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Mini-SRAM Test Structures: Distributed SRAM Yield Micro Probes for Monitoring 3D Integrated Chips JB Kuang and Keith Jenkins IBM Research June 2013

JB Kuang and Keith Jenkins IBM Research June 2013

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Mini-SRAM Test Structures: Distributed SRAM Yield Micro Probes for Monitoring 3D Integrated Chips. JB Kuang and Keith Jenkins IBM Research June 2013. Author Details. - PowerPoint PPT Presentation

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Page 1: JB Kuang and Keith Jenkins IBM Research June 2013

Mini-SRAM Test Structures: Distributed SRAM Yield Micro Probes

for Monitoring 3D Integrated Chips

JB Kuang and Keith Jenkins

IBM Research

June 2013

Page 2: JB Kuang and Keith Jenkins IBM Research June 2013

2013 © IBM CorporationMini 3D SRAM Monitor

Author Details• JB Kuang is research staff member of IBM’s Austin Research

Laboratory. His technical activities are in the area of high speed SRAM and eDRAM cache designs, double precision floating point logic, on-chip power supply generation, and most recently NAND Flash disk and memory appliances.

• Keith Jenkins is research staff member of IBM’s Watson Research Center. His current activities include investigating the use of graphene for high-frequency integrated circuits, and developing on-chip circuits for in situ measurement of timing jitter, power supply transients, device variability and circuit reliability.

2

Page 3: JB Kuang and Keith Jenkins IBM Research June 2013

2013 © IBM CorporationMini 3D SRAM Monitor

Extended Abstract3D integration (3DI) offers increased interconnect bandwidth and cache/memory

density, which can be in the form of high capacity DRAM, high performance SRAM arrays, or a combination of such. One challenge is the area efficiency trade-off, which is dictated by the native TSV pitch and keep-out distance between the TSV regions and active silicon area. It is desirable to observe SRAM cells in real time, across chip dimensional span or even on a stratum, due to SRAM’s extreme sensitivity to even parameter variations and device sizes.

This work describes a small physical footprint, distributed on-chip observation infrastructure, which monitors SRAM in the vicinity of TSV regions. Information on locality specific Vt variation, read current fluctuation, and power supply sensitivity can be easily extracted either for fabrication facility tuning or customized on-chip operating configuration settings. Our implementation choice is in the matured 45nm SOI technology with high SRAM cell yield and stable baseline planar technology characteristics. In this fashion, we isolate contributions from the baseline 2D technology and observe issues directly attributed to the unique features of 3DI. The short ring ensures one unique undisputed frequency and correlation with the TSV neighbor.

In summary, the proposed on-chip monitoring methodology demonstrates (1) the effectiveness of short-loop compact sized SRAM oscillators to achieve yield and DFM enhancements; (2) the availability of density margins for 3DI physical design rule optimization; (3) opportunities of intra- and inter-stratum location dependent parametric optimization in a large 3DI system.

3

Page 4: JB Kuang and Keith Jenkins IBM Research June 2013

2013 © IBM CorporationMini 3D SRAM Monitor44

Motivation

• There is a need to understand the interaction between through-silicon via (TSV) stress and SRAM device/cell behavior in 3D integration.

• TSVs may induce VT shift or aggravate VT scatter from random dopant fluctuation and process variations.

• DFM-oriented test structures can reflect actual device usage and circuit style to flag potential yield detractors.

• It is highly desirable to maximize usable silicon area in each stratum, guide the design rule optimization, and is environmentally green and fiscally responsible to minimize 3D hardware iterations.

Page 5: JB Kuang and Keith Jenkins IBM Research June 2013

2013 © IBM CorporationMini 3D SRAM Monitor55

The Approach• Create a small SRAM-like test circuit which:

• Uses unaltered SRAM cells.

• Uses real local evaluation circuit.

• Captures word line to cell evaluation read timing.

• Operates with the correct supply voltages (VDD, VCS).

• Allows standalone operation with a minimal number of input signals, which can be controlled by scan latches.

• Is small enough that it be easily placed in strategic locations on every stratum of interest.

• Simplicity: use only 5 inputs and 1 ring output per instance

Page 6: JB Kuang and Keith Jenkins IBM Research June 2013

2013 © IBM CorporationMini 3D SRAM Monitor66

Placement of Test Structures• Basic idea: explore impact of distance to TSV SRAM device

performance.

• Ring Oscillator made up of the internal SRAM timing path!

Active Silicon real estate

Page 7: JB Kuang and Keith Jenkins IBM Research June 2013

2013 © IBM CorporationMini 3D SRAM Monitor77

The Building Block

Page 8: JB Kuang and Keith Jenkins IBM Research June 2013

2013 © IBM CorporationMini 3D SRAM Monitor

Small Profile Monitor Test Structure

8

• 4 active SRAM cells make one observation point

• Measured array electrical effect < half TSV width

• Even columns, active; odd columns, wiring only

Active Read Access Path

Page 9: JB Kuang and Keith Jenkins IBM Research June 2013

2013 © IBM CorporationMini 3D SRAM Monitor99

• 4x32 (6x34 actual) petite sub-array with built-in control infrastructure.

Array in Test Structure

wla group

wlb group

active wl

blc (active cell 0 side)

global bl output

lvl-shift wl drv

accessed cell

active local eval

global eval-like enable

Legend

Page 10: JB Kuang and Keith Jenkins IBM Research June 2013

10

Placement of Mini-probe Instances

Cases of most Intrusion into keep-out region

Cases of least Intrusion into keep-out region

Cases of half-way Intrusion into keep-out region

Jente Kuang
Page 11: JB Kuang and Keith Jenkins IBM Research June 2013

2013 © IBM CorporationMini 3D SRAM Monitor

pass

fail

VC

S(V

)

VDD(V)1111

Reference Shmoo DiagramFor a 14MB Functional SRAM on the same wafer with

identical peripheral circuitry and subarray construct style

Page 12: JB Kuang and Keith Jenkins IBM Research June 2013

2013 © IBM CorporationMini 3D SRAM Monitor1212

Simulated Waveforms for Evaluating Bit Lines

Oscillator frequency dictated by bit line evaluation

Page 13: JB Kuang and Keith Jenkins IBM Research June 2013

2013 © IBM CorporationMini 3D SRAM Monitor13

Measurement Results

An example ofring-by-ring SRAM-RO frequencies

Measured on chips with TSVs

0 1 2 3 4 5 6 7 80.94

0.96

0.98

1.00

1.02

1.04

1.06

fre

qu

en

cy r

ela

tive

to

me

an

ring number

Average frequency comparisonfor chips with and without TSVs

10 11 12 13 14 15 160

2

4

6

8

10 11 12 13 14 15 160

2

4

6

8

red=TSVblue=noTSV

eve

nts

RO frequency (MHz)

Page 14: JB Kuang and Keith Jenkins IBM Research June 2013

2013 © IBM CorporationMini 3D SRAM Monitor14

Measurement Results –Relative Frequency difference between TSV and non-TSV wafers before and after the annealing process

*omission of annealing causes increase of PFET Vt

Before annealing After annealing

0 1 2 3 4 5 6 7 8

-0.06

-0.04

-0.02

0.00

0.02

rela

tive

fre

qu

en

cy d

iffe

ren

ce

ring number

0 1 2 3 4 5 6 7 8

-0.04

-0.02

0.00

0.02

0.04

rela

tive

fre

qu

en

cy d

iffe

ren

ce

ring number

Page 15: JB Kuang and Keith Jenkins IBM Research June 2013

2013 © IBM CorporationMini 3D SRAM Monitor15

Conclusion

Distributed self-oscillating mini-probes are proven effective in detecting chip level as well as locale dependent parameter variations.

The average SRAM ring oscillator frequency for all rings of TSV-chips is lower, by a small percentage, on a wafer with known stress induced pFET Vt shift.

Such wafers also show strong dependence (a few percent) on the proximity of the TSV to the active cells.

These mini-probes aid yield parametric characterization on 3DI chips.