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Metalor Technologies (Japan) Corporation
P r o d u c t C a t a l o g u e
2
METALOR, It's a synonym of processes
for high quality precious metals.
Electronics technology, such as cellular phones, personal computers, televisions,
automobiles, airplanes, etc., plays an important role in every scenes of our life, from our office to home,
and in accordance with the significant change and advancement in this information society,
the technology is also making advances everyday.
Advancement of "surface finishing technology" is necessary for high integration
of electronic circuits and high-density mounting technology, which are at the core of these technologies.
Metalor Technologies (Japan) Corporation provides the precious metal processes contributing
to this technology (precious metal surface finishing chemicals and machines).
Metalor Technologies (Japan) Corporation also has several overseas offices: Singapore, Taiwan, South Korea,
Shanghai, etc. including Japan,and continues to provide high-quality precious metal surface finishing chemicals
and machines to meet the diversifying needs of the markets and increasing globalization.
Cyanide -free gold-plating process
Cyanide gold-plating process
Electroless gold-plating process
Alloy plating process
Cyanide silver-plating process
Pre-treatment or after- treatment agents
Stripper
Platinum-plating process
Palladium-plating process
Rhodium-plating process
Ruthenium-plating process
(Electrolytic) gold-plating process for decorative parts
Plating Machine For Lead Frames
Connector Plating Machine
Carrier Type Plating Machine
Washer
Electroplating Machine
Electroless Plating Machine
Etching Machine
Other Plating Machines
Analysis And Prototyping For Plating
PROCESS
EQUIPMENT
SERVICE
■メタローテクノロジーズジャパン(株)様/会社案内(英語版)/P.02-03/4C/仕上がりサイズ:W297mm×H210mm 2011.06.16
P r o d u c t C a t a l o g u e
2
METALOR, It's a synonym of processes
for high quality precious metals.
Electronics technology, such as cellular phones, personal computers, televisions,
automobiles, airplanes, etc., plays an important role in every scenes of our life, from our office to home,
and in accordance with the significant change and advancement in this information society,
the technology is also making advances everyday.
Advancement of "surface finishing technology" is necessary for high integration
of electronic circuits and high-density mounting technology, which are at the core of these technologies.
Metalor Technologies (Japan) Corporation provides the precious metal processes contributing
to this technology (precious metal surface finishing chemicals and machines).
Metalor Technologies (Japan) Corporation also has several overseas offices: Singapore, Taiwan, South Korea,
Shanghai, etc. including Japan,and continues to provide high-quality precious metal surface finishing chemicals
and machines to meet the diversifying needs of the markets and increasing globalization.
Cyanide -free gold-plating process
Cyanide gold-plating process
Electroless gold-plating process
Alloy plating process
Cyanide silver-plating process
Pre-treatment or after- treatment agents
Stripper
Platinum-plating process
Palladium-plating process
Rhodium-plating process
Ruthenium-plating process
(Electrolytic) gold-plating process for decorative parts
Plating Machine For Lead Frames
Connector Plating Machine
Carrier Type Plating Machine
Washer
Electroplating Machine
Electroless Plating Machine
Etching Machine
Other Plating Machines
Analysis And Prototyping For Plating
PROCESS
EQUIPMENT
SERVICE
■メタローテクノロジーズジャパン(株)様/会社案内(英語版)/P.02-03/4C/仕上がりサイズ:W297mm×H210mm 2011.06.16
PROCESS
4 5
NCF Series
ECF Series
K-130
K-200
K-130(AF)
K-200WT
K-44
K-700
K-720D
K-440
PROCESS
EL-GOLD#20
ATOMEX
ATOMEX-PC
IMEX 210
IMEX-510D
SUPER MEX Series
K-185ST
K-186SB
FINE BARRIER 7000
K-186J
K-188
K-77
K-76
K-100
CYANIDE-FREE GOLD-PLATING PROCESS
CYANIDE GOLD-PLATING PROCESS
STRIKE SOLUTIONPURE GOLD
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Vickers)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Vickers)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Vickers)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Vickers)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
For cyanide-free series strike plating
For cyanide-free series strike plating
Direct strike plating on copper wiring
Bright finishes
Bright finishes
Matt finishes
Bright finishes, application for wiring
Bright finishes, application for wiring
Semi-bright finishes
Semi-bright finishes
Semi-bright finishes, high current density
Good adhesion
Good adhesion
Anti-fungus properties
Anti-fungus properties and good operation
Gold-plating for bonding
Direct gold-plating on copper for bonding
IC frames, LSI and package applications
ELECTROLESS GOLD-PLATING PROCESS
ALLOY PLATING PROCESS
Autocatalytic gold-plating on coppersubstrate
Standard process for immersion gold-plating
Direct gold-plating on copper substrate
Gold-plating for copper or copper type substrate for reduced Ni corrosion
Direct gold-plating on copper substrate, low gold content type
Cyanide-free series immersion gold-plating solution
Cyanide-free series immersion gold-plating solution with low gold content
Cyanide-free series immersion gold-plating solution
Cyanide-free series autocatalytic gold-plating solution
Cyanide-free series autocatalytic gold-plating solution with high-speed
Cyanide-free series autocatalytic gold-plating solution
Suitable for Ni barrier specifications
Conditions vary in accordance withapplications
Suitable for Ni barrier specifications
Suitable for lead-free connector specifications
Au-Ni Alloy plating solution
For rack and barrel plating
For rack and barrel plating
EL-GOLD#20 is a gold-plating solution that can be thick-plated on copper substrate.
ATOMEX is an immersion gold-plating solution for nickel substrate.
ATOMEX-PC is an immersion gold-plating solution used to plate gold on copper substrate.
SUPER MEX series is a cyanide-free autocatalytic gold plating process. Customers can select immersion gold plating processes or thick autocatalytic plating processes.
K-185ST is cobalt type hard gold plating process with high performance. It is used for printed circuit boards, flexible circuit boards and connectors.
K-186SB is a cobalt type hard gold plating solution for selective plating, which can eliminate excess plating related to solution leakage.
FINE BARRIER 7000 is a cobalt type hard gold plating solution for selective plating, which can eliminate excess plating related to solution leakage.
K-186J is cobalt type hard gold plating process with high performance. It is used for printed circuit boards, flexible circuit boards and connectors. (suitable for lead-free soldering)
K-188 offers stable Au/Ni alloy gold plating and is suitable for connectors used for improved heat resistance.
K-77 is acid bright gold plating process, suitable for electronic and industrial components which needs solid adherence and wear resistance.
IMEX 210 is a plating solution that reduces nickel corrosion and has a good adhesion to the substrate.
IMEX-510D is a plating solution, which is used for applying gold plating on copper substrate.
K-76 is an acid bright gold plating solution with superior electrodeposition performance.
K-100 is an acid gold strike plating process, most suitable for decorative parts.
NCF Series, non-cyanide electrolytic gold plating process is a high purity plating process used as pre-treatment process for gold and precious metal plating and strike gold plating applications.
ECF Series, non-cyanide electrolytic gold plating process, is a weak alkali-type, high-purity and cyanide-free plating process. Photo-resist damage is low, enabling fine pattern surface treatment. Customers may choose bright or matt finishes.
K-130 is a gold-plating solution, which exhibits an excellent adhesion and suitable for strike and thin plating for electronics components and decorative parts.
K-200 is a gold-plating solution, which exhibits an excellent adhesion and suitable for strike and thin plating for electronics components and decorative parts.
K-130(AF) offers long range operations because it has stronger anti-fungus properties compared to conventional strike plating processes.
K-200WT is low pH type strike gold plating solution which has stable operation, and also has anti-fungus properties.
K-44 is a pure gold-plating for barrel plating for decorative parts, printed circuit boards, etc.
K-700 is a pure gold-plating process with improved thickness uniformity for electrodeposition.
K-720D is a pure gold-plating for direct gold plating on copper substrates, and it prevents copper contamination in the plating solution and improves life of solution.
K-440 is a high speed acid gold-plating process suitable for high-purity and heat resistance deposit and also when jet spot plating machining is required.
FINE BARRIER 7000
■メタローテクノロジーズジャパン(株)様/会社案内(英語版)/P.04-05/4C/仕上がりサイズ:W297mm×H210mm 2011.06.16
PROCESS
4 5
NCF Series
ECF Series
K-130
K-200
K-130(AF)
K-200WT
K-44
K-700
K-720D
K-440
PROCESS
EL-GOLD#20
ATOMEX
ATOMEX-PC
IMEX 210
IMEX-510D
SUPER MEX Series
K-185ST
K-186SB
FINE BARRIER 7000
K-186J
K-188
K-77
K-76
K-100
CYANIDE-FREE GOLD-PLATING PROCESS
CYANIDE GOLD-PLATING PROCESS
STRIKE SOLUTIONPURE GOLD
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Vickers)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Vickers)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Vickers)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Vickers)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
For cyanide-free series strike plating
For cyanide-free series strike plating
Direct strike plating on copper wiring
Bright finishes
Bright finishes
Matt finishes
Bright finishes, application for wiring
Bright finishes, application for wiring
Semi-bright finishes
Semi-bright finishes
Semi-bright finishes, high current density
Good adhesion
Good adhesion
Anti-fungus properties
Anti-fungus properties and good operation
Gold-plating for bonding
Direct gold-plating on copper for bonding
IC frames, LSI and package applications
ELECTROLESS GOLD-PLATING PROCESS
ALLOY PLATING PROCESS
Autocatalytic gold-plating on coppersubstrate
Standard process for immersion gold-plating
Direct gold-plating on copper substrate
Gold-plating for copper or copper type substrate for reduced Ni corrosion
Direct gold-plating on copper substrate, low gold content type
Cyanide-free series immersion gold-plating solution
Cyanide-free series immersion gold-plating solution with low gold content
Cyanide-free series immersion gold-plating solution
Cyanide-free series autocatalytic gold-plating solution
Cyanide-free series autocatalytic gold-plating solution with high-speed
Cyanide-free series autocatalytic gold-plating solution
Suitable for Ni barrier specifications
Conditions vary in accordance withapplications
Suitable for Ni barrier specifications
Suitable for lead-free connector specifications
Au-Ni Alloy plating solution
For rack and barrel plating
For rack and barrel plating
EL-GOLD#20 is a gold-plating solution that can be thick-plated on copper substrate.
ATOMEX is an immersion gold-plating solution for nickel substrate.
ATOMEX-PC is an immersion gold-plating solution used to plate gold on copper substrate.
SUPER MEX series is a cyanide-free autocatalytic gold plating process. Customers can select immersion gold plating processes or thick autocatalytic plating processes.
K-185ST is cobalt type hard gold plating process with high performance. It is used for printed circuit boards, flexible circuit boards and connectors.
K-186SB is a cobalt type hard gold plating solution for selective plating, which can eliminate excess plating related to solution leakage.
FINE BARRIER 7000 is a cobalt type hard gold plating solution for selective plating, which can eliminate excess plating related to solution leakage.
K-186J is cobalt type hard gold plating process with high performance. It is used for printed circuit boards, flexible circuit boards and connectors. (suitable for lead-free soldering)
K-188 offers stable Au/Ni alloy gold plating and is suitable for connectors used for improved heat resistance.
K-77 is acid bright gold plating process, suitable for electronic and industrial components which needs solid adherence and wear resistance.
IMEX 210 is a plating solution that reduces nickel corrosion and has a good adhesion to the substrate.
IMEX-510D is a plating solution, which is used for applying gold plating on copper substrate.
K-76 is an acid bright gold plating solution with superior electrodeposition performance.
K-100 is an acid gold strike plating process, most suitable for decorative parts.
NCF Series, non-cyanide electrolytic gold plating process is a high purity plating process used as pre-treatment process for gold and precious metal plating and strike gold plating applications.
ECF Series, non-cyanide electrolytic gold plating process, is a weak alkali-type, high-purity and cyanide-free plating process. Photo-resist damage is low, enabling fine pattern surface treatment. Customers may choose bright or matt finishes.
K-130 is a gold-plating solution, which exhibits an excellent adhesion and suitable for strike and thin plating for electronics components and decorative parts.
K-200 is a gold-plating solution, which exhibits an excellent adhesion and suitable for strike and thin plating for electronics components and decorative parts.
K-130(AF) offers long range operations because it has stronger anti-fungus properties compared to conventional strike plating processes.
K-200WT is low pH type strike gold plating solution which has stable operation, and also has anti-fungus properties.
K-44 is a pure gold-plating for barrel plating for decorative parts, printed circuit boards, etc.
K-700 is a pure gold-plating process with improved thickness uniformity for electrodeposition.
K-720D is a pure gold-plating for direct gold plating on copper substrates, and it prevents copper contamination in the plating solution and improves life of solution.
K-440 is a high speed acid gold-plating process suitable for high-purity and heat resistance deposit and also when jet spot plating machining is required.
FINE BARRIER 7000
■メタローテクノロジーズジャパン(株)様/会社案内(英語版)/P.04-05/4C/仕上がりサイズ:W297mm×H210mm 2011.06.16
PROCESS
6 7
Silver Bright
N Bright
AG-30
S-900 Series
SP-4000
AG-10
LED BRIGHT AG-20, AG-20
EL-Ag#31
Super Dip, Power Dip
Pre Dip S
After Treatment Agent B
TBO-100
X-10, X-50
Chemistrip XO
Chemistrip NB
PROCESS
Pt-250
Pt-745
PD-LF-100
PD-LF-800
PD-LF-810
PD-LF-820
PD Strike
PALLNIC Series
RH-F
RH-W
RH-FW
RH-221
RH-225M
CYANIDE SILVER-PLATING PROCESS
PALLADIUM-PLATING PROCESS
RHODIUM-PLATING PROCESS
PLATINUM-PLATING PROCESS
PRE-TREATMENT ORAFTER-TREATMENT AGENTS STRIPPER
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Vickers)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Knoop)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Knoop)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Vickers)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
Bright and hard silver plating solution (additive agent only)
Bright and hard silver plating solution (additive agent only)
Bright and soft application (additive agent only)
Low cyanide high-speed silver plating solution for lead frame
Low cyanide high-speed silver platingsolution for lead frame
Low cyanide high-speed silver platingsolution for lead frame
Low cyanide high-speed silver platingsolution for lead frame
Bright and hard silver plating solution (additive agent only)
Bright silver plating solution (additive agent only)
Autocatalytic thick silver plating solution
Powder
Powder
Powder
Powder
Immersion time
Immersion time
Liquid
Liquid
Liquid
Liquid
Liquid
Liquid
Anti-immersion agent for silver plated lead frame
Anti-immersion agent for silver plated lead frame
Anti-immersion agent for silver plated lead frame
Anti-tarnish agent for copper and copper alloy substrate
Chemicals for preventingepoxy bleed out (EBO)
Chemicals for preventing epoxy bleed out (EBO)
Silver stripperfor lead frame
Silver stripperfor lead frame
Stripping agentfor selectivegold plating
Stripping agentfor copperstrike plating
For sulfuric acid type
For phosphoric acid type
For sulfuric acid type for decorative
For sulfuric acid type for industrial
For low stress thick plating
For Pd-PPF
For Pd-PPF
For thin plating Pd-PPF
For thin plating Pd-PPF
Pd strike solution
Pd/Ni alloy plating solution (Ni:10g/L)
Pd/Ni alloy plating solution (Ni:6g/L)
Pd/Ni alloy plating solution (Ni:10g/L)
High speed jet-type (Ni:10g/L)
Weak acidic strike plating
Alkaline thick plating
Pt-250 is weak acidic platinum plating process, suitable for thin plating electronic components which require heat and corrosion resistance.
PD-LF-800 is a high-purity palladium plating solution and the plating has stable solderability.
PD-LF-810 is a thin-plating with good solderability, and suitable for Pd-PPF.
PD-LF-820 is a thin-plating with good solderability, and suitable for Pd-PPF.
Pd strike solution. Can be adjusted according to requirements.
RH-W is dense and hard plating with bright white deposit.
RH-FW is a sulfuric acid rhodium plating solution with white bright deposit.
Pt-745 is a platinum plating process suitable for electronic components, electric contact parts, electrode, and arts and crafts.
PD-LF-100 is a high purity palladium plating process with neutral and weak alkaline.
PALLNIC Series is an alloy plating process made from palladium and nickel, most suitable for products such as printed circuit boards, terminals and connectors.
RH-F is a sulfuric acid type rhodium plating solution. Its electrodeposits are elaborate and have whitish brightness, most suitable for thin plating of decorative parts.
RH-221 is an acidic plating process suitable for electronic components with excellent physical performance.
RH-225M is a sulfuric acid rhodium plating process. It has low stress deposit for various electric contact parts.
Used for lead switches because it gives mirror-bright appearance and hard deposit.
N Bright achieves bright deposit. Three times harder than normal silver plating. These characteristics make it suitable for electric contact parts requiring wear resistance.
A weak alkaline type high speed plating process and widely used as selective silver plating process for lead frame.
SP-4000 is widely used as a spot silver plating solution for lead frame and can be used with a wider current density range and maintaining stable operation.
AG-30 is a silver plating additive agent for soft deposit by rack plating.
AG-10 is suitable for lead switches; it gives mirror-bright appearance and hard deposit.
LED BRIGHT AG-20, AG-20 is a silver plating additive agent with semi-bright to mirror-bright deposit for LED applications.
This alkaline autocatalytic silver plating process is suitable for electronic components.
Super Dip and Power Dip are anti-immersion agents to prevent immersion of silver onto copper lead frame for silver plating.
Pre Dip S is a post-treatment agent for effectively preventing discoloration of copper lead frame after silver plating.
After treatment agent B effectively prevents epoxy bleed out of silver paste.
TBO-100 is an after-treatment agent for effectively preventing epoxy bleed out of silver paste.
X-10 and X-50 are electrolytic strippers for selective silver plating on copper lead frame.
Chemistrip XO is a chemical stripper, which can avoid damage to selective silver strike plating deposits on iron, nickel substrate and iron-nickel alloy substrates.
Chemistrip NB is a gold chemical stripper for effectively removing parts of gold plating for selective gold plating connector.
CHARACTERISTICSBATH
TEMPER-ATURE(℃)
CONTENT PRO-PERTY
TREAT-MENTTIME
(sec)PROCESS
APPLI-CATIONSLEAD FRAME
APPLICATIONS
CHARACTER-ISTICS
BATHTEMPERATURE(℃)
ADDITIONDENSITY
SITUA-TION
CURRENTDENSITY
(A/dm2)PROCESS STRIPPING RATE
(sec/μm)
TYPE OFBATH(pH)
LEAD FRAME
CONNECTOR
LED BRIGHT AG-20 Bright and hard silver plating solution for LED (additive agent only)
■メタローテクノロジーズジャパン(株)様/会社案内(英語版)/P.06-07/4C/仕上がりサイズ:W297mm×H210mm 2011.06.16
PROCESS
6 7
Silver Bright
N Bright
AG-30
S-900 Series
SP-4000
AG-10
LED BRIGHT AG-20, AG-20
EL-Ag#31
Super Dip, Power Dip
Pre Dip S
After Treatment Agent B
TBO-100
X-10, X-50
Chemistrip XO
Chemistrip NB
PROCESS
Pt-250
Pt-745
PD-LF-100
PD-LF-800
PD-LF-810
PD-LF-820
PD Strike
PALLNIC Series
RH-F
RH-W
RH-FW
RH-221
RH-225M
CYANIDE SILVER-PLATING PROCESS
PALLADIUM-PLATING PROCESS
RHODIUM-PLATING PROCESS
PLATINUM-PLATING PROCESS
PRE-TREATMENT ORAFTER-TREATMENT AGENTS STRIPPER
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Vickers)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Knoop)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Knoop)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Vickers)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
Bright and hard silver plating solution (additive agent only)
Bright and hard silver plating solution (additive agent only)
Bright and soft application (additive agent only)
Low cyanide high-speed silver plating solution for lead frame
Low cyanide high-speed silver platingsolution for lead frame
Low cyanide high-speed silver platingsolution for lead frame
Low cyanide high-speed silver platingsolution for lead frame
Bright and hard silver plating solution (additive agent only)
Bright silver plating solution (additive agent only)
Autocatalytic thick silver plating solution
Powder
Powder
Powder
Powder
Immersion time
Immersion time
Liquid
Liquid
Liquid
Liquid
Liquid
Liquid
Anti-immersion agent for silver plated lead frame
Anti-immersion agent for silver plated lead frame
Anti-immersion agent for silver plated lead frame
Anti-tarnish agent for copper and copper alloy substrate
Chemicals for preventingepoxy bleed out (EBO)
Chemicals for preventing epoxy bleed out (EBO)
Silver stripperfor lead frame
Silver stripperfor lead frame
Stripping agentfor selectivegold plating
Stripping agentfor copperstrike plating
For sulfuric acid type
For phosphoric acid type
For sulfuric acid type for decorative
For sulfuric acid type for industrial
For low stress thick plating
For Pd-PPF
For Pd-PPF
For thin plating Pd-PPF
For thin plating Pd-PPF
Pd strike solution
Pd/Ni alloy plating solution (Ni:10g/L)
Pd/Ni alloy plating solution (Ni:6g/L)
Pd/Ni alloy plating solution (Ni:10g/L)
High speed jet-type (Ni:10g/L)
Weak acidic strike plating
Alkaline thick plating
Pt-250 is weak acidic platinum plating process, suitable for thin plating electronic components which require heat and corrosion resistance.
PD-LF-800 is a high-purity palladium plating solution and the plating has stable solderability.
PD-LF-810 is a thin-plating with good solderability, and suitable for Pd-PPF.
PD-LF-820 is a thin-plating with good solderability, and suitable for Pd-PPF.
Pd strike solution. Can be adjusted according to requirements.
RH-W is dense and hard plating with bright white deposit.
RH-FW is a sulfuric acid rhodium plating solution with white bright deposit.
Pt-745 is a platinum plating process suitable for electronic components, electric contact parts, electrode, and arts and crafts.
PD-LF-100 is a high purity palladium plating process with neutral and weak alkaline.
PALLNIC Series is an alloy plating process made from palladium and nickel, most suitable for products such as printed circuit boards, terminals and connectors.
RH-F is a sulfuric acid type rhodium plating solution. Its electrodeposits are elaborate and have whitish brightness, most suitable for thin plating of decorative parts.
RH-221 is an acidic plating process suitable for electronic components with excellent physical performance.
RH-225M is a sulfuric acid rhodium plating process. It has low stress deposit for various electric contact parts.
Used for lead switches because it gives mirror-bright appearance and hard deposit.
N Bright achieves bright deposit. Three times harder than normal silver plating. These characteristics make it suitable for electric contact parts requiring wear resistance.
A weak alkaline type high speed plating process and widely used as selective silver plating process for lead frame.
SP-4000 is widely used as a spot silver plating solution for lead frame and can be used with a wider current density range and maintaining stable operation.
AG-30 is a silver plating additive agent for soft deposit by rack plating.
AG-10 is suitable for lead switches; it gives mirror-bright appearance and hard deposit.
LED BRIGHT AG-20, AG-20 is a silver plating additive agent with semi-bright to mirror-bright deposit for LED applications.
This alkaline autocatalytic silver plating process is suitable for electronic components.
Super Dip and Power Dip are anti-immersion agents to prevent immersion of silver onto copper lead frame for silver plating.
Pre Dip S is a post-treatment agent for effectively preventing discoloration of copper lead frame after silver plating.
After treatment agent B effectively prevents epoxy bleed out of silver paste.
TBO-100 is an after-treatment agent for effectively preventing epoxy bleed out of silver paste.
X-10 and X-50 are electrolytic strippers for selective silver plating on copper lead frame.
Chemistrip XO is a chemical stripper, which can avoid damage to selective silver strike plating deposits on iron, nickel substrate and iron-nickel alloy substrates.
Chemistrip NB is a gold chemical stripper for effectively removing parts of gold plating for selective gold plating connector.
CHARACTERISTICSBATH
TEMPER-ATURE(℃)
CONTENT PRO-PERTY
TREAT-MENTTIME
(sec)PROCESS
APPLI-CATIONSLEAD FRAME
APPLICATIONS
CHARACTER-ISTICS
BATHTEMPERATURE(℃)
ADDITIONDENSITY
SITUA-TION
CURRENTDENSITY
(A/dm2)PROCESS STRIPPING RATE
(sec/μm)
TYPE OFBATH(pH)
LEAD FRAME
CONNECTOR
LED BRIGHT AG-20 Bright and hard silver plating solution for LED (additive agent only)
■メタローテクノロジーズジャパン(株)様/会社案内(英語版)/P.06-07/4C/仕上がりサイズ:W297mm×H210mm 2011.06.16
PROCESS
8
EQUIPMENT
9
RU-33
Black RU-LB
Yamabuki Series
Light Gold
K-100
K-76
K-81
K-84
K-130
K-200
N-205
(ELECTROLYTIC) GOLD-PLATING PROCESS FOR DECORATIVE PARTS
RUTHENIUM-PLATING PROCESSPCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Vickers)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Vickers)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
True gold color strike type, decorative
Green gold color strike type, decorative
Reddish gold color strike, decorative
Whitish gold color strike, decorative
Hamilton gold color strike, decorative
True gold color strike, decorative
Au or Co series
Hamilton gold color thick plating type
Light yellow gold color, decorative
Acidic pure gold
Acidic pure gold
Gold plating directly for stainless steel
For switch contact
Black type for decorative plating
Gold plating solution for thin plating decoration, 18K, 20K, 23K and 24K versions are available.
K-100 is an acidic gold strike plating process, most suitable for decorative parts.
K-76 is an acidic bright gold plating solution.
A bright gold thin-plating solution.
K-81 is an alkaline plating process, suitable for various areas such as high performance decorative parts, precision products and electronic and industrial components.
K-84 is a thick type decorative acid alloy plating process, suitable for products such as watch cases and watch bands.
K-130 is a gold plating solution that offers stable deposit adhesion.
K-200 is an acidic gold strike plating process. Bath control is easy and it is best for various areas from electronic and industrial components to high performance decorative parts.
N-205 can be directly used for gold plating on stainless steel, most suitable for decorative parts.
RU-33 is an acid high-purity ruthenium plating solution. Most suitable for electric contact parts and wear resistant components with excellent physical performance.
Black RU-LB is a ruthenium plating solution for black decoration.
MITOMO SEMICONENGINEERING CO.REEL TO REEL PLATING MACHINE
Mitomo Semicon Engineering Co. offers its own product lines, which are designed and produced in accordance to meet demands for high-mix, low-volume production. Our concept is to produce moduled equipment which is "easy to use", "easy to change production" and "easy to maintain". We offer tailor made products for each customer.
CONNECTOR PLATING MACHINE CARRIER TYPE PLATING MACHINE WASHER
PLATING MACHINE FOR LEAD FRAMES
CONNECTOR Ni-AuSOLDERING PLATINGMACHINE
CONNECTOR Ni-AuSOLDERING PLATINGMACHINE (U-TURN)
CARRIER TYPE ELECTROLESSCOPPER PLATING MACHINE WASHER FOR LEAD FRAMES
SILVER SPOT PLATINGMACHINE FOR LEAD FRAMES
SILVER SPOT PLATINGMACHINE FOR LEAD FRAMES(4 STRANDS)
SILVER SPOT PLATINGMACHINE FOR CUT-STRIPLEAD FRAMES
PALLADIUM PLATINGMACHINE FOR LEAD FRAMES
There is no pin damage by using special positioning structures not using "pilot pin". Using positioning structures by graphic processing realizes high-accuracy plating, and the plating accuracy is improved by using a laser-processed mask.※Machine specifications are determined according to customers requirements.
A spot plating machine with 2 x 2 strands for manufacturing of a wide variety of products in small quantities. Two strands of one side of the machine improve the maintenance performance.※Machine specifications are determined according to customers requirements.
Using a servomotor allows for smooth operations. The machine is equipped with a special plating jig, which can be changed easily, and which doesn’t require adjustment. Easy handling by touch panel.※Machine specifications are determined according to customers requirements.
The special structure improves the thickness uniformity of plating. A large capacity of power dispatching is possible because of the in-water structure. Easy maintenance by compact design.※Machine specifications are determined according to customers requirements.
Improved loading and unloading operation by easy switching of the reel. The control BOX is equipped, so you can operate the machine by monitoring the control panel. Almost all connector types can be partially plated by using a variety of partial plating cells.※Machine specifications are determined according to customers requirements.
By using a U-turn system space-saving can be achieved. Improved loading and unloading operation by easy switching of the reel. Almost all connector types can be partially plated by using a variety of partial plating cells.※Machine specifications are determined according to customers requirements.
Using an AC servomotor allows for smooth operations together with increased produc-tivity by using multiple carriers.※Machine specifications are determined according to customers requirements.
The washer for lead frames is equipped with four-line simultaneous loading and independent unloading for each line. For manufacturing of a wide variety of products in small quantities, and easy maintenance by compact design.※Machine specifications are determined according to customers requirements.
■メタローテクノロジーズジャパン(株)様/会社案内(英語版)/P.08-09/4C/仕上がりサイズ:W297mm×H210mm 2011.06.16
PROCESS
8
EQUIPMENT
9
RU-33
Black RU-LB
Yamabuki Series
Light Gold
K-100
K-76
K-81
K-84
K-130
K-200
N-205
(ELECTROLYTIC) GOLD-PLATING PROCESS FOR DECORATIVE PARTS
RUTHENIUM-PLATING PROCESS
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Vickers)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
PCB, FPCCHARACTERISTICS
APPLICATIONSBATH
TEMPERATURE(℃)
METAL PURITY(%)
CURRENTDENSITY
(A/dm2)
CURRENTEFFICIENCY(%)
DEPOSITION RATE(μm/min)
CONTENT(g/ℓ)
HARDNESS(Vickers)
TYPE OFBATH(pH)
PROCESS
CONNECTOR
SEMICONDUCTORWAFER
LEAD FRAME
ELECTRONICCOMPONENTS
DECORATION
True gold color strike type, decorative
Green gold color strike type, decorative
Reddish gold color strike, decorative
Whitish gold color strike, decorative
Hamilton gold color strike, decorative
True gold color strike, decorative
Au or Co series
Hamilton gold color thick plating type
Light yellow gold color, decorative
Acidic pure gold
Acidic pure gold
Gold plating directly for stainless steel
For switch contact
Black type for decorative plating
Gold plating solution for thin plating decoration, 18K, 20K, 23K and 24K versions are available.
K-100 is an acidic gold strike plating process, most suitable for decorative parts.
K-76 is an acidic bright gold plating solution.
A bright gold thin-plating solution.
K-81 is an alkaline plating process, suitable for various areas such as high performance decorative parts, precision products and electronic and industrial components.
K-84 is a thick type decorative acid alloy plating process, suitable for products such as watch cases and watch bands.
K-130 is a gold plating solution that offers stable deposit adhesion.
K-200 is an acidic gold strike plating process. Bath control is easy and it is best for various areas from electronic and industrial components to high performance decorative parts.
N-205 can be directly used for gold plating on stainless steel, most suitable for decorative parts.
RU-33 is an acid high-purity ruthenium plating solution. Most suitable for electric contact parts and wear resistant components with excellent physical performance.
Black RU-LB is a ruthenium plating solution for black decoration.
MITOMO SEMICONENGINEERING CO.REEL TO REEL PLATING MACHINE
Mitomo Semicon Engineering Co. offers its own product lines, which are designed and produced in accordance to meet demands for high-mix, low-volume production. Our concept is to produce moduled equipment which is "easy to use", "easy to change production" and "easy to maintain". We offer tailor made products for each customer.
CONNECTOR PLATING MACHINE CARRIER TYPE PLATING MACHINE WASHER
PLATING MACHINE FOR LEAD FRAMES
CONNECTOR Ni-AuSOLDERING PLATINGMACHINE
CONNECTOR Ni-AuSOLDERING PLATINGMACHINE (U-TURN)
CARRIER TYPE ELECTROLESSCOPPER PLATING MACHINE WASHER FOR LEAD FRAMES
SILVER SPOT PLATINGMACHINE FOR LEAD FRAMES
SILVER SPOT PLATINGMACHINE FOR LEAD FRAMES(4 STRANDS)
SILVER SPOT PLATINGMACHINE FOR CUT-STRIPLEAD FRAMES
PALLADIUM PLATINGMACHINE FOR LEAD FRAMES
There is no pin damage by using special positioning structures not using "pilot pin". Using positioning structures by graphic processing realizes high-accuracy plating, and the plating accuracy is improved by using a laser-processed mask.※Machine specifications are determined according to customers requirements.
A spot plating machine with 2 x 2 strands for manufacturing of a wide variety of products in small quantities. Two strands of one side of the machine improve the maintenance performance.※Machine specifications are determined according to customers requirements.
Using a servomotor allows for smooth operations. The machine is equipped with a special plating jig, which can be changed easily, and which doesn’t require adjustment. Easy handling by touch panel.※Machine specifications are determined according to customers requirements.
The special structure improves the thickness uniformity of plating. A large capacity of power dispatching is possible because of the in-water structure. Easy maintenance by compact design.※Machine specifications are determined according to customers requirements.
Improved loading and unloading operation by easy switching of the reel. The control BOX is equipped, so you can operate the machine by monitoring the control panel. Almost all connector types can be partially plated by using a variety of partial plating cells.※Machine specifications are determined according to customers requirements.
By using a U-turn system space-saving can be achieved. Improved loading and unloading operation by easy switching of the reel. Almost all connector types can be partially plated by using a variety of partial plating cells.※Machine specifications are determined according to customers requirements.
Using an AC servomotor allows for smooth operations together with increased produc-tivity by using multiple carriers.※Machine specifications are determined according to customers requirements.
The washer for lead frames is equipped with four-line simultaneous loading and independent unloading for each line. For manufacturing of a wide variety of products in small quantities, and easy maintenance by compact design.※Machine specifications are determined according to customers requirements.
■メタローテクノロジーズジャパン(株)様/会社案内(英語版)/P.08-09/4C/仕上がりサイズ:W297mm×H210mm 2011.06.16
EQUIPMENT
10 11
SERVICE
MITOMO SEMICONENGINEERING CO.PLATING MACHINE FOR SEMICONDUCTOR-WAFERS
Mitomo Semicon Engineering Co. is a world pioneer in plating machine for semiconductor-wafers. We have sold more than 100 units to the worldwide market. Adding not only jet-type plating machine but also dip- type plating machine to our product line, we offer plating machines meeting customers' requirements.
ELECTROPLATING MACHINE ANALYSIS AND PROTOTYPING FOR PLATING
ELECTROPLATING MACHINE ELECTROLESS PLATING MACHINE ETCHING MACHINE OTHER PLATING MACHINES
RACK TYPE SEMIAUTOMATICCOMPLEX PLATING MACHINE
ELECTROLESS AUTOMATICPLATING MACHINE
ETCHING MACHINE FORGOLD BUMP(MANUAL TYPE / AUTO TYPE)
OTHER PLATING MACHINESFOR SUCH AS300 MM WAFER
PLATING MACHINE FORGALLIUM ARSENIC
AU 14CUP-TYPEPLATING MACHINE
CU 14CUP-TYPEPLATING MACHINE
IN-DRAFT TYPEONE CUP-TYPEPLATING MACHINE
Machine for consistent plating of copper, nickel, solder, etc. Using a rack type machine achieves operations under greater diversity of conditions. Variety of plating solutions can be used, because each processing tank can be customized. The motions of pretreatment, rinsing, plating, rinsing, plating, etc. can be done automatically. Most advanced machine for complex plating.
Machine for electroless nickel and immersion gold plating. Automatic processing from the electroless nickel to the immersion gold by one carrier batch. Automatic processing by setting each processing tank for complex pre-treatment of the electroless plating process.
Etching machine for gold plating with a set of carriers. Efficient etching process. Compact and user-friendly design. Etching machine for copper plating is also available.
We produce other plating machines for 300 mm wafer. Any type of machines are available for custom-made including both rack type and cup type. We can produce plating machines to respond to all types of materials, shapes (round or angle) and sizes, etc.
Machine for plating of 6-inch gallium-arsenic wafers. Technology to prevent damaging very brittle gallium arsenic wafers is featured. The picture above shows a machine with 4 cups, and up to 27 cups are available.
Standard machine used for gold plating from the top of 8-inch silicon wafers. Excellent maintenance performance and low running cost. All machine parts are our company's product from the power supply to the operation software, as well as the body. The international standard machine with easy conversion into plating of 6-inch silicon wafers.
Machine for wiring from the top of 8-inch wafers and copper plating. Includes pre-treatment machine as standard equipment, and user-friendly. Face-down type machines achieve excellent operation and maintenance performance with little loss of plating solu-tion, and low running cost. Easy conversion into plating of 6-inch silicon wafer.
Multipurpose wafer plating machine for one wafer processing. A variety of specifications are available by custom-made. Responds to machines for from 2-inch to 8-inch silicon wafers and includes QDR washing tank, static tank, vacuum tweezers, and hand shower as standard equipments. Same structure as our mass production machines, so plating conditions and other technologies in this machine can be applied to mass production machines. Only small amount of solution to be used.
As a part of technical service for customers, we have established a service system for sample plating, analysis service and material characteristics analysis service.
TESTING AND EVALUATION SERVICE ANALYSIS SERVICE CHARACTERIZATION ANDANALYSIS SERVICE
We offer sample plating service for initial evaluation necessary for customers to carry out process evaluation. In addition to sample plating production for wafers, we offer sampling and feedback of sampling of printed circuit boards and connectors.
We maintain our support system to address issues at customer sites making full use of analysis equipment.
We offer analysis services, including chemical composition analysis of plating deposits, elemental analysis and analysis of crystal orientation and crystal structure analysis of very small cross sections.
■メタローテクノロジーズジャパン(株)様/会社案内(英語版)/P.10-11/4C/仕上がりサイズ:W297mm×H210mm 2011.06.16
EQUIPMENT
10 11
SERVICE
MITOMO SEMICONENGINEERING CO.PLATING MACHINE FOR SEMICONDUCTOR-WAFERS
Mitomo Semicon Engineering Co. is a world pioneer in plating machine for semiconductor-wafers. We have sold more than 100 units to the worldwide market. Adding not only jet-type plating machine but also dip- type plating machine to our product line, we offer plating machines meeting customers' requirements.
ELECTROPLATING MACHINE ANALYSIS AND PROTOTYPING FOR PLATING
ELECTROPLATING MACHINE ELECTROLESS PLATING MACHINE ETCHING MACHINE OTHER PLATING MACHINES
RACK TYPE SEMIAUTOMATICCOMPLEX PLATING MACHINE
ELECTROLESS AUTOMATICPLATING MACHINE
ETCHING MACHINE FORGOLD BUMP(MANUAL TYPE / AUTO TYPE)
OTHER PLATING MACHINESFOR SUCH AS300 MM WAFER
PLATING MACHINE FORGALLIUM ARSENIC
AU 14CUP-TYPEPLATING MACHINE
CU 14CUP-TYPEPLATING MACHINE
IN-DRAFT TYPEONE CUP-TYPEPLATING MACHINE
Machine for consistent plating of copper, nickel, solder, etc. Using a rack type machine achieves operations under greater diversity of conditions. Variety of plating solutions can be used, because each processing tank can be customized. The motions of pretreatment, rinsing, plating, rinsing, plating, etc. can be done automatically. Most advanced machine for complex plating.
Machine for electroless nickel and immersion gold plating. Automatic processing from the electroless nickel to the immersion gold by one carrier batch. Automatic processing by setting each processing tank for complex pre-treatment of the electroless plating process.
Etching machine for gold plating with a set of carriers. Efficient etching process. Compact and user-friendly design. Etching machine for copper plating is also available.
We produce other plating machines for 300 mm wafer. Any type of machines are available for custom-made including both rack type and cup type. We can produce plating machines to respond to all types of materials, shapes (round or angle) and sizes, etc.
Machine for plating of 6-inch gallium-arsenic wafers. Technology to prevent damaging very brittle gallium arsenic wafers is featured. The picture above shows a machine with 4 cups, and up to 27 cups are available.
Standard machine used for gold plating from the top of 8-inch silicon wafers. Excellent maintenance performance and low running cost. All machine parts are our company's product from the power supply to the operation software, as well as the body. The international standard machine with easy conversion into plating of 6-inch silicon wafers.
Machine for wiring from the top of 8-inch wafers and copper plating. Includes pre-treatment machine as standard equipment, and user-friendly. Face-down type machines achieve excellent operation and maintenance performance with little loss of plating solu-tion, and low running cost. Easy conversion into plating of 6-inch silicon wafer.
Multipurpose wafer plating machine for one wafer processing. A variety of specifications are available by custom-made. Responds to machines for from 2-inch to 8-inch silicon wafers and includes QDR washing tank, static tank, vacuum tweezers, and hand shower as standard equipments. Same structure as our mass production machines, so plating conditions and other technologies in this machine can be applied to mass production machines. Only small amount of solution to be used.
As a part of technical service for customers, we have established a service system for sample plating, analysis service and material characteristics analysis service.
TESTING AND EVALUATION SERVICE ANALYSIS SERVICE CHARACTERIZATION ANDANALYSIS SERVICE
We offer sample plating service for initial evaluation necessary for customers to carry out process evaluation. In addition to sample plating production for wafers, we offer sampling and feedback of sampling of printed circuit boards and connectors.
We maintain our support system to address issues at customer sites making full use of analysis equipment.
We offer analysis services, including chemical composition analysis of plating deposits, elemental analysis and analysis of crystal orientation and crystal structure analysis of very small cross sections.
■メタローテクノロジーズジャパン(株)様/会社案内(英語版)/P.10-11/4C/仕上がりサイズ:W297mm×H210mm 2011.06.16
OUTLINE
13
Metalor Technologies (Japan) Corporation
April 1, 2011
310,000,000yen
Kenji Kasuga
【Head Office】Shinagawa East One Tower 9F2-16-1, Kohnan, Minato-ku, Tokyo 108-0075[Switchboard] TEL:81-3-6863 -3385 FAX:81-3-6863-3565[Sales Dept.] TEL:81-3-6863 -3386 FAX:81-3-6863-3387
【Numazu Plant】678 Ipponmatsu, Numazu-City,Shizuoka 410-0314[Switchboard] TEL:81-55-967-9641 FAX:81-55-968-0986[ R & D ] TEL:81-55-966-1271 FAX:81-55-966- 6192
(1)Manufacturing, processing, and selling of all salts and all solutions that related to plating
(2)Manufacturing, processing, and selling of Industrial paste(3)Collect precious metals by refining the material that contains
precious metals(4)Design, manufacturing and selling of plating processing equipment,
transportation equipment and other mechanical devices(5)Design, manufacturing and selling of instruments and metallic mold
used to equipment described in the preceding (4)(6)Maintenance, repair, remodeling and installation of mechanical
devices and instruments(7)All the related businesses that relates directly or indirectly to the
aboveNote: The above items include the business activities of our subsidiaries.
Mitomo Semicon Engineering Co, Ltd.Metalor Coatings (Singapore)Pte Ltd.Metalor Coatings (Taiwan)Corp.Metalor Coatings(Shanghai)Co, Ltd.Metalor Coatings (Korea)Corp.
[Company Name][Foundation][Capital][President & Representative Director][Address]
[Purpose of business]
[Subsidiary]
ORGANIZATIONAL STRUCTURE
C o m p a n y O v e r v i e w
AdvancedCoatingsDivision
Electrotechnics
Division
Refining
Division
OUTLINE
ORGANIZATIONAL STRUCTURE
HISTORY
GLOBAL NETWORK
Metalor Technologies (Japan) Corporation
MitomoSemicon
EngineeringCo, Ltd.
MetalorCoatings
(Singapore)Pte Ltd.
MetalorCoatings(Taiwan)
Corp.
MetalorCoatings
(Shanghai)Co, Ltd.
MetalorCoatings(Korea)Corp.
■メタローテクノロジーズジャパン(株)様/会社案内(英語版)/P.12-13/4C/仕上がりサイズ:W297mm×H210mm 2011.06.16
OUTLINE
13
Metalor Technologies (Japan) Corporation
April 1, 2011
310,000,000yen
Kenji Kasuga
【Head Office】Shinagawa East One Tower 9F2-16-1, Kohnan, Minato-ku, Tokyo 108-0075[Switchboard] TEL:81-3-6863 -3385 FAX:81-3-6863-3565[Sales Dept.] TEL:81-3-6863 -3386 FAX:81-3-6863-3387
【Numazu Plant】678 Ipponmatsu, Numazu-City,Shizuoka 410-0314[Switchboard] TEL:81-55-967-9641 FAX:81-55-968-0986[ R & D ] TEL:81-55-966-1271 FAX:81-55-966- 6192
(1)Manufacturing, processing, and selling of all salts and all solutions that related to plating
(2)Manufacturing, processing, and selling of Industrial paste(3)Collect precious metals by refining the material that contains
precious metals(4)Design, manufacturing and selling of plating processing equipment,
transportation equipment and other mechanical devices(5)Design, manufacturing and selling of instruments and metallic mold
used to equipment described in the preceding (4)(6)Maintenance, repair, remodeling and installation of mechanical
devices and instruments(7)All the related businesses that relates directly or indirectly to the
aboveNote: The above items include the business activities of our subsidiaries.
Mitomo Semicon Engineering Co, Ltd.Metalor Coatings (Singapore)Pte Ltd.Metalor Coatings (Taiwan)Corp.Metalor Coatings(Shanghai)Co, Ltd.Metalor Coatings (Korea)Corp.
[Company Name][Foundation][Capital][President & Representative Director][Address]
[Purpose of business]
[Subsidiary]
ORGANIZATIONAL STRUCTURE
C o m p a n y O v e r v i e w
AdvancedCoatingsDivision
Electrotechnics
Division
Refining
Division
OUTLINE
ORGANIZATIONAL STRUCTURE
HISTORY
GLOBAL NETWORK
Metalor Technologies (Japan) Corporation
MitomoSemicon
EngineeringCo, Ltd.
MetalorCoatings
(Singapore)Pte Ltd.
MetalorCoatings(Taiwan)
Corp.
MetalorCoatings
(Shanghai)Co, Ltd.
MetalorCoatings(Korea)Corp.
■メタローテクノロジーズジャパン(株)様/会社案内(英語版)/P.12-13/4C/仕上がりサイズ:W297mm×H210mm 2011.06.16
GLOBAL NETWORK
14 15
HISTORY
Foundation of a « Preliminary Rolling Factory » at Le Locle by Martin de Pury & Cie
Take over of the factory by the Banque du Locle
Take over of the Banque du Locle by the Swiss Bank Corporation (SBC)
Foundation of Métaux Précieux SA Metalor, SBC’s subsidiary
Majority ownership taken over by private investors
Acquisition of Microfil SA
Introduction of the new company name Metalor Technologies
Acquisition of Englehard-CLAL chemicals business
Sale of the Medical Division
Spin-off of Dental Division
Purchase of JM Hong Kong gold and silver refining assets
Majority ownership taken over by Astorg Partners a French private equity firm
Acquisition of AMI Doduco’s activities in the Americas
Closure of Watches and Jewelry Division
Acquisition of NECC’s coating activities in Japan
Foundation of Metalor Technologies(Japan)Corp.
1852
1864
1918
1936
1998
1999
2 001
2002
2003
2005
2007
2009
2010
2 011
Metalor Electrotechnics
USA Corp.
MetalorTechnologies
SA
Metalor Finance SA
Metalor Techn. Operations (Mexico)
S.A. de C.V.
MetalorTechnologies
USA Corp.
MetalorElectrotechnics
(Puerto Rico), LLC
MetalorTechnologies(Iberica) SA
MetalorTechnologies(Sweden) AB
MetalorTechnologiesFrance S.A.S.
MetalorTechnologies(Italy) S.R.L.
MetalorTechnologies(Suzhou) Ltd.
MetalorTechnologies (Japan) Corp.
MitomoSemicon
EngineeringCo, Ltd.
MetalorTechnologies
(Hong Kong) Ltd.
MetalorTechnologies(Singapore)
Pte Ltd.
MetalorTechnologies
(UK) Ltd.
Metalor Technologies International SA
Metalor USA Refining Corp. Peru Branch
Netherlands Branch Thailand Branch Taiwan Branch
Metalor Techn. Services (Mexico)
S.A. de C.V.
Metalor Coatings(Singapore)
Pte Ltd.
Metalor Coatings(Taiwan) Corp.
Metalor Coatings(Shanghai)
Co, Ltd.
Metalor Coatings(Korea) Corp.
■メタローテクノロジーズジャパン(株)様/会社案内(英語版)/P.14-15/4C/仕上がりサイズ:W297mm×H210mm 2012.04.09
GLOBAL NETWORK
14 15
HISTORY
Foundation of a « Preliminary Rolling Factory » at Le Locle by Martin de Pury & Cie
Take over of the factory by the Banque du Locle
Take over of the Banque du Locle by the Swiss Bank Corporation (SBC)
Foundation of Métaux Précieux SA Metalor, SBC’s subsidiary
Majority ownership taken over by private investors
Acquisition of Microfil SA
Introduction of the new company name Metalor Technologies
Acquisition of Englehard-CLAL chemicals business
Sale of the Medical Division
Spin-off of Dental Division
Purchase of JM Hong Kong gold and silver refining assets
Majority ownership taken over by Astorg Partners a French private equity firm
Acquisition of AMI Doduco’s activities in the Americas
Closure of Watches and Jewelry Division
Acquisition of NECC’s coating activities in Japan
Foundation of Metalor Technologies(Japan)Corp.
1852
1864
1918
1936
1998
1999
2 001
2002
2003
2005
2007
2009
2010
2 011
Metalor Electrotechnics
USA Corp.
MetalorTechnologies
SA
Metalor Finance SA
Metalor Techn. Operations (Mexico)
S.A. de C.V.
MetalorTechnologies
USA Corp.
MetalorElectrotechnics
(Puerto Rico), LLC
MetalorTechnologies(Iberica) SA
MetalorTechnologies(Sweden) AB
MetalorTechnologiesFrance S.A.S.
MetalorTechnologies(Italy) S.R.L.
MetalorTechnologies(Suzhou) Ltd.
MetalorTechnologies (Japan) Corp.
MitomoSemicon
EngineeringCo, Ltd.
MetalorTechnologies
(Hong Kong) Ltd.
MetalorTechnologies(Singapore)
Pte Ltd.
MetalorTechnologies
(UK) Ltd.
Metalor Technologies International SA
Metalor USA Refining Corp. Peru Branch
Netherlands Branch Thailand Branch Taiwan Branch
Metalor Techn. Services (Mexico)
S.A. de C.V.
Metalor Coatings(Singapore)
Pte Ltd.
Metalor Coatings(Taiwan) Corp.
Metalor Coatings(Shanghai)
Co, Ltd.
Metalor Coatings(Korea) Corp.
■メタローテクノロジーズジャパン(株)様/会社案内(英語版)/P.14-15/4C/仕上がりサイズ:W297mm×H210mm 2012.04.09
Metalor Technologies (Japan) Corporation