FEI QUANTA 400 SEM STANDARD OPERATING PROCEDURES · 2016-03-25 · DOCUMENT: FEI SEM SYSTEM OPERATING PROCEDURES Version: 1.0 3 1.0 Introduction 1.1 Scope These procedure apply to

DOCUMENT: FEI SEM SYSTEM OPERATING PROCEDURES Version: 1.0

FEI QUANTA 400 SEM STANDARD OPERATING PROCEDURES

Version: 1.0 JAN 2014

UNIVERSITY OF TEXAS AT ARLINGTON

Nanotechnology Research Center


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TABLE OF CONTENTS

1.0 INTRODUCTION……………………………………….…….…….…. 3

1.1 SCOPE ……………………………………….……….…........ 3

1.2 DESCRIPTION……………………………….…….…….….…. 3

1.3 SAFETY……………………………………..………....…… 3-4

2.0 HARDWARE..............................……………….…………….…..... 4

2.1 PROCESS GASES: N2 ……………………..…....…..….…..... 4

2.2 FEI QUANTA 400 SEM………….. ……....…….….…...……. 4

2.3 Alcatel Adixen 28G dry pump…………….………….………. 4

2.4 One computer for FEI Quanta 400 SEM…..……….….….... 4

2.5 Manual User Interface (MUI) ………………………….….….. 4

3.0 REQUIREMENTS ……..…..………………………..…..………......... 5

3.1 TRAINING ………………………….…....…..….……... 5

3.2 RESTRICTION ………………….……...…….….………….. 5

3.3 SYSTEM CHECKS …………………………………….……..... 5

4.0 OPERATION PROCEDURE …………………………..………………... 5

4.1 SYSTEM LOGIN …………………………….…........…….....5-7

4.2 XT MICROSCOPE CONTROL SOFTWARE ……………..………..7-8

4.3 SAMPLE/SPECIMEN HOLDER MOUNTING .…….…..…..……. 8-9

4.4 MAIN CHAMBER VENT AND PUMP DOWN …………….……. 9-13

4.5 IMAGING PRE-CHECKS…………………….…....……….…..13-14

4.6 OBTAINING AN IMAGE ………………………………….….14-18

4.7 STAGE CONTROL .…………..…….………………….............18

4.8 MEASUREMENT AND ANNOTATION ………………………… 18-19

4.9 OBTAINING AND SAVING AN IMAGE ………………………… 19-20


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1.0 Introduction

1.1 Scope

These procedure apply to the FEI Quanta 400 Scanning Electron Microscope (SEM) located in bay4 of the NanoFab. All maintenance should follow the procedure s set forth in the manufacturer’s maintenance and operations manuals. This document is for reference only. Personnel should be trained by authorized staff prior to operating this equipment.

1.2 Description

The FEI Quanta 400 SEM is a Tungsten filament SEM. It can produces enlarged images of a variety of specimens, achieving magnifications of over100 000x providing high resolution imaging in a digital format. This important and widely used analytical tool provides exceptional field of view and minimal specimen preparation.

1.3 Safety 1.3.1 This equipment is connected to HIGH VOLTAGE. Be very careful

and aware of electrical hazards. If you encounter any electrical malfunctions, contact NanoFab staff immediately.

1.3.2 This equipment uses AC and DC power. DO NOT operate this

machine with any component enclosures/panels open. 1.3.3 This equipment has a 30 kV acceleration voltage Tungsten

filament SEM Column. 1.3.4 This equipment may generate radiation during operation! It is

strictly prohibited to remove any cover panels, particularly those on the optics column and the specimen chamber.

1.3.5 This equipment has no emergency off (EMO) switch/button

mounted. In case of an emergency, switch off the breaker switch labelled MAINS S0 (through the hole at the cabinet back side), which is placed at the very right side in the row. An emergency would be fire, smoke, electrocution hazards, and an injury to


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anyone using this particular equipment. If the MAINS SO breaker is switch off, notify NanoFab staff immediately.

Fig 1.3.5 1.3.6 This equipment uses N2 gas which in high concentration can be

asphyxiates. The process gas is normally pumped out of the system. If the process pressure is not being maintained or the system cannot reach base pressure, notify NanoFab staff immediately.

2.0 Hardware

2.1 Process gases: N2

2.2 FEI Quanta 400 SEM

2.3 Alcatel Adixen 28G dry pump

2.4 One computer for FEI Quanta 400 SEM

2.5 Manual User Interface (MUI)

Fig 2.5


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3.0 Requirements

3.1 Training

You must be a qualified FEI Quanta 400 SEM user. To become qualified, you will need to be trained by a NanoFab staff. Once training is complete, you will be given a user id and password to access the equipment.

3.2 Restrictions

3.2.1 No biological specimen or samples

3.2.2 Always wear gloves when handling anything that goes into the system

3.2.3 Only electrically conductive tape or paint may use for sample

mounting.

3.3 System Checks

3.3.1 Check to ensure the green power button is lit. If the green power is not lit, notify NanoFab staff immediately.

Fig 3.3.1

3.3.2 Ensure that the main computer in on.

4.0 Operation Procedure

4.1 System login

4.1.1 Click the Start UI button to start xT Microscope Control software.


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Fig 4.1.1

4.1.2 Enter your 1000 user name and password.

Fig 4.1.2

4.1.3 When the xT microscope Control software is available, the

Beam Control Page displays on the screen.


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Fig 4.1.5

4.2 xT Microscope Control Software consist of the following:

4.2.1 The Title Bar – labels the application (label 1) 4.2.2. The Menu Bar – contains all operation menus and Submenus (label 2) 4.2.3 The Toolbar – contains functional icons for the

most frequently used microscope controls and for the fast access to the Pages (label 3)

4.2.4 Image Windows – image windows with adjustable Databar (label 3)

4.2.5 Pages and Modules – microscope and image

control elements organized into modules making up the pages (label 4)

4.2.6 The Preferences dialogue – pre-settings of operating conditions (label 5)


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Fig 4.2.6

4.3 Sample/Specimen holder mounting

4.3.1 Choose one of the available sample holder mounts.

4.3.2 Attach your sample onto one of the sample holder using a

conductive paint or conductive tape. If using conductive paint, ensure paint is fully degassed.

4.3.3 Seat the sample holder into the appropriate hole on the

sample holder mount.


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Fig 4.2.3

4.4 Main Chamber Vent and Pump Down

4.4.1 On the stage module page under “Coordinates” double left click on “exchange position”. This will move the stage to the sample exchange position.

Fig 4.4.1


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4.4.2 On the beam control page, click on vent.

Fig 4.4.2

4.4.3 A message dialog will appear asking the user to confirm the vent procedure. Click on “Yes” to confirm vent. It will take approximately 1 minute to vent the chamber.


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Fig 4.4.3

4.4.4 Once vented, carefully open the chamber specimen. Ensure proper clearance of the stage mount and the back of the stage to the SEM column as indicated in Figure 4.3.3.

Fig 4.3.4

4.4.5 You are now ready to mount the sample holder mount. Mount

the sample onto the center of stage using a stage bolt and appropriate hex wrench.


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Fig 4.4.5

4.4.6 Close the chamber specimen door.

4.4.7 On the beam control page, click on “pump” and press on the door for a few second.

Fig 4.4.7

4.4.8 The chamber will begin to pump down. Once the chamber is

fully pumped down the flashlight icon will turn green. This is the indicator that the chamber is pumped down.


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Fig 4.4.8

4.5 Imaging pre-checks

4.5.1 Ensure the High Vacuum mode is selected. This tool is restricted to High Vacuum mode only.

Fig 4.5.1


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4.5.2 Select the voltage relative to your specimen type (max voltage for this tool is 20kV).

Fig 4.5.2

4.5.3 Select the proper spot size (3 or 4 recommended)

Fig 4.5.3

4.5.4 Select the lowest magnification

Fig 4.5.4

4.6 Obtaining an image

4.6.1 Watch vacuum status on the lower right and ensure it is green. Click on the HV button to ramp up the High Voltage and heat up the electron source.


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Fig 4.6.1

4.6.2 At this point, the screen will display 4 quad. Click on the left Quad 1 to activate the quad. The active

Quad will have blue text in the data bar. If the image pause, press F6 to un-pause.

Fig 4.6.2

4.6.3 Activate Quad 4 by left clicking on it. From the pull down menu, select CCD and press F5. This will display a live image of the chamber and F5 toggles between single and quad image display.


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Fig 4.6.3

4.6.4 You should have a live image of your specimen in Quad 1 and a live image of the chamber is quad 4. Adjust your brightness and contrast using the MUI.

Fig 4.6.4 4.6.5 Adjust magnification, focus and stigmatism on your specimen

by using the MUI. 4.6.6 Move the stage to the highest area on your specimen by

pointing to the area of interest on your SEM image and double left click. The stage will move to the area that you have double click on. Use the live CCD image to guide your stage movement.

4.6.7 Adjust magnification, focus and stigmatism as needed.


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4.6.8 If this is a new specimen, run the Link Z to FWD function. This function will link the stage with actual working distant.

Fig 4.6.8

4.6.9 On the stage module page under “Coordinates” e nter 10 into “Z” and press “enter” on the keyboard to move the stage to 10mm working distant. 10 mm working distant will give the best image quality on most specimen.

Fig 4.6.9

4.6.10 It is highly suggested that you perform focus,


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Stigmatism and Z Link FWD as you are imaging. When you are done with imaging, turn off “HV’, vent the system and remove your sample holder. Once the sample holder is removed, pump the system back down.

4.7 Stage Control

4.7.1 X/Y movement of the stage can be done by double left click on point of interest on your SEM image. The stage will automatically move to point that you have clicked on.

4.7.2 Other controls such as tilt, z-movement and rotation can be adjusted on the stage module page.

Fig 4.7.2

4.8 Measurement and annotation

4.8.1 The system is calibrated regularly for measurement accuracy. If any user have any doubt about of measurement accuracy, please contact NanoFab staff.

4.8.2 The measurement/annotation module combines tools for

measuring and making annotations in electron images. A measurement tool, an annotation shape or a text label can be selected from the first three icons on top of the module, and then drawn in an electron image quad. All objects are sequentially indexed and displayed in the list box below icons.


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Fig 4.8.2

4.9 Obtaining and saving an image

4.9.1 An image can be obtain by left click on the “camera” icon.

Fig 4.9.1

4.9.2 Once an image has been capture, a save as page will automatically appear giving you the option the save the image file.


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Fig 4.9.2

Documents

FEI QUANTA 400 SEM STANDARD OPERATING PROCEDURES · 2016-03-25 · DOCUMENT: FEI SEM SYSTEM OPERATING PROCEDURES Version: 1.0 3 1.0 Introduction 1.1 Scope These procedure apply to