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• Figure 1: From http://www.spirecorp.com/spire-biomedical/surface-modification-technology/ion-implantation.php
Channeling
• Less nuclear stopping and low electron densities
• Produces a tail in the implant distribution
• Largest effect when the incident ion is small
• Avoided by using an implant tilt or preamorphizing.
Lattice damage
• Bonds broken.• Critical dose dependent on energy, species
and temperature.• More damage further in due to nuclear
stopping becoming the dominant mechanism• Anneal used to decrease defect density and to
activate implanted species
Shallow junctions
• Low energy difficult due to beam broadening
• Very low energy implants usually performed using molecules
• Thermal electrons