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Microstructural CharacterizationMicrostructural Characterizationof of
MaterialsMaterials
EunEun SooSoo ParkPark
Office: 33-316 Telephone: 880-7221Email: [email protected] hours: by an appointment
2009 spring
04. 22. 2009
C, Cr, Au-Pd
A purpose of coating
2. Increase the efficiencyof secondary electron
3. Protect the specimensurface against primaryelectron beam
Prevention ofcharge-up
Improvement ofSignal to Noise(S/N) ratio
Reduction of damage
1. Give a conduction to specimen surface
I0Ib Is
Ia
Ib:Back scattered Electron
I0:Primary Beam
Is:Secondary Electron
Ia:Specimen Current
Theory of Scanning Electron MicroscopeTheory of Scanning Electron Microscope
I0= Is +Ib+ Ia Charge-up
Charge-up Phenomena Eliminate Charge-up Phenomena
Vacc:1.5kVVacc:1.5kV Vacc:0.7kVVacc:0.7kV
Specimen : SiO2 on Photo Resist Line Pattern
Observation at lower accelerating voltagesObservation at lower accelerating voltages
conductivitysample
non-conductivitysample
after coating
SE
metal-coating
primary electron beam
SESE SE
Improvement of (S/N) ratio
Non-Conductive Samples Observation
Specimen : Ceramics
Vacc : 5kVUpper Detector
Vacc : 1kVUpper detector
Specimen : Ceramics
Vacc : 1kVUpper Detector
Vacc : 1kVLower Detector
Non-Conductive Samples Observation
(1)
(2)
(3)
(4)
Probe current
거친 imageLoss Damage small
High resolution
Smooth image Deteriorated resolutionlarge
More damage
1/109 A 1/1010 A
1/1011 A
돌기
가장자리
원주
1.0 KV
1.3 KV 10 KV
4 KV
절연도료 초파리
Working distance Aperature size
거친 image
Astigmatism
Astigmatism
꽃가루
Excessive contrast
Excessive brightnessInsufficient brightness
Insufficient contrast
Optimum
Contrast &Brightness
Influenced
Uninfluenced
고무나무유액
