstrand AB Sandvik Coromant, Stockholm (Sweden)

10:50 – 11:10 coffee break 11:10 – 11:30 ThC4

TIME DEVELOPMENT OF PLASMA PARAMETERS IN PULSED MAGNETRON PLASMA H. Bäcker1 and J.W. Bradley2 1 Off Line Coatings, Pilkington, Lathom/Ormskirk (United Kingdom) 2 UMIST, Department of Physics, Manchester (United Kingdom)

11:30 – 11:50 ThC5

ANOMALOUS BEHAVIOR OF A HIGH POWER PULSED MAGNETRON PLASMA V. Kouznetsov1, J. R. Drake2, N. Brenning2, I. Axnäs2, L. Hultman3, U. Helmersson3 1 Chemfilt R&D AB c/o Royal Institute of Technology, Alfven Laboratory, Stockholm (Sweden) 2 Alfven Laboratory, Royal Institute of Technology, Stockholm (Sweden) 3 Thin Film Physics Division, Department of Physics, Linköping University (Sweden)

11:50 – 12:10 ThC6

TIME-RESOLVED DIAGNOSTICS OF HIGH-POWER PULSED DC MAGNETRON DISCHARGES FOR IONIZED HIGH-RATE SPUTTERING OF METALLIC FILMS J. Vlcek, A.D. Pajdarova, P. Belsky, M. Kormunda, S. Potocky, J. Musil Department of Physics, University of West Bohemia, Plzen (Czech Republic)

12:10 – 12:30 ThC7

HIGH QUALITY FILMS ON COMPLEX SHAPED SUBSTRATES WITH IONISED PVD J. Alami, P.Å.O. Persson, J. Böhlmark, U. Helmersson IFM, Linköping University (Sweden)

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12:30 – 12:50 ThC8

HIGH POWERED PULSED MAGNETRON SPUTTERING OF METALLIC FILMS IN AR, NE, AND HE PLASMAS S.L. Rohde, J. Li; D.M. Mihut Dept. of Mechanical Engineering, Lincoln (USA)

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Chairman: M. R. Wertheimer, Montréal (Canada) 14:15 – 14:55 Plenary Lecture P7

PROCESSING OF POLYMERS BY PLASMA TECHNOLOGIES F. Arefi-Khonsari, M. Tatoulian, F. Bretagnol, R. Jafari, W. Morscheidt Laboratoire de Genie des Procedes Plasmas et Traitement de Surface, ENSCP, Paris (France)

15:10 – 16:40 Poster Session (Foyer and First Floor) Oral Session ThA (afternoon session): Carbon Coatings II Chairman: H. Biederman, Prague (Czech Republic) 16:40 – 17:10 Keynote Lecture K17

CARBON COATING SELECTION FOR INDUSTRIAL APPLICATIONS J. Vetter1, J. Brand2, O. Kayser1, P. Siemroth3 1 Sulzer-Metaplas Ionon GmbH, Bergisch Gladbach (Germany) 2 FhG-IST Braunschweig, Braunschweig (Germany) 3 Arc Precision GmbH, Dresden (Germany)

17:10 – 17:30 ThA9

SUPERHARD AMORPHOUS CARBON FILMS FROM 1 nm TO 100 µm THICKNESS: PROPERTIES AND APPLICATION B. Schultrich1, V. Weihnacht1, H. Schulz1, P. Siemroth2, H.-J. Scheibe3 1 Fraunhofer-Institut für Werkstoff- und Strahltechnik, Dresden (Germany) 2 Arc Precision GmbH; Dresden (Germany) 3 Fraunhofer USA, Center for Coatings and Laser Applications, Michigan State University (USA)

17:30 – 17:50 ThA10

BIOCOMPATIBILITY OF DIAMOND Katarzyna Bakowicz, Stanislaw Mitura

Biomedical Engineering Division, Institute of Materials Science & Engineering, Technical University of Lodz (Poland)

17:50 – 18:10 ThA11

LINK BETWEEN THE CHARACTERISTICS OF A PULSED MICROWAVE PLASMA USED FOR DIAMOND GROWTH AND THE PROPERTIES OF THE FILMS T. Lamara, M. Belmahi, G. Henrion, J. Bougdira, M. Rémy Lab. Physique des Milieux Ionisés et Applications – CNRS Université Henri Poincaré –VANDOEUVRE les NANCY Cedex (France)

18:10 – 18:30 ThA12

METAL CARBON LAYERS STATE OF THE ART AND FUTURE APPLICATION T.G. Krug, C. Strondl, R. Tietema Hauzer Techno Coating BV, Venlo (The Netherlands)

18:30 – 18:50 ThA13

NOVEL APPROACHES IN THE DEVELOPMENT OF ADVANCED TRIBOLOGICAL COATINGS FOR TEMPERATURE SENSITIVE COMPONENTS BY MEANS OF PULSED DC SPUTTERING G. Erkens, R. Cremer; T. Rasa CemeCon AG, Würselen (Germany)

18:50 – 19:10 ThA14

DIAMOND-LIKE CARBON COATING FOR CUTTING TOOLS IN INDUSTRIAL APPLICATION U. Hornauer, F.-R. Weber G-Elit GmbH – GÜHRING Group, Berlin (Germany)

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14:15 – 14:55 Plenary Lecture P7 (see page 33, Room Richard Strauss) 15:10 – 16:40 Poster Session (Foyer and First Floor) Oral Session ThB (afternoon session): Plasma Polymerisation, Coatings on Polymers Chairman: D. Hegemann, St. Gallen (Switzerland) 16:40 – 17:10 Keynote Lecture K18

MICRO- AND NANO-STRUCTURED SURFACES, PRODUCED BY MEANS OF PLASMA PROCESSES, MODULATE ADHESION OF EUKARYOTIC CELLS. E. Sardella1, Roberto Gristina2, Giorgio S. Senesi2, Loredana Detomaso1, Erica D’Aloia1, Riccardo d’Agostino1,2, Pietro Favia1,2 1 Department of Chemistry, University of Bari (Italy) 2 Institute of Inorg. Methodology of Plasma, (IMIP) CNR (Italy)

17:10 – 17:30 ThB9

DETECTION AND IDENTIFICATION OF PINHOLES IN PLASMA-POLYMERISED THIN FILM BARRIER COATINGS ON METAL FOILS. A. Schulz1, D. Herrmann2, F. Kessler2, J. Schneider1, M. Walker1, U. Schumacher1 1 Institut für Plasmaforschung, Universität Stuttgart, Stuttgart (Germany) 2 Zentrum für Sonnenenergie- und Wasserstoff-Forschung (ZSW), Stuttgart (Germany)

17:30 – 17:50 ThB10

ULTRATHIN CARBON-FLUORINE FILM PROCESSING J. Barz, M. Haupt, U. Vohrer, Ch. Oehr Fraunhofer Institute for Interfacial Engineering and Biotechnology, Stuttgart (Germany)

17:50 – 18:10 ThB11

FUNCTIONAL COATING DEPOSITION BY PLASMA POLYMERISATION Anita Mistry1, F.R. Jones1 and T. English2 1 Department of Engineering Materials, The University of Sheffield (United Kingdom) 2 Corus Plc., Rotherham (United Kingdom)

18:10 – 18:30 ThB12

MACROSCOPIC PLASMA-CHEMICAL APPROACH TO PLASMA POLYMERIZATION OF HMDSO D. Hegemann, U. Schütz, A. Fischer Swiss Federal Laboratories for Materials Testing and Research EMPA, Laboratory for Functional Fibres and Textiles, St.Gallen (Switzerland)

18:30 – 18:50 ThB13

SURFACE ANALYSIS OF PLASMA-DEPOSITED POLYMER FILMS BY TIME OF FLIGHT STATIC SECONDARY ION MASS SPECTROMETRY (TOF-SSIMS) BEFORE AND AFTER EXPOSURE TO AMBIENT AIR U. Oran, S. Swaraj, J. F. Friedrich and W. E. S. Unger Bundesanstalt für Materialforschung - und prüfung (BAM), Berlin (Germany)

18:50 – 19:10 ThB14

MECHANICAL AND OPTICAL PROPERTIES OF PLASMA-POLYMERIZED VINYLTRIETHOXYSILANE R. Prikryl1, V. Cech1, L. Zajickova2, J. Vanek1, S. Behzadi3 and F.R. Jones3 1 Institute of Materials Chemistry, Brno University of Technology, Brno (Czech Republic) 2 Department of Physical Electronics, Masaryk University, Brno (Czech Republic) 3 Department of Engineering Materials, University of Sheffield (United Kingdom)

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14:15 – 14:55 Plenary Lecture P7 (see page 33, Room Richard Strauss) 15:10 – 16:40 Poster Session (Foyer and First Floor) Oral Session ThC (afternoon session): Optical Properties, Process Control, Hybrid

Processes Chairman: P. Frach, Dresden (Germany) 16:40 – 17:10 Keynote Lecture K19

NANO-MOTHEYE ANTIREFLECTION PATTERN BY PLASMA TREATMENT OF POLYMERS A. Kaless, P. Munzert, U. Schulz, N. Kaiser Fraunhofer Institute of Applied Optics and Precision Engineering, Jena (Germany)

17:10 – 17:30 ThC9

TiO2/SiO2 THIN FILMS PREPARED BY PLASMA AND ION BEAM ASSISTED CHEMICAL VAPOUR DEPOSITION F. Gracia1, F. Yubero1, T. Girardeau2, J.P. Espinós1, A.R. González-Elipe1 1 Instituto de Ciencia de Materiales de Sevilla (CSIC-U. Sevilla), (Spain) 2 Laboratoire de Metallurgie-Univ POITIERS Futuroscope-Chasseneuil (France)

17:30 – 17:50 ThC10

ION BOMBARDMENT EFFECTS ON NUCLEATION OF SPUTTERED Mo NANO-CRYSTALS IN Mo/B4C/Si MULTILAYERS V. Rigato1, G.Salmaso1, A. Patelli2, E. Bontempi3, L. Depero3, Nuno Carvalho4, Jeff Th. M. de Hosson4 1 LNL-INFN, Via dell'Università 2, Legnaro-Padova (Italy) 2 Dip. Ingegneria dell’Informazione – Università di Padova, (Italy) 3 INSTM, Laboratorio di Strutturistica Chimica – Università di Brescia (Italy) 4 Dept. Applied Physics, University of Groningen (The Netherlands)

17:50 – 18:10 ThC11

IN-PROCESS RATE DETERMINATION OF SPUTTERED OPTICAL FILMS BY USE OF A FAST AOS SPECTROMETER MONITORING SELECTED PLASMA EMISSION LINES Thomas Löhken1, Michael Vergöhl1, René Dittrich2 and Till Wallendorf2 1 Fraunhofer IST, Braunschweig (Germany) 2 IfU Diagnostic Systems GmbH, Lichtenau (Germany)

18:10 – 18:30 ThC12

REACTIVE GAS CONTROL OF NON STABLE PLASMAS. Victor Bellido-González, Benoit Daniel, John Counsell, Dr Dermot Monaghan GENCOA, Liverpool (United Kingdom)

18:30 – 18:50 ThC13

QUANTUM CASCADE LASER- AND TUNABLE DIODE LASER-ABSORPTION SPECTROSCOPY: A VALUABLE TOOL FOR ON-LINE PROCESS MONITORING H. Ferber1, S. Glitsch2, F. Hempel2, J. Röpcke2, S. Saß2 1 DaimlerChrysler Forschung und Technik, Forschungszentrum Ulm (Germany) 2 INP Greifswald, Greifswald (Germany)

18:50 – 19:10 ThC14

TRIBOLOGICAL PROPERTIES OF A CrN COATING CONTAINING CARBON NANOPARTICLES S. Mutti, S. Luridiana Microcoat S.p.a., Sedriano (Italy)

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08:30 – 9:10 Chairman: J. G. Han, Suwon (Korea) Plenary Lecture P8

DEPOSITION AND PROPERTIES OF NANOSTRUCTURED HARD COATINGS Jörg Patscheider1, Franz-Josef Haug1 and Thomas Zehnder1,2 1 EMPA, Laboratory for Surfaces, Coatings and Magnetism, Dübendorf (Switzerland)

2 CAFI, Le Locle (Switzerland) Oral Session FrA: Nano Composites Chairman: A. Cavaleiro, Coimbra (Portugal) 09:20 – 09:50 Keynote Lecture K20

RECENT PROGRESS IN FUNDAMENTAL UNDERSTANDING AND DEVELOPMENT OF MULTICOMPONENT NANOSTRUCTURED THIN FILMS Dmitry Shtansky, Evgeny Levashov Moscow State Institute of Steel and Alloys, Moscow (Russia)

09:50 – 10:10 FrA1

TiC/a-C NANOCOMPOSITE COATINGS: NANOSTRUCTURE AND PROPERTIES D. Galvan, Y.T. Pei, J.Th.M. De Hosson, A. Cavaleiro* Materials Science Center and Netherlands Institute for Metals Research, University of Groningen (The Netherlands) *University of Coimbra, Coimbra (Portugal)

10:10 – 10:30 FrA2

IN SITU INVESTIGATION OF THE INTERNAL STRESS WITHIN THE nc-Ti2N/nc-TiN NANOCOMPOSITE COATINGS PRODUCED BY A COMBINED MAGNETRON SPUTTERING AND ION IMPLANTATION METHOD E.Grigore1, C.Ruset1, K.Short2, H.Dong3, X.Y.Li, T.Bell3 1 The National Institute for Laser, Plasma and Radiation Physics, Bucharest (Romania) 2 Australian Nuclear Science and Technology Organisation, Materials Division, Menai (Australia) 3 The University of Birmingham, School of Engineering (Department of Metallurgy & Materials), Birmingham (United Kingdom)

10:30 – 10:50 FrA3

CHARACTERIZATION OF TaN-Cu NANOCOMPOSITE THIN FILMS C. M. Wang, J. H. Hsieh, C. Li, and T. P. Chen School of Mechanical and Production Engineering, Nanyang Technological University (Singapore)

10:50 – 11:10 coffee break 11:10 – 11:30 FrA4

DESIGN, CONSTITUTION AND PERFORMANCE OF MULTIFUNCTIONAL NANOCOMPOSITE COATINGS FOR TRIBOLOGICAL APPLICATIONS M. Stueber Forschungszentrum Karlsruhe, Institute of Materials Research I (Germany)

11:30 – 11:50 FrA5

PHYSICAL PROPERTIES VERSUS STRUCTURE IN (Ti,Si,Al)N NANOCOMPOSITE COATINGS S. Carvalho1, L. Rebouta1, F. Vaz1, J.A. Mendes1, S. Lanceros-Méndez1, A. Cavaleiro2 and E. Alves3 1 Dept. Física, Universidade do Minho, Azurém, Guimarães (Portugal) 2 ICMES – Fac. Ciências e Tecnologia da Universidade de Coimbra (Portugal) 3 ITN, Dept. de Física, Sacavém (Portugal)

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11:50 – 12:10 FrA6

DEPOSITION OF Ti-B-C-N NANOCOMPOSITE COATINGS BY DC UNBALANCED MAGNETRON SPUTTERING: EFFECTS OF SUBSTRATE TEMPERATURE AND BIAS VOLTAGE I.-W. Park1, K.H. Kim1, A.O. Kunrath2, D. Zhong2, J. J. Moore2

1 Department of Materials Science and Engineering, Pusan National University (South Korea) 2 Advanced Coatings and Surface Engineering Laboratory, Colorado School of Mines, Golden (USA)

12:10 – 12:30 FrA7

W-B-N SPUTTER-DEPOSITED THIN FILMS FOR MECHANICAL APPLICATION C. Louro1, R. Lamni2, F. Lévy2 1 ICEMS, Departamento de Engenharia Mecânica – Polo II-Universidade de Coimbra (Portugal) 2 Institut of Physics of Complexe Matter, EPFL, Lausanne (Switzerland)

12:30 – 12:50 FrA8

NANOCOMPOSITE HARD COATINGS PRODUCED BY PULSE MAGNETRON SPUTTERING H. Klostermann, B. Böcher, F. Fietzke, Th. Modes, and O. Zywitzki Fraunhofer Institut für Elektronenstrahl- und Plasmatechnik, Dresden (Germany)

12:50 Closing

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08:30 – 9:10 Plenary Lecture P8 (see page 36, Room Richard Strauss) Oral Session FrB: Wear Resistance, Tribology, Solid Lubricants Chairman: W. Fleischer, Venlo (The Netherlands) 09:20 – 09:50 Keynote Lecture K21

TRIBOLOGICAL CHALLENGES FOR PLASMA SURFACE ENGINEERED MATERIALS – A REVIEW P. A. Dearnley School of Mechanical Engineering, University of Leeds (United Kingdom)

09:50 – 10:10 FrB1

Nb, Hf, OR B ALLOYED Ti1-xAlxN COATINGS K. Kutschej1, N. Fateh1, P. H. Mayrhofer2, M. Kathrein3, P. Polcik4, C. Mitterer2 1 Materials Center Leoben, Franz-Josef-Strasse 13, 8700 Leoben, Austria 2 Department of Physical Metallurgy and Materials Testing, University of Leoben (Austria) 3 CERATIZIT Austria GmbH, Reutte (Austria) 4 Plansee AG, Reutte (Austria)

10:10 – 10:30 FrB2

CHARACTERIZATION OF MONO, MULTILAYERS AND MULTICOMPONENT HARD COATINGS DEPOSITED BY R.F. MAGNETRON SPUTTERING: APPLICATION TO WOOD MACHINING C. Labidi1, C. Nouveau1, M.A. Djouadi2 1 Ecole Nationale Supérieure d’Arts et Métiers, LaBoMaP, Cluny (France) 2 Institut des Matériaux Jean Rouxel, Nantes (France)

10:30 – 10:50 FrB3

ION-INDUCED STRESS RELAXATION DURING MAGNETRON SPUTTER DEPOSITION OF CUBIC BORON NITRIDE THIN FILMS B. Abendroth, R. Gago, F.Eichhorn, A. Kolitsch, W. Möller Institute for Ion Beam Physics and Materials Research, Forschungszemtrum Rossendorf, Dresden (Germany)

10:50 – 11:10 coffee break 11:10 – 11:30 FrB4

FAILURE DURING SCRATCH TESTING OF THIN AND THICK CrN COATINGS EXAMINED USING FIB R. Hoy1, V. Sivel1, G.C.A.M. Janssen2

1 Netherlands Institute for Metals Research, Delft (The Netherlands) 2 Delft University of Technology, Department of Materials Science and Engineering (The Netherlands)

11:30 – 11:50 FrB5

PLASMA IMMERSION ION IMPLANTED TITANIUM-BORON BASED COATINGS: TRIBOLOGICAL BEHAVIOR AT ROOM AND HIGH TEMPERATURES B. Prakash, J.P. Celis Katholieke Universiteit Leuven, Department Metaalkunde en Toegepaste Materiaalkunde, Leuven (Belgium)

11:50 – 12:10 FrB6

MECHANICAL PROPERTIES OF NANOCRYSTALLINE Ti-B-(N) COATINGS PRODUCED BY DC MAGNETRON SPUTTERING A. García-Luis, M. Brizuela, J.I. Oñate, J.C. Sánchez-López*, D. Martínez-Martínez*, C. López-Cartes*, A. Fernández* Fundación INASMET, Mikeletegui Pasealekua, Donostia-San Sebastián (Spain) *Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. Sevilla) (Spain)

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12:10 – 12:30 FrB7

DEPOSITION OF MAGNETRON SPUTTERED TiN-MoS2 COMPOSITE COATING WITH Ti-TiN GRADED INTERLAYER Mahfujur Rahman1, Julfikar Haider1 and M.S.J. Hashmi 1,2 1 NCPST and MPRC, Dublin City University (Ireland) 2 School of Mechanical and Manufacturing Engineering, Dublin City University, (Ireland)

12:30 – 12:50 FrB8

THE EFFECT OF SOLID LUBRICANTS ON TOOL PERFORMANCE DURING DRILLING N.R. Thomas1, D.G. Teer1, S. Hickman1, J. Wallbank2 and S. Barnes2

1 Teer Coatings Ltd, Hartlebury (United Kingdom) 2 Warwick Manufacturing Group, University of Warwick (United Kingdom)

12:50 Closing

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08:30 – 9:10 Plenary Lecture P8 (see page 36, Room Richard-Strauss) Oral Session FrC (morning session): Theory and Modelling Chairman: S. Berg, Uppsala (Sweden) 09:20 – 09:50 Keynote Lecture K22

MODELING OF GAS DISCHARGE PLASMAS: WHAT CAN WE LEARN FROM IT? A. Bogaerts University of Antwerp, Dept. of Chemistry (Belgium)

09:50 – 10:10 FrC1

MATERIALS’ HARDNESS DETERMINATION, BY MEANS OF A FEM SUPPORTED SIMULATION OF NANOINDENTATION K.–D. Bouzakis, N. Michailidis Laboratory for Machine Tools and Manufacturing Engineering, Mechanical Engineering Department, Aristoteles University of Thessaloniki (Greece)

10:10 – 10:30 FrC2

A CONTRIBUTION OF MOLECULAR DYNAMIC SIMULATION FOR SOPHISTICATED ENGINEERING OF COATING PROCESSES APPLIED TO PVD-DC SPUTTER DEPOSITION E. Westkämper1,3, P. Klein2, B. Gottwald1, S. Sommadossi1, P. Baumann2, A. Gemmler3 1 IFF, Univ. Stuttgart (Germany)

2 Fraunhofer-ITWM (Germany) 3 Fraunhofer-IPA, Stuttgart (Germany)

10:30 – 10:50 FrC3

STRENGTH OF COATINGS - A NEW CONCEPT OF MECHANICAL EVALUATION ON THE BASIS OF SIMULATED FRACTURE BEHAVIOR - S. Kamiya1, H. Nagasawa1, K. Yamanobe1, H. Hanyu2, S. Suzuki1, M. Saka1 1 Department of Mechanical Engineering, Tohoku University, Sendai (Japan) 2 OSG CORPORATION, Research & Development, Toyokawa (Japan)

10:50 – 11:10 coffee break 11:10 – 11:30 FrC4

MODELS FOR PLASMA NITRIDING OF FERRITIC STEELS J.-D. Kamminga1, G.C.A.M. Janssen2 1 Netherlands Institute for Metals Research, AL Delft (The Netherlands) 2 Delft University of Technology, Department of Materials Science and Engineering, AL Delft (The Netherlands)

11:30 – 11:50 FrC5

INFLUENCE OF PLANETARY KINEMATICS AND BATCH FILLING ON FILM HOMOGENEITY AND DEPOSITION RATE IN INDUSTRIAL BATCH COATERS– A SIMULATION APPROACH B. Schultrich, S. Völlmar, D. Römer Fraunhofer-Institut für Werkstoff- und Strahltechnik, Dresden (Germany)

11:50 – 12:10 FrC6

EXPERIMENTAL ANALYSIS AND KINETIC MODEL OF A RF O2/HMDSO PLASMA FOR SiO2 DEPOSITION M. Goujon1,2, T. Belmonte1, G. Henrion2

1 LSGS (UMR CNRS 7570) Ecole des Mines, Nancy (France) 2 LPMIA (UMR CNRS 7040) Université H. Poincaré, Vandoeuvre les Nancy (France)

12:10 – 12:30 FrC7

APPLICATION TO ATMOSPHERIC PRESSURE PLASMA DEVICES OF AIR CHEMICAL KINETICS SIMULATIONS C.Riccardi, R.Barni, P.Esena Dipartimento di Fisica G. Occhialini, Università degli Studi di Milano-Bicocca and INFM, Milano (Italy)

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12:30 – 12:50 FrC8

MONTE CARLO SIMULATION OF THE PVD TRANSPORT PROCESS FOR ALLOYS E. Lugscheider, D. Parkot Materials Science Institute, RWTH Aachen University (Germany)

12:50 Closing

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Poster – Corrosion MoP1 INFLUENCE OF PROCESS PARAMETERS ON THE CORROSION

PROPERTIES OF ELECTROLYTIC CONVERSION PLASMA COATED MAGNESIUM ALLOYS C. Blawert1, V. Heitmann1, W. Dietzel1, H. M. Nykyforchyn2 and M. D. Klapkiv2 1 Center for Magnesium Technology, GKSS Research Center, Geesthacht (Germany) 2 Karpenko Physico-Mechanical Institute of the National Academy of Sciences of Ukraine, Lviv (Ukraine)

MoP2 CORROSION BEHAVIOUR OF THERMALLY FLAME SPRAYED FeCr

COATINGS ON STEEL SUBSTRATES N. F. Ak1, E. Celik1,2, K. Demirkurt2, A. Cakir1

1 Dokuz Eylul University, Metallurgical And Materials Engineering, Izmir (Turkey) 2 KROMA, AOSB, Izmir (Turkey)

MoP3 CORROSION RESISTANCE MECHANISM OF PLASMA-BASED LOW-

ENERGY NITROGEN ION IMPLANTED AUSTENITIC STAINLESS STEEL M. K. Lei1, X. M. Zhu2 1 Surface Engineering Laboratory, Department of Materials Engineering, Dalian University of Technology, Dalian (China) 2 Department of Materials Science and Engineering, Dalian Railway Institute, Dalian (China)

MoP4 A STUDY ON CORROSION CHARATERIZATION OF PLASMA OXIDIZED

65/35 BRASS WITH VARIOUS FREQUENCIES Chang Gyu Park1, Seung Ho Ahn1, Jung Gu Kim1, Yun Mo Jung2, Sang Ju Lee2, Jeon Gun Han2 1 Department of Advanced Materials Engineering, Sunkyunkwan University, Suwon (Korea) 2 Center for Advanced Plasma Surface Technology, Sunkunkwan University Suwon (Korea)

MoP5 RESISTANCE TO ELECTROCHEMICAL CORROSION OF CrXNY-COATED,

DLC-COATED AND NITRIDED TOOL STEEL IN THE ENVIRONMENT OF WET WOOD J. Kaminski1, J. Rudnicki1, C. Nouveau2, A. Savan3 and P. Beer4 1 Faculty of Material Sciences, Warsaw University of Technology, Warsaw (Poland) 2 Research and Technology Organisation (SERAM-ENSAM), Cluny (France) 3 Centre Suisse d’Electronique et de Microtechnique, Neuchatel (Switzerland) 4 Faculty of Wood Technology, Agricultural University of Poznan (Poland)

MoP6 TiN-NCD COMPOSITE COATING PRODUCED ON THE TI6AL4V ALLOY

INTENDED FOR MEDICAL APPLICATIONS. A. Sokolowska1,2, T. Wierzchon2, S. Mitura1, J. Rudnicki2, P. Niedzielski1, A. Boczkowska2 , G. Boguslawski1 1 Institute of Materials Science, Lódz University of Technology (Poland) 2 Faculty of Materials Sciences and Engineering, Warsaw University of Technology (Poland)

MoP7 THE CORROSION PROPERTIES OF IMPLANTED MATERIALS WITH

PROTECTIVE COATINGS IN THE ISOTONIC PHYSIOLOGICAL SOLUTION. A.V. Zykova1, V.V. Luk’yanchenko2, V.I. Safonov3 1 Scientific Centre of Physical Technologies, Kharkov (Ukraine) 2 INMASTERS, Ltd, Kharkov (Ukraine) 3 Centre of Scientific & Technical Researchs Kharkov (Ukraine)

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MoP8 STRUCTURE OF DUPLEX CrN/NbN COATINGS AND THEIR PERFORMANCE AGAINST CORROSION AND WEAR T.Savisalo1, D. B. Lewis1, Q.Luo1, M. Bolton2, P. Hovsepian1

1 Sheffield Hallam University, Materials Research Institute (United Kingdom) 2 Eltro (GB) Ltd. Hampshire (United Kingdom)

MoP9 EFFECT OF MACROPARTICLE DEFECTS ON OXIDATION BEHAVIOR OF

NITRIDE BASED COATINGS AT RELATIVELY LOW TEMPERATURE F. Üstel1, N. Solak2, M. Ürgen2, S. Aydin2 and A.F. Cakir2 1 Sakarya University, Department of Metallurgy and Materials Science, Adapazari (Turkey) 2 Istanbul Technical University, Department of Metallurgical and Materials Engineering, Istanbul (Turkey)

MoP10 HIGH TEMEPERATURE CORROSION PROPERTIEIS OF CrNX AND SiNX

COATINGS DEPOSITED BY IBAD METHOD J.Pitter, F.Cerny1, J.Cizner2 and J.Suchanek3 ATG Ltd., Prague (Czech Republic) 1 Czech Technical University, Faculty of Mechanical Engineering, Dept. of Physics, Prague (Czech Republic) 2 SVUM Comp., Research Centre Bechovice, Prague (Czech Republic) 3 Czech Technical University, Faculty of Mechanical Engineering, Dept. of Technology, Prague (Czech Republic)

MoP11 STRUCTURE AND PROPERTIES OF COMBINED COATINGS C/Al/Al2O3

A.D. Pogrebnjak1, B.P. Gritsenko2, Yu.N. Tyurin3, N.A. Pogrebnjak (Jr.)1, D.A. Alontseva4, M.L Zhadkevich3 ,Sh.M. Ruzimov5 1 Sumy Institute for Surface Modification, Sumy (Ukraine) 2 Institute for Physics of Strength and Material Science, Tomsk (Russia) 3 O.E.Paton Electric Welding Institute, NAN of Ukraine, Kiev (Ukraine) 4 East-Kazakhstan Technical University, Ust-Kamenogorsk (Kazakhstan) 5 National Tashkent University (Uzbekistan)

MoP12 SiOX-LIKE THIN FILMS PLASMA POLYMERISED FROM A MIXTURE OF

HEXAMETHYLDISILOXANE AND OXYGEN FOR IMPROVING THE CORROSION BEHAVIOUR A. Cremona1, L. Laguardia1, E. Mesto2, E. Vassallo1 1 Istituto di Fisica del Plasma - CNR Milan (Italy) 2 Università degli Studi di Bari - Dip. Geomineralogico (Italy)

Poster – Plasma-CVD MoP13 INFLUENCE OF HYDROGEN SULPHIDE ADDITION ON THE ALUMINA

DEPOSITION BY PLASMA CVD M. Fink1, J. Laimer1, H. Störi1, C. Mitterer2 1 Institut für Allgemeine Physik, Vienna University of Technology (Austria) 2 Institut für Metallkunde und Werkstoffprüfung, Montanuniversität Leoben (Austria)

MoP15 DESIGN AND CHARACTERISATION OF A CAPACITIVELY COUPLED

PLASMA REACTOR FOR DEPOSITION OF SILICON-FILMS USING VHF UP TO 500 MHZ J. Ruediger, A. Kottwitz; R. Terasa; J. Bartha University of Technology Dresden (Germany)

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MoP16 VHF PLASMA CVD OF SILICON OXIDE

K. Schade, F. Stahr, S. Röhlecke, O. Steinke, R. Richter1, F. Schopper1, J. Hartung2

FAP Forschungs- und Applikationslabor Plasmatechnik GmbH, Dresden (Germany) 1 Max-Planck-Institut für Physik, MPI Halbleiterlabor, München (Germany) 2 VON ARDENNE Anlagentechnik GmbH, Dresden (Germany)

MoP17 Micro-Jet Plasma CVD with HMDSO/O2

Kamel Silmy1, Andreas Holländer1, Jan Thömel2 and Andreas Dillmann2 1 Fraunhofer-Institut für Angewandte Polymerforschung, Potsdam (Germany) 2 Hermann-Föttinger-Institut für Strömungsmechanik, Technische Universität Berlin (Germany)

MoP18 SINGLE SOURCE PRECURSORS FOR PLASMA-ENHANCED CVD OF

Si-C-N FILMS INVESTIGATED BY MASS SPECTROMETRY Th. Stelzner, M. Arold, F. Falk, H. Stafast IPHT Jena e.V. (Germany)

MoP19 ADHESION, FRICTION AND THERMAL BEHAVIOURS OF SiC BASED FILMS

GROWN BY MICROWAVE PACVD ON TITANIUM ALLOYS L. Thomas1, M. Joinet1, G. Covarel2, V. Lucas3, C. Boher4 1 CNRS-IMP - Tecnosud - Rambla de la Thermodynamique, Perpignan (France) 2 Institut Universitaire de Technologie de Mulhouse (France) 3 EADS-CCR - Suresnes (France) 4 CROMeP - EMAC - Campus Jarlard - ALBI CT (France)

MoP20 APPLICATION OF TWO-STAGE AND CONTINUOUS DUPLEX PROCESSES

TO SURFACE TREATMENT OF HOT FORGING DIES Jan Walkowicz, Jerzy Smolik, et al. Institute for Terotechnology, Radom (Poland)

Poster – Surface Modification MoP21 SHORT-TIME PLASMA SURFACE MODIFICATION OF POLYMER

POWDERS IN A DOWNFLOWING TUBE REACTOR C. Arpagaus1, Ph. Rudolf von Rohr1, A. Rossi2 1 Institute of Process Engineering, ETH Zurich (Switzerland) 2 Laboratory for Surface Science and Technology, ETH Zurich (Switzerland) Department of Inorganic and Analytical Chemistry, Università degli Studi di Cagliari (Italy)

MoP22 ACCESS OF DIFFERENT PLASMA PROCESSES TO HIGH ASPECT RATIO

GAPS AND HOLES OF COMPLEX MICROSTRUCTURES ANALYZED BY XPS W. Besch, K. Schröder, A. Ohl Institut für Niedertemperatur-Plasmaphysik, Greifswald (Germany)

MoP23 PLASMA MODIFICATION OF NANO- AND MICRO-PARTICLES

V. Brüser1, M.M. Khan1, G. Thieme2, H. Kersten1 1 Institute of Non-Temperature Plasma Physics (INP), Greifswald (Germany) 2 University of Greifswald, Department of Physics, Greifswald (Germany)

MoP24 PLASMA SURFACE MODIFICATION OF CARBON FIBRES

V. Brüser1, M. Heintze1, J. Lohmar2, H. Bubert3, W. Brandl4, G. Marginean4 1 Institute of Low-Temperature Plasma Physics, Greifswald (Germany) 2 Degussa-Hüls AG, Marl (Germany) 3 Institute of Spectrochemistry and Applied Spectroscopy, Dortmund (Germany) 4 University of Applied Sciences, Gelsenkirchen (Germany)

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MoP25 MODIFICATION OF POLYESTER TRACK MEMBRANES BY PLASMA TREATMENTS Lazea, L.I. Kravets1, B. Albu2, C. Ghica3, G. Dinescu National Institute for Laser, Plasma and Radiation Physics, Magurele Bucharest (Romania) 1 Joint Institute for Nuclear Research, Flerov Laboratory of Nuclear Reactions, Dubna (Russia) 2 Research Centre for Membranes and Macromolecular Materials, Bucharest (Romania) 3 National Institute of Materials Physics, Magurele, Bucharest (Romania)

MoP26 PLASMA TREATMENT OF POLYETHYLENE POWDER FOR BETTER

ADHESION TO METAL SUBSTRATE J. Hladík1, P. Špatenka1, P. Knoth2

1 Technical University of Liberec, Faculty of Machinery Engineering, Department of Material Science (Czech Republic) 2 ARPLAS GmbH, Wolfen – Thalheim (Germany)

MoP27 STUDY ON THE PHOTOCATALYTIC ACTIVITY IMPORVEMENT OF TIO2

THIN FILMS USING OXYGEN PLASMA SURFACE TREATMENT METHODS C.-K. Jung, Y.-H. Song, T.-K. Kim1, J. -H. Oh1, J.-H. Boo Department of Chemistry, SungKyunKwan University, Suwon (Korea) 1 SolarTech. CO. Ltd. (Korea)

MoP28 NEW BIODEGRADABLE MATERIAL BASED ON RF PLASMA MODIFIED

STARCH Mariusz Kaczmarek1, Hieronim Szymanowski1, Maciej Gazicki-Lipman1, Boguslaw Wozniak2, Jacek Józwiak2

1 Institute for Materials Science and Engineering, Technical University of Lodz (Poland) 2 Leather Research Institute, Lodz (Poland)

MoP29 INFLUENCE OF PLASMA TREATMENT ON THE FIBRE, SIZING AND

MATRIX SYSTEM OF REINFORCED POLYMERS M. Kaiser, R. Emmerich, H. Urban, D. Gittel Fraunhofer Institute of Chemical Technology, Pfinztal (Germany)

MoP30 PLASMA-BONDING OF POLYMERS

F. Katzenberg Universität Dortmund (Germany)

MoP31 MOBILE PLASMA ACTIVATION OF POLYMERS USING THE PLASMAGUN

Roland Gesche, Reinhold Kovacs, Joachim Scherer Aurion Anlagentechnik GmbH, Seligenstadt (Germany)

MoP32 EFFECT OF THE OXYGEN PLASMA TREATMENT PARAMETERS ON

THE CARBON NANOTUBES SURFACE PROPERTIES G. Marginean1, W. Brandl1, V. Chirila1,2 1 University of Applied Sciences, Gelsenkirchen (Germany) 2 University “Politehnica” Timisoara (Romania)

MoP33 STUDY ON THE ETCH PROCESSES OF VARIOUS MATERIALS USING A

LOW ANGLE FORWARD REFLECTED NEUTRAL BEAM ETCHING SYSTEM B.J.Park, D.H.Lee, S.D.Park, G.Y.Yeom Department of Materials Engineering, Sungkyunkwan University, Suwon (South Korea)

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MoP34 ALTERNATIVE ETCHING GASES TO SF6 FOR PLASMA ENHANCED

CHAMBER CLEANING IN SILICON DEPOSITION SYSTEMS T. Rößler, M. Albert, R. Terasa, J.W. Bartha University of Technology, Dresden (Germany)

MoP35 PLASMA POLYMER INTERLAYERS AS ADHESION PROMOTORS IN PE-

TITANIUM COMPOSITES Rolf-Dieter Schulze, Jörg Friedrich, Dietmar Schulze Federal Institute for Materials Research and Testing, Berlin (Germany)

MoP36 MODIFICATION OF LIGNOCELLULOSIC FIBRES BY AR PLASMA

TREATMENTS IN COMPARISON WITH CHEMICAL AND BIOLOGICAL TREATMENTS S. Zanini, C. Riccardi, C. Canevali, M. Orlandi, L. Zoia, E-L Tolppa, F. Agnoli1 Universita’ degli Studi di Milano-Bicocca, Milano (Italy) 1 Dipartimento di Chimica Fisica, Venezia (Italy)

MoP37 MICROWAVE PLASMA MODIFICATION AND GRAFT COPOLYMERIZATION

OF WOOD SURFACES X. K. Yang1, G. B. Du2, T. C. Quan1, X. Y.Yang1, and J. Zhang3

1 Analysis & Test Institute of Yunnan Province, Kunming (P.R.China) 2 Southwest Forestry College, Kunming (P.R.China) 3 Department of Physics, Yunnan University, Kunming (P.R.China)

Poster – Generation MoP38 INVESTIGATION OF LASER-PRODUCED PLASMA INTERACTION WITH

MATERIALS W,V AND Mo R. Khaydarov, U. Kunishev, G. Berdiyorov, E.Tojihanov Scientific-Research Institute of Applied Physics at the National University of Uzbekistan, Tashkent (Uzbekistan)

MoP39 MULTIPURPOSE 14.5 GHZ ECR ION SOURCE: SPECIALITIES AND

APPLICATION FOR SURFACE MODIFICATION S.KÖKÉNYESI2, S. BIRI1, I. IVÁN2, J. PÁLINKÁS2, I.A. SZABÓ2, E. TAKÁCS2, A. VALEK1 1 Institute of Nuclear Research (ATOMKI), Debrecen (Hungary) 2 University of Debrecen, Debrecen (Hungary)

MoP40 AN APPLICATION OF CYLINDRIC ELECTROMAGNETRON ELECTRODE TO

PLASMA ENHANCED PVD AND CVD PROCESSES AND THEIR COMBINATION F. Olcaytug, H. Schalko, H. Ebel, A. Sobczyk, M. Kaczmarek, C. Rapiejko, H.Szymanowski, M. Gazicki-Lipman, H. Yasuda Institute for Materials Science and Engineering, Lodz (Poland)

MoP41 FAST OPTICAL EMISSION SPECTROSCOPY (OES) DURING THE

DEPOSITION OF MAGNETIC COATINGS USING RF-SPUTTERING TECHNIQUES AND PULSED ARC PLASMA Bernd Engers1, Guido Willers1, Swen Marke2, Till Wallendorf2 1 Angaris GmbH, Halle (Germany) 2 IfU Diagnostic Systems GmbH, Lichtenau (Germany)

Poster – New Plasma and Ion Sources MoP42 PROPERTIES AND APPLICATIONS OF THE ELECTRON-BEAM PLASMA

GENERATED INSIDE A CLOSED VOLUME Abdul Mahir, Michael Vasiliev Department of Aerospace Research, Moscow Institute of Physics and Technology, Dolgopruny (Russia)

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MoP43 PLASMAPOLYMERISATION USING AN ION GUN INVERSE MAGNETRON SOURCE Victor Bellido-González1, Dr Dermot Monaghan1, Sarah Powell1, Alberto García2, Marta Brizuela2, 1 GENCOA LTD, Wavertree Technology Park, Liverpool (UK) 2 INASMET, Parque Tecnológico, Donostia-San Sebastian (Spain)

MoP44 CHARACTERISTICS OF PLASMA AND SINX ETCHING USING A

MAGNETICALLY ENHANCED INTERNAL-ANTENNA-TYPE INDUCTIVELY COUPLED PLASMA SYSTEM S. J. Jung, K. N. Kim, Y. J. Lee, and G.. Y. Yeom Dept. of Materials Engineering, Sungkyunkwan University, Suwon (Korea)

MoP45 PLASMA CHARACTERISTICS OF AN INDUCTIVELY COUPLED PLASMA

(ICP) SYSTEM BY EMPLOYING MULTIPOLAR MAGNETIC FIELDS K.N. Kim, S.J. Jung, and G.Y. Yeom, Dept. of Materials Engineering, Sungkyunkwan University, Suwon (Korea)

MoP46 TECHNOLOGICAL SYSTEMS WITH CROSSED E×B FIELDS AND VACUUM

ARC PLASMA SOURCES I. Levchenko1, M. Romanov1, M. Keidar2 1 National Airspace University, Kharkov (Ukraine) 2 Department of Aerospace Engineering, The University of Michigan, Ann Arbor (USA)

MoP47 NON-LINEAR EVOLUTION OF VORTICES IN ELECTROSTATIC PLASMA

LENS FOR HIGH-CURRENT ION BEAM FOCUSING FOR MATERIAL PROCESSING V.I. Maslov2, A.A. Goncharov1, I.N. Onishchenko2, V.L. Stomin2, V.N. Tretyakov3 1 Institute of Physics NASU, 252650 Kiev 2 NSC Kharkov Institute of Physics & Technology, Kharkov (Ukraine) 3 Karazin Kharkov National University, Kharkov (Ukraine)

MoP48 APPLICATION OF THE BALLISTIC PLASMATRON OF SUPERADIABATIC

COMPRESSION FOR SURFACE TREATMENT V. Shmelev, S. Podoynitsyn, N. Vasilik Institute of Chemical Physics of Russian Academy of Science, Moscow (Russia)

MoP49 STUDIES OF SQUIRREL CAGE TYPE COAXIAL ACCELERATOR FOR IPD

PROCESS Marek Rabinski1, Krzysztof Zdunek2, Marian Paduch3, Krzysztof Tomaszewski3 1 Institute for Nuclear Studies, Otwock-Swierk (Poland) 2 Warsaw University of Technology (Poland) 3 Institute of Plasma Physics and Laser Microfusion, Warsaw (Poland)

MoP50 OFF-RESONANCE MICROWAVE ION SOURCE FOR IMPLANTATION

N. Sakudo, R. Nishimoto, Y. Tamashiro, T. Shinohara and M. Matsumine Kanazawa Institute of Technology, Advanced Materials R & D Center, Ishikawa (Japan)

MoP51 SOURCE OF SOLID IONS BASED ON CYLINDRICAL MAGNETRON

SPUTTERING SYSTEM A.A. Bizyukov, I.A. Bizyukov, A.E. Kashaba, K.N. Sereda Kharkov National University (Ukraine)

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MoP52 CHARACTERISTICS OF VAPOR - AIR DISCHARGES WITH POROUS

ELECTROLYTE ELECTRODE FOR METAL SURFACES MODIFICATION M.F. Achatov2, A.F. Gaisin1, E.E. Son1, R.S. Sharifullin2 1 Moscow Institute of Physics and Technology; Department of Physical Mechanics (Russia) 2 Kasan Technical University

MoP53 THE ELECTROLITE JET – METAL ELECTRODE VAPOUR-AIR DISCHARGE

FOR PLASMA SURFACE PROCESSING A.F. Gaisin, E.E. Son Moscow Institute of Physics and Technology, Department of Physical Mechanics (Russia)

Poster – Plasma Diagnostics MoP54 ION DETECTION MASS SPECTROMETRY OF ATMOSPHERIC PLASMA

GENERATION Y. Aranda Gonzalvo, J.A. Rees, C.L. Greenwood, D. Seymour and I.D. Neale Hiden Analytical Ltd., Warrington (United Kingdom)

MoP55 SPATIALLY RESOLVED MASS SPECTROMETRY OF REACTIVE AR/SF6/N2

PLASMA JETS Thomas Arnold1, Sergey Grabovsky2 Axel Schindler1, Hans-Erich Wagner2 1 Leibniz-Institute for Surface Modification, Leipzig (Germany) 2 Ernst-Moritz-Arndt-University, Greifswald (Germany)

MoP56 PROPERTIES OF FIELD EMISSION FROM HIGH VOLTAGE RF ANTENNA

Vl.V. Bobkov, J.-M. Noterdaeme, R. Wilhelm Max-Planck-Institut für Plasmaphysik, EURATOM Association, Garching (Germany)

MoP57 INVESTIGATIONS OF AN ATMOSPHERIC PRESSURE PLASMA JET BY

OPTICAL EMISSION SPECTROSCOPY S. Förster, C. Mohr, W. Viöl University of Applied Sciences and Arts, Department of Science and Technology, Göttingen (Germany)

MoP58 DENSITIES OF N AND H ATOMS BY LIF IN MICROWAVE FLOWING POST-

DISCHARGES F.Gaboriau1, M. Hazard1,2, N. Gherardi2 , F. Massines2 and A. Ricard1

1 CPAT 2 LGET, CNRS – Univ. Paul Sabatier, Toulouse (France)

MoP59 DESIGN AND STUDY OF A DBD REACTOR FOR THE PLASMA

REMEDIATION OF VOCS AND HYDROCARBONS IN AIR Victor Rico1, José Cotrino1, Alfonso Caballero1, Agustín R. González-Elipe1, Juan Perez-Tinao Gironella2, Maria A.Arilla2 1 Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. Sevilla) (Spain) 2 INABENSA, Sevilla (Spain)

MoP60 PLASMA DIAGNOSTICS IN THE PULSE MAGNETRON SPUTTERING

SYSTEM USED FOR DEPOSITION OF CARBON AND TiC:H THIN FILMS M. Cada1 , Z. Hubicka1, V. Kulikovski1,2, P. Adámek1,3, P. Bohác1 1 Institute of Physics ASCR, Prague (Czech Republic) 2 Institute for Problems of Materials Science, Academy of Sciences of Ukraine, Kiev (Ukraine) 3 University of South Bohemia, College of Education, Dept. Phys., Ceské Budejovice (Czech Republic)

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MoP61 NEGATIVE IONS IN ARGON-OXYGEN DISCHARGES

H.M. Katsch, C. Manthey, A.Wagner and H.F. Döbele Institut für Experimentelle Physik, Universität Duisburg-Essen (Germany)

MoP62 OPTICAL EMISSION SPECTRA AND ION ENERGY DISTRIBUTIONS IN TiN

DEPOSITION PROCESS BY REACTIVE PULSED MAGNETRON SPUTTERING Yong M. Kim1, Min J. Jung1, J. Vlcek2, J. Musil2 and Jeon. G. Han1 1 Center for Advanced Plasma Surface Technology, Sungkyunkwan University, Suwon (Korea) 2 Dept. of Physics, University of West Bohemia, Plzen (Czech Republic)

MoP63 VIBRATIONAL-ROTATIONAL TEMPERATURE MEASUREMENT OF

ATMOSPHERIC PRESSURE COLD PLASMA FOR POLYMER SURFACE MODIFICATION J. H. Kim, Y. H. Choi, Y. S. Hwang Department of Nuclear Engineering, Seoul National University (Korea)

MoP64 CORRELATION BETWEEN GDMS AND ABSORPTION SPECTROSCOPY IN

Ar/N2 REACTIVE AMPLIFIED MAGNETRON DISCHARGES S. Konstantinidisa, A Ricard2, R. Snyders1, H. Vandeparre1, J.P. Dauchot1, M. Hecq1

1 Laboratory of Inorganic and Analytical Chemistry, University of Mons-Hainaut, Materia Nova, Mons (Belgium) 2 CPAT, Univ. Paul Sabatier, Toulouse (France)

MoP65 PRODUCTION OF AMMONIA RADICALS IN A DIELECTRIC BARRIER

DISCHARGE AND THEIR INJECTION FOR DENITRIFICATION Y. Kusano, F. Leipold, A. Fateev, B. Stenum, E. Tsakadze, H. Egsgaard and H. Bindslev Risø National Laboratory, Roskilde (Denmark)

MoP66 TIME RESOLVED DIAGNOSTICS OF TRANSIENT AND STABLE SPECIES IN

FLUOROCARBON PLASMAS BY INFRARED TUNABLE DIODE LASER SPECTROSCOPY Onno Gabriel, Konstantin Li, Jürgen Meichsner Institute of Physics, University of Greifswald (Germany)

MoP67 STUDY OF PLASMA PARAMETERS IN A HMDSO-CONTAINING RF

DISCHARGE J. Matheis1, D. Hegemann2, Ch. Oehr3 and A. Lunk1 1 Institut für Plasmaforschung, Universität Stuttgart (Germany) 2 Eidgenössische Materialprüfungs- und Forschungsanstalt (EMPA), St. Gallen (Switzerland) 3 Fraunhofer für Grenzflächen- und Bioverfahrenstechnik IGB, Stuttgart (Germany)

MoP68 COMPARATIVE STUDY OF DC AND PULSED POST MAGNETRON

DISCHARGES Santosh Kumar Dandapat & S. Mukherjee FCIPT, Institute of Plasma Research, Gandhinagar (India)

MoP69 CHARACTERISTICS OF PLASMA PARAMETERS IN N2/Ar ECR PLASMA

FOR NITRIDATION H. Muta, D. H. Thang and Y. Kawai Kyushu University, Kasuga, Fukuoka (Japan)

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MoP70 STUDY OF PLASMA IN HYBRID MAGNETRON-LASER DEPOSITION

SYSTEM USED FOR TiC THIN FILMS PREPARATION M. Novotný1, M. Jelínek1, J. Bulír1, Z. Zelinger2 1 Institute of Physics, Academy of Sciences of the Czech Republic, Prague (Czech Republic) 2 J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, Prague (Czech Republic)

MoP71 CHARACTERIZATION OF DC, PULSED-DC AND RF PLASMAS IN A DUAL

FACING TARGET MAGNETRON SPUTTERING SYSTEM. V. Rigato1, G. Salmaso1, F. Refosco1, A. Patelli2 1 INFN- Laboratori Nazionali di Legnaro (Italy) 2 Dip. Ingegneria dell’Informazione – Università di Padova, via Gradenigo, Padova (Italy)

MoP72 SELECTIVE EFFECT OF ION/SURFACE INTERACTION IN LOW FREQUENCY

PACVD OF SIC:H FILMS : COMPARISON BETWEEN EXPERIMENTS AND SIMULATION A.Soum Glaude1, L.Thomas1, E.Tomasella2, J.M.Badie3, R.Berjoan3 1 CNRS-IMP, Tecnosud - Rambla de la Thermodynamique, Perpignan (France) 2 CNRS-LMI, 24 Avenue des Landais, Aubière (France) 3 CNRS-IMP, BP5 Odeillo - Font Romeu (France)

MoP73 PHASE AND SPACE RESOLVED EMISSION SPECTROSCOPIC

INVESTIGATIONS OF AN INDUCTIVELY COUPLED RF PLASMA USING AN IMAGING ACOUSTO-OPTIC SPECTROMETER Viktor Kadetov1, Timo Gans1, Uwe Czarnetzki1, Swen Marke2, Till Wallendorf2 1 Ruhr-Universität Bochum, Institut für Plasma- und Atomphysik, Bochum (Germany) 2 IfU Diagnostic Systems GmbH, Lichtenau (Germany)

MoP74 SOLIDS PLASMAS DIAGNOSTIC TECHNIQUES

V. Kouznetsov1, J. R. Drake2, N. Brenning2, I. Axnäs2 1 Chemfilt R&D AB c/o Royal Institute of Technology, Alfven Laboratory, Stockholm (Sweden) 2 Alfven Laboratory, Royal Institute of Technology, Stockholm (Sweden)

MoP75 TIME-RESOLVED LANGMUIR PROBE DIAGNOSTICS OF HIGH-POWER

PULSED DC MAGNETRON DISCHARGE PLASMAS A.D. Pajdarova, J. Vlcek, P. Kudlacek, and J. Lukas Department of Physics, University of West Bohemia, Plzen (Czech Republic)

Poster – Large Area Coatings MoP76 UPSCALING OF NEW MULTIFUNCTIONAL THIN FILM SYSTEMS AS A

RESULT OF R&D COOPERATION BETWEEN SMES AND RESEARCH-INSTITUTES S. Sattel, P. Pesch TZO GmbH, Rheinbreitbach (Germany)

MoP77 SYNTHESIS OF POLYCRYSTALLINE SILICON THIN FILMS ON THE LARGE-

SCALE (680MMX880MM) GLASS SUBSTRATE BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION USING LARGE-SCALE INDUCTIVELY COUPLED PLASMA SOURCE WITH MULTIPLE INTERNAL ANTENNAS UNITS A. Ebe1, Y. Setsuhara2, T. Shoji3, S. Miyake1 1 EMD Corporation, Kyoto (Japan) 2 Department of Aeronautics and Astronautics, Kyoto University (Japan) 3 Department of Energy Engineering and Science, Nagoya University (Japan)

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MoP78 PHOTOCATALYTIC TITANIUM DIOXIDE THIN FILMS PREPARED BY

REACTIVE PULSE MAGNETRON SPUTTERING AT LOW TEMPERATURE AND EFFECT OF NITROGEN DOPING D. Glöß, P. Frach, O. Zywitzki, T. Modes, S. Klinkenberg, C. Gottfried Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik (FEP), Dresden (Germany)

MoP79 PRODUCTION OF LARGE AREA VHF PLASMA USING LADDER SHAPED

ELECTRODE H. Takatsuka1, Y. Takeuchi2, Y. Yamauchi1, T. Shioya and Y. Kawai Graduate School of Engineering Sciences, Kyushu University, Fukuoka (Japan) 1 Nagasaki Shipyard & Machinery Works, Mitsubishi Heavy Industries Ltd., Isahaya, Nagasaki (Japan) 2 Nagasaki Research & Development Center, Mitsubishi Heavy Industries Ltd., Fukahori, Nagasaki (Japan)

MoP80 INFLUENCE OF THE MAGNETIC FIELD ON PROPERTIES OF MgO FILM

DEPOSITED BY CATHODIC VACUUM ARC METHOD Eun-Sung Lee1, Jong-Kuk Kim1, Sung-Kyu Bae1, Sunghun Lee1, Young-Sang Cho2 1 Advanced Thin Film Group, Korea Institute of Machinery and Materials (KIMM), Changwon, Kyungnam (Korea) 2 A-tech system, Kyunggido (Korea)

MoP81 DYNAMIC PACVD COATING OF STRIP METAL WITH SILICON OXIDE,

TITANIUM OXIDE AND AMORPHOUS CARBON FILMS K. Ortner, T. Jung Fraunhofer-Institut für Schicht- und Oberflächentechnik, Braunschweig (Germany)

MoP82 OPTIMIZATION OF DC MAGNETRON SPUTTERING PROCESS FOR

INDUSTRIAL THIN GRADIENT FILM OF SOLAR THERMAL ABSORBERS Shuxi Zhao, Ewa Wäckelgård Uppsala University, The Ångström Laboratory, Uppsala (Sweden)

Poster – Flat Panels MoP83 CHARACTERISTICS OF SIO2 FILMS DEPOSITED BY ROOM

TEMPERATURE PE-CVD FOR OLED PASSIVATION C. H. Jeong, J. H. Lee, J. T. Lim, N. G. Jo, and G. Y. Yeom Department of Materials engineering, Sungkyunkwan university, Suwon, Korea

MoP84 CHARACTERIZATION OF BN THIN FILMS FOR THE APPLICATION AS A

PROTECTIVE LAYER IN PDP Sunghun Lee, Jong-Kuk Kim, Eungsun Byon, and Gun-Hwan Lee Advanced Thin Film Group, Korea Institute of Machinery and Materials, Changwon (Korea)

MoP85 PROPERTIES OF TRANSPARENT-CONDUCTING ANODE WITH AN IMI

STRUCTURE FOR INVERTED TOP-EMISSION ORGANIC LIGHT-EMITTING DIODES J.T. Lim, N.G. Cho, C.H. Jeong, *Y.W. Ko, *J.H. Lee, G.Y. Yeom Dept. of Materials Engineering, Sungkyunkwan Univ., Suwon (Korea) *Electronics and Telecommunications Research Institute (ETRI), Taejon (Korea)

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Poster – Stress Control, Permeation TuP1 MECHANICAL STRESS EVOLUTION DURING THERMAL CYCLING OF

PECVD SILICON OXIDE FILMS G. Ayvazyan, S. Minasyan, and K. Melkonyan Engineering Academy of Armenia, Yerevan (Armenia)

TuP2 X-RAY DIFFRACTION ANALYSIS OF RESIDUAL STRESSES IN SMOOTH

FINED-GRAIN DIAMOND COATINGS DEPOSITED ON TA6V ALLOYS FOR TRIBOLOGICAL APPLICATIONS. P. Goudeau1, L. Vandenbulcke2, C. Met2, M.I. De Barros3, P. Andreazza4, D. Thiaudiere5, M. Gailhanou5 1 LMP, University of Poitiers (France) 2 LCSR, CNRS, Orleans (France) 3 LTDS, ECL, Lyon (France) 4 CRMD Orleans (France) 5 LURE, University of Paris-Sud, Orsay (France)

TuP3 CONTROL OF MACROSTRESS IN REACTIVELY SPUTTERED MO(AL)NX

FILMS BY ENERGY OF BOMBARDING IONS J. Šuna, J. Musil and P. Dohnal Department of Physics, University of West Bohemia, Plzen (Czech Republic)

TuP4 APPLICATION OF THE INTERFACIAL INDENTATION TEST FOR ADHESION

TOUGHNESS DETERMINATION D. Chicot1, P. Araujo2, A. Tricoteaux3, J. Lesage1. 1 Laboratoire de Mécanique de Lille, UMR CNRS 8107, U.S.T. Lille., IUT A GMP, Le Recueil, Villeneuve d’Ascq (France) 2 Universidade Tiradentes, UNIT, ITP, Aracaju - SE (Brazil) 3 LMP/LAMAC, Université de Valenciennes et du Hainaut-Cambrésis, IUT MP, Maubeuge (France)

TuP5 STRESS AND MECHANICAL PROPERTIES OF LOW-DIMENSIONAL

SYSTEMS Ti-Cr-N DEPOSITED BY VACUUM ARC V.V. Uglov1, V.M. Anishchik1, S.V. Zlotski1, G.Abadias2, S.N. Dub3 1 Belarussian State University, Minsk (Belarus) 2 Laboratoire de Mètallurgie Physique Universitè de Poitiers, Chasseneuil Futuroscope cedex (France) 3 Institute of Superhard Materials, Kiev (Ukraine)

TuP6 BOUNDRY-FREE Ta-Zr AND Ta-Zr-N BARRIER FILMS BY REACTIVE CO-

SPUTTERING Z. Z. Tang, J.H. Hsieh, and C. Li School of Mechanical and Production Engineering, Nanyang Technological University (Singapore)

Poster – Thin Film and Surface Characterization and Analysis TuP7 IN-SITU X-RAY DIFFRACTION DURING SPUTTER DEPOSITION OF Ti1-XAlXN

THIN FILMS M. Beckers1, N. Schell1,2, R.M.S. Martins1,2, W. Möller1 1 Institute of Ion Beam Physics and Materials Research, Forschungszentrum Rossendorf, P.O. Box 510119, 01314 Dresden (Germany) 2 ROBL-CRG at ESRF, Grenoble (France)

TuP8 STRUCTURE AND PROPERTIES OF TITANIUM OXIDE LAYERS

DEPOSITED BY REACTIVE ELECTRON BEAM EVAPORATION T. Modes1, B. Scheffel1, Chr. Metzner1, O. Zywitzki1, E. Reinhold2

1 Fraunhofer Institut Elektronenstrahl- und Plasmatechnik, Dresden (Germany) 2 Von Ardenne Anlagentechnik GmbH, Dresden (Germany)

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TuP9 INVESTIGATION OF THE NANOSTRUCTURE AND POST-COAT THERMAL

TREATMENT OF WEAR RESISTANT PVD CRTICU(B,N) COATINGS M.A. Monclus1, M.A. Baker1, C. Tsotsos2, A. Leyland2, A. Matthews2

1 The Surface Analysis Laboratory, School of Engineering, University of Surrey (United Kingdom) 2 Department of Engineering Materials, The University of Sheffield (United Kingdom)

TuP10 MACROSCOPIC FUNCTION VS. MICROSCOPIC AND NANOSCOPIC

FEATURES: MULTI-PROBE TESTING OF SURFACES AND THIN FILMS BY OPTICAL CHARACTERISATION TECHNIQUES Uwe Beck, Andreas Hertwig Bundesanstalt für Materialforschung und –prüfung, Berlin (Germany)

TuP11 SURFACES FOR FOOD INDUSTRY: EFFECTS OF MICROSCOPIC AND

MACROSCOPIC FEATURES, ROUGHNESS, AND SURFACE ENERGY ON THE ADHESION AND KINETICS OF SPECIES AND THE CLEANING OF SURFACES Uwe Beck1, Georg Reiners1, Nadja Gamer1, R. Schmidt2, K. Sommer3, U.Bobe3 1 Bundesanstalt für Materialforschung und –prüfung, Berlin (Germany) 2 Fachhochschule Jena (Germany) 3 TU München (Germany)

TuP12 IMPACT TEST ON COATINGS AND OTHER HARD MATERIALS AT

ELEVATED TEMPERATURES K. –D. Bouzakis, G. Maliaris, S. Kompogiannis, D. Koptsis Laboratory for Machine Tools and Manufacturing Engineering, Mechanical Engineering Department, Aristoteles University of Thessaloniki (Greece)

TuP13 INFLUENCE OF ANNEALING TREATMENTS AND THICKNESS ON THE

THERMIC STABILITY AND THE CRYSTALLOGRAPHIC ORIENTATIONS OF THIN CHROMIUM NITRIDE LAYERS (CrN, Cr2N) L. Chekour1, C. Nouveau2, A. Chala3, C. Labidi2 , N. Rouag4, M.A. Djouadi5 1 Laboratoire des Couches Minces et Interfaces, Université de Constantine, (Algérie) 2 LABOMAP, Ecole Nationale Supérieure d’Arts et Métiers, Cluny (France) 3 Laboratoire des Matériaux Semi-conducteurs et Métalliques, Université de Biskra (Algérie) 4 Laboratoire de microstructures et défauts dans les matériaux, Université de Constantine (Algérie) 5 LPCM, Institut des Matériaux UMR Nantes (France)

TuP14 HIGH SUBSTRATE TEMPERATURE TO MODIFY MECHANICAL

PROPERTIES OF TITANIUM OXYNITRIDE THIN FILMS PREPARED BY REACTIVE SPUTTERING Jean-Marie Chappé, Joseph Gavoille, Nicolas Martin, Jan Lintymer, Jamal Takadoum

Laboratoire de Microanalyse des Surfaces (LMS), Ecole Nationale Supérieure de Mécanique et des Microtechniques (ENSMM), Besançon (France)

TuP15 MODIFICATION OF WC HARD ALLOY BY COMPRESSIVE PLASMA FLOW.

V.V. Uglov1, V.M. Anishchik1, V.M. Astashynski2, N.N. Cherenda1, I.G. Gimro2, A.V. Kovyazo2 1 Belarusian State University, Minsk (Belarus) 2 Institute of Molecular and Atomic Physics, National Academy of Sciences of Belarus, Minsk (Belarus)

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TuP16 TREATMENT OF COPPER BY HIGH FREQUENCY OXYGEN PLASMA

U. Cvelbar, M. Mozetic and A. Zalar Institut Jozef Stefan, Ljubljana (Slovenia)

TuP17 THERMAL STABILITY OF MAGNETRON SPUTTERED ZR-SI-N FILMS

R. Daniel1, J. Musil1, P. Zeman1, C. Mitterer2 1 Department of Physics, University of West Bohemia, Plzen (Czech Republic) 2 Department of Physical Metallurgy and Materials Testing, University of Leoben, (Austria)

TuP18 XPS INVESTIGATIONS OF CHROMIUM NITRIDE THIN FILMS

A. Lippitz and Th. Hübert Bundesanstalt für Materialforschung und –prüfung (BAM), Berlin (Germany)

TuP19 MODIFICATION OF ELECTRODE MATERIALS FOR PLASMA TORCHES

I.R. Jankov1, R.N. Szente2, I.D. Goldman1, M.N.P. Carreño3, M.A. Valle3, M. Behar4, C.A.R. Costa5, F. Galembeck5, R. Landers6 1 Instituto de Física, Universidade de São Paulo, São Paulo- SP (Brazil) 2 Divisão de Mecânica e Eletricidade, Instituto de Pesquisas Tecnológicas do Estado de São Paulo- IPT, São Paulo (Brazil) 3 Departamento de Sistemas Eletrônicos- PSI, Escola Politécnica, Universidade de São Paulo (Brazil) 4 Instituto de Física, Universidade Federal de Rio Grande do Sul, Porto Alegre- RGS (Brazil) 5 Instituto de Química, Universidade Estadual de Campinas (Brazil) 6 Instituto de Física Gleb Wataghin, Universidade Estadual de Campinas (Brazil)

TuP20 ELECTRICAL AND PHYSICAL CHARACTERISTICS OF METAL-INSULATOR

(HfO2)-METAL CAPACITORS S.W. Jeong and Yonghan Roh*

School of Information and Communication Engineering, Sungkyunkwan University, Suwon (Korea)

TuP21 EFFECTS OF ANNEALING TEMPERATURE ON CHARACTERISTICS OF

HfO2 DEPOSITED ON INTRINSIC-Si (40 Å and 60 Å ) /Si0.8Ge0.2/p-Si S. H . Jeong , H. D. Kim and Y. Roh* School Of Information And Communication Engineering, Sungkyunkwan University, Suwon (Korea)

TuP22 STRUCTURE AND MECHANICAL PROPERTIES OF MAGNETRON

SPUTTERED ZrOx AND Zr-Cu-O FILMS J.Musil and M.Jirout Department of Physics, University of West Bohemia, Plzen (Czech Republic)

TuP23 MECHANICAL AND STRUCTURAL CHARACTERIZATION OF OXIDATION

RESISTANT PVD CrSiN FILMS A. Thobor-Keck1, A.S. Dehlinger1, F. Lapostolle1, D. Pilloud2, J-F. Pierson2, J. von Stebut3, C. Coddet1 1 Laboratoire d'Etudes et de Recherche sur les Matériaux, les Procédés et les Surfaces (LERMPS) / Université de Technologie de Belfort – Montbéliard (UTBM) BELFORT (France) 2 Centre de Recherche sur les Ecoulements, les Surfaces et les Transferts (CREST – UMR CNRS 6000) Université de Franche-Comté - Pôle Universitaire Montbeliard (France) 3 Laboratoire de Science et Génie des Surfaces, Ecole des Mines de Nancy (France)

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TuP24 NANOINDENTATION OF CHROMIUM ZIGZAG THIN FILMS SPUTTER

DEPOSITED J. Lintymer1, N. Martin1, J.-M. Chappé1, J.Gavoille1, P Delobelle2, J. Takadoum1 1 Laboratoire de Microanalyse des Surfaces (LMS) Ecole Nationale Supérieure de Mécanique et des Microtechniques (ENSMM) Besançon (France) 2 Laboratoire de Mécanique Appliquée Raymond Chaléat (LMARC - UMR 6604 CNRS), Université de Franche-Comté, Besançon (France)

TuP25 CHARACTERIZATION OF NANOSTRUCTURED TI-AL-SI-N THIN FILMS

DEPOSITED BY R.F.-REACTIVE SPUTTERING METHOD T. Mae1, M. Nose2, H. Suzuki3, E. Honbo4 , Y. Okumura5 and Y. Sakamoto1 1 Toyama National College of Technology, Toyama (Japan) 2 Takaoka National College, Takaoka (Japan) 3 Graduate school, Toyama University, Toyama (Japan) 4 Toyama Industrial Research Center, Takaoka (Japan) 5 Technical Department, Daido Industry Co. Ltd., Kaga (Japan)

TuP26 ADHESION REDUCTION OF OPTICAL POLYMER MELTS ON SCREWS OF

INJECTION MOLDING MACHINES BY SURFACE MODIFICATION WITH PVD COATINGS K. Bobzin, E. Lugscheider, M. Maes, F. Manz Materials Science Institute, RWTH Aachen University (Germany)

TuP27 THICKNESS DEPENDENCE OF Bi2Te3 THIN FILMS PROPERTIES

Martin Pavelka1– Radek Zeipl2 – Miroslav Jelínek1 - Jarmila Walachová2

Václav Studnicka 1 1 Institute of Physics,Academy of Science of the Czech Republic, Prague (Czech Republic) 2 Institute of Radio Engineering and Electronics, Academy of Science of the Czech Republic, Prague (Czech Republic)

TuP28 STABILITY OF REACTIVELY SPUTTERED SILVER OXIDE FILMS

J.F. Pierson *, C. Rousselot Département CREST, Institut FEMTO-ST (UMR CNRS 6174), Université de Franche-Comté, Montbéliard (France)

TuP29 IN-SITU IR-SPECTROSCOPIC AND KELVIN PROBE INVESTIGATIONS OF

PLASMA MODIFIED MODEL SUBSTRATES J. Raacke, M. Giza, G. Grundmeier Max-Planck-Institute for Iron Research, Düsseldorf (Germany)

TuP30 STRUCTURAL AND CHEMICAL EFFECTS ON THE HARDNESS

BEHAVIOUR OF Cr(Al)N COATINGS J.C. Sánchez-López1, D. Martínez-Martínez1, C. López-Cartes1, A. Fernández1, M. Brizuela2, A. García-Luis2, J.I. Oñate2 1 Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. Sevilla) (Spain) 2 Fundación Inasmet, Mikeletegui Pasealekua, Donostia-San Sebastián (Spain)

TuP31 APPLYING THE LASER-ACOUSTIC TEST METHOD TO OPTIMISE THE

DEPOSITION OF DIAMOND-LIKE CARBON FILMS Harald Schulz, Dieter Schneider, Hans-Joachim Scheibe and Bolko Schöneich Fraunhofer Institute for Material and Beam Technology, Dresden (Germany)

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TuP32 LASER-ACOUSTIC TESTING OF DEFECTIVE FILMS

Michael Leonhardt, Dieter Schneider, Joerg Kaspar, Steffen Schenk, Fraunhofer Institut für Werkstoff- und Strahltechnik, Dresden (Germany)

TuP33 ELECTRONIC PROPERTIES OF CrOXNY-FILMS, DEPOSITED BY REACTIVE

DC MAGNETRON SPUTTERING FROM A CHROMIUM TARGET IN Ar/O2/N2-ATMOSPHERES R. Mientus1, K. Ellmer Hahn-Meitner-Institut, Berlin (Germany) 1 Optotransmitter-Umweltschutz-Technologie e.V., Berlin (Germany)

TuP34 CHARACTERIZATION OF THIN FILM MATERIALS WITH ERDA

E. Strub, W. Bohne, J. Röhrich Hahn-Meitner-Institut, Berlin (Germany)

TuP35 CHARACTEROZATON OF OXIDE FILMS GENERATED ON STAINLESS

STEEL IN WATER VAPOR AND OXYGEN PLASMAS Tatsuya Suzuki, Yukiko Sawado, Yasuhiko Fujii Research Laboratory for Nuclear Reactors, Tokyo Institute of Technology (Japan)

TuP36 THERMAL STABILITY OF TiAlN/Mo MULTILAYERS

C.J. Tavares1, C. Vidrago1, J.P. Rivière2, E. Lebourhis2

1 Depto. de Física, Universidade do Minho, Azurém, Guimarães (Portugal) 2 Lab. de Metallurgie Physique, Université de Poitiers, Futuroscope (France)

TuP37 COMPARISON OF THE STRUCTURAL AND OPTICAL PROPERTIES OF

ZINC OXIDE THIN FILMS DEPOSITED FROM R.F. AND D.C. SPUTTERING AND SPRAY PYROLYSIS. A. Mosbah1, A. Moustaghfir2, S. Abed3, N. Bouhssira3, M.S. Aida3, E. Tomasella2, M. Jacquet2 1 Physics department, Faculty of Sciences, Ferhat Abbas University, Sétif (Algeria) 2 Laboratoire des Matériaux Inorganiques, UMR CNRS 6002, Université Clermont Ferrand (Blaise Pascal), Aubière (France) 3 Thin Films and Interfaces Laboratory, Faculty of Sciences, Mentouri University, Constantine (Algeria)

TuP38 THE FORMATION OF LOW-DIMENSIONAL STRUCTURES BY

COMPRESSIVE PLASMA FLOWS V.V. Uglov(a) , V.M. Anishchik1, Yu.V. Sveshnikov1, V.M. Astashynski2, E.A. Kostyukevich2, A.M. Kuzmitski2, V.V. Askerko2 1 Belarussian State University, Minsk (Belarus) 2 Institute of Molecular and Atomic Physics of National Academy of Sciences of Belarus, Minsk (Belarus)

TuP39 FORMATION OF NITRIDE PHASES UNDER THE ACTION OF

COMPRESSION PLASMA FLOW ON IRON AND CARBON STEEL V.V. Uglov, V.M. Anishchik, V.V. Astashynski Belarusian State University, Minsk (Belarus)

TuP40 MECHANICAL PROPERTIES AND SURFACE MORPHOLOGY OF COPPER

COATING ON STAINLESS STEEL AFTER ELECTRON BEAM TREATMENT V.P. Rotstein1, A.B. Markov1, V.V. Uglov2, A.K. Kuleshov2, M.V. Novitskaya2, S.N. Dub3, Y. Pauleau4, F. Thièry4 1 Institute of High Current Electronics, Tomsk (Russia) 2 Belarusian State University, Minsk (Belarus) 3 Institute of Superhard Materials, Kiev (Ukraine) 4 National Polytechnic Institute of Grenoble, Grenoble (France)

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TuP41 STRUCTURAL FEATURES OF FILMS PRODUCED BY THE IMPULSE

PLASMA DEPOSITION METHOD E. Wierzbinski, M. Mirkowska, K. Nowakowska - Langier, K. Zdunek Faculty of Material Science and Engineering, Warsaw University of Technology, (Poland)

TuP42 MICROMACHINING AND NANOTESTING OF MINIATURE PVD COATING

SPECIMENS M. Smid, E. Coronel, U. Wiklund, and S. Hogmark The Ångström Laboratory, Uppsala University (Sweden)

TuP43 FABRICATION OF LOW TEMPERATURE POLY-SILICON BY INDUCTIVELY

COUPLED PLASMA ASSISTED MAGNETRON SPUTTERING Keun-Cheol Yoo1, Bohwan Park1, Junghoon Joo2 and Jung-Joong Lee1 1 School of Materials Science and Engineering, Seoul National University, Seoul (Korea) 2 Department of Materials Science and Engineering, Kunsan National University, Kunsan (Korea)

TuP44 HIGH-TEMPERATURE OXIDATION RESISTANCE OF Ta-Si-N COATINGS

WITH A HIGH Si CONTENT P. Zeman, J. Musil, H. Zeman, R. Daniel Department of Physics, University of West Bohemia, Plzen (Czech Republic)

TuP45 ATOMIC STEP ORIENTATIONS ON Si(5 5 12)-2X1 SURFACES

J.Zhang1,2, T.Ding1, S.H.Cho2, W.X.Quan2, Y.Z.Zhu2 1 Dept. of Physics, Yunnan University, Kunming (P.R.China) 2 Dept. of Physics, Chonbuk National University, Chonju (Korea)

TuP46 SURFACE MECHANICAL RELIABILITY ASSESSMENT OF THIN COATINGS

BY MACRO-INDENTATION AND FRICTION FATIGUE TESTING S. Poulat1, D. Mercs1, C. Charron1, 2, J.P. Arnould2 , J. von Stebut2 1 Teer Coatings Ltd., Hartlebury Worcs. (United Kingdom) 2 Laboratoire de Science et Génie des Surfaces, Ecole des Mines, Nancy (France)

Poster – PVD TuP47 THE INFLUENCE OF THE PROCESS PARAMETERS ON THE DIELECTRIC

FILMS GROWN IN A PULSED MAGNETRON SPUTTERING SYSTEM M. Braic, V. Braic, M. Balaceanu, G. Pavelescu National Institute for Optoelectronics, Bucharest (Romania)

TuP48 MULTI-LAYER DEPOSITION BY MAGNETRON SPUTTERING

P. Plantin1, P. Brault1, A.-L. Thomann1, T. Sauvage2, A. Pineau3, C. Wang4 1 Groupe de Recherches sur l’Energétique des Milieux Ionisés UMR6606 -CNRS, Ecole Polytechnique de l’Université d’Orléans, Université d’Orléans (France) 2 Centre d’Etudes et de Recherches par Irradiations, Orleans (France) 3 Centre de Recherches sur la Matière Divisée – UMR 6619 CNRS – Université d’Orléans (France) 4 School of Science, Beijing University of Astronautics and Aeronautics, Beijing (P. R. China)

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TuP49 SYNTHESIS, CHARACTERISATION, AND PROPERTIES OF TUNGSTEN

OXYNITRIDES N.J.M. Carvalho1,2, N. Parreira1, A. Cavaleiro1, and J.Th.M. De Hosson2

1 ICEMS – Faculdade de Ciências e Tecnologia da Universidade de Coimbra, Dep. Eng. Mecânica, Polo II, Coimbra (Portugal) 2 Dep. Of Applied Physics, Materials Science Center and Netherlands Institute for Metals Research, University of Groningen (The Netherlands)

TuP50 SYNTHESIS AND CHARACTERIZATION OF HARD COATING THIN FILMS

DEPOSITED BY TRIODE SPUTTERING A. Chala1, M.A. Djouadi2, C. Nouveau3, M.S. Aida4 1 Laboratory of Metallic Materials, Physics Department, University of Biskra (Algeria) 2 Institut des Matériaux Jean Rouxel, Nantes (France) 3 Laboratoire Bourguignon des Matériaux et Procédés, ENSAM, Cluny (France) 4 Laboratoire des Couches Minces et Interfaces, University of Constantine, (Algeria)

TuP51 METAL-DOPED CARBON FILMS OBTAINED BY MAGNETRON

SPUTTERING B. T. Cieciwa1, M. Balden1, I. Quintana1, E. de Juan Pardo1, A. Wiltner1, M. Sikora2, H. Bolt1

1 Max-Planck-Institut für Plasmaphysik, EURATOM Association, Garching (Germany) 2 AGH University of Science and Technology, Department of Solid State Physics, Krakow (Poland)

TuP52 DEPOSITION OF LixZn1-xO THIN FILMS BY MEANS OF HOLLOW CATHODE

SPUTTERING SYSTEM Z. Hubicka1, M. Cada1, P. Adámek2, A. Deyneka1, L. Jastrabík1, G. Suchaneck3, G. Gerlach3

1 Institute of Physics ASCR, Prague (Czech Republic) 2 University of South Bohemia, College of Education, Dept. Phys., Ceské Budejovice (Czech Republic) 3 Institute of Solid State Electronics, University of Technology Dresden (Germany)

TuP53 SUBPICOSECOND AND ENHANCED NANOSECOND PLD TO GROW ZnO

FILMS IN NITROGEN AMBIENT Miroslav Jelinek1, Agriro Klini2, T. Kocourek1, M. Novotný1, Costas Fotakis2, Radek Zeipl3, Antonino Santoni4 1 Institute of Physics AS CR, Prague (Czech Republic) 2 Foundation for Research and Technology – Hellas (FORTH), Institute of Electronic Structure and Laser (IESL), Laser and Application Division, Heraklion Crete (Greece) 3 Institute of Radio Engineering and Electronics AS CR, Prague (Czech Republic) 4 ENEA, Centro Ricerche Frascati, Via Enrico Fermi, Frascati, Roma (Italy)

TuP54 METALLIZATION OF PIEZOELECTRIC BANDS BY THE USE OF HIGH

DENSITY PLASMA J. Hennecart, P-Y. Jouan, A. Tricoteaux, F. Ebel and N. Horny LMP/LAMAC, Université de Valenciennes et du Hainaut-Cambrésis, IUT MP Maubeuge (France)

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TuP55 A STUDY ON THE ENERGY DISTRIBUTION FOR GRID-ASSISTING

MAGNETRON SPUTTERING Min J. Jung1, J. Houska2, P. Baroch2, J. Vlcek2, J. Musil2, K.H. Nam1, Jeon G. Han1 1 Center for Advanced Plasma Surface Technology Sungkyunkwan University, Suwon (Korea) 2 Department of Physics, University of West Bohemia, Plzen (Czech Republic)

TuP56 LARGE- SCALE VACUUM ARC COATINGS FACILITY

D.A. Karpov, V.V. Ivanov, A.A. Filippov, V.A. Krilov, V.M. Lisichkin, V.Ya. Moiseev, S.G. Saksaganskiy, R. Ni*, M. Zhanji* D.V. Efremov Institute of Electrophysical Apparatus, St.-Petersburg (Russia) *Lanzhou Institute of Physics, Lanzhou (China)

TuP57 DEVELOPMENT OF THIN FILMS FOR THE CONTROL OF INTERFACE

PROPORTIES OF SIC-FIBRE / STEEL COMPOSITES S. Levchuk, A. Brendel, H. Maier, H. Bolt Max-Planck-Institut fuer Plasmaphysik, EURATOM Association, Garching (Germany)

TuP58 CHROMIUM REACTIVE SPUTTERING IN ARGON-OXYGEN AN ARGON-

WATER VAPOUR MIXTURES C. Nouvellon1, JP Dauchot2, M. Hecq2, H. Cornil3

1 Unité de Chimie Inorganique et Analytique, Materia Nova, Mons (Belgium) 2 Laboratoire de Chimie Inorganique et Analytique, Université de Mons Hainaut, Materia Nova, Mons (Belgium) 3 Arcelor Innovation, Flémalle (Belgium)

TuP59 REACTIVE SPUTTERING OF IRON IN AR-N2 AND AR-O2 MIXTURES

C. Petitjean, C. Rousselot, J.F. Pierson * Département CREST, Institut FEMTO-ST (UMR 6174), Université de Franche-Comté, Pôle Universitaire, Montbéliard (France)

TuP60 MULTILAYER INTERFERENCE FILTERS APPLIED ON HIGHLY LOADED

DISCHARGE LAMPS BY MAGNETRON SPUTTERING Arnd Ritz Philips GmbH Forschungslaboratorien, Aachen (Germany)

TuP61 LASER-ARC MODULE FOR DEPOSITION OF SUPERHARD AMORPHOUS

CARBON (TA-C) WITH INDUSTRIAL BATCH COATERS C.-F. Meyer, M. Leonhardt1, H.-J. Scheibe1, B. Schultrich, H. Schulz Fraunhofer-Institut für Werkstoff- und Strahltechnik, Dresden (Germany) 1 Fraunhofer USA, Center for Coatings and Laser Applications, Michigan State University, East Lansing (USA)

TuP62 EVOLUTION OF DROP PHASE IN ARC DISCHARGE AT LOW PRESSURE

A.A.Bizyukov, V.I.Gritsenko, E.V.Romaschenko1, K.N.Sereda, A.D.Chibisov Kharkiv National University, Kharkiv (Ukraine) 1 East-Ukrainian National University, Lugansk (Ukraine)

TuP63 CORRELATION BETWEEN SPATIAL DISTRIBUTION OF VOLATILE AND

CONDENSED COMPONENTS OF REACTIVE PLASMA FLOW GENERATED BY CIRCULAR VACUUM-ARC SOURCES ON THE STOICHIOMETRY AND DEFECTIVENESS OF DEPOSITED COATINGS Jan Walkowicz1, Jerzy Smolik1, Rafal Brudnias1, Barabara Kulakowska-Pawlak2 and Wieslaw Zyrnicki2 1 Institute for Terotechnology, Radom (Poland) 2 Institute of Inorganic Chemistry and Metallurgy of Rare Elements, Wroclaw University of Technology, Wroclaw (Poland)

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TuP64 INFLUENCE OF THE VACUUM-ARC SOURCE MAGNETIC SYSTEM

CONFIGURATION AND ARC DISCHARGE PARAMETERS ON THE EVOLUTION, STRUCTURE AND LOCATION OF ARC SPOTS ON THE CATHODE SURFACE Jan Walkowicz1, Jerzy Smolik1, Zbigniew Slomka1, Barabara Kulakowska-Pawlak2 and Wieslaw Zyrnicki2 1 Institute for Terotechnology, Radom (Poland) 2 Institute of Inorganic Chemistry and Metallurgy of Rare Elements, Wroclaw University of Technology, Wroclaw (Poland)

TuP65 MAGNETIC-FIELD-ASSISTED PULSED LASER DEPOSITION OF HARD

COATINGS Dirk Rost, Günter Reiße, Steffen Weißmantel Hochschule Mittweida, University of Applied Sciences, Mittweida (Germany)

TuP66 PROPERTIES OF NANO-MULTILAYERED HARD COATINGS DEPOSITED

BY A NEW AIP-UBMS HYBRID COATING SYSTEM K. Yamamoto1, S. Kujime2, K. Takahara2 1 Materials Research lab., Kobe Steel Ltd. (Japan) 2 Advanced Products & Technology Dept., Kobe Steel Ltd. (Japan)

TuP67 VACUUM ARC DEPOSITION BY USING A VENETIAN BLIND PARTICLE

FILTER O. Zimmer Fraunhofer Institute for Material and Beam Technology (IWS), Dresden (Germany)

TuP68 FIXTURES FOR ECONOMICAL PVD PRODUCTION

S. Esser 4pvd, Service & Supply, Aachen (Germany)

Poster – Biological and Medical Applications TuP69 STERILIZATION OF BIOLOGICAL MATERIALS WITH CORONA DISCHARGE

PLASMA L. Aubrecht, J. Koller, V. Scholtz Department of Physics, Faculty of Electrical Engineering, Czech Technical University, Prague (Czech Republic)

TuP70 SYNTHESIS AND CHARACTERIZATION OF TiN,TiAlN AND TiN/TiAlN

BIOCOMPATIBLE COATINGS M. Braic, V.Braic, M.Balaceanu, G.Pavelescu, A.Vladescu National Institute for Optoelectronics, Bucharest (Romania)

TuP71 ELECTROCHEMICAL PROPERTY AND CELL ADHESION OF METAL ION

IMPLANTATED TITANIUM FOR MEDICAL IMPLANTS Eungsun Byon1, Jong-Kuk Kim1, Sungmo Moon1, Yongsoo Jeong1, Lee-Ra Cho2, Beom-Seok Chang2, Young-Taeg Sul3, Takao Hanawa4 1 Surface Engineering Department, Korea Institute of Machinery and Materials, Changwon (Korea) 2 Kangnung National University Dental Hospital, Gangneung (Korea) 3 Dept. of Biomaterial Sciences/Handicap Research, University of Göteborg, (Sweden) 4 Biomaterials Center, National Institute for Materials Science, Tsukuba (Japan)

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TuP72 FORMATION OF BIOCOMPATIBLE MATERIALS WITH NANOSTRUCTURED

SURFACE Elinson V.M., Drachev A.I.1, Potraysay V.V., Laymin A.N., Fedorova S.S. “MATI”- Russian State Technological University named K.E.Tsiolkovsky; Moscow (Russia) 1 Enikolopov Institute of Synthetic Polymer Materials Russian Academy of Sciences (Russia)

TuP73 FIBROPLAST GROWTH ON PVD COATED SURFACES OF DENTAL

IMPLANTS Michael Griepentrog1, Maren Herzog2, Alexander Dück1, Matthias Hannig3, Birte Größner-Schreiber2 1 BAM Federal institute for Materials Research and Testing, Berlin (Germany) 2 University of Kiel, School of Dental Medicine, Clinic for Restorative Dentistry and Periodontology, Kiel (Germany) 3 University of Saarland, Clinic for Restorative Dentistry and Periodontology, Homburg (Germany)

TuP74 PLASMA DEPOSITED ACRYLIC ACID AND ALLYLAMINE COATINGS:

STABLE SURFACES TO CONTROL FIBROBLASTS BEHAVIOUR L. Detomaso1, Roberto Gristina2, Giorgio S. Senesi2, Pietro Favia2, Riccardo d’Agostino2

1 Department of Chemistry, University of Bari (Italy) 2 Institute of inorganic Methodologies and Plasmas (IMIP), CNR Bari (Italy)

TuP75 THE SYNTHESIS OF TiAlSiN FILM DEPOSITED USING MAGNETRON

SPUTTERING SYSTEM H.Y.Lee1, W.S.Jung1, J.G.Han1, S.M.Seo2, J.H.Kim2, Y.H.Bae2 1 Center for Advanced Plasma Surface Technology, Sung Kyun Kwan University, Suwon (Korea) 2 Research complex, Max plasma Co., Sung Kyun Kwan University, Suwon (Korea)

TuP76 PLASMA AIDED SURFACE MODIFICATION FOR THE GENERATION OF

DNA MICROARRAYS Neumann, T. and Rühe, J.*

Institute for Microsystems Technology, Freiburg (Germany) TuP77 PECVD OF BIOCOMPATIBLE COATINGS ON 316L STAINLESS STEEL

G. Ram Prasad1, D. C. Cameron1, B. P. McNamara2 and R. O’Kennedy3

1 National Centre for Plasma Science and Technology 2 National Centre for Sensors Research 3 School of Biotechnology Dublin City University (Ireland)

TuP78 SURFACE PROCESSES AND PROPERTIES OF ION IMPLANTED NiTi

ALLOY N. Shevchenko, M.-T. Pham, E. Richter, and M.F. Maitz Forschungszentrum Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, Dresden (Germany)

TuP79 PLASMA ENHANCED CVD DEPOSITION OF TITANIUM OXIDE FOR

BIOMEDICAL APPLICATIONS. A. Sobczyk, J. Kowalski, M. Gazicki-Lipman, W. Jakubowski, L. Klimek, H. Szymanowski Institute for Materials Science and Engineering, Technical University of Lodz (Poland)

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TuP80 STRUCTURE AND PROPERTIES OF TITANIUM BASED COATINGS

PREPARED BY METAL PLASMA IMMERSION ION IMPLANTATION AND DEPOSITION I. Tsyganov1, M. F. Maitz2, E. Wieser2, E. Richter2, H. Reuther2 1 Lipetsk State Technical University, Lipetsk (Russia) 2 Forschungszentrum Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, Dresden (Germany)

Poster – Sensors TuP81 STRUCTURAL AND ELECTRICAL PROPERTIES OF PZT COATINGS ON

PLANE GLASS-SUBSTRATES AND FIBERS M. Amberg, F.-J. Haug, K. Glaentz, M. Halbeisen, D. Hegemann, A. Fischer Swiss Federal Laboratories for Materials Testing and Research (EMPA), Laboratory for Functional Fibers and Textiles, St.Gallen (Switzerland)

TuP82 INDUSTRIAL SCALE MAGNETRON SPUTTERED MOLYBDENUM FILMS:

A COMPREHENSIVE STUDY OF THE RELATION BETWEEN NANOSTRUCTURE AND THERMO-ELECTRICAL PROPERTIES W. Hilber1, F. Schäffler2, K. Hingerl2 1 E+E Elektronik GmbH, Engerwitzdorf (Austria) 2 Universität Linz, Institut für Festkörper- und Halbleiterphysik (Austria)

TuP83 INFLUENCE OF RF BIAS VOLTAGE ON AlN GROWTH USED FOR SAW

DEVICES. V. Mortet1, A. Djouadi2 and P-Y. Jouan3 1 Institute of Physics, Academy of Sciences of the Czech Republic, Prague (Czech Republic) 2 LPCM, Institut des Matériaux UMR 6502, Nantes (France) 3 LMP/LAMAC, Université de Valenciennes et du Hainaut-Cambrésis, IUT MP Maubeuge (France)

TuP84 TiN OXIDE THIN FILMS PREPARED BY LASER-ASSISTED CVD:

STRUCTURAL AND GAS SENSING PROPERTIES. J. Lancok, A. Santoni, S. Loreti, I. Menicucci , C. Minarini Institute of Physics, Academy of Sciences of the Czech Republic, Prague (Czech Republic) ENEA C.R. Frascati (Italy) ENEA-Portici, Località Granatello, Portici, (Italy)

TuP85 PHOTOLITHOGRAPHIC STRUCTURING OF A THIN METAL FILM COIL ON A

ZERODUR CYLINDER F. Löffler, C. Siewert Physikalisch-Technische Bundesanstalt, Braunschweig (Germany)

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Poster – Optical and Electrical Properties WeP1 ELECTRICAL AND OPTICAL INVESTIGATIONS OF HIGHLY (001)

TEXTURED WSX AND MOSX FILMS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING S. Seeger, T. Guminskaya, T. Dittrich, K. Ellmer Hahn-Meitner-Institut, Dept. Solar Energetic, Berlin (Germany)

WeP2 SOME PROPERTIES OF TIMGN THIN FILMS DEPOSITED BY REACTIVE DC

MAGNETRON SPUTTERING M. Fenker1, M. Balzer1, H. Kappl1, O. Banakh2 1 FEM, Schwäbisch Gmünd (Germany) 2 Institute of Applied Sciences, Le Locle (Switzerland)

WeP3 OPTICAL MEASUREMENT OF THE TI IMPLANTED SAPPHIRE

N. K. Huang, D. Z. Wang. and J. R. Lei Key Lab of Radiation Physics and Technology (Sichuan University), Ministry of Education; Institute of Nuclear Science and Technology, Sichuan University, Chengdu (P. R. China)

WeP4 FLUORESCENCE PROPERTIES OF CRYSTALLINE EU DOPED Y2O3

NANOSTRUCTURES EMBEDDED BY AMORPHOUS MATRIX ELABORATED BY PULSED LASER DEPOSITION. J. Lancok, C. Garapon, A. Pillonet, O. Marty, J. Mugnier LPCML, CNRS UMR 5620-Université Lyon-I, Villeurbanne (France) Institute of Physics Academy of Sciences (Czech Republic)

WeP5 PROTECTIVE COATINGS INCREASING THE REFLECTANCE OF MIRRORS

R.T. Galiaoutdinov, N.F. Kashapov, G.S. Luchkin Kazan State Technological University, Kazan (Russia)

WeP6 PROPERTIES OF ELECTRICALLY HEATED MIRRORS

R.?. Galiaoutdinov, N.?. Kashapov, G.S. Luchkin The Kazan state technological university, Kazan (Russia)

WeP7 PROPERTIES AND ELECTROCHROMIC PERFORMANCES OF

REACTIVELY SPUTTERED TUNGSTEN OXIDE FILMS WITH WATER AS REACTIVE GAS H. Sadiki1, C. Rousselot1, J.F. Pierson1, N. Martin2, G. Terwagne3 1 Département C.R.E.S.T., Institut F.E.M.T.O.-ST (UMR CNRS 6174), Université de Franche-Comté, Pôle Universitaire, Montbéliard (France) 2 LMS-E.N.S.M.M., 26, Besançon (France) 3 L.A.R.N., Faculté des Sciences, Département de Physique, Namur (France)

WeP8 CHARACTERISATION OF BLACK PLASMA ELECTROLYTIC OXIDATION

COATINGS ON ALUMINIUM ALLOYS T. Pilkington1, A.L. Yerokhin1, A. Leyland1, A. Matthews1, P. Shashkov2, V. Samsonov2, A. Shatrov2 1 Department of Engineering Materials, University of Sheffield (United Kingdom) 2 Keronite Ltd., Abington, Cambridge (United Kingdom)

WeP9 IMPROVED RESISTIVITY OF ION DOPED DC SPUTTERED ZnO:(Al) FILMS

FROM NOVEL CERAMIC TARGET MATERIAL Florian Ruske1, Volker Sittinger1,Bernd Szyszka1, Wolfgang Werner1, Karl-Uwe van Osten2, Klaus Dietrich2, Ricarda Rix2 1 Fraunhofer IST, Braunschweig (Germany) 2 GfE Metalle und Materialien GmbH, Nürnberg (Germany)

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WeP10 LOW-TEMPERATURE ACTIVATION OF ION-IMPLANTED NANO-SCALE

DOPANT LAYER FOR ULTRA-SHALLOW SEMICONDUCTOR JUNCTION FORMATION BY NONEQUILLIBRIUM PHONON EXCITATION PROCESSES Y. Setsuhara1, M. Hashida2, M. Fuita3, K. Takahashi1 and K. Ono1 1 Department of Aeronautics and Astronautics, Kyoto University, Yoshida-honmachi, Sakyo-ku, Kyoto (Japan) 2 Institute for Chemical Research, Kyoto University, Gokasho Uji, Kyoto (Japan) 3 Institute for Laser Technology, Suita, Osaka (Japan)

WeP11 EXCIMER LASER INDUCED CRYSTALLIZATION OF AMORPHOUS

HYDROGENATED CARBON-GERMANIUM FILMS FABRICATED BY PLASMA CVD J. Tyczkowski, P. Kazimierski, Y. Hatanaka1, T. Aoki2 Technical University of Lodz, Faculty of Process and Environmental Engineering, Lodz (Poland) 1 Aichi University of Technology, Manori, Nishihazama-cho Gamagohri, Aichi (Japan) 2 Research Institute of Electronics, Shizuoka University, Johoku, Hamamatsu (Japan)

Poster – Plasma Polymerisation WeP12 DEPOSITION OF THE ORGANIC POLYMER THIN FILMS BY PECVD AND

COMPARISON OF THEIR PHYSICAL AND ELECTROCHEMICAL PROPERTIES S. H. Cho, I.-S. Bae, Y. J. Yu1, and J. G. Kim1, J.-H. Boo Department of Chemistry, SungKyunKwan University, Suwon (Korea) 1 Department of Advanced Materials Engineering, SungKyunKwan University, Suwon (Korea)

WeP13 PLASMA POLYMERIZATION OF DYE-CONTAINING THIN FILMS

A. Barranco, M. Bielmann, O. Groening, R. Wildmer, P. Groening Swiss Federal Laboratories for Materials Testing and Research-EMPA, Thun (Switzerland) Solid State Physics Group, Physics Dept. University of Fribourg (Switzerland)

WeP14 INFLUENCE OF THE SUBSTRATE CONDITION ON THE NUCLEATION OF

PLASMA-PARYLENE COMPOSITE FILMS G. Dinescu, B. Mitu, C. Petcu National Institute for Laser, Plasma and Radiation Physics, Magurele, Bucharest (Romania)

WeP15 SEMI-CONDUCTIVE POLYMERIC FILMS OBTAINED BY PLASMA

POLYMERIZATION OF ANTHRACENE IN DC DISCHARGE A. Drachev, A. Gilman, Yu. Fedoseev, E. Demidova, À. Kuznetsov Enikolopov Institute of Synthetic Polymeric Materials, Russian Academy of Sciences (Russia)

WeP16 PLASMA INDUCED POLYMERISATION OF UNSATURATED AMPHIPHILES

IN AEROSOL AND THIN FILMS Jörg Ehlbeck1, Mario Maaß1,Torsten Dwars2, Hans Fuhrmann2, Günther Oehme2 1 Institut für Niedertemperatur-Plasmaphysik, Greifswald (Germany) 2 Leibniz Institut für Organische Katalyse, Rostock (Germany)

WeP17 SPECIFICS OF ALLYL POLYMERIZATION IN PULSED PLASMAS

J. Friedrich, V. Gerstung, R. Mix, G. Kühn Bundesanstalt für Materialforschung und –prüfung, Berlin (Germany)

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WeP18 RF MAGNETRON SPUTTERING OF POLYISOBUTYLENE AND LOW

DENSITY POLYETHYLENE J. Kousal1, J. Hanuš1, A. Choukorov1, P. Hlídek1, H. Biederman1, D. Slavínská1, J. Zemek2

1 Department of Macromolecular Physics, Charles University, Prague (Czech Republic) 2 Institute of Physics, Academy of Sciences, Prague (Czech Republic)

WeP19 DEPOSITION OF METAL PHTHALOCYANINE FILMS BY GLOW DISCHARGE

INDUCED SUBLIMATION FOR GAS SENSING APPLICATIONS G. Maggioni1, S. Carturan1, A. Quaranta2, M. Tonezzer2, A. Patelli3, R. Ceccato2, A. Vomiero1, G. Della Mea2 1 University of Padua c/o INFN - LNL, Legnaro, Padova (Italy) 2 Department of Materials Engineering and Industrial Technologies, University of Trento, Povo (TN) (Italy) 3 Department of Electronics and Informatics, University of Padua, Padova (Italy)

WeP20 A STUDY OF THE MOLECULAR DAMAGE OF POLYIMIDE PRECURSOR

MONOMERS DEPOSITED BY GLOW DISCHARGE INDUCED SUBLIMATION G. Maggioni1, A. Quaranta2, E. Negro2, S. Carturan1, A. Scandurra3, G. Della Mea2 1 University of Padua c/o INFN - LNL, Legnaro, Padova (Italy) 2 Department of Materials Engineering and Industrial Technologies, University of Trento, Povo (TN) (Italy) 3 Laboratorio Superfici e Interfasi - Consorzio Catania Ricerche, c/o ST Microelectronics, Catania (Italy)

WeP21 DC PLASMA-POLYMERIZATION OF PYRROLE: STRUCTURE AND

PROPERTIES F. Nastase, Claudia Nastase and Ioan Stamatin University of Bucharest, Faculty of Physics, 3Nano-SAE Research Centre, Bucharest- Magurele (Romania)

WeP22 TAILOR-MADE SURFACES BY PLASMA POLYMERIZATION OF

ALLYLAMINE AND POST PLASMA REACTIONSJörg Pahnke and Jürgen Rühe Chemistry and Physics of Interfaces, Institute for Microsystem Technology (IMTEK), University of Freiburg (Germany)

WeP23 PLASMA POLYMERISATION OF METHYLPHENYLSILANE AND

PHENYLTRIMETHYLSILANE O. Salyk, P. Broza, N. Dokoupil, R. Herrmann, I. Kuritka1, J. Prycek, M. Weiter Faculty of Chemistry, Brno University of Technology, Brno (Czech Republic) 1 Faculty of Technology, Tomas Bata University in Zlin (Czech Republic)

WeP24 LARGE AREA VHF PLASMA POLYMERISATION ELECTRODE SYSTEM

K. Schade, J. Kuske, S. Röhlecke, F. Stahr, O. Steinke FAP Forschungs- und Applikationslabor Plasmatechnik GmbH, Dresden (Germany)

WeP25 A MASS SPECTROMETRIC STUDY OF CONTINUOUS WAVE PLASMA

POLYMERISATION OF ACRYLIC ACID WITH HELP OF DIFFERENT CARRIER GASES. V. Sciarratta, B. Elkin, M. Müller, U. Vohrer, C. Oehr, H. Brunner Fraunhofer-Institute for Interfacial Engineering and Biotechnology, Stuttgart (Germany)

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WeP26 X-RAY ABSORPTION AND PHOTOELECTRON SPECTROSCOPY ON

PLASMA-POLYMERIZED FILMS PREPARED FROM ORGANIC MOLECULES (ETHYLENE, ALLYL ALCOHOL, STYRENE) S. Swaraj, U. Oran, A. Lippitz, R.-D. Schulze, J. F. Friedrich and W. E. S. Unger Bundesanstalt für Materialforschung und –prüfung (BAM), Berlin (Germany)

Poster - Plasma DiffusionTreatment WeP27 STUDY OF THE DUPLEX TREATMENT ON 32CDV13 LOW ALLOY STEEL:

APPLICATION IN WOOD MACHINING A. Chala1, L. Chekour2, M.A. Djouadi3, C. Saied1, M.S. Aida2, C. Nouveau4 1 Département de Physique, Université de Biskra (Algérie) 2 Laboratoire des couches minces et interfaces, Université de Constantine, (Algérie) 3 Institut des Matériaux Jean Rouxel, Nantes (France) 4 LABOMAP – ENSAM, Cluny (France)

WeP28 ON DOUBLE LAYERS STRUCTURES IN PLASMA ASSISTED NITRIDING OF

AUSTENITIC STAINLESS STEEL AND NICKEL ALLOYS T. Czerwiec, H. He, V. Rigaud, S. Weber, C. Dong, H. Michel Laboratoire de Science et Génie des Surfaces, Ecole des Mines, Nancy (France)

WeP29 THE RECENT PROGRESS IN PLASMA BORIDING -SCALING UP-

P. Kaestner1, J. Brand2, J. Crummenauer3, G. Laudien4, S. J. Son1, K.-T. Rie1

1 Institut für Oberflächentechnik und plasmatechnische Werkstoffentwicklung, IOPW, University of Braunschweig (Germany) 2 Fraunhofer-Institut für Schicht- und Oberflächentechnik, Braunschweig (Germany) 3 Sulzer Metaplas Ionon Oberflächenveredelungstechnik GmbH, Bergisch Gladbach (Germany) 4 Volkswagen AG, Wolfsburg (Germany)

WeP30 EFFECT OF FREQUENCY ON THE PROPERTIES OF AISI 4340 STEEL

J. Alphonsa1, S. Gaurav2, G. Akshat2, G. Jhala1, S. Tiwari3, S. Gupta1 and S. Mukherjee1 1 FCIPT, Institute for Plasma Research, Gandhinagar (India) 2 IIT, Kharagpur (India) 3 NML, Ahmedabad (India)

WeP31 APPLICATION OF PLASMA IMMERSION ION IMPLANTATION FOR

IMPROVED PERFORMANCE OF TOOLS AND INDUSTRIAL COMPONENTS M. Ueda, L.A.Berni, R.M.Castro Associated Laboratory of Plasma, National Institute for Space Research, S.J.Campos, S. Paulo (Brazil)

WeP32 EFFECT OF NITROGEN ON THE PLASMA (ION) CARBURIZED LAYER OF

HIGH NITROGEN AUSTENITIC STAINLESS STEEL SUS316LN(0.56%N) Y. Ueda1, N. Kanayama1, K. Ichii2, T. Oishi2 and H. Miyake2 1 Shimane Institute for Industrial Technology, Shimane (Japan) 2 Faculty of Engineering, Kansai University, Osaka (Japan)

Poster – Ion Beam and Plasma Immersion Techniques WeP33 ENERGETIC NEUTRAL GENERATION IN COLLISIONAL CATHODE SHEATH

K.S. Suraj and S. Mukherjee FCIPT, Institute for Plasma Research, Gandhinagar (India)

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WeP34 ELECTROCHEMICAL CORROSION PROPERTIES OF AISi 304 SS TREATED

BY LOW, INTERMEDIATE AND HIGH TEMPERATURE PLASMA IMMERSION ION IMPLANTATION IN A TOROIDAL VESSEL A. E. Muñoz-Castro1, R. Valencia A.1, S. R. Barocio1, R. López-Callejas1,2, A.Mercado-Cabrera1, O. G. Godoy-Cabrera1,2, D. A. Fuentes-González1, and J. Arellano-Calderón1,2 1 Instituto Nacional de Investigaciones Nucleares, Plasma Physics Laboratory, México D.F. (México) 2 Instituto Tecnológico de Toluca, Electrical and Electronic Department, Toluca (México)

WeP35 NITRIDE FORMATION IN TRANSITION METALS DURING HIGH DOSE –

HIGH TEMPERATURE IMPLANTATION S. Mändl, J.W. Gerlach, B. Rauschenbach Leibniz-Institut für Oberflächenmodifizierung, Leipzig (Germany)

WeP36 TWO-DIMENSIONAL SHEATH EVOLUTION IN METAL PLASMA IMMERSION

ION IMPLANTATION S. Mändl1, G. Thorwarth2, B. Stritzker2, B. Rauschenbach1, 1 Leibniz-Institut für Oberflächenmodifizierung, Leipzig (Germany) 2 Universität Augsburg, Experimentalphysik IV, Augsburg (Germany)

WeP37 COMBINED DEPOSITION AND IMPLANTATION OF Cu ON Si USING METAL

PLASMA IMMERSION ION IMPLANATION S. Mändl, B. Rauschenbach Leibniz-Institut für Oberflächenmodifizierung, Leipzig (Germany)

WeP38 IMPROVEMENTS OF TRIBOLOGICAL PROPERTIES OF CrNiMo AND

CrCoMo ALLOYS BY NITROGEN PLASMA IMMERSION ION IMPLANTATION M.Ueda1, L.A.Berni1, R.M.Castro1, H.Reuther2, M.Lepienski3, P.C.Soares Jr3 1 Associated Laboratory of Plasma, National Institute for Space Research, S.J.Campos, S.Paulo (Brazil) 2 Institute of Ion Beam Physics and Materials Research, Center Rossendorf, Dresden (Germany) 3 Department of Physics, Federal University of Paraná (Brazil)

WeP39 LOW LOSS WAVEGUIDE IN Nd3+-DOPED SILICATE GLASS FABRICATED

BY CARBON ION IMPLANTATION Shi-Ling Li1, , Ke-Ming Wang1,2, Feng Chen1, Xue-Lin Wang1, Gang Fu1, Qing-Ming Lu3, Li-Li Hu4, Ding-Yu Shen5, Hong-Ji Ma5, Rui Nie5 1 School of Physics and Microelectronics, Shandong University (China) 2 State Key Laboratory of Crystal Materials, Shandong University (China) 3 School of Chemistry and Chemical Engineering, Shandong University (China) 4 Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai (China) 5 Department of Technical Physics & the Key Laboratory of Heavy Ions Physics, Ministry of Education, China, Peking University, Beijing (China)

Poster – High Rate Deposition and Pulsed Plasmas WeP40 HIGH-RATE REACTIVE MAGNETRON SPUTTERING OF TRANSPARENT

TITANIUM DIOXIDE FILMS J. Musil, P.Baroch and D. Herman Department of Physics, University of West Bohemia, Plzen (Czech Republic)

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WeP41 COMPOSITION OF TI-C:H FILMS OBTAINED BY PULSED AND

CONTINUOUS MAGNETRON SPUTTERING V. Kulikovsky1,2, A. Kuzmichev3, P. Bohac1, K. Jurek1 and L. Jastrabik1

1 Institute of Physics, ASCR, Prague (Czech Republic) 2 Institute for Problems of Materials Science, Academy of Sciences of Ukraine, Kiev (Ukraine) 3 National Technical University of Ukraine “Kiev Polytechnical Institute”, Kiev (Ukraine)

WeP42 INFLUENCING OF PLASMA AND COATINGS DURING THE PHYSICAL

VAPOUR DEPOSITION THROUGH COMBINATION OF STEERED ARC AND MODIFIED PULSED ARC PROCESS E. Hettkamp; H. Mecke Otto-von-Guericke-University of Magdeburg; Institute of Electric Power Systems; Magdeburg (Germany)

WeP43 INVESTIGATIONS OF SILICON NITRIDE LAYERS DEPOSITED IN PULSED

MICROWAVE GENERATED AMMONIA-SILANE PLASMAS U. Schweitzer, J. Krüger, J. Schneider, M. Walker, and U. Schumacher, Institut für Plasmaforschung, Universität Stuttgart (Germany)

WeP44 HIGH-POWER PULSED MAGNETRON SPUTTERING WITH A GROOVED

TARGET J. Lukas, J. Lestina, J. Musil, and J. Vlcek Department of Physics, University of West Bohemia, Plzen (Czech Republic)

WeP45 COMPARISON OF THE OPERATING CHARACTERISTICS OF AN OPPOSED

TARGET MAGNETRON USING FERROMAGNETIC AND NON-FERROMAGNETIC TARGETS T. Moiseev and D. C. Cameron National Centre for Plasma Science and Technology, Dublin City University (Ireland)

WeP46 BEHAVIOUR OF SURFACE TEMPERATURE OF SUBSTRATE AT PULSED

VACUUM – PLASMA PROCESSING. A.A.Bizyukov, A.Y.Kashaba, E.V.Romaschenko*, K.N.Sereda Kharkiv National University, Kharkiv (Ukraine) * East-Ukrainian National University, Lugansk (Ukraine)

WeP47 TEMPORAL AND SPATIAL SURVEY OF PLASMA PARAMETERS IN A

PULSED MAGNETRON DISCHARGE A Vetushka, S Thompson and J W Bradley Dept. of Physics, UMIST, Manchester (United Kingdom)

WeP48 INNOVATIVE PULSED PLASMA POWER SUPPLIES

S. Wimmer, Thomas Müller; Roland Kullmer MICROPULS® Plasmagenerators, Rübig GmbH & Co KG, Wels (Austria)

WeP49 EFFECT OF PLASMA TEMPERATURE AND PLASMA PULSATION

FREQUENCY ON ATOMIC NITROGEN PRODUCTION T. Godfroid, J. P. Dauchot, M. Hecq Université de Mons-Hainaut, laboratoire de Chimie Inorganique et Analytique Bâtiment Materia-Nova, Parc Initialis, Mons (Belgium)

Poster – Atmospheric Pressure Processes WeP50 STUDY OF THE CHARACTERISTICS OF A PLASMA REACTOR FOR THE

PROMOTION OF CHEMICAL REACTIONS R.Benocci, C.Broggi, M. Piselli, C. Riccardi

Università degli Studi di Milano-Bicocca, Dipartimento di Fisica, Milano (Italy)

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WeP51 SILICON NITRIDE DEPOSITION ON TEMPERATURE SENSITIVE PARTS AT

ATMOSPHERIC PRESSURE BY MEANS OF ARC ACTIVATED CVD Daniela Rogler1, Gerrit Mäder1, Volkmar Hopfe1, Ines Dani1, Klaus Landes2, Eckart Theophile2, Ulrich Kreißig3 1 Fraunhofer Institute Material Beam Technology, Dresden (Germany) 2 University of Federal Armed Forces, Munich (Germany) 3 Forschungszentrum Rossendorf (Germany)

WeP52 ATMOSPHERIC PRESSURE MICROWAVE CVD FOR DEPOSITION

FUNCTIONAL LAYERS - CHARACTERISATION OF SILICA LAYER PROPERTIES Liliana Roch, Volkmar Hopfe, Ines Dani, Beate Leupolt, Bolko Schöneich, Romy Liske, Wulf Grählert1, B. Schuhmacher, C. Ostwald2, Simon Hurst, Benito Guillermo3 1 Fraunhofer Institute Material and Beam Technology, IWS, Dresden (Germany) 2 ThyssenKrupp Stahl AG / Dortmunder Oberflächencentrum GmbH (Germany) 3 Pilkington European Technical Centre

WeP53 EFFECTS OF INDIUM-THIN-OXIDE (ITO) SURFACE PRE-CLEANING USING

He/O2 ATMOSPHERIC PRESSURE PLASMA ON THE PERFORMANCE OF EL DEVICES J. H. Lee, C.H. Jeong, N.G. Jo, J.T. Lim, Y.H. Lee, S.J. Kyung, and G.Y. Yeom Dept. of Materials Engineering, Sungkyunkwan Univ. Suwon, Kyunggi (Korea)

WeP54 SURFACE TREATMENT OF POLYMER MATERIALS USING AN

ATMOSPHERIC COLD PLASMA JET AND THEIR SURFACE CHARACTERISTICS D. K. Song1,2, S. H. Baeg1, M. H. Baeg1, S. H. Yang1 and S. G. Kang2 1 Nano Surface Technology Team, Korea Institute of Industrial Technology, Cheonan (Korea) 2 Surface Engineering Lab, Division of Materials Science and Engineering, Han-yang University, Seoul (Korea)

WeP55 SURFACE MODIFICATION OF COTTON FIBRE WITH A GLOW DISCHARGE

IN AMBIENT AIR Eef Temmerman1, Christophe Leys1 and Yuri Akishev2 1 Department of Applied Physics, Ghent University, Ghent (Belgium) 2 State Research Centre of Russian Federation TRINITI, Troitsk, Moscow Region (Russia)

WeP56 PLASMA CLEANING OF „ENDLESS" SUBSTRATES BY USE OF A TANDEM

DIELECTRIC BARRIER DISCHARGE M. Teschke, D. Korzec, E. G. Finantu-Dinu, J. Engemann Forschungszentrum für Mikrostrukturtechnik, University of Wuppertal (Germany)

WeP57 CHARACTERISATION OF POLYMER FILMS PRODUCED BY A DBD IN AR /

FLUOROCARBON MIXTURES I. P. Vinogradov and A. Lunk Institut für Plasmaforschung, Universität Stuttgart (Germany)

WeP58 3-IN-1"-PLASMA WIRE SYSTEM

D. Wandke, W. Viöl University of Applied Sciences and Arts, Department of Science and Technology, Göttingen (Germany)

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WeP59 SURFACE MODIFICATION OF WOOD AND TIMBER MATERIALS BY

DIELECTRIC BARRIER DISCHARGES A. Wolkenhauer, G. Avramidis, P. Rehn, W. Viöl University of Applied Sciences and Arts, Department of Science and Technology, Göttingen (Germany)

Poster – Hybrid and Duplex Processes WeP60 DUPLEX TREATMENT FOR THE ENHANCEMENT OF COMPONENTS

WORKING LIFE D. Braga1, J.P. Dias1, A. Cavaleiro2 1 LED-IPN, Instituto Pedro Nunes, Coimbra (Portugal) 2 ICEMS, Departamento de Engenharia Mecanica, Universidade de Coimbra, (Portugal)

WeP61 PLASMA STUDY OF A DLC/TiC/Ti PARALLEL DEPOSITION PROCESS

COMBINING PULSED LASER DEPOSITION AND MAGNETRON SPUTTERING J. Bulír, M. Novotný, M. Jelínek, T. Kocourek, V. Vorlícek, V. Studnicka Institute of Physics, Academy of Sciences of the Czech Republic (Czech Republic)

WeP62 IMPROVEMENT OF LASER SINTERED TOOLS WITH PVD COATINGS

P. Panjan1, S. Dolinšek2, M. Dolinšek3, M. Tušek4, M. Cekada1 1 Jozef Stefan Institute, Ljubljana (Slovenia) 2 University of Ljubljana, Faculty of Mechanical Engineering, Ljubljana (Slovenia) 3 Regional Technological Center Zasavje, Hrastnik (Slovenia) 4 TKC d.o.o., Ljubljana (Slovenia)

WeP63 TRANSIENT LOW-TEMPERATURE ATOMIC AND MASS TRANSPORT AND

OTHER PROCESSES IN NANO-STRUCTURED Al2O3 CERAMICS S. M. Duvanov, Applied Physics Institute, National Academy of Sciences of Ukraine, Sumy (Ukraine)

WeP64 MODIFICATION OF TRIBOLOGICAL PROPERTIES OF NITROGEN

IMPLANTED PVD COATINGS R.J. Rodríguez, M. Rico, A. Medrano, G. G. Fuentes, R. Martínez, B. Lerga and J.A. García. AIN Centro de Ingeniería Avanzada de Superficies, Cordovilla – Pamplona (Spain)

WeP65 IPVD DEPOSITION OF TITANIUM BASED THIN FILMS

J.C. Imbert, C. Boisse-Laporte, L. de Poucques, L. Teule-Gay, O. Voldoire, M. Touzeau and J. Bretagne. Laboratoire de Physique des Gaz et des Plasmas, Université Paris-Sud, ORSAY (France)

WeP66 THE SYNTHESIS OF WC-TI THIN FILM DEPOSITED BY HYBRID COATING

SYSTEM W.S. Jung1, H.Y. Lee1, J.G. Han1, J.H. Kim2, S.M. Seo2, E.H. Bae2 1 Center for Advanced Plasma Surface Technology, Sung Kyun Kwan University, Suwon (Korea) 2 Research complex, Max plasma Co., Sung Kyun Kwan University, Suwon (Korea)

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WeP67 SYNTHESIS OF TiB2 COATINGS BY ICP ASSISTED DC MAGNETRON

SPUTTERTING Bohwan Park1, Dong-Ha Jung1, Hoon Kim1, Keun-Cheol Yoo1, Jung-Joong Lee1, Jung-Hoon Joo2 1 School of Mater. Sci. Eng., Seoul National University, Seoul (Korea) 2 Department of Materials Science and Engineering, Kunsan National University (Korea)

Poster – In-situ Process Control WeP68 ALGORITHM FOR PRESSURE CONTROL OF INDUSTRIAL PLASMA-

CHEMICAL REACTORS G. Ayvazyan, R. Barsegyan, and A. Gyurjyan Engineering Academy of Armenia, Yerevan (Armenia)

WeP69 POST-PROCESS-ANALYSES OF THE TEMPORAL FILM DEVELOPMENT

THROUGHOUT PHYSICAL VAPOR DEPOSITION BY USING THE COATINGWATCH Frank Hollstein1, Renate Ohser-Wiedemann2, Tomas Nowotny3

1 TECHNO-COAT Oberflaechentechnik GmbH (Germany) 2 Freiberg University of Mining and Technology - Institute of Physical Metallurgy ( Germany) 3 Hochschule Zittau/Goerlitz (FH) – University of Applied Sciences (Germany)

WeP70 PROCESS CONTROL FOR HIGH RATE REACTIVE DEPOSITION OF Al

DOPED ZnO FILMS USING ICP-ASSISTED MAGNETRON SPUTTERING S. J. Jung1, B. M. Koo1, Y. H. Han1, J. J. Lee1, and J. H. Joo2

1 School of Materials Science and Engineering, Seoul National University (Korea) 2 Department of Materials Science and Engineering, Kunsan National University, Kunsan (Korea)

WeP71 Mo/Si MULTILAYER GROWTH MONITORING BY REAL TIME IN SITU

SPECTROSCOPIC ELLIPSOMETRY Eva Schubert, S. Mändl, H. Neumann, B. Rauschenbach Leibniz-Insitut für Oberflächenmodifizierung Leipzig e.V., Leipzig (Germany)

Poster – Polymer and Textile Treatment WeP72 ElECTROSPUN NON-WOVEN MATS OF EVOH

Yujun Zhang1,2, Yudong Huang1, Guifen Gong2, Zhenhao Jin2 1 Dept. of Applied Chemistry, Harbin Institute of Technology (China) 2 School of Materials Science and Engineering, Harbin University of Science and Technology (China)

WeP73 COMPERATIVE STUDY OF PLASMA-INDUCED AND WET-CHEMICAL

CLEANING OF SYNTHETIC FIBERS M. Keller, A. Ritter, D. Hegemann and A. Fischer Swiss Federal Laboratories for Materials Testing and Research (EMPA), Laboratory for Functional Fibers and Textiles, St. Gallen (Switzerland)

WeP74 DEPOSITION OF TECHNICAL TEXTILES WITH WATER-/OIL-REPELLENT

COATINGS IN A DIELECTRIC BARRIER DISCHARGE AT ATMOSPHERIC PRESSURE A. Dinkelmann1, A. Lunk2 , M. Shakhatre2 , T. Stegmaier1 , I. Vinogradov2

1 Institut für Textil- und Verfahrenstechnik Denkendorf (Germany) 2 Institut für Plasmaforschung, Universität Stuttgart (Germany)

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WeP75 PENETRATION OF THE OXYGEN PLASMA THROUGH LAYERS OF THE

PES FABRICS T. Vatuna, P. Špatenka Technical University of Liberec, Faculty of Mechanical Engineering, Department of Material Science (Czech Republic)

Poster – Nano Structures WeP76 MICROCHEMICAL, MECHANICAL AND WEAR RESISTANT

CHARACTERISTICS OF ARC PLASMA DEPOSITED TICN/ZRCN SUPERLATTICE COATINGS M. Balaceanu, M. Braic, V. Braic, G. Pavelescu National Institute for Optoelectronics, Bucharest (Romania)

WeP77 ZrN/TiN MULTILAYERS AS DEBRIS SHIELDS FOR EUV MIRRORS GROWN

M. Braic1, P. Choi2, C. Dumitrescu2, M. Balaceanu1

1 Tehnoprof Centre, National Institut for Optoelectronics, Magurele-Bucharest (Romania) 2 EPPRA, SILIC, Courtaboeuf (France)

WeP78 INVESTIGATION OF STRUCTURED TiAlN- AND TiOX-COATINGS WITH

MOTHEYE-LIKE SURFACE MORPHOLOGIES F. Burmeister, E. Schaeffer , G. Kleer, W. Doell Fraunhofer Institut für Werkstoffmechanik, Freiburg (Germany)

WeP79 STUDING THE GROWTH CONDITIONS, THE ALIGNMENT AND

STRUCTURE OF THE ZnO NANORODS J. Grabowska*, K. K. Nanda, E. McGlynn, J. -P. Mosnier and M. Henry School of Physical Sciences and National Centre for Plasma Science & Technology, Dublin City University, Glasnevin, Dublin (Ireland)

WeP80 TOPOGRAPHIC PROCESSING OF ELASTOMER SURFACES

F. Katzenberg Universität Dortmund (Germany)

WeP81 XRD AND RBS STRUCTURAL REFINEMENT OF SIMULTANEOUS

DEPOSITION OF TiAlN/Mo MULTILAYERS C. Vidrago1, C.J. Tavares1, L Rebouta1, E. Alves2, J.P. Rivière3

1 Depto. de Física, Universidade do Minho, Azurém, Guimarães (Portugal) 2 Instituto tecnológico e Nuclear, Sacavém (Portugal) 3 Lab. de Metallurgie Physique, Université de Poitiers, Futuroscope (France)

Poster – Laser Treatment and Thermal Spraying WeP82 LASER CLEANING AND NITRIDING OF IRON SURFACES BY IN AIR LASER

TREATMENT A.-L. Thomann1, A. Basillais1, M. Wegscheider1, N. Semmar1, C. Boulmer-Leborgne1, A. Péreira2, P. Delaporte2, M. Sentis2 1 GREMI, CNRS/Université d’Orléans (France) 2 P3, CNRS/Université de la Méditerranée, Pôle scientifique de Luminy, Marseille (France)

WeP83 APPLICATION OF ULTRA MICRO-INDENTATION AND SCRATCH

TESTS ON FeCr COATINGS ON STEEL SUBSTRATES H. Cetinel, M. Toparli, E. Celik, T. Aksoy Dokuz Eylul University, Metallurgical and Materials Engineering, Bornova, Izmir (Turkey)

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WeP84 PRETREATMENT FOR PLASMA SPRAY PROCESSING BY CATHODE

SPOTS OF LOW PRESSURE ARC Tsuginori Inaba1, Yuya Kubo2, Satoru Maezono2, Masayuki Hara2, Toru Iwao3, Hiroshi Ogura4, Shogo Tobe4 1 Chuo University, Faculty of Science and Engineering, Department of Electrical, Electronic, and Communication Engineering, Tokyo (Japan) 2 Chuo University, Graduate School of Science and Engineering, Course of Electrical, Electronic, and Communication Engineering, Tokyo (Japan) 3 Musashi Institute of Technology, Faculty of Engineering, Department of Electrical and Electronic Engineering, Tokyo (Japan) 4 Ashikaga Institute of Technology, School of Engineering, Department of Mechanical Engineering, Tochigi (Japan)

WeP85 WEAR BEHAVIOR OF FLAME-SPRAYED Al2O3-TiO2 COATINGS ON PLAIN

CARBON STEEL SUBSTRATES I. M. KUSOGLU1, B. UYULGAN1, E. ÇELIK1,2 and Ö. DEMIRKURT2 1 Dokuz Eylul University, Faculty of Engineering, Dept. of Metallurgical and Materials Engineering, Bornova, Izmir (Turkey) 2 Kroma, AOSB, Izmir (Turkey)

WeP86 HVOF THERMAL SPRAYED COATINGS ON ALUMINIUM ALLOYS AND

ALUMINIUM MATRIX COMPOSITES J. A. Picas1, A. Forn1, R. Rilla2 and E. Martín1 1 Materials Science Department, Polytechnic University of Catalonian, Vilanova i

la Geltrú (Spain) 2 RALSA (Rilla, Alvarez y López, S.A.). Langreo (Spain)

WeP87 EXPERIMENTAL STUDY OF EFFECTIVE EFFICIENCY IN A CERAMIC

COATED DIESEL ENGINE I. Taymaz1, K.Çakir and A. Mimaroglu 1 Faculty of Engineering, University of Sakarya, Esentepe Kampusu, Adapazari-(Turkey)

WeP88 THERMAL BEHAVIOUR OF HVOF SPRAYED WC–BASED COATINGS

C. Tekmen1, A. Turk2, E. Celik1, O. Culha1 1 Dokuz Eylul University, Metallurgical and Materials Engineering, Izmir (Turkey) 2 Sakarya University, Metallurgical and Materials Engineering, Sakarya (Turkey)

WeP89 THE EFFECT OF THERMAL CYCLING CONDITIONS ON THE FAILURE

BEHAVOUR OF MgZrO3 COATINGS C. Tekmen1, I. Ozdemir1,2, E. Celik1, U. Cocen1, Y. Tsunekawa2

1 Dokuz Eylul University, Metallurgical and Materials Engineering, Bornova, Izmir (Turkey) 2 Toyota Technological Institute, Material Processing Lab, Hisakata Tempaku, Nagoya (Japan)

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Poster – Wear Resistance ThP1 COMBINATION COATINGS IN B-C-N AND Ti-B-N SYSTEM FOR

TOOLS – CHARACTERIZATION AND APPLICATION TESTS M.Keunecke1, K.Bewilogua1, E. Wiemann2, H. Thomsen1, R. Wittorf1 1 Fraunhofer-Institute for Surface Engineering and Thin Film (IST), Braunschweig (Germany) 2 Institute for Machine Tools and Factory Management, Technical University Berlin (Germany)

ThP2 WEAR BEHAVIOUR OF NANO-STRUCTURED PVD HARD COATINGS

TiAlCrYN IN HIGH SPEED MILLING OF AUTOMOTIVE ALUMINIUM-SILICON ALLOYS Q. Luo1, P.Eh. Hovsepian1, G. Robinson1, M. Howarth1, R. Ebner2, W. Liebfahrt3, A. Deeming4, T. Zeus5, A. Herrmann6

1 Materials Research Institute, Sheffield Hallam University, Sheffield (United Kingdom) 2 Werkstoff-Kompetenzzentrum Leoben, Leoben (Austria) 3 Böhler Edelstahl GmbH & Co KG, Kapeenberg (Austria) 4 Hydra Clarkson International, Sheffield (United Kingdom) 5 Emuge Werk Richard Glimpel GmbH & Co. KG, Lauf (Germany) 6 Advanced Process Technologies, Centro Ricerche Fiat, Torino (Italy)

ThP3 EFFECT OF MICRO-BLASTING AND POLISHING OF COATED CUTTING

INSERT SUBSTRATES AND SURFACES ON THEIR MILLING PERFORMANCE K.–D. Bouzakis1, G. Skordaris1, N. Michailidis1, G. Erkens2 1 Laboratory for Machine Tools and Manufacturing Engineering, Mechanical Engineering Department, Aristoteles University of Thessaloniki (Greece) 2 CemeCon AG, Würselen (Germany)

ThP4 PVD HARD COATINGS APPLIED FOR WEAR PROTECTION OF DRAWING

DIE P. Panjan1, I. Boncina2, J. Bevk2, M. Cekada1 1 Jožef Stefan Institute, Ljubljana (Slovenia) 2 Kolektor d.o.o., Idrija (Slovenia)

ThP5 WEAR BEHAVIOUR OF HVOF SPRAYED WC-BASED COATINGS

E. Celik1, C. Tekmen1, B. Uyulgan1, O. Culha1, A. Turk2 1 Dokuz Eylul University, Metallurgical and Materials Engineering, Bornova, Izmir (Turkey) 2 Sakarya University, Metallurgical and Materials Engineering, Sakarya (Turkey)

ThP6 TRIBOLOGICAL BEHAVIOUR OF Cr2O3 COATINGS AS BEARING

MATERIALS E. Celik, H. Cetinel, C. Tekmen

Dokuz Eylul University, Metallurgical and Materials Engineering, Bornova, Izmir (Turkey)

ThP7 INVESTIGATION ON TiAlN/ZrN COATINGS FOR GLASS MOULDING

APPLICATIONS M. Hock, G. Kleer Fraunhofer-Institut für Werkstoffmechanik, Freiburg ( Germany)

ThP8 WEAR BEHAVIOUR OF MARTENSITIC STAINLESS STEEL AFTER PIII

SURFACE TREATMENT D. Manova, S. Mändl, H. Neumann, B. Rauschenbach Leibniz-Institut für Oberflächenmodifizierung, Leipzig (Germany)

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ThP9 DEPOSITION OF CrN COATINGS BY CVD AND PVD FOR WEAR

RESISTANCE APPLICATION Siddhartha K. Pradhan, C. Nouveau La.Bo.Ma.P., ENSAM, Cluny (France)

ThP10 LOW TEMPERATURE ION NITRIDING OF THE CUTTING KNIVES MADE OF

HSS STEEL P. Beer1, J. Rudnicki2, S. Bugliosi3, A. Sokolowska2,4, E. Wnukowski5

1 Department of Machines Construction Faculty of Wood Technology, AR in Poznan (Poland) 2 Faculty of Materials Sciences and Engineering, Warsaw University of Technology (Poland) 3 Instituto di Scienza e Technologia dei Materiali Ceramici , C.N.R., Orbassano (IO) (Italy) 4 Institute of Materials Science, Lódz University of Technology, Lódz (Poland) 5 GASS Ltd., Suwalki (Poland)

ThP11 WEAR BEHAVIOUR OF THERMALLY FLAME SPRAYED FeCr COATINGS

ON PLAIN CARBON STEEL SUBSTRATE B. Uyulgan1, E. Celik1, N.F. Ak1, I. Ozdemir2 1 Dokuz Eylul University, Metallurgical And Materials Engineering, Bornova, Izmir (Turkey) 2 Material Processing Lab., Toyota Technological Inst. 2-R-1, Hisakata, Tempaku Nogaya (Japan)

ThP12 SCRATCH RESISTANCE AND WEAR OF CrNX COATINGS

P. van Essen 1,2, R. Hoy1, J.-D. Kamminga1, G.C.A.M. Janssen2, A.P. Ehiasarian3 1 Netherlands Institute for Metals Research, Delft (The Netherlands) 2 Delft University of Technology, Department of Materials Science and Engineering, Delft (The Netherlands) 3 Materials Research Institute, Sheffield Hallam University (United Kingdom)

ThP13 ELEMENTAL DISTRIBUTIONS AND INTERMIXING IN TiAlN/VN

SUPERLATTICE HARD COATINGS AT ANGSTROM RESOLUTION Zhaoxia Zhou, W Mark Rainforth, U Falke1, A Bleloch1, Papken Eh Hovsepian2, and W -Dieter Münz2 Department of Engineering Materials, The University of Sheffield (United Kingdom) 1 SuperSTEM at Daresbury laboratory, Daresbury, Cheshire (United Kingdom) 2 Materials Research Institute, Sheffield Hallam University (United Kingdom)

ThP14 BALL CRATERING AN EFFICIENT TOOL FOR WEAR RATE

DETERMINATION OF THIN COATINGS LOCAL WEAR MECHANISMS ON PERFORATED SCOATINGS Christian Leroy1, Kirsten Ingolf Schiffmann2, Karel van Acker3, Jürgen von Stebut1 1 LSGS, Nancy (France) 2 Fraunhofer Institut für Schicht- und Oberflächentechnik, Braunschweig (Germany) 3 VITO, Mol (Belgium)

ThP15 INVESTIGATION OF SEVERAL PVD COATINGS FOR BLIND HOLE TAPING

IN AUSTENITIC STAINLESS STEEL A. Reiter1, B. Brunner2, M. Ante1, J. Rechberger2 1 BALZERS Ltd., Balzers (Liechtenstein) 2 FRAISA SA., Bellach (Switzerland)

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Poster – Tribology ThP16 TRIBOLOGICAL BEHAVIOUR OF W-ti-N SPUTTERED THIN FILMS

P. N. Silva1, J.P. Dias1, A. Cavaleiro2 1 LED&MAT – Instituto Pedro Nunes, Coimbra (Portugal) 2 ICEMS - Departamento de Engenharia Mecanica - FCTUC, Coimbra (Portugal)

ThP17 WEAR BEHAVIOUR OF ELECTRIC ARC SPRAYED CuSn COATING

E. Dokumaci, E. Celik, M. I. Muglali, M. Toparli Dokuz Eylül University, Metallurgical and Materials Engineering, Izmir (Turkey)

ThP18 MAGNETRON SPUTTERING OF CrN COATINGS WITH ADDITIONS OF

ALUMINIUM: MECHANICAL AND TRIBOLOGICAL STUDY M. Brizuela1, A. García-Luis1, I. Braceras1, J.I. Oñate1, J.C. Sánchez-López2, D. Martínez-Martínez2, C. López-Cartes2, A. Fernández2 1 FUNDACION INASMET, Donostia-San Sebastián (Spain) 2 Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. Sevilla) (Spain)

ThP19 THE TRIBOLOGICAL BEHAVIORS OF Ti-Al-Si-N COATING LAYERS WITH

DIFFERENT COUNTERPART MATERIALS AND SLIDING SPEEDS Hyeong-Ho Jin, Jung Wook Kim, Young-Rae Cho, Kwang Ho Kim, Seog-Young Yoon School of Materials Science and Engineering, Pusan National University, Busan (South Korea)

ThP20 NANOSTRUCTURE INFLUENCE ON DLC-Ag TRIBOLOGICAL COATINGS

C. P. Lungu1, I. Mustata1, G. Musa1, A. M. Lungu1, V. Zaroschi1 K. Iwasaki2, R. Tanaka2, T. Oi2, K. Fujita2 1 National Institute for Lasers, Plasma and Radiation Physics, Magurele-

Bucharest (Romania) 2 Japan Ultra-high Temperature Materials Institute, Ube, Yamaguchi (Japan)

ThP21 DETERIORATION MECHANISMS OF ALUMINUM EXTRUSION DIE AND THE

LIFE-TIME IMPROVEMENT OF THE DIE WITH PVD COATINGS S. Masa1, S. Matsuoka2, M. Nose3, T. Ishikuro4 and T.Yago5 1 Graduate school of Toyama Prefectural University, Kurokawa, Kosugi (Japan) 2 Dept. of Mechanical Engineering, Toyama Prefectural University, Kurokawa, Kosugi (Japan) 3 Takaoka National College (Japan) 4 Industrial Research Center (Japan) 5 Hokunetsu Co. Ltd., Toyama (Japan)

ThP22 THE TRIBOLOGICAL AND THERMO-TRIBOLOGICAL BEHAVIOUR OF PVD COATINGS: A COMPARATIVE INVESTIGATION G. Nayal Institute of Materials Research, Aleppo (Syria)

ThP23 FUNCTIONALLY GRADED Ti-CNX(H) COATINGS WITH ENHANCED

TRIBOLOGICAL PROPERTIES D. Boscarino1, S. Vezzù2, S. Restello2, V. Rigato2 1 Thin Films srl, Padova (ITALY) 2 INFN-Laboratori Nazionali di Legnaro, Legnaro (PD) (ITALY)

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ThP24 TRIBOLOGY IN DRY MACHINING USING (Cr,Al)N AND (Ti,Al)N COATED

TOOLS C. Berger1, E. Abele2, E. Broszeit1, H. Hoche1, H. Scheerer1, B. Schramm2 1 Institute of Materials Technology, Darmstadt University of Technology (Germany) 2 Institute of Production Management, Technology and Machine Tools, Darmstadt University of Technology (Germany)

ThP25 SLIDING WEAR BEHAVIOR OF BORONIZED AISI 52100 STEEL

U Sen1, S Sen and H Unal 1 Sakarya University, Technical Education Faculty, Department of Metal Education, Sakarya (Turkey)

ThP26 HARD TRIBOLOGICAL Ti-Si-B-(N) AND Ti-Al-Si-B-(N) COATINGS

D.V. Shtansky1, A.N. Sheveiko1, M.I. Petrzhik1, E.A. Levashov1, A. Leyland2, A.L. Yerokhin2, A. Matthews2 1 Moscow State Institute of Steel and Alloys, Moscow (Russia) 2 Department of Engineering Materials, University of Sheffield, Sheffield (United Kingdom)

ThP27 TRIBOLOGICAL COATINGS: FROM ENIGMA OF CHOICES TO QUALITY

MANAGEMENT Dr. Alexander A. Minewitsch TTZH „Tribologie & Hochtechnologien“, Garbsen (Germany)

Poster - Ultra Hard Materials ThP28 LOW FREQUENCY RF-PAMOCVD OF THE NEW NANOCRYSTALLINE

MULTILAYERED MATERIALS FOR SUPER-HARDNESS APPLICATIONS D.-C. Lim, C. -K. Jung, J. H. Park, and J.-H. Boo* Center for Advanced Plasma Surface Technology and Department of Chemistry, Sungkyunkwan University, Suwon (Korea)

ThP29 DYNAMIC DIAGNOSTICS OF PLASMA-SURFACE INTERACTION DURING

BORON NITRIDE DEPOSITION K. Matsushita and T. Yoshida Department of Materials Engineering, Graduate School of Engineering, The University of Tokyo (Japan)

ThP30 SUPER-HARD CARBON MATERIALS AND BORON NITRIDE LAYERS

PRODUCED ON THE AL2O3-MO CUTTING EDGES A. Olszyna Faculty of Materials Science and Technology, Warsaw University of Technology (Poland)

ThP31 HARD Si-C-N AND Si-B-C-N FILMS PREPARED BY REACTIVE MAGNETRON

SPUTTERING Z. Soukup, J. Vlcek, J. Cizek, S. Potocky, M. Kormunda, V. Perina University of West Bohemia, Dept. of Physics, Faculty of Applied Sciences, Prague (Czech Republic)

ThP32 STUDY OF PLASMA SPRAYED CERAMIC COATINGS FOR HIGH DENSITY

POWER MICROWAVE LOADS N.Spinicchia1, G.Angella3, R.Benocci2, A.Bruschi1, A.Cremona1, G.Gittini1, A.Nardone1, E.Signorelli3, E.Vassallo1 1 Istituto di Fisica del Plasma ENEA-CNR-EURATOM, Milano (Italy) 2 Università di Milano-Bicocca, Dipartimento di Fisica, Milano (Italy) 3 Istituto per l’Energetica e le Interfasi CNR, Milano (Italy)

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Poster – Nano Composites ThP33 CONSTITUTION, MICROSTRUCTURE, PROPERTIES AND PERFORMANCE

OF MAGNETRON SPUTTERED NANOCOMPOSITE COATINGS IN THE SYSTEM Ti-Al-N-C M.Stueber1, U.Albers1, H.Leiste1 1 Forschungszentrum Karlsruhe, Institute of Materials Research I (Germany)

ThP34 GROWTH MORPHOLOGY OF NITRIDE COATINGS SYNTHESIZED UNDER

DIFFERENT CONDITIONS E. Bergmann, A. Toppo; B. Burdet; A. Schuetze; V.H. Derflinger;M. Morstein;T. Cselle; M Tobler Geneva School of Engineering (Switzerland)

ThP35 OXIDATION RESISTANCE AND HARDNESS IN NANO-COMPOSITE TiN/SiNx

COATINGS DEPOSITED BY AN ARC-SPUTTER HYBRID PROCESS F.-J. Haug1, P. Schwaller1, J. Patscheider1, A. Karimi2, M. Tobler3 1 Swiss Federal Laboratories for Material Testing and Research (EMPA), Surfaces, Coatings, and Magnetism, Dübendorf (Switzerland) 2 Swiss Federal Institute of Technology (EPFL), Faculty of Basic Science, Lausanne (Switzerland) 3 Ionbond AG, Olten (Switzerland)

ThP36 HYBRID ICP/ SPUTTER DEPOSITION OF TiC/CaO NANOCOMPOSITE

FILMS FOR BIOMEDICAL APPLICATIONS W. Kulisch1,2, P. Colpo2, P.N. Gibson2, G. Ceccone2, D.V. Shtansky 3, E.A. Levashov3 and F. Rossi2, 1 Department of Natural Sciences, University of Kassel (Germany) 2 Institute for Health and Consumer Protection, Joint Research Centre, Ispra (Italy) 3 Moscow State Institute of Steel and Alloys (Russia)

ThP37 HARD ZrO2/Al2O3 NANOLAMINATED PVD COATINGS EVALUATED BY

NANOINDENTATION A. Portinha1, V. Teixeira1, J. Carneiro1, S. N. Dub2, R. Shmegera2

1 University of Minho - Physics Department, Guimarães (Portugal) 2 Institute for Superhard Materials, Kiev (Ukraine)

ThP38 A COMPARATIVE STUDY OF THE MECHANICAL AND TRIBOLOGICAL

PROPERTIES OF CERAMIC NITRIDE AND NANOSTRUCTURED METALLIC PVD COATINGS PRODUCED BY ELECTRON BEAM EVAPORATION. C. Tsotsos, A. Leyland and A. Matthews Department of Engineering Materials, University of Sheffield (United Kingdom)

Poster – Theory and Modelling (Thin Films, Particle Interaction, Processing, Kinetics) ThP39 FRACTAL BEHAVIOUR OF SIO2 THIN FILMS PREPARED BY MICROWAVE

PECVD Angel Yanguas, Jose Cotrino, Francisco Yubero, Agustin R. Gonzalez-Elipe Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. Sevilla) (Spain)

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ThP40 A MODEL FOR HARDNESS OF THIN COATED SURFACE FROM

STANDARD MICRO-INDENTATION TESTS J. Lesage1, D. Chicot1, A. Pertuz1, P-Y Jouan2, A. Soom3 1 Laboratoire de Mécanique de Lille, UMR CNRS 8107, U.S.T. Lille., IUT A GMP, Le Recueil, Villeneuve d’Ascq (France) 2 Laboratoire des matériaux avancés céramiques, LAMAC, Université de Valenciennes et du Hainaut-Cambrésis, Maubeuge (France) 3 Department of Mechanical & Aerospace Engineering, University at Buffalo, State University of New York, Amherst (USA)

ThP41 MODELLING OF FRACTURE IN COATING SYSTEMS SUBJECTED TO

THERMAL LOADING: USE OF FINITE ELEMENT TECHNIQUE A Mimaroglu, , I Taymaz, K Yilmazçoban and A Ozel University of Sakarya, Faculty of Engineering, Esentepe Kampusu, Adapazari, (Turkey)

ThP42 MECHANICAL PROPERTIES OF YTTRIUM DIBORIDE THIN FILMS

Denis Music, Helmut Dirichs, Raphael Mertens, Carlos Martinez and Jochen M. Schneider Materials Chemistry, Aachen (Germany)

ThP43 THERMAL ANALYSIS FOR CERAMIC COATED PISTON OF A DIESEL

ENGINE I.Taymaz1, U. Kocabicak and M. Firat 1 Faculty of Engineering, University of Sakarya, Esentepe Kampusu, Adapazari (Turkey)

ThP44 NUMERICAL INVESTIGATION OF THERMAL CYCLING IN WC-Ni AND WC-

Co COATINGS USING FINITE ELEMENT METHOD Mustafa Toparli 1, Hakan Cetinel1, Cagri Tekmen1, Erdal Celik1 1 Dokuz Eylul University, Metallurgical and Materials Engineering, Bornova, Izmir (Turkey)

ThP45 INFLUENCE OF INDENTATION DEPTH ON THE DETERMINATION OF THE

APPARENT YOUNG’S MODULUS OF BI-LAYER MATERIAL: EXPERIMENTS AND NUMERICAL SIMULATION. F. Cleymand, O. Ferry, R. Kouitat and J. von Stebut Laboratoire de Science et Génie des Surfaces, UMR CNRS 7570, INPL_Ecole des Mines; Nancy (France)

ThP46 A THREE DIMENSIONAL NUMERICAL STUDY OF VERTICAL INTERNAL

CRACKS IN A COATING/SUBSTRATE SPECIMEN UNDER SLIDING SPHERICAL CONTACT. R. Kouitat Njiwa and J. von Stebut Laboratoire de Science et Génie des Surfaces, UMR CNRS 7570, INPL_Ecole des Mines; Nancy (France)

ThP47 DESCRIPTION OF EVOLUTION OF NEWBORN FORMATIONS ON THE

CATHODE OF GLOW OR MAGNETRON DISCHARGES V.V. Bobkov1, S.S. Alimov1, Vl.V. Bobko2, Yu.V. Slyusarenko3, R.I. Starovoitov1 1 Kharkov National University, Kharkov (Ukraine) 2 Max-Planck-Institut für Plasmaphysik, EURATOM Association, Garching (Germany) 3 Kharkov Insitute of Physics and Technology, National Science Center, Kharkov (Ukraine)

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ThP48 ANOMALOUS INTERACTION OF MOVING ATOMS OR MOLECULES WITH

MODULATED SURFACE Vladimir I. Vysotskii, Nicolae V. Maksyta. Kiev Shevchenko University, Kiev (Ukraine)

ThP49 THE STABILITY ANALYSIS OF REACTIVE SPUTTERING PROCESS WITH

PLASMA CHEMISTRY Chuan. Li; J.H. Hsieh Nanyang Technological University (Singapore)

ThP50 SIMCOAT SIMULATION PROGRAM FOR PROCESS OPTIMISATION IN

INDUSTRIAL VACUUM ARC DEPOSITION S. Völlmar, D. Römer, B. Schultrich Fraunhofer-Institut Werkstoff-und Strahltechnik, Dresden (Germany)

ThP51 3D ETCHING MODELLING IN THE PRESENCE OF COMPLEX SHAPE

CONDUCTORS A.P. Smirnov1, J. J. Oh2, W. Park2, E.A. Sheina1, J. K. Shin2, A. B. Shmelev1 1 Moscow State University faculty of Computation Mathematics and Cybernetics, Moscow (Russia) 2 Samsung Advanced Institute of Technology, Computational Science and Engineering Laboratory, Suwon (Korea)

ThP52 EXPERIMENTAL AND THEORETICAL INVESTIGATIONS OF ION DENSITY

DISTRIBUTION IN PVD COATING CHAMBER WITH SEVERAL CATHODES O. Sobolyev; H. Mecke Otto-von-Guericke-University of Magdeburg; Institute of Electric Power Systems; Magdeburg (Germany)

ThP53 SYSTEM OF LINEAR WIRES IN ANISOTROPIC PLASMA

Yatsenko N.M., Yatsenko E.A. Department of Radiophysics and Electronics, Karazin Kharkiv National University, Kharkiv (Ukraine)

ThP54 ABNORMAL DIFFUSION OF ADSORBED ATOMS ON A SUBSTRATE IN

PLASMA AND CONTRIBUTIONS OF ELECTRON SYSTEM IN SUB-SURFACE LAYER Sadaharu Yoneda, Yoshihiro Furusato, Shinya Ohwatari, Masataka Taniguchi, Mituomi Yamaguchi, Kozo Obara Division of Nanostructure Advanced Materials, Kagoshima University (Japan)

ThP55 TWO TYPE DIFFUSION PROCESSES OF SPUTTERED PARTICLES

INDUCED BY COLLISIONS AT SUBSURFACE LAYER IN PLASMA Masakatsu Mabuchi, Mituomi Yamaguchi, Syogo Shirasawa, Hirotaka Manaka, Kozo Obara Division of Nanostructured Advanced Materials, Kagoshima University (Japan)

ThP56 NANOPOWDER MANAGEMENT AND PLASMA PARAMETERS IN RF

PARALLEL-PLATE SILANE-BASED DISCHARGES K. Ostrikov1,2, I. Denysenko2,3,4, S. V. Vladimirov1, M. Y. Yu3, C. H. Diong2 and S. Xu2 1 School of Physics, The University of Sydney, Sydney (Australia) 2 Natural Sciences, NIE, Nanyang Technological University (Singapore) 3 Theoretical Physics I, Ruhr-University Bochum (Germany) 4 Kharkiv National University (Ukraine)

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ThP57 THE RESONANCE ELECTRON ENERGY DISTRIBUTION FUNCTION NEAR

SURFACE WITH ADSORBED MOLECULES E.E. Son Moscow Institute of Physics and Technology, Department of Physical Mechanics (Russia)

Poster – Coatings on Polymers ThP58 NEW CONCEPTS FOR PRECISION OPTICAL AND ANTIREFLECTIVE

COATINGS DEPOSITED BY REACTIVE PULSE MAGNETRON SPUTTERING H. Bartzsch, J. S. Liebig, S. Lange, K. Goedicke, P. Frach Fraunhoferinstitut Elektronenstrahl- und Plasmatechnik, Dresden (Germany)

ThP59 DEPOSITION OF SiOx DIFFUSION BARRIERS ON FLEXIBLE PACKAGING

MATERIALS BY PECVD A.Bieder1, A. Grueniger1, Ph. Rudolf von Rohr1 1 Institute of process engineering, ETH Zurich (Switzerland)

ThP60 PROPERTIES OF ITO ON PET FILM IN DEPENDENCE ON THE COATING

CONDITIONS AND THERMAL PROCESSING Michael Boehme1, Christoph Charton2 1 Southwall Europe GmbH, Großröhrsdorf (Germany) 2 Fraunhofer Institute for Electron Beam and Plasma Technology, Dresden (Germany)

ThP61 THE LOW TEMPERATURE SYNTHESIS OF AL DOPED ZnO FILMS ON

POLYMER USING REACTIVE PULSE MAGNETRON SPUTTERING Yun M. Chung*, Min J. Jung, Yong M. Kim, Jeon G. Han Center for Advanced Plasma Surface Technology, Sungkyunkwan University, Suwon (Korea)

ThP62 ITO THIN FILM DEPOSITION BY REACTIVE D.C. MAGNETRON

SPUTTERING ON POLYMER SUBSTRATES FOLLOWED BY CO2 LASER POST TREATMENT A. Fischer1, R. Schwarz2, K. Gläntz1, F.-J. Haug3, M. Amberg1, D. Hegemann1, and G. Seyfang4 1 Swiss Federal Laboratories for Materials Testing and Research (EMPA): St. Gallen 2 SSZ Zug AG, Zug (Switzerland) 3 Dübendorf (Switzerland) 4 Swiss Federal Institute of Technology ETH Zürich (Switzerland)

ThP63 INVESTIGATION OF THE RF PULSE MODULATED PLASMA JET SYSTEM

DURING THE DEPOSITION OF Pb(ZrxTi1-x)O3 THIN FILMS ON POLYMER SUBSTRATES M. Cada1,3, Z. Hubicka1, P. Virostko1,3, A. Deyneka1, M. Tichý1,3, L. Jastrabík1, G. Suchaneck2, G. Gerlach2

1 Institute of Physics ASCR, Prague (Czech Republic) 2 Institute of Solid State Electronics, University of Technology, Dresden (Germany) 3 Faculty of Mathematics and Physics, Charles University in Prague (Czech Republic)

ThP64 TRANSPORT CHARACTERISTICS OF TRACK MEMBRANES MODIFIED IN

PLASMA OF DIMETHYLANILINE Lyubov I. Kravets1, Serguei N. Dmitriev1, Alla B. Gilman2, Aleksandr I. Drachev2 1 Joint Institute for Nuclear Research, Flerov Laboratory of Nuclear Reactions, Dubna (Russia) 2 Enikolopov Institute of Synthetic Polymeric Materials (Russia)

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ThP65 INVESTIGATIONS OF PLASMA POLYMERIZED BARRIER FILMS ON

POLYMERIC MATERIALS M. Walker, F. Meermann, J. Schneider, K. Bazzoun, J. Feichtinger, A. Schulz, J. Krüger and U. Schumacher Institute of Plasma Research, University of Stuttgart (Germany)

ThP66 PECVD OF NANOCRYSTALLINE SILICON LAYERS ON HIGH TG POLYMER

SUBSTRATES L. MacQueen1, G. Dennler2, J. Zikovsky1, M. R. Wertheimer1,4, M. Latreche3 and G. Czeremuszkin3 1 Groupe des Couches Minces and Department of Engineering Physics, École Polytechnique, Montréal (Canada) 2 Johannes Kepler University, Linz (Austria) 3 Nova-Plasma Inc., Montréal (Canada)

ThP67 BARRIER PROPERTIES OF HMDSO PLASMA TREATED

POLYETHYLENETEREPHTHALATE S. Zanini1, C. Riccardi1, M. Orlandi1, P. Esena1, M. Tontini1, V. Cassio2 1 Universita’ degli Studi di Milano-Bicocca, Milano (Italy) 2 Neograf s.r.l., Moretta (CN) (Italy)

Poster –Magnetic Devices, Solid Lubricants and Superhard Coatings ThP68 NANOSTRUCTURED GMR FILMS PREPARED BY TVA METHOD

I. Mustata1, C. P. Lungu1, A. M. Lungu1, C.Surdu-Bob1 G. Filoti2, C. Logofatu2, C. Negrila2

1 National Institute for Lasers, Plasma and Radiation Physics, Magurele-Bucharest (Romania) 2 National Institute for Materials Physics, Magurele-Bucharest (Romania)

ThP69 W-S-C SPUTTERED FILMS: INFLUENCE OF THE CARBON DOPING

METHOD ON THE MECHANICAL PROPERTIES M. Evaristo1, A. Nossa1, A. Cavaleiro2 1 Escola Superior de Tecnologia e Gestão, Instituto Politécnico da Guarda, Guarda (Portugal) 2 ICEMS – Departamento de Engenharia Mecânica – FCTUC, Coimbra (Portugal)

ThP70 THE LUBRICITY OF OXIDES REVISED BASED ON A POLARISABILITY

APPROACH B.Prakash, J.P.Celis Katholieke Universiteit Leuven, Department Metaalkunde en Toegepaste Materiaalkunde, Leuven (Belgium)

ThP71 DEPOSITION AND CHARACTERIZATION OF COMPOSITE HARD-SOLID

LUBRICANT COATING BY CLOSED-FIELD MAGNETRON SPUTTERING Julfikar Haider1, Mahfujur Rahman1, Brian Corcoran2 and M. S. J. Hashmi1,2

1 NCPST and MPRC, Dublin City University (Ireland) 2 School of Mechanical and Manufacturing Engineering, Dublin City University, (Ireland)

ThP72 MECHANICAL PROPERTIES OF BORON NITRIDE FILMS PREPARED BY

PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION Hangsheng Yang1, Chihiro Iwamoto2 and Toyonobu Yoshida1

1 Department of Materials Engineering, School of Engineering, The University of Tokyo, Tokyo (Japan) 2 Engineering Research Institute, School of Engineering, The University of Tokyo (Japan)

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Poster – Carbon Coatings ThP73 CHEMICAL BONDING AND MICROSTRUCTURE ASPECTS ON THE

TRIBOLOGICAL AND MECHANICAL BEHAVIOR OF NANOCRYSTALLINE TiC/AMORPHOUS CARBON COMPOSITES D. Martínez-Martínez1, J.C. Sánchez-López1, C. López-Cartes1, A. Fernández1, M. Brizuela2, A. García-Luis2, J.I. Oñate2 1 Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. Sevilla), Sevilla (Spain) 2 Fundación Inasmet, Mikeletegui Pasealekua, Donostia-San Sebastián (Spain)

ThP74 COMPARISON OF BULK AND SURFACE STRUCTURE IN A-C:H FILMS

D. Liu, G. Benstetter, W. Frammelsberger Electrical Engineering Department, University of Applied Sciences Deggendorf (Germany)

ThP75 BONDING ENVIROMENT IN FILMS DEPOSITED FROM Ar/CH4 AND

Ar/CH4/N2 ECR-DISCHARGES. EFFECT OF VOLTAGE POLARIZATION ON THE GROTH PROCESSES M. Camaro, R. Gago1, C. Gomez-Aleixandre and J.M. Albella Instituto de Ciencia de Materiales de Madrid (CSIC), Cantoblanco, Madrid (Spain) 1 Institut für Ionenstrahlphysik und Materialforschung, Forschungszentrum Rossendorf e.V., Dresden (Germany)

ThP76 NANOSTRUCTURED CARBON GROWTH BY EXPANDING RF PLASMA

ASSISTED CVD ON Ni-COATED SILICON SUBSTRATE S. Vizireanu, B. Mitu, G. Dinescu National Institute for Laser, Plasma and Radiation Physics, Magurele, Bucharest (Romania)

ThP77 THE STUDY OF STRESS IN NANOCRYSTALLINE DIAMOND FILM

SYNTHESIZED BY PLASMA ENHANCED HOT-FILAMENT CHEMICAL VAPOR DEPOSITION METHOD C. Z. Gu, H. J. Li, Z. L. Wang, J. J. Li Laboratory of Micrifabrication, Institute of Physics, Chinese Academy Sciences, Beijing (China)

ThP78 THE IMPROVEMENT OF CUTTING PERFORMANCE IN SEMI-DRY

CONDITION BY THE COMBINATION OF DLC COATING AND CVD SMOOTH SURFACE DIAMOND COATING H.Hanyu1, S.Kamiya2, Y.Murakami1, Y.Kondoh3 1 OSG CORPORATION, Research & Development, Aichi (Japan) 2 Tohoku University, Department of Mechanical Engineering, Sendai (Japan) 3 OSG CORPORATION, Mechanical Design, Arumi, Shinshiro, Aichi (Japan)

ThP79 WEAR-CORROSION PERFORMANCE OF Si-INCORPORATED DIAMOND-

LIKE CARBON (Si-DLC) FILMS H.G. Kim, S.H. Ahn, J.G. Kim, S.J. Park1, K.R. Lee1 Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon (Korea) 1 Future Technology Research Division, Korea Institute of Science and Technology Cheongryang, Seoul (Korea)

ThP80 EFFECT OF CATALYSTS ON THE INTERNAL STRUCTURES OF CARBON

NANOTUBES DEPOSITION BY ATMOSPHERIC PRESSURE PE-CVD S.J. Kyung, Y.H. Lee, C. W. Kim, J.H. Lee and G.Y. Yeom Department of Materials Engineering, Sungkyunkwan University, Suwon (Korea)

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ThP81 EFFECT OF CARBON BUFFER LAYER ON ADHESION OF DLC COATINGS

ON WC-CO SUBSTRATES Jong-Kuk Kim1, Sung-Kyu Bae1, Eungsun Byon1, Sang-Jin Lee2, Kwang-Ryeol Lee 3 1 Surface Engineering Department, Korea Institute of Machinery and Materials, Changwon (Korea) 2 J&L Tech Co., Ltd., Siheung-City (Korea) 3 Future Technology Research Division, Korea Institute of Science and Technology, Seoul (Korea)

ThP82 NANOTUBE FORMATION AND FULLERENE BEAM ACCELERATION IN

NANOTUBE SOURCE WITH DUSTY PLASMA FLOW BY SELF-CONSISTENTLY FORMED NONMONOTONOUS ELECTRIC DOUBLE LAYER V.I.Maslov, A.M.Egorov, V.I.Lapshin, N.M.Maslova, I.N.Onishchenko, G.A.Skorobagat’ko, V.L.Stomin NSC Kharkov Institute of Physics & Technology, Kharkov (Ukraine)

ThP83 ACTIVE CORROSION PROTECTION FOR METALLIC SURFACES BY

NANOSTRUCTURED THIN FILMS E.M. Moser1, M. Bösch1, J. Painot1, S. Mikhailov2, F. Munnik2, O. Banakh2, M. Faller3, S. Virtanen4, P. Schmutz4, 1 University of Applied Sciences, Geneva (Switzerland) 2 University of Applied Sciences, Le Locle (Switzerland) 3 Swiss Federal Laboratories for Materials Testing and Research, Dübendorf (Switzerland) 4 Swiss Federal Institute of Technology, Zürich (Switzerland)

ThP84 PECVD OF ORDERED CARBON NANOTIP STRUCTURES: ROLE OF

ELEMENTARY PROCESSES IN THE IONIZED GAS PHASE K. Ostrikov1,2, Z. Tsakadze2, I. Denysenko2,3, P. Rutkevych2, S. V. Vladimirov1

and S. Xu2 1 School of Physics, The University of Sydney, Sydney (Australia) 2 Natural Sciences, NIE, Nanyang Technological University (Singapore) 3 Theoretical Physics I, Ruhr-University Bochum (Germany)

ThP85 THE ELECTRICAL AND STRUCTURAL PROPERTIES OF THE CNx FILMS

GROWN BY CLOSE FIELD UNBALANCED MAGNETRON SPUTTERING Yong Seob Park1,2, Byungyou Hong1,2 1 School of information and communication Engineering, Sungkyunkwan University, Suwon (Korea) 2 Center for Advanced Plasma Surface Technology (CAPST), Sungkyunkwan University, Suwon (Korea)

ThP86 INVESTIGATION OF NUCLEATION AND GROWTH MECHANISMS OF

NANOCRYSTALLINE DIAMOND/AMORPHOUS CARBON COMPOSITE FILMS C. Popov1, S. Boycheva1, M. Jelinek2 and W. Kulisch1 1 Institute of Microstructure Technologies and Analytics (IMA), University of Kassel (Germany) 2 Institute of Physics, Academy of Sciences of the Czech Republic, Prague (Czech Republic)

ThP87 INFLUENCE OF ENERGETIC ION BOMBARDMENT ON W-C:H COATINGS

DEPOSITED WITH W AND WC TARGETS C. Strondl, N.M. Carvalho; J.Th.M De Hosson; T. Krug; R. Tietema Hauzer Techno Coating BV, Venlo (The Netherlands)

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ThP88 TRIBOLOGICAL PROPERTIES OF SUPERHARD AMORPHOUS CARBON

FILMS (Ta-C) V. Weihnacht, H. Schulz, D. Klaffke1, H.-J. Scheibe2, B. Schultrich Fraunhofer-Institut für Werkstoff- und Strahltechnik, Dresden (Germany) 1 Bundesanstalt für Materialforschung und -prüfung, Berlin (Germany) 2 Fraunhofer USA, Center for Coatings and Laser Applications, Michigan State University, East Lansing (USA)

ThP89 CONTROL OF RESIDUAL STRESS AND ADHESION IN HARD CARBON

COATINGS N. Wöhrl, S. Reuter, O. Filipov and V. Buck Thin Film Technology Group, Dept. of Physics, University of Duisburg-Essen, Essen (Germany)

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General Information Registration

PSE 2004 86

Conference Location The Ninth International Conference on Plasma Surface Engineering will be held in the Kongresshaus (Congress-Center) Richard-Strauss-Platz D-82467 Garmisch-Partenkirchen (Germany) Conference Office The conference office is located in the foyer of the congress center (main entrance). Opening hours, September 12 – 17, 2004: Sunday 16:00 to 19:00 h Wednesday 08:00 to 18:00 h Monday 08.00 to 18:00 h Thursday 08:00 to 18:00 h Tuesday 08:00 to 18:00 h Friday 08:00 to 14:00 h Conference Telephone/Telefax The conference office` telephone and telefax numbers are: phone +49-(0)8821 180812, fax +49-(0)8821 180850 Conference Language The conference language will be English. No simultaneous translation will be provided. Conference Secretariat/Registration Everybody who wishes to attend the conference has to register online at www.akplasma.org/pse2004.php3 or to complete the enclosed Registration Form and return it to the conference secretariat : VDI Technologiezentrum GmbH Marion Böckmann Graf-Recke-Str. 84 D-40239 Duesseldorf, Germany http://www.akplasma.org e-mail: [email protected] Fax: +49 211 6214 484 Deadlines Registrations until August 15 will be considered for the list of participants. Hotel reservation has to be completed by the 09th of August the latest. Conference Fees Regular registration fee 480 € Reduced fee for early registration before July 15, 2004 450 € The registration fee includes the conference proceedings, book of abstracts, Welcome Reception, industrial/Bavarian Eevening. It does not include the tutorial on Saturday/Sunday. Two-days Ticket 295 € This special ticket is only valid for the conference and exhibition on Tuesday and Wednesday including book of abstracts and social evening. Students 180 € The students` fee does not include the proceedings and the tutorial on Saturday/Sunday. (To make sure to participate at a reduced fee a copy of your student card together with your registration is urgently requested.) Accompanying persons 50 € Fee includes Welcome Reception and Industrial/Bavarian Evening. Tutorial 150 €*/ 300 € This ticket is only valid for the tutorial ”Fundamentals and Trends in Plasma Surface Processing” on Saturday and Sunday. (* reduced fee for students, a copy of your student card together with your registration is urgently requested)

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Mode of Payment For payment by banktransfer it is absolutely necessary to indicate the invoice number and to include the name of the participant. Authors have to fill in the enclosed registration form, too. The conference fee includes V.A.T. of 16 %. After August 09 no further conference information will be mailed, but handed over at the conference office in Garmisch-Partenkirchen. Exhibition An exhibition of machines, equipment and services will be held during the conference on Tuesday and Wednesday. For further details please contact the conference secretariat. Conference Proceedings Proceedings of the International Conference on Plasma Surface Engineering will be published after the conference and distributed to all regular delegates. Accommodation Tourist Information (Ms Hofmann) Postfach 15 62 82467 Garmisch-Partenkirchen

Germany Phone: +49-(0)8821 180-726 Fax: +49-(0)8821 180-759

has been appointed the official agent for hotel reservations. Please use the online booking form for hotel reservations at: www.akplasma.org\pse2004.php3. Delegates will receive a confirmation of the hotel reservation from the „tourist information office“ directly. Hotel reservations should be made by the 09th August the latest. Participants are requested to notify any changes or cancellations of room reservations to the hotel directly. Insurance The VDI Technologiezentrum GmbH as the organiser of the conference cannot accept responsibility for personal accidents or loss of or damage to private property of participants and accompanying persons which may occur either during, or arising from the conference. Participants should, therefore take whatever steps they consider necessary regarding insurance. Restaurants A variety of restaurants in town offer local and international food for lunch. During the exhibition light meal will be offered against cash in the exhibition area. No special arrangement for lunch will be made. Taxi Taxis can be ordered by calling 2408 and 2409 (Marienplatz) or 1616 (Bahnhofsplatz). Car Parking Car parking space for about 250 cars is available at the congress center. Participants arriving by car are advised to use these facilities.

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Travel to Garmisch-Partenkirchen How to reach Garmisch-Partenkirchen by train: from Munich or Augsburg, average travel time: from Munich central station about 80 min (approx. hourly schedule) from Augsburg central station about 100 min (change at Weilheim/Obb.) by car: via Autobahn A 95/E 4, 110 km from Munich by air:

via Munich (Flughafen München) direct railway transfer to Munich central station by public transport (S-Bahn) available

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PSE 2004 Registration

PSE 2004

Registration Form (please type or print clearly)

Name First (Name)s Title Institute/Company Street Zip code City Country Phone Fax e-mail Accompanied by: I wish to register for the Ninth International Conference on Plasma Surface Engineering. Please pick in the boxes. 01 Full registration 450 €* / 480 € (* reduced fee for registration before July 15, 2004) 02 Two-day Ticket (excluding Proceedings) 295 €

03 Reduced fee for students 180 € To make sure to participate at a reduced fee a copy of your student card together with your registration is urgently requested.

04 Fee for accompanying persons 50 € number

05 Tutorial 150 €** /300 €

(** reduced fee for students, a copy of your student card together with your registration is urgently requested)

I will attend Welcome Reception Combined Industrial/Bavarian Evening

Payment: credit card (AMEXO, VISA, Eurocard, Mastercard)

No.: expire date: (mm/yy)

I hereby authorize the organisers of the PSE to collect the conference fee from my credit card.

bank transfer (only participants from EU-countries) on receipt of invoice.

Authors have to fill in the registration form, too. Place and Date Signature

Ninth International Conference on Plasma Surface Engineering Conference and Exhibition Garmisch-Partenkirchen (Germany) September 13 – 17, 2004

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PSE 2004

Please return this Registration Form to the conference office or use the online registration form at www.akplasma.org/pse2004.php3:

VDI Technologiezentrum GmbH Marion Böckmann Graf-Recke-Str. 84 40239 Düsseldorf GERMANY

Announcement 10th Conference on Plasma Surface Engineering (PSE 2006) 11.09.2006 - 15.09.2006 Garmisch Partenkirchen (Germany)