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J.M. KaramPresident & CEO
MEMSCAP
Phone: +33 4 76 52 55 80Fax: +33 4 76 52 55 81
Email: [email protected]
Slide2J. M. Karam Company Confidential
Specifications Architecture Optimization Schematic Capture
BehavioralSimulation
Design Centering
AutomaticLayout Generation
DRCEtching Verification
Cross-Section Viewing3D Viewing
FEM/BEM
Process Variations
Slide3J. M. Karam Company Confidential
Specifications Architecture Optimization FEM/BEMAnalysis
BehavioralModeling
BehavioralSimulation
Layout Generation
DRCEtching Verification
Cross-Section Viewing3D Viewing
DesignCentering
Full SystemFunctionality
Process Variations
Slide4J. M. Karam Company Confidential
Schematic Capture(e.g. DA)
Schematic Capture(e.g. DA)
Mixed-TechnologySimulator
(e.g. Continuum/Eldo)
Mixed-TechnologySimulator
(e.g. Continuum/Eldo)
Place&Route[Layout Tool]
(e.g. IC Station)
Place&Route[Layout Tool]
(e.g. IC Station)
MEMSHDL-A/
VHDL-AMSLibrary
MEMSHDL-A/
VHDL-AMSLibrary
LayoutGenerators
LayoutGenerators
TechnologyFiles
TechnologyFiles
FEM to HDL-ATranslator
FEM to HDL-ATranslator
DRCDRC
Cross-SectionViewer
Cross-SectionViewer
EtchingVerification
EtchingVerification
ResultInterface
ResultInterface
Field Solvers(FEM, etc.)
ANSYS
DeviceDesigner
SystemDesigner
Optimization &Manufacturing
Yield ManagementTools
Layout to 3D Solid-Model
Layout to 3D Solid-Model
MaterialData Base
MaterialData Base
Slide5J. M. Karam Company Confidential
• Generic : VULCAINTM
• Customizable by the User to the targeted process technology• Seamless Design Flow: from Front-End to Back-End• Anisotropic & Sacrificial Etching Simulation• Multi-Segment, Multi-Angle Cross-Section Viewer• Layout to/from 3D Solid-Model Generator • EDDTM-Mesh : FEM to HDL-A Translator
• Foundry Modules :• KANAGATM [MCNC/Cronos]
More than 75 Device Generators !
Slide6J. M. Karam Company Confidential
MEMS HDL-A ModelSchematic Symbol Layout Generator
Building BlockLevel
Device Level
Generic FEM Validated Characterized
Level 2
Level 1
Slide7J. M. Karam Company Confidential
• Algorithms : Monte Carlo & Surface Response Methods
• Customizable for any MEMS Process• Extract Data from Process of
Critical Monitors• Build Statistical Model
• Behavioral Simulation • Considering Process Variations• Design Centering
Slide8J. M. Karam Company Confidential
Slide9J. M. Karam Company Confidential
Slide10J. M. Karam Company Confidential
Slide11J. M. Karam Company Confidential
• Ensure Schematic Driven Layout
Generators• Coupled to System Level Model
• Improve Productivity at Layout
Custom Design
• Device Generators • Functions (Non-Manhattan Shapes)• Building Blocks• Device Level
Slide12J. M. Karam Company Confidential
Slide13J. M. Karam Company Confidential
Slide14J. M. Karam Company Confidential
Anisotropic Etching Simulation Sacrificial Etching Simulation
Slide15J. M. Karam Company Confidential
Slide16J. M. Karam Company Confidential
Layout Area Selection Layout FEM 3D Viewer (VRML, etc.)
Slide17J. M. Karam Company Confidential
Slide18J. M. Karam Company Confidential