25
University of California, Berkeley PLASMA NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 YEARS AND BEYOND M.A. Lieberman Department of Electrical Engineering and Computer Sciences University of California Berkeley, CA 94720 Download this talk: http://www.eecs.berkeley.edu/lieber LiebermanDAMOP07 1

NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

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Page 1: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

NA

NO

ELEC

TR

ON

ICS

AN

DP

LA

SM

AP

RO

CESSIN

G—

TH

EN

EX

T15

YEA

RS

AN

DB

EY

ON

D

M.A

.Lie

ber

man

Dep

artm

ent

ofEle

ctri

calEngi

nee

ring

and

Com

pute

rSci

ence

sU

niv

ersi

tyof

Cal

ifor

nia

Ber

kele

y,C

A94

720

Dow

nloa

dth

ista

lk:

http

://w

ww

.eec

s.be

rkel

ey.e

du/∼

liebe

r

Lie

berm

anD

AM

OP07

1

Page 2: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

OU

TLIN

E

•T

hena

noel

ectr

onic

sre

volu

tion

•D

ualf

requ

ency

capa

citi

vedi

scha

rges

–St

andi

ngw

aves

and

skin

effec

ts

•T

hene

xt15

year

san

dbe

yond

W.P

.A

llis

(1901–1999)

Co-founder

ofth

eG

EC

Lie

berm

anD

AM

OP07

2

Page 3: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

TH

EN

AN

OELEC

TR

ON

ICS

REV

OLU

TIO

N

Lie

berm

anD

AM

OP07

3

Page 4: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

TH

EN

AN

OELEC

TR

ON

ICS

REV

OLU

TIO

N

•Tra

nsis

tors

/chi

pdo

ublin

gev

ery

11 2–2

year

ssi

nce

1959

•1,

000,

000-

fold

decr

ease

inco

stfo

rth

esa

me

perf

orm

ance

inth

ela

st30

year

s

EQ

UIV

ALEN

TA

UT

OM

OT

IVE

AD

VA

NC

E

•60

mill

ion

mile

s/hr

•20

mill

ion

mile

s/ga

l•

Thr

owaw

ayra

ther

than

pay

park

ing

fees

•3

mm

long

×1

mm

wid

e•

Cra

sh3×

ada

y

Lie

berm

anD

AM

OP07

4

Page 5: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

DO

UB

LE/T

RI

GA

TE

TR

AN

SIS

TO

RS

•V

erti

calst

ruct

ures

can

bebu

iltw

ith

curr

ent

fabr

icat

ion

tech

niqu

es•

CM

OS

can

besc

aled

anot

her

15ye

ars

•St

ate

ofth

ear

t(2

005)

:–

Inm

anuf

actu

re:

50nm

(200

atom

s)ga

tele

ngth

1.5

nm(5

atom

s)ga

teox

ide

thic

knes

s–

Smal

lest

fabr

icat

edC

MO

Str

ansi

stor

(NE

C):

5nm

(20

atom

s)ga

tele

ngth

–Lim

itin

gga

tele

ngth

from

sim

ulat

ions

(des

ktop

ic):

4nm

(16

atom

s)ga

tele

ngth

Lie

berm

anD

AM

OP07

5

Page 6: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

EV

OLU

TIO

NO

FET

CH

ING

DIS

CH

AR

GES

FIR

STG

EN

-E

RA

TIO

N

SEC

ON

DG

EN

ER

-A

TIO

N

TH

IRD

GE

N-

ER

AT

ION

??

Lie

berm

anD

AM

OP07

6

Page 7: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

DU

AL

FR

EQ

UEN

CY

CA

PA

CIT

IVE

DIS

CH

AR

GES

Lie

berm

anD

AM

OP07

7

Page 8: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

WH

YD

UA

LFR

EQ

UEN

CY

CA

PA

CIT

IVE

DIS

CH

AR

GES?

•In

the

year

2020

—6n

mga

tew

idth

,6

billi

ontr

ansi

stor

s,73

GH

zon

-chi

pcl

ock

—14

–18

wir

ing

leve

ls(d

iele

ctri

cla

yers

)ne

edto

beet

ched

•W

hyca

paci

tive

disc

harg

e?—

low

surf

ace

area

seen

bypl

asm

a(i

nexp

ensi

ve)

—si

licon

uppe

rel

ectr

ode

(con

trol

ofF/C

Fx

rati

o)—

robu

stun

iform

ity

over

wid

epr

essu

rera

nge

•W

hydu

alfr

eque

ncy

oper

atio

n?—

Inde

pend

ent

cont

rolof

ion

flux

and

ion

bom

bard

ing

ener

gyto

the

subs

trat

e

Hig

hfr

eque

ncy

pow

erco

ntro

lsio

nflu

xLow

freq

uenc

yvo

ltag

eco

ntro

lsio

nen

ergy

Lie

berm

anD

AM

OP07

8

Page 9: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

TY

PIC

AL

OP

ER

AT

ING

CO

ND

ITIO

NS

~~

Vl

Vh+ – + –

R∼

15–3

0cm

,L∼

1–3

cmp∼

30–3

00m

Tor

r,C

4F

8/O

2/A

rfe

edst

ock

Hig

hfr

eque

ncy

f h∼

27.1

–160

MH

z,V

h∼

200–

500

VLow

freq

uenc

yf l

∼2–

13.5

6M

Hz,

Vl∼

500–

1500

VA

bsor

bed

pow

ers

Ph,

Pl∼

500–

3000

W

Lie

berm

anD

AM

OP07

9

Page 10: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

HIG

HFR

EQ

UEN

CY

ELEC

TR

OM

AG

NET

ICEFFEC

TS

Lie

berm

anD

AM

OP07

10

Page 11: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

STA

ND

ING

WAV

ES

AN

DSK

INEFFEC

TS

•H

igh

freq

uenc

yan

dla

rge

area

⇒st

andi

ngw

ave

effec

ts

•H

igh

freq

uenc

y⇒

high

dens

ity⇒

skin

effec

ts

1.M

.A.Lie

ber

man,J.P

.B

ooth

,P.C

haber

t,J.M

.R

ax,and

M.M

.Turn

er,

Pla

sma

Sourc

esSci

.Tec

hnol.

11,283

(2002)

2.P.C

haber

t,J.Phys.

D:A

ppl.

Phys.

40,R

63

(2007)

Lie

berm

anD

AM

OP07

11

Page 12: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

CY

LIN

DR

ICA

LC

APA

CIT

IVE

DIS

CH

AR

GE

Con

side

ron

lyth

ehi

ghfr

eque

ncy

sour

ce

~+

2R

ss 2d2l

Plas

ma

Vh

z

r

Shea

th

Shea

th

Fie

lds

cann

otpa

ssth

roug

hm

etal

plat

es

(1)

Vs

exci

tes

radi

ally

outw

ard

wav

ein

top

vacu

umga

p(2

)O

utw

ard

wav

eex

cite

sra

dial

lyin

war

dw

ave

inpl

asm

a

Lie

berm

anD

AM

OP07

12

Page 13: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

SU

RFA

CE

WAV

EM

OD

E

•Pow

eren

ters

the

plas

ma

via

asu

rfac

ewav

em

ode:

Pla

sma

Stan

ding

wav

e

Dec

ay(w

eak)

Dec

ay

Surf

ace

Wav

eM

ode

λδ

s 2d s

•R

adia

lw

avel

engt

hfo

rsu

rfac

ew

ave

(low

dens

ity

limit

):

λ≈

λ0

√1

+d/s

∼λ

0 3

wit

0=

c/f

the

free

spac

ew

avel

engt

h•

Axi

alsk

inde

pth

for

surf

ace

wav

e:

δ∼

c ωp

•T

here

are

also

evan

esce

ntm

odes

lead

ing

toed

geeff

ects

near

r=

R

Lie

berm

anD

AM

OP07

13

Page 14: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

STA

ND

ING

WAV

EEFFEC

T

•R

=50

cm,d

=2

cm,s

=0.

4cm

,n

e=

109

cm−

3,δ≈

16cm

•P

cap

(das

h),P

ind

(dot

)an

dP

tot

(sol

id)

asa

func

tion

ofr

13.5

6M

Hz

(λ≈

9–10

m)

40.7

MH

z(λ

≈3

m)

Power/area

r (c

m)

025

50

0.51 0

Tota

l

Cap

aciti

ve

Indu

ctiv

eEdg

eef

fect

Power/area

r (c

m)

025

50

0.51 0

Tota

l

Cap

aciti

ve

Indu

ctiv

eEdg

eef

fect

Smal

lsta

ndin

gw

ave

and

skin

effec

ts

Lar

gest

andi

ngw

ave

effec

t;ce

nter

-hig

hpr

ofile

Lie

berm

anD

AM

OP07

14

Page 15: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

EX

PER

IMEN

TA

LR

ESU

LTS

FO

RSTA

ND

ING

WAV

ES

20×

20cm

disc

harg

ep

=15

0m

Tor

r50

Wrf

pow

er

The

stan

ding

wav

eef

-fe

ctis

seen

at60

MH

zan

dis

mor

epr

onou

nced

at81

.36

MH

z

(A.Per

ret,

P.C

haber

t,J-P

Booth

,J.Jolly,

J.G

uillo

nand

Ph.

Auvra

y,

Appl.

Phys.

Let

t.83,243,2003)

Lie

berm

anD

AM

OP07

15

Page 16: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

SU

PP

RESSIO

NO

FSTA

ND

ING

WAV

EEFFEC

TS

•Sh

aped

elec

trod

e(a

nddi

elpl

ate)

elim

inat

est

andi

ngw

ave

effec

ts

•In

crea

sed

over

allt

hick

ness

ince

nter

com

pare

dto

edge

keep

svo

ltag

eac

ross

disc

harg

ese

ctio

nco

nsta

nt•

The

elec

trod

esh

ape

isa

Gau

ssia

n,in

depe

nden

tof

the

plas

ma

prop

-er

ties

L.Sanso

nnen

sand

J.Sch

mitt,

Appl.

Phys.

Let

t.82,182

(2003)

P.C

haber

t,J.L

.R

aim

bault,J.M

.R

ax,and

A.Per

ret,

Phys.

Pla

smas11,4081

(2004)

Lie

berm

anD

AM

OP07

16

Page 17: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

EX

PER

IMEN

TA

LC

ON

FIR

MA

TIO

N

•5–

250

mTor

rar

gon,

50–3

00W

H.Sch

mitt

etal,

J.A

ppl.

Phys.

95,4559

(2004)

Lie

berm

anD

AM

OP07

17

Page 18: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

SK

INEFFEC

TS

•R

=50

cm,d

=2

cm,s

=0.

4cm

,f

=13

.56

MH

z,λ≈

9m

•P

cap

(das

h),P

ind

(dot

)an

dP

tot

(sol

id)

asa

func

tion

ofr

ne

=10

9cm

−3

(δ=

16.7

cm)

ne

=10

10

cm−

3(δ

=5.

3cm

)

Power/area

r (c

m)

025

50

0.51 0

Tota

l

Cap

aciti

ve

Indu

ctiv

eEdg

eef

fect

Power/area

r (c

m)

025

50

0.51 0

Tota

l

Cap

aciti

ve

Indu

ctiv

e

Edg

eef

fect

Smal

lsta

ndin

gw

ave

and

skin

effec

ts

Lar

gesk

ineff

ects

;ce

nter

-low

profi

le

Lie

berm

anD

AM

OP07

18

Page 19: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

SK

INEFFEC

TS

•Sk

ineff

ects

=⇒

radi

alno

nuni

form

itie

sat

high

dens

itie

sw

hen

δ< ∼

0.45

√d

R

δ∝

1 √n

=co

llisi

onal

orco

llisi

onle

sssk

inde

pth

d=

bulk

plas

ma

half-

thic

knes

sR

=di

scha

rge

radi

us•

Use

1Dtr

ansm

issi

onlin

ean

alys

is+

glob

al(l

owpr

essu

re)

orlo

cal(h

igh

pres

sure

)po

wer

bala

nce

=⇒

self-

cons

iste

ntst

andi

ngw

ave/

skin

effec

ts

(P.C

haber

t,J.L

.R

aim

bault,P.Lev

if,J.M

.R

ax,and

M.A

.Lie

ber

man,

Pla

sma

Sourc

es:Sci

.Tec

hnol.

15,S130,2006)

Lie

berm

anD

AM

OP07

19

Page 20: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

TH

EN

EX

T15

YEA

RS

AN

DB

EY

ON

D

Lie

berm

anD

AM

OP07

20

Page 21: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

TH

EEX

PER

TS

SP

EA

K†

•“T

here

isno

tth

esl

ight

est

indi

cati

onth

at[n

ucle

ar]e

nerg

yw

illev

erbe

obta

ined

”—

Alber

tEin

stei

n,19

32•

“Any

one

who

expe

cts

aso

urce

ofpo

wer

from

the

tran

sfor

mat

ion

ofth

ese

atom

sis

talk

ing

moo

nshi

ne.”

—Ern

estRut

herf

ord,

1933

•“A

few

deca

des

henc

e,[w

hen

cont

rolle

dfu

sion

isac

hiev

ed],

ener

gyw

illbe

free

—ju

stlik

eth

eun

met

ered

air.

”—

John

von

Neu

man

n,19

56•

“Rad

ioha

sno

futu

re.”

—Lo

rdK

elvi

n,18

97•

“Ith

ink

ther

eis

aw

orld

mar

ket

for

abou

tfiv

eco

mpu

ters

.”—

Tho

mas

J.W

atso

n,19

43•

Whe

rea

calc

ulat

orlik

eE

NIA

Cis

equi

pped

wit

h18

,000

vacu

umtu

bes

and

wei

ghs

30to

ns,

com

pute

rsin

the

futu

rem

ayha

veon

ly1,

000

vacu

umtu

bes

and

perh

aps

only

wei

gh1

1 2to

ns.”

—Pop

ular

Mec

hani

cs,M

arch

1949

•“6

40k

ough

tto

been

ough

for

anyb

ody.

”—

BillG

ates

,19

81†

C.C

erfand

V.N

avask

y,V

illa

rd,N

ewYork

,1998

Lie

berm

anD

AM

OP07

21

Page 22: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

INT

ER

NA

TIO

NA

LT

EC

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)

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ngth

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)28

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hani

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onne

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erlim

itat

ion

ofar

ound

200

W/c

m2

•Fo

rmid

able

man

ufac

turi

ngis

sues

rem

ain;

eg,l

itho

grap

hy,m

etro

logy

“You

can

scal

eC

MO

Sdo

wn

anot

her

10–1

5ye

ars;

noth

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hes

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telC

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Cra

igB

arre

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Lie

berm

anD

AM

OP07

22

Page 23: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

BEY

ON

D20

20

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oore

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⇒1s

tpr

oduc

tin

2006

:Fr

eesc

ale

MR

AM

(4M

b,35

ns)

Lie

berm

anD

AM

OP07

23

Page 24: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

PIE

INT

HE

SK

Y†

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Dch

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allim

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muc

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rth

anC

MO

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an-

sist

ors)

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ingl

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ectr

ontr

ansi

stor

s”(n

eed

low

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pera

ture

s)

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ross

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com

puti

ng”

(rep

lace

relia

ble

CM

OS

swit

ches

wit

hde

fect

-pr

one

nano

wir

esw

itch

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elf-as

sem

bled

,DN

A-b

ased

com

pute

rs”

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each

own

one

alre

ady)

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uant

umco

mpu

ting

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xpon

enti

ally

fast

erco

mpu

tati

onfo

rni

che

appl

icat

ions

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g.co

debr

eaki

ng)

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ma

Joe

Hillunio

nso

ng,The

Pre

ach

erand

the

Sla

ve,1911

Lie

berm

anD

AM

OP07

24

Page 25: NANOELECTRONICS AND PLASMA PROCESSING — THE NEXT 15 …lieber/Lieberman... · 1 2 –2 years since 1959 • 1,000,000-fold decrease in cost for the same performance in the last

Un

iver

sity

of

Cal

iforn

ia, B

erke

ley

PL

AS

MA

CO

NC

LU

SIO

NS

•C

MO

Ssc

ales

to24

-ato

mga

tele

ngth

sin

2020

•C

MO

Spr

oduc

tim

prov

emen

tsco

ntin

uefa

rbe

yond

2020

•P

lasm

are

acto

rre

sear

chan

dde

velo

pmen

tw

illin

tens

ifyto

mee

tth

ese

need

s

•D

ispl

acin

gC

MO

Sbe

yond

2020

isun

likel

y;ot

her

tech

nolo

gies

will

bein

tegr

ated

into

the

CM

OS

plat

form

Dow

nloa

dth

ista

lk:

http

://w

ww

.eec

s.be

rkel

ey.e

du/∼

liebe

r

W.P

.A

llis

(1901–1999)

Co-founder

ofth

eG

EC

Lie

berm

anD

AM

OP07

25