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8/9/2019 Measurement of Transmission and Reflectance of PV Materials and Cells
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Measurement ofTransmissionand Ref lectance ofPV Mater ia ls and Cel ls
Shimadzu
UV-VIS-NIR Spectrophotometers
C101-E114
8/9/2019 Measurement of Transmission and Reflectance of PV Materials and Cells
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Solar cell manufacturing plants are constantly seeking higher conversion efficiency. For this reason, the evaluation
of transmission and reflectance by a spectrophotometer at a specific wavelength region is required.
The SolidSpec-3700/UV-3600 are held in high regard by major solar cell manufacturers around the world for their
role in the development of solar cell materials, cells and modules, and also for ensuring of consistent quality in
mass production.
SolidSpec-3700/UV-3600 Play Important Roles
Thin-Fi lm Si Solar Cel l
a-Si/uc-Si spectral absorption coefficient
Transmission of glass substrates with TCO
Back electroden-type microcrystalline Si
i-type microcrystalline Si
p-type microcrystalline Si
n-type a-Si
i-type a-Si
p-type a-Si
TCO
Glass substrate
Crystal l ine Si Cel l Solar Cel ls
Verification of effectiveness of anti-reflective film
Dye-Sensit ized Solar Cel l
Transmission and Reflectance Measurement of Solar Cel l Materials
Spectral absorption coefficient of TiOz electrodes after dye adsorption
Transmission of glass or polymer substrates with transparentconducting film
• Glass or polymer substrate with TCO • Cover glass • EVA film
CIGS Solar Cel ls
Transmission of transparent conducting film (ZnO: Al or B doped)
Spectral absorption coefficient of photoelectric transfer layer
ZnO (Al or B doped)Buffer layer
CIGSSMo back electrodeGlass substrate
Glass or polymer filmTransparent conducting film
PlatinumElectrolyte
Titanium oxide electrodeTCO
Glass or polymer film
F
r o n t
e
l e c t r o d e
F
r o n t
e
l e c t r o d e Anti-reflective film
n-type Si
p-type Si substrate
p+ layerBack electrode
8/9/2019 Measurement of Transmission and Reflectance of PV Materials and Cells
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olidSpec-3700 Reduces Measurement Workload and Achieves More Eff icient Analysis
olar Cell Manufacturing Processes
The large sample compartment enables non-destructive measurement of large samples up to
700 mm x 560 mm.
(1) Samples are easy to place.
The optional Automatic X-Y Stage enables samples to be moved to specified positions so that multiple points
can be measured automatically.
(2) Measurement workload at mult iple specif ied points can be reduced.
Attachment of the Variable Angle Absolute Specular Reflectance Measuring Device enables samples to be
measured at any angle of incidence without swapping accessories.
(3) Workload when changing measurement angle of incidence can be reduced.
560mm
700mm
Conventional
methods
SolidSpec
to
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Ideal for Evaluations of Solar Cell Manufacturing Processes and Materia
Large Sample Compartment Model SolidSpec-3700High Sensit ivi ty – World’s First* UV-VIS-NIRSpectrophotometer with Three Detectors
SolidSpec-3700Sample Compartment
Relationship Between Detectors and Measurable Range (Common to Both SolidSpec-3700 and UV-3600)
Detectors Optical System
Three Dimensional Optical Path
A photomultiplier tube (PMT) detector is used for the ultraviolet and visible
regions, while an InGaAs detector and a cooled PbS detector are used for the
near-infrared region. Use of the InGaAs and PbS detectors makes the sensitivity
in the near-infrared region significantly high.
The PMT detector can be switched to the InGaAs detector in the range of 700 nm to 1000 nm (the default switching wavelength is 870 nm).
The InGaAs detector can be switched to the PbS detector in the range of 1600 nm to 1800 nm (the default switching wavelength is 1650 nm).
Ultra-Large Sample Compartment –Wide Variety of Samples HandledA 3D optical system and ultra-large sample compartment allow extra large
samples up to 700 mm x 560 mm in size to be placed flat, making large sample
setting easier. And, the Automatic X-Y Stage enables automatic multi-point
measurement of samples up to 310 mm x 310 mm to be measured with nitrogen
gas purged.
* As of February 2005, in-house report
Integrating
sphereMonochrometer
WI lamp
D2 lamp
PbS detector
PMT
Integrating
sphere
InGaAs detector
Monochrometer
Direct Detection Unit
(DDU: optional)
PMT
InGaAs
PbS
UV
190nm 380nm 780nm 3300nm
Visible NIR
190 to 1000 nm
700 to 1800 nm
1600 to 3300 nm
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Accessories for Film Measurement
Optical System
Optical System Around Detectors
PbS detector
InGaAs detector
PMT detector
Desktop Model UV-3600High Sensit ivi tyThis instrument incorporates a PMT (photomultiplier tube) detector
for the ultraviolet and visible regions and an InGaAs detector, and
a cooled PbS detector for the near-infrared region. With
conventional instruments, there is a drop in sensitivity at the
crossover wavelength between the regions covered respectively by
the PMT and PbS detectors. Using an InGaAs detector to cover
this region, however, ensures high sensitivity across the entire
measurement wavelength range. The 1500-nm noise level does
not rise above 0.00003 Abs.
Film Holder (P/N 204-58909) Standard Type
Applicable sample size: Minimum 16 (W) x 32 (H) mm
Maximum 80 (W) x 40 (H) x 20 (t) mm
Film Holder (Special Order)
This accessory is mounted in the instrument's sample
compartment, and enables rotation of the sample and attachment
of a polarizer.
It is particularly suited to the measurement of transmission
characteristics of polarized film. There are many other accessories
available for the UV-3600.
High Resolution, Ultra-Low Stray Light and Wide Measurement Wavelength Range
Using a high-performance double monochromator makes it possible to attain an ultra-low stray light level (0.00005% max. at 340 nm) with a
high resolution (max. 0.1 nm). The wide wavelength range of 185 nm to 3300 nm enables measurements over the ultraviolet, visible and near-
infrared regions, allowing spectrophotometry to be performed in a variety of different fields.
InGaAs
PbS
PMT
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SolidSpec-3700 Accessories
The Automatic X-Y Stage enables automatic in-plane mapping measurement of crystalline Si solar cells as they
are, and even thin-film Si or CIGS solar cells of a maximum size of 310 mm x 310 mm. The results of measuring a
glass substrate with TCO (SnO) for thin-film solar cells shown above indicate that an in-plane transmittance error
Automatic X-Y Stage
This stage enables automatic multi-point measurement of samples
of a maximum size of 310 mm x 310 mm.
Mounted on Instrument
Wavelength (nm)
300
700
1000
1500
6.68
77.8
69.96
31.38
6.3
77.77
71.99
35.61
6.52
76.25
70.88
34.02
7.1
75.44
69.62
30.95
6.52
76.78
70.34
31.68
Measurement Point 1 Measurement Point 2 Measurement Point 3 Measurement Point 4 Measurement Point 5
In-Plane Mapping Measurement of Transmittance at 5 Points in a Glass Substrate Surface with TCO at Specific Wavelengths
Wavelength (nm)
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Solar Cel l Material , Cel l and Module Analysis and Evaluation Instruments
The angle of incidence of the light irradiating the sample can be
changed with ease thanks to a goniometer system that allowsrotation of the sample and detector (integrating sphere) on the
same axis. The integrating sphere can also be installed on the
transmitting side to enable measurement of transmission at a
variable angle of incidence and measurement of the distribution of
the scattered angle of transmission.
Applicable sample size
Measurement wavelength range
Absolute specular incidence angle, Variable in range
Transmittance detection angle, Variable in range
50 (W) x 50 (H) x 2 (t) mm
300 to 2600 nm
5 ϒ to 70 ϒ
0 ϒ to 90 ϒ
Variable Angle Absolute Specular Reflectance Measuring
Device (Special Order)
Structure of Variable Angle Absolute Specular Reflectance
Measuring Device
Mounted in Sample Compartment
Specifications
Reference light
Reference sideintegrating sphere
Sample
Mask
Sample sideintegrating sphere
Sample lightSample lightReference sideintegrating sphere
Sample sideintegrating sphere
Each of the sampleholder and sample typedetector angles can beset independently.
Moving parts
Energy Dispersive X-RayFluorescence Spectrometer
EDX Series
[Applications]Non-destructive composition analysis and filmthickness measurement of CIGSS/CIGS, buffer layers, TCO thin films, and electrodes
XPS Imaging Spectrometer
ESCA-3400(Kratos Amicus)
[Applications]Chemical bonding analysis of CIGSS/CIGS thinfilms and buffer layers in depth direction
Single Nano Particle Size Analyzer
IG-1000
[Applications]Particle size and particle-size-distributionmeasurements of nano-size metal particlesin range 0.5 nm to 200 nm
Universal Testing Machine
AG-X
[Applications]Module compression and tensile testing, end-sealingmaterial and back sheet peeling testing, evaluation ofbonding strength of interconnections
FTIR Spectrophotometer
IRPrestige-21
[Applications]Analysis of ultraviolet light and thermaldegradation of EVA and other transparentbonding film, evaluation of Si-H bonding strength
UV/PY (UV Irradiation/Pyrolysis)
GCMS-QP2010 Plus
[Applications]Analysis of chemical changes and deterioration of EVAin the optical, thermal and oxidation degradationphases by combining UV irradiation and pyrolysis
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The contents of this brochure are subject to change without notice.
SHIMADZU CORPORATION. International Marketing Division
3. Kanda-Nishikicho 1-chome, Chiyoda-ku, Tokyo 101-8448, JapanPhone: 81(3)3219-5641 Fax. 81(3)3219-5710
URL http://www.shimadzu.com
JQA-0376
Founded in 1875, Shimadzu Corporation, a leader in the
development of advanced technologies, has a distinguished
history of innovation built on the foundation of contributing tosociety through science and technology. We maintain a global
network of sales, service, technical support and applications
centers on six continents, and have established long-term
relationships with a host of highly trained distributors located
in over 100 countries. For information about Shimadzu, and to
contact your local office, please visit our Web site at
www.shimadzu.com