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May 2013 Issue

AVS Recognition forExcellence inLeadershipAVS Recognition forExcellence inLeadership Presentedto Nava Setter andLeisl Folks

Save the DatePacific Rim Symposiumon Surfaces, Coatings,& Interfaces (PacSurf2014) Symposium HighlightsAVS 60th InternationalSymposium &Exhibition Nothing MattersIs Your Message Clear?The Vocabulary ofSurface ChemicalAnalysis - Vocabularyand Terminology Publication Highlights Surface ScienceSpectra Editor Update

Enhancing TopicalDrugs: New StudyImages Fatty AcidPenetration intoHuman Skin

Membership Highlights

Vacuum TechnologyDivision Shop NoteAward 2012

AVS Has a NewStudent Chapter-Rensselaer PolytechnicInstitute

2013 Election Slate

Conference Reports29th North AmericanMolecular BeamEpitaxy Conference(NAMBE 2012)

AVS Recognition for Excellence in Leadership

AVS Recognition for Excellence in Leadership Presented to Nava Setter andLeisl Folks

The AVS Membership Committee is recognizing Nava Setter (EPFL, Switzerland) andLiesl Folks (Dean, School of Engineering and Applied Sciences, University at Buffalo - SUNY) for Excellence in Leadership. The AVS seeks to recognize individuals who notonly excel in science and/or engineering, but who also, through mentoring, haveenhanced the careers of future generations who might not otherwise have consideredor had access to opportunities in science, engineering, and technology. Theirleadership in the effort to develop fully the world's human resources is critical to thebest scientific and engineering progress. Recipients of this honor will have their profiledisplayed on the AVS Website, featured in this Newsletter and will receive acertificate of recognition. Click here for eligibility & nominations criteria. Interview with Nava Setter As the recipient of the AVS Excellence in LeadershipRecognition, Nava Setter, opens her interview withsome commentary on being a role model: "When appointed as a professor 24 years ago, Irealized that this came with academic as well aspersonal expectations to "inspire" others. As a woman engineer there has always been a "rolemodel" expectation. How can an ordinary person whois reasonable, honest, and not inclined to illusionsrealistically fulfill these expectation? I do attribute tomyself another role-to serve as a successful exampleproving that ordinary people can accomplish theirdreams. One does not have to be an exceptional person in order to have fulfilling life.What matters is to have dreams and the desire and persistence to realize them. I stillhave to keep reminding this myself too: There are still many dreams to fulfill." Q: Tell us how you have become a materials engineer?A: I always had a clear vision on what I am going to be, but this vision still keepsevolving: At the age of 12, I wanted to be a teacher in a detention center for youthin social difficulty. I had this desire based on own experience, that with appropriateguidance one can become self-motivated to acquire knowledge and that self-teachingis the most interesting way to study. This plan was replaced by a new one when I moved to secondary school and startedreading regularly the daily newspapers; then I wanted to become a secret agent, tohelp bring home to Israel Jews who were held in prisons in Syria and Iraq. Then itwas time to select the study stream for high school. I chose the physics/mathematicsorientation because I considered it more challenging than humanities studies. Ibelieve seeing it as more challenging stemmed from the fact that only very few girlstook it (embedded gender bias...no doubt). When university time arrived, my heart wanted physics but my mind told me to bepragmatic; to do interesting physics one would need to do first a Ph.D., and Idoubted my capacity for this. An engineer could practice her profession withoutadvanced degree. It was the idea of being able to design large structures that mademe chose Civil Engineering. Already during my Masters studies I realized that

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2013 InternationalConference onFrontiers ofCharacterization andMetrology forNanoelectronics

ICMCTF InternationalConference onMetallurgical Coatingsand Thin Films (ICMCTF2013)

Spring 2013 Meeting ofthe Hudson MohawkChapter

Upcoming Events

Surface Analysis 2013June 5-7, 2013Urbana, IL PEC 2013June 18-21, 2013Raleigh, NCWebsite 21st InternationalConference on IonBeam AnalysisJune 23-28, 2013 Seattle, WAWebsite IVNC 2013July 8-12, 2013Roanoke, VAWebsite

ISSP2013July 10-12, 2013Kyoto Research ParkKyoto, JapanWebsite ALD 2013July-28, 31, 2013San Diego, CAWebsite 21st InternationalSymposium on PlasmaChemistryAugust 4-9, 2013Cairns, AustraliaWebsite IVS 2013 September 30, 2013Herzliya, Israel Website

PacSurf 2014December 7-11, 2014

understanding the meaning of things and turning this understanding into somethinguseful is what really drives me. I asked myself what makes matter stick together intoa solid-and studied cements towards improving their mechanical behavior. Later on, during my Ph.D. studies, I turned my interest into electrical properties ofmatter -for the simple reason that it is easier to measure precisely electricalproperties, as the available equipment for electrical measurement are very sensitive.After completion of my studies, moving between various departments and faculties(civil engineering, physics, chemistry, and solid state science) and some work in R&Din a research institute, I was appointed professor of materials engineering, and foundthat this profession matched perfectly my background and interests. I am entirely fascinated by this profession: It is so broad, encompasses reallyeverything 'material', from 'bio' to 'energy' and from 'nano'to large structures, fromthe fundamental to the applied, including physics, chemistry, and every branch ofengineering, an ideal profession for individualists. I like also the complex name"materials science and engineering," which for me represents the development ofunderstanding of nature (science) and the making something useful out of it(engineering). Q: Choose one word you feel explains you best.A: Commitment. Only recently I have realized that it is a very strong sense ofcommitment that drives me to invest a lot of energy even in tasks I find boring. If Isaid I'd do something, I cannot even imagine not doing it-I can't help it. Q: Favorite quote?A: There are many quotes and poems which display an essential truth in concise orpoetic ways and by which I am touched and inspired. A poem that comes to my mindin this very moment is Ithaka by Constantine P. Kavafy, telling that the road is notless important than the final destination. "When you set out for Ithaka Ask that your way be long, full of adventure, full ofinstruction...." Q: If you could leave one piece of advice for our future generations, whetherit is science related or not, what would it be?A: On my 50th birthday I've asked myself what I am missing in life, and embarkedon an entirely new road that resulted in the creation of a high school in a remote,rural location, a school which is now, since several years, one of the top schools inscience and humanities in Tanzania. My idea was to enable talented youth to reachtheir full potential with the perspective that they will soon after contribute toimproving life conditions of their fellow people (and by this my small contribution willbe amplified). The satisfaction is enormous when I see these wonderful youngsters flourish andremember that I contributed a little to this. It also empowers me constantly, as Iknow I am capable to restart at zero again and accomplish my goals. During themany years I have been visiting the school I always felt that I get In return muchmore than I give. Humbling. It is still a very difficult project, though. Briefly, based on this, I recommend with astrong conviction that you do not hesitate to embark on a new project you dream of:Do it carefully but boldly. Everything you want to achieve can be accomplished if youare ambitious and persistent. And even if it won't end exactly the way you haveplanned it initially, it will lead you to interesting and fruitful experiences... but then.....Constantine P. Kavafy, quoted above, has already said it long ago ... And in muchmore powerful words. Read Full Interview

Interview with Leisl Folks Q: Describe a typical day in your life.A: I have a new role this year, as Dean of Engineeringand Applied Sciences at the University at Buffalo, whichis tremendously exciting. Because I am transitioningfrom industry to academia, I have a steep learningcurve, so my days are packed with meetings with keystakeholders in the university and the community. I am

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Kohala Coast, HIWebsite Event Calendar Announcements

Upcoming BoardMeetings

2013July 22, 2013 New York, New York October 27, 2013 Long Beach, California 2014January 12, 2014Santa Fe, New Mexico April 27, 2014San Diego, California August 4, 2014 New York, NY

November 9, 2014Baltimore, Maryland

Corporate Members

Advanced EnergyIndustries Inc. AJA International, Inc. Alicat Scientific, Inc. Altair Technologies, Inc. BellowsTech, LLC Capitol Vacuum Parts CeramTec North America Denton Vacuum LLC Duniway Stockroom Corp. Evans Analytical Group FMG Enterprises, Inc. Gamma Vacuum GNB Corporation Helium Leak Testing, Inc. Hiden Analytical, Inc.

Hine Automation

looking forward to figuring out my new job well enoughthat I can get back to a more measured pace! However, it is just wonderful being back in academiaagain, with the opportunity to interact with students atall levels on a regular basis, and to be surrounded bycutting-edge innovations and ideas. Q: What is your favorite part of your job?A:I'm loving all of it! The role of a Dean encompassesmany facets of academic life, touching students, staff,faculty, alumni, industry partners, and governmental partners. Trying to figure outways to help and encourage all these groups to succeed across the three missions ofTeaching, Research and Service, is at the heart of my job. In parallel, we have toensure strong coordination of all the activities to have an efficient organization. Q: Who has encouraged you throughout your career and/or life? Inspiredyou?A: My parents have been the most wonderful supporters throughout my life, and thathas been a tremendous benefit to me. Just knowing I had their support at all stageshas given me the courage to take on new challenges, and to be persistent. Likemany of their generation, they were not able to attend college after high school, butwere 100% supportive of me undertaking multiple degrees so that I could become aphysicist. Q: Did you have a mentor?A: I have benefited from great mentors at all stages in my studies and career. Themost influential has been my PhD supervisor, Prof. Robert Street AO, at theUniversity of Western Australia, who has been a tremendous mentor to me, andwhose guidance remains relevant all these decades after my graduation. He hasachieved astonishing things in his life, academically and in service roles, and all withconsummate professionalism, good humor and good grace. Q. How did you become affiliated with AVS?A: As a physicist working in the highly interdisciplinary magnetic data storageindustry, the AVS has provided a natural home for my interests. My research hasspanned from basic science to technology development to commercialization, and hasincluded magnetic materials, interfaces, and processing topics. The AVS is a greatorganization because it brings all these diverse interests together to share knowledgeand advance technology. Q: Have you always wanted to be a member? What motivated you to join?A: I guess most people, me included, quite reasonably join such organizations out ofself-interest when we are young, for the networking opportunities. But for many ofus, the motivation evolves as our careers advance, and we see and relish theopportunities to help others and build community. Read Full InterviewRead Press Release

Save the Date: PacSurf 2014

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HVS Leak Detection ION-TOF USA Inc. Kratos Analytical Kurt J. Lesker Company M&I Materials, Ltd.(Apiezon) MeiVac, Inc. MEWASA North America,Inc. MKS Instruments, Inc. Nor-Cal Products Nordiko TechnicalServices Limited Omicron NanotechnologyUSA, LLC Oxford Instruments -Austin Scientific Pfeiffer VacuumTechnology Physical Electronics Plasmaterials, Inc. Plasma-Therm PREVAC sp. z o.o. Process Materials, Inc. RBD Instruments, Inc. RF VII, Inc. RHK Technology Inc. SAES Getters USA, Inc. Scientific Instruments,Inc. Sequoia Brass andCopper SPECS Surface NanoAnalysis GmbH

Staib Instruments, Inc. Sumitomo (SHI)Cryogenics of America,Inc. Super ConductorMaterials, Inc.

Pacific Rim Symposium on Surfaces, Coatings, & Interfaces (PacSurf 2014)

December 7-11, 2014Hapuna Beach Prince HotelKohala Coast, Hawaii Website The Pacific Rim Symposium on Surfaces, Coatings, & Interfaces (PacSurf2014) is a new International Symposium on surfaces, coating, and interfaces beingorganized by a scientific advisory board that has representatives from 11 differentcountries around the Pacific Rim. Symposium attendees will interact during morningand evening sessions that will include plenary, invited, and contributedpresentations. Call for abstracts details will be available in October 2013.Symposium focus areas will include:

Energy Harvesting & StorageBiomaterial InterfacesNanomaterialsThin Films

Program Chair & Scientific Advisory Board:

Program Chair: Dave Castner (Univ. of Washington)Australia: Sally McArthurCanada: Adam HiitchcockChile: Ulrich VolkmannP.R. China: Hongjun GaoJapan: Masahiro KudoKorea: DaeWon MoonMexico: Alberto Herrera GomezNew Zealand: James McQuillanSingapore: Sam ZhangTaiwan: Jinn ChuUnited States: Joseph Greene

Symposium Highlights

AVS 60th International Symposium & Exhibition (AVS 60)

October 27-November 1, 2013Long Beach, CaliforniaWebsite

Division/Group Program

Advanced Surface EngineeringApplied Surface ScienceBiomaterial Interfaces

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Ted Pella, Inc. Thermo Fisher Scientific Trillium US U-C Components Inc. Vacuum Engineering &Materials Co., Inc. Vacuum Research Corp.

VAT Inc. VG Scienta, Inc. Join Now

40 Year Members Over the years, AVS hasrecognized 40-yearmembers of the Society atthe Awards Ceremony heldat the InternationalSymposium and Exhibition.The Forty-Year Clubconsists of current AVSmembers who have beenactive in the Society for 40years or more. AVS wouldlike to continue torecognize these members;however, to ensure that wecapture all members from1973 we ask that youplease notify the AVS officeif you or someone youknow is eligible for 40-yearstatus. Please contactAngela Klink at 212-248-0200 x221 orangela@avs.org.

AVS Online Store If you missed youropportunity to purchaseyour AVS 5K Run shirt orAVS 59 CommemorativeMug, please go to theAVS Online Store for ourcomplete selection. Staytuned for more new items.

Electronic Materials & ProcessingMagnetic Materials, Films & InterfacesManufacturing Science & TechnologyMEMS & NEMSNanometer-Scale Science & TechnologyPlasma Science & TechnologySurface ScienceThin FilmVacuum Technology

Focus Topics/Other Sessions

Accelerating Materials Discovery for Global Competitiveness Actinides and Rare EarthsAdvanced Imaging of Cell and Bacteria Interactions with SurfacesAtom Probe TomographyBiomolecules at Aqueous InterfacesSpectroscopic EllipsometryEnergy FrontiersExhibitor Technology SpotlightGraphene and Other 2D MaterialsHelium Ion MicroscopyIons at Aqueous InterfacesIn Situ Spectroscopy and MicroscopyScientific Discovery through the Materials Genome InitiativeNanoparticle-Liquid InterfacesScanning Probe Microscopy Synchrotron Analysis Transparent Conductors and Printable ElectronicsTribology

Nothing Matters

Is Your Message Clear? The Vocabulary of Surface Chemical Analysis -Vocabulary and Terminology The loss of the Mars Climate Orbiter was the result of a miscommunication-the failureto recognize that information was needed in newton seconds and not as pound-forceseconds. Although scientific advancement and technology reliability require clear andunambiguous communication, papers, reports and vendor specifications frequentlyuse terminology in inconsistent or incorrect ways. If you have ever wondered whento use 'attenuation length' rather than 'inelastic mean free path' or 'dose' rather than'fluence,' then you will appreciate access to an authoritative vocabulary. A comprehensive set of surface chemical analysis vocabulary and terminology hasbeen made available at no cost in order to help minimize some of the confusion andinconsistencies present in describing the analysis of surfaces. Developed by the ISOTechnical Committee 201, the vocabulary can be accessed through the websites offive educationally focused organizations, one of which is the AVS. It is the hope of theISO TC201 committee that making the terminology freely available as a resource forresearchers, editors, authors and reviewers will help minimize the inconsistent andsometimes contradictory uses of terminology in the literature. The ISO TC201 vocabulary, developed with considerable input from AVS membersincludes definitions of methods and important terminology for surface analysis,scanned probe methods and data treatment methods, such as multivariate analysis.The terminology is structured in two parts:

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Ti 2p photoelectron spectra acquired at a 75degree emission angle from epitaxial

TiN(001) grown in situ and Si3N4/TiN(001)bilayers grown in situ. The Si3N4 overlayerswere deposited with biases of _7, _150, and

_250 V

ISO18115-1:2010 - Surface chemical analysis - Vocabulary -Part 1, Generalterms and terms used in spectroscopy.ISO18115-2:2010 - Surface chemical analysis - Vocabulary - Part 2, Termsused in scanning-probe microscopy.

Additional information, indices of terms and access to the vocabulary can be foundthrough any of the links below:

1. http://www.avs.org/education-technical-resources.aspx 2. http://www.emsl.pnl.gov/capabilities/spectroscopy/surface_analysis/ 3. http://www.npl.co.uk/science-technology/surface-and-

nanoanalysis/research/international-standardisation-and-traceability/vocabulary-of-some-800-terms-for-surface-chemical-analysis-iso

4. http://www.aist.go.jp/aist_e/aist_laboratories/6metrology/iso.html

If you have suggestions for terms or concepts that need to be added to thesedocuments, please send them to Alex Shard (alex.shard@npl.co.uk).

Publication Highlights

Surface Science Spectra Editor Update By James Castle, SSS Editor It is a pleasure to give a mid-termmessage of good progress to thoseinterested in the development ofSurface Science Spectra. It is amoment to recall that last year the2012 Journal was complete and printversions posted to all subscribinginstitutions on the first working day of2013. We are already receivingsubmissions for the current year butwould like more - now is the time, forall those who wished to see timelypublication by this important Journal,to put it to the test! Send your SSSsubmissions now. To see an example of how XPS,through the vehicle of SSS, can helpin your research on hidden interfacessee the set of papers on the Si3N+/TiN Interface published in Volume 19. Asexplained by the authors (including my co-editor, Rick Haasch) in an Introduction tothis set, the interaction of the two materials across a prepared interface is revealedby changes in the intensity of the Ti2p satellites. The importance of charge transferacross the interface is shown dramatically in the figure reproduced below. Noticehow the satellite intensity changes with overlayer growth conditions from that of theopen TiN surface to give, eventually, a satellite peak almost as intense as thephotoelectron peak itself.

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Generalizing the importance of this set, it shows that the partial electrontransparency of thin layers can be a real advantage in understanding the behaviorof hidden interfaces - especially when combined with the additional power offeredby angle resolution. We are very happy to publish, as a set, papers on closely related properties such asthose describing interfaces and expect to have more of this type in the currentvolume.

Enhancing Topical Drugs: New Study Images Fatty Acid Penetration intoHuman Skin Article: "Studying the penetration of fatty acids into human skin by ex vivoTOF-SIMS imaging," Biointerphases2013, 8:3. Topically applied drugs, from anti-itch cream to anti-inflammatories and antibiotics,must pass through a barrier in the skin called the stratum corneum, a layercomposed of dead cells called corneocytes and a matrix of lipids, a class of naturallyoccurring molecules that includes fats, waxes, and certain vitamins. A collaborationamong Lithuanian and French researchers is using mass spectrometry imagingtechniques to better understand how the permeation of drugs through this barriermight be enhanced. "Not only topicals, but also systemically acting drugs might be enhanced for theirpenetration or permeation through the skin," says Vitalis Briedis of the LithuanianUniversity of Health Sciences. The collaboration includes Briedis' PhD student TomaKezutyte, and Alain Brunelle of the Centre National de la Recherche Scientifique(CNRS, Institute of Natural Substances Chemistry) in France. Brunelle's teamincludes co-author Nicolas Desbenoit, now at the Centre de Recherche PublicGabriel Lippman in Luxemburg. In a recent study published in AVS' open-access journal Biointerphases, theresearchers focused on four fatty acids -- oleic, lauric, capric, and linoleic -- thathave been classified as chemical penetration enhancers (CPEs). They wished toevaluate whether any of these four molecules enhanced the penetration of drugsinto layers of the skin in vitro, and then to tell whether this penetration alsoenhanced the permeation of a model drug. To evaluate the molecules' skin penetration abilities, the collaborators applied eachof the fatty acids and a control molecule to ex vivo human skin samples. They alsoapplied an antifungal drug called tolnaftate, chosen as a model for the experimentbecause its properties ensured it would diffuse through the skin's lipid barrier. Theythen imaged the penetration of the fatty acids into the skin sample using Time ofFlight Secondary Ion Mass Spectrometry (ToF-SIMS), a chemical imaging methodthat is well suited to lipid analysis but that had never before been used to visualizetopically applied fatty acids' penetration into human skin.

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The techniques showed that all four fatty acids permeated the skin better than thecontrol. However, just because the fatty acid penetrated didn't mean it took thedrug with it. "Surprisingly, the penetration of fatty acid into the skin did not present a guaranteeof improved penetration or permeation of the model drug substance," Briedis says."Thus, the effects of CPEs should be studied on a case by case basis." Of the four,oleic acid had the best performance: though it did not penetrate as well as lauricacid, it alone significantly enhanced the penetration of the model drug. It is thought that CPEs work by inserting themselves between adjacent lipidmolecules in the intercellular lipid bilayer. This rearrangement of the organization ofthe lipid bilayer "fluidizes" it, making it easier for certain drug molecules to passthrough. In the coming months, the team intends to continue to pursue transdermal drugpenetration studies using Tof-SIMS imaging. "The results of the study have provedthe applicability of the ToF-SIMS technique to study the distribution of compoundsin complex biological matrixes, including the skin," Briedis says. "We expect theapplication of ToF-SIMS will give new insights into the mechanisms affectingdelivery of drugs through the skin."

Membership Highlights

Vacuum Technology Division Shop Note Award 2012

The Journal of Vacuum Science & Technology (JVST) publishes short "how to do it"articles called Shop Notes. Each year the Vacuum Technology Division gives one ormore awards for the best Shop Notes that appear in JVST A and JVST B. The 2012Vacuum Technology Division Shop Note was awarded to: High-percentage success method for preparing and pre-evaluating tungstentips for atomic-resolution scanning tunneling microscopyJames K. Schoelz, Peng Xu, Steven D. Barber, Dejun Qi, Matthew L. Ackerman et al.J. Vac. Sci. Technol. B 30, 033201 (2012); doi: 10.1116/1.3701977

AVS Has a New Student Chapter-Rensselaer Polytechnic InstituteA new Student Chapter was approved by the Board of Directors at the April meeting:Rensselaer Polytechnic Institute. AVS started Student Chapters in 2003 to provideuniversity students tailored opportunities for career and professional development. Ifyou would like to join an existing Student Chapter or start a Student Chapter AVSwill be happy to assist. The list of current chapters are:

Dallas MetroplexFlorida International UniversityNorthwestern UniversityUCLAUniversity of Alabama at Tuscaloosa University of Central FloridaUniversity of FloridaUniversity of Illinois at Urbana-Champaign University of Washington Rensselaer Polytechnic Institute

2013 Election Slate

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President-Elect:

Ian Gilmore, National Physical Laboratory, UKIvan G. Petrov, University of Illinois, Urbana-Champaign

Clerk: Joe Greene, University of Illinois, Urbana-Champaign Treasurer: Gregory J. Exarhos, Pacific Northwest National Laboratory Directors:

Anna Belu, Medtronic Susan Burkett, The University of Alabama Timothy Gessert, National Renewable Energy Lab (NREL) John Lannon, RTI International Sally McArthur, Swinburne University of Technology, Australia Christian Mitterer, University of Leoben, Austria

Trustees:

Yves Chabal, University of Texas-DallasLynnette Madsen, National Science FoundationJoerg Patscheider, EMPA, SwitzerlandRichard van de Sanden, DIFFER, The Netherlands

Conference Reports 29th North American Molecular Beam Epitaxy Conference (NAMBE 2012)The 29th North American Molecular Beam Epitaxy Conference was held at theEvergreen Marriott Conference Resort in Stone Mountain Park, Georgia, from October14-17, 2012, with gold level sponsorship provided by Veeco, the Office of NavalResearch, Riber, and Osemi. Additional sponsors included k-Space Associates, UMC,ChemTrace, and Quantum Clean. The conference was chaired by Alan Doolittle (Georgia Institute of Technology), withGanesh Balakrishnan, (University of New Mexico) as Program Chair. More than 200attendees from 11 countries attended the conference. The plenary talk was given byAmy Liu (IQE, Inc.) on "Challenges and Opportunities for Commercial MBE," providinga realistic and encouraging view of the existing impact and future potential of MBE forindustry. Entertaining and informative invited talks were given by Darrell Schlom(Cornell University) on "Why Ruin an MBE? Reflections on a Quarter Century of OxideMBE," as well as Minjoo Larry Lee (Yale University) on Effects of Surface Orientationand Sign of Strain on Lattice-mismatched Epitaxy." The Program Committee assembled a strong technical program with 10 oral sessionsand 2 poster sessions, covering growth and devices in GaN and InGaN, antimonides,detector metals, II-VI materials, nanostructures, bismuth alloys, photovoltaics, andnovel materials, as well as characterization and MBE technology. In addition, theparticipation of 20 vendors in the exhibitor hall provided ample interactions with thefolks who make the equipment and services that we use and wish we could use. The conference banquet was held aboard areproduction Mississippi riverboat as ittoured Stone Mountain Lake, providingbeautiful night views of the carving featuredon the cover, as well as the resort andnatural areas of the park. The 2012 MBEInnovator Award was presented to DarrellSchlom (Cornell University) "for applyingMBE to the growth and customization ofoxides with atomic layer precision,integrating them with semiconductors, andemploying strain to enhance theirproperties," while the NAMBE YoungInvestigator Award went to Minjoo LarryLee (Yale University) "for outstanding

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contributions to growth of III-phosphidematerials and devices by solid-sourcemolecular beam epitaxy." Art Gossard andRod Beresford resigned from the AdvisoryBoard this year and will be missed. The conference included two lively rumpsessions, "MBE: An Extended Forecast" andanother on "Detectors and MBE, Made forEach Other?" Student awards for beststudent talks and posters were presented. Papers from the conference will be published in a special issue of the Journal ofVacuum Science and Technology B. We would like to thank Della Miller and HeatherKorff of AVS with their help organizing the conference and Nancy Schultheis andTonya Yandle of AVS for their tireless work on this special issue. The 30th NAMBE conference will be held at Banff Centre in Banff, Alberta, fromOctober 5-11, 2013, and will be chaired by James Gupta (National Research Council,Canada), with Zetian Mi of McGill University as the program chair. A two-dayworkshop is planned after the conference. For details visit www.nambe2013.com.

2013 International Conference on Frontiers of Characterization and Metrologyfor NanoelectronicsThe 2013 International Conference on Frontiers of Characterization and Metrology forNanoelectronics, held at (and co-sponsored by) the National Institute of Standardsand Technology (NIST) in March 2013, was an enormous success, bringing in ~170attendees from all over the world. The bi-yearly conference, the ninth in the series,focused on the frontiers and innovation in characterization and metrology ofnanoelectronics for semiconductor manufacturing, a $300 billion industry. Keynote talks by Mike Mayberry, VP and Director of Component Research, Intel;Naga Chandrasekaran, VP of Process R&D, Micron; and Gyeong-Su Park, Leader ofAnalytical Science Group, Samsung Advanced Institute of Technology, set the toneearly on the first day, driving home the message that metrology is critical as chipsizes shrink to 20 nm. Nearly 30 other invited talks and 70 poster presentationfollowed over the three-day event. The slides and posters from many of thesepresentations can be viewed on the conference website. A tour of the NISTfacilities preceded the event. "Audience feedback on the talks was extremely positive," stated David Seiler, Chair ofthe conference. "Many of the people I spoke with thought that this was the bestconference we've had yet and that it was very well-organized. I was pleased with thehigh quality of the invited talks and posters." The 2013 International Conference on Frontiers of Characterization and Metrology forNanoelectronics was sponsored by the National Institute of Standards andTechnology, CEA-LETI, College of Nanoscale Science and Engineering, SEMI,International SEMATECH Manufacturing Initiative (ISMI), Semiconductor ResearchCorporation (SRC), IEEE/Electron Devices Society, American Physical Society (APS),American Vacuum Society (AVS), the National Science Foundation (NSF), and FutureFab International. Gold sponsors included Jordan Valley Semiconductors Ltd.; CEA-LETI; NIST; Intel; Cameca; Metryx; and weSRCH.com. Silver sponsors includedReVeraand NanoMEGAS.

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International Conference on Metallurgical Coatings and Thin Films (ICMCTF 2013)

By Paul Mayrhofer, General Chair and Yip-Wah Chung, Program Chair The International Conference on Metallurgical Coatings and Thin Films (ICMCTF),organized by the Advanced Surface Engineering Division (ASED) of AVS, featured 12symposia (including 7 regular and 4 topical symposia) covering 36 sessions, apremier equipment exhibition, four short courses, and three focused topic sessions. The technical program contained 455 oral (including 72 invited talks) and 179 posterpresentations from more than 40 countries. Since its inception in 1974, ICMCTF hasgrown into a leading international forum for the coating and thin films community.The 40th Anniversary of ICMCTF continued the strong tradition of promoting a trulyglobal exchange of information among scientists, engineers, technologists, andmanufacturers for science and technology. We wish to express special thanks to ourpremium sponsors (Oerlikon Balzers, Elsevier, Plansee, Platit, Sulzer Metaplas, andNSF Summer Institute) that made many celebration events possible throughout theweek, including a mobile app for attendees to keep track of these events andtechnical activities. The conference opened on Monday morning with a Plenary Lecture by Professor TobinMarks, Northwestern University (USA), entitled: "Designer Materials forUnconventional Electronics". The extensive 55-booth exhibition on Tuesday and Wednesday not only offered anopportunity to gather information about the latest products and services available, italso provided a unique interface between the marketplace and the laboratory for theexchange of ideas on equipment, materials, and services. As part of the Exhibitionopening, Professor Francoise Massines, Directeur de recherché au CNRS (FR),presented the Exhibition Keynote Lecture entitled: "Atmospheric Pressure Plasmas forInline Coatings: Status and Challenges". This year's Bunshah Award Laureate was Professor William D. Sproul, ReactiveSputtering Inc. and Colorado School of Mines. Bill presented his Honorary Lecture:"40 Years of Advancement in PVD Technology" during the Bunshah Award andGraduate Student Awards convocation on Wednesday. The three ICMCTF GraduateStudent Awards were presented to Dominik Jäger (Gold), EMPA, Swiss FederalLaboratories for Materials Science and Technology, Switzerland, Manfred Schlögl(Silver), Vienna University of Technology and Montanuniversität Leoben, Austria, andD'Arcy Stone (Bronze), Southern Illinois University, USA. The subsequent awardsbuffet reception was a lively social activity to toast and honor the Awardees andcelebrate the 40th Anniversary. Nominations for 2014 are already being accepted; please visit www.avs-ased.orgfor more information on the nomination procedure. The 40th anniversary of ICMCTF was celebrated throughout the week with daily socialactivities such as the Welcome Reception on Monday evening, the ExhibitionReception on Tuesday evening and the lunchtime Friday Thank You and See You NextYear Party, supported especially by our premium sponsors. The conference proceedings will be published in the archival journals Surface andCoatings Technology and Thin Solid Films with the same rigorous reviewing processas regular papers, handled by our Guest Editors. The accepted manuscripts will beposted on these journals websites for open access to all. Mark your calendar - the 41st ICMCTF will be held April 28-May 2, 2014 at the Town& Country Hotel in San Diego, CA. In July, the Call for Papers will be available athttp://www.icmctf.org. We look forward seeing you at ICMCTF 2014!

Spring 2013 Meeting of the Hudson Mohawk Chapter By Carl A. Ventrice, Jr. Chair, Hudson Mohawk AVS Chapter The AVS Hudson Mohawk Chapter held its Spring 2013 Meeting on April 24, 2013, atthe General Electric Global Research Center in Schenectady, New York. There were 45attendees at the meeting. The meeting had both an oral presentation session and aposter session. Six talks and 15 posters were presented at the meeting.

Beneath the AVS Surface: May 2013

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The chapter gave an award for the best oral presentation and the best posterpresentation. Swatilekha Saha, who is a graduate student in the Department ofPhysics, Applied Physics, and Astronomy at Rensselaer Polytechnic Institute, won theaward for the best oral presentation for her talk entitled "Transport Through ZnPorphyrin for Application in Nanoelectronic Devices." Manasa Medikonda, who is agraduate student at the College of Nanoscale Science & Engineering at the Universityat Albany-SUNY, won the award for the best poster presentation for her posterentitled "X-ray Characterization of Ge1-xSnx Alloys and the Effect of SnConcentration on the Band Gap."

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