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MC Chemical Solutions for SemiconductorChemical Reaction Creates New Values

A newly introduced umbrella brand of Mitsubishi Chemical’s products and services for semiconductor industry

Cross-functional worldwide collaboration in MCC group companies for delivering one-stop solutions to the market

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We build strong partnerships with customers by delivering high-

quality products and services to semiconductor industry globally

and contribute to the realization of sustainable society.

Our Mission

SemiconductorDivision

StrategyOffice

Semiconductor Solution

Department

PlanningGr.

R&DGr.

Semiconductor Materials

Department

MCSSUSA

MCSSEurope

MCSSAP*

Newly established as of April 1st,2020

Regional groups (Virtual org.)

MCC, Tokyo

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Organizational Structure

※AP : Asia Pacific

cleanpart Group (GE, FR)IMEC as member (BE)

MCSS Europe

Shinryo (JP)GemTEK (CH)MC Taiwan (TW)MC Solution (KR)

MCSS AP

Cleanpart US (CA, AZ, TX, MA)MCIC (CA)

MCSS USA

Mitsubishi Chemical (JP)

HQ

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Global Footprint

aquaPASS™

This water-based antistatic agent is derived from polyaniline-based, water-soluble electroconductive polymers.This agent prevents particles from adhering due to static electricity when used as a coating on films and plastic substrates.Use of this agent enables the production of thin films with excellent antistatic performance, transparency, and minimal humidity dependency.

Antistatic Agent

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Products&

Services

Antistatic Agent for Electron Beam Lithography

This antistatic agent is used to prevent electrons from accumulating on the resist surface during electron beam lithography.This material is used in advanced photomask manufacturing to help prevent charge-up failures.

aquaSAVE™

Synthetic Silica Sand MKC™ Silica

Ultrapure synthetic silica powder derived from silicon alkoxide. Ideal as a raw material for quartz glass (silica glass) which requires high purity.

Lithomax™Photo Resist Photosensitive Polymer

This photosensitive polymer for photo resists is used during the formation of semiconductor circuits.This material is designed to satisfy strict quality requirements, such as high purity and low metal content, associated with the miniaturization of circuit patterns.Our services include polymer design, prototyping, and mass production.

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Products&

Services

Advanced Cleaning Chemical

Post Cu/Low-k CMP Cleaning Solution, "MCX-SDR4“

Advanced Cleaning Solution for RCA Process, "MC1“

Multifunctional Advanced Cleaning Solution, "AM1"

High Performance Wet Etchant for Semiconductor/FPD

an electronic chemical used in wet etching in semiconductor manufacturing.

Products: Si etchant, Al etchant

Ultra High Purity Process Chemicals for Semiconductor

Over 30 years of stable supply

Products: Sulfuric acid, Nitric acid, Ammonia solution, Hydrogen peroxide,Hydrochloric acid

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Products&

Services

Precision cleaning service for equipment kits and parts that requires stringent cleaning with very low tolerance on left-over microscopic particles or other contaminants.

A wide range of surface technology services – plasma spray coatings, electrical arc spray coatings, flame spray coatings, plating, diamond-like coatings, surface roughness adjustment, etc.

A treatment service using high level polishing, cleaning and stripping technology that enables used test wafers to be reused in semi-conductor manufacturing line.

Precision cleaning, surface coating & treatment, and wafer reclaim

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Products&

Services

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Thank you