Intro Semicon

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    Introduction to Semiconductors

    Ohm Law: V=R I

    R= L / A

    : electrical resistivity (property of the material)

    Material Resistivity

    insulator > 105 cm

    semiconductor 10-3 105 cm

    conductor < 10-3 cm

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    Semiconductor band structure

    Electrons in an isolated atom occupy discrete

    energy levels.

    Energy levels of short-distance interacting atomsdegenerate into bands.

    Energy

    Forbidden gap

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    Relationship between conductivity

    and band-structure Conductivity depends on the availability of

    unoccupied states in the most external occupied

    energy band: conductors: external band is partially occupied;

    insulators and Semiconductors: external band is fully

    occupied at 0 K (valence band).

    Insulators and semiconductors differ in terms of

    gap amplitude (0.5 eV 1.5 eV for S.C.).

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    Relationship between conductivity

    and band-structure Insulators' gap is larger than 5 eV

    Larger gap amplitude leads to a lower probability

    of transition from the valence to the conductionband.

    Interband transitions are thermally activated.

    S.C. EG

    Silicon 1.12 eV

    Germanium 0.66 eV

    Gallium-Arsenide 1.42 eV

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    Intrinsic carrier concentration

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    Holes in Semiconductors

    Electrons in an intrinsic semiconductor usually

    belong to the valence band.

    Transition of an electron from valence toconduction band is mainly induced by thermal

    energy or by light.

    Such a transition leaves an hole in valence band. Holes feature a positive electric charge and an

    equivalent conduction mass.

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    Mono-Crystalline Silicon

    Silicon belongs to the fourth group: four valence

    electrons available to form covalent bonds.

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    Doping of Mono-Crystalline Silicon

    Doping: substitution of silicon atoms with atoms of theIII (lack of an electron ---> hole) or of the V group

    (electron in excess in conduction band).

    Donors: elements of the V group; ND

    Acceptors: elements of the III group; NA

    1014 < NA/D

    < 1021 cm-3

    At T=300 K almost all doping atoms are activated(ionized)

    in case of N-type doping: n=ND

    =ND

    +

    in case of P-type doping: p=NA=NA-

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    Doped semiconductors

    at equilibrium: np=ni

    2

    charge neutrality: p+ND

    -n-NA

    =0

    N-Doped semiconductor (ND

    >NA

    ):

    P-Doped semiconductor (NA>ND):

    Doping compensation

    n=NDNANDNA

    24ni2

    2N

    DN

    Ap=

    ni

    2

    NDNA

    p=NANDNAND

    24ni2

    2NAND n=

    ni

    2

    NAND

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    Mathematical model of transport and

    electrostatics

    Drift-diffusion Equations J

    n= q

    nnE + qD

    ngrad(n)

    Jp

    = qp

    pE - qDp

    grad(p)

    E = -grad

    n/p conductivity: qnn / q

    pp

    Poisson Equation :

    2=

    q

    pnN

    DN

    A

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    Resistivity vs. doping concentration

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    Drift velocity vs. Electric Field

    vD

    = E

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    Mobility vs. doping concentration

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    Mobility vs. Temperature

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    The Junction-Diode

    n

    p

    p

    n

    B ASiO

    2Al

    A

    B

    Al

    A

    B

    Cross-section of pn-junction in an IC process

    One-dimensional

    representation diode symbol

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    The junction diode

    The Junction Diode

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    The Junction-Diodehole diffusion

    electron diffusion

    p n

    hole drift

    electron drift

    ChargeDensity

    Distance

    x+

    -

    Electrical

    xField

    x

    PotentialV

    W2-W1

    0

    (a) Current flow.

    (b) Charge density.

    (c) Electric field.

    (d) Electrostatic

    potential.

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    Giunzione polarizzata

    Polarizzazione diretta --> abbassamento della

    barriera; diffusione dei portatori verso la regione

    in cui questi sono minoritari.

    Polarizzazione inversa --> incremento della

    barriera; incremento del campo elettrico nella

    regione svuotata. Bassa corrente a causa della

    ridotta concentrazione di portatori di carica.

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    Current Equation

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    Forward Bias

    x

    pn0

    np0

    -W1 W20

    pn

    (W2)

    n-regionp-region

    Lp

    diffusion

    Excess of minority carriers diffusing across the junction

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    Reverse Bias

    x

    pn0

    np0

    -W1 W20

    n-regionp-region

    diffusion

    Depletion --> increase of the fixed depletion charge

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    Diode's Models

    VD

    ID= IS(eVD/T 1)

    +

    VD

    +

    +

    VDon

    ID

    (a) Ideal diode model (b) First-order diode model

    Temperature dependence: VDon = VDon(300 K) + TC (T 300 K)

    For Silicon Junction Diodes at T ~ 300 K: TC

    = -2mV/ K

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    Reverse Breakdown

    25.0 15.0 5.0 5.0

    VD(V)

    0.1

    ID(A)

    0.1

    0

    0

    Usually requires large reverse bias (up to several hundreds of Volts) in

    conventional diodes.

    Zener Diodes: intentionally designed in order to obtain low breakdown

    voltage (good voltage generator).

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    The PN junction as a solar cell

    Photo-generated carriers surviving recombination and separated by the junction

    field contribute a negative current -IL that (approximately) superimposes to the

    conventional I-V characteristic.

    M.A. Green, Solar Cells, Univ. South Wales.

    S

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    PN junction solar cell

    M.A. Green, Solar Cells, Univ. South Wales.

    S

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    Conversion Efficiency

    Efficiency requires:

    large open-circuit voltage VOC

    Low saturation current IS (dark I-V charact.)

    Large short-circuit current ISC

    Low IS --> low recombination rates

    Large ISC --> small band-gap (downside: energywasted into heat generation).