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1 EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3 rd EUVL Symposium

EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

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Page 1: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

1

EUV Exposure SystemDevelopment Plan in Nikon

Nov-4.2004

Nikon CorporationTakeshi Asami

3rd EUVL Symposium

Page 2: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Outline

• Introduction• Current Status

– Source– Optics– Coating– Contamination– Body, Stages

• Development Plan• Summary

Page 3: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Nikon Lithography Roadmap

Criticallayer

exposuremethod

CY 01 02 03 04 05 06 07 08 09 10 11 12 13 14 15 16

Technology Node hp130 hp90 hp65 hp45 hp32 hp22

DRAM Half Pitch 130 115 100 90 80 70 65 57 50 45 35 32 25 22MPU Gate in resist 90 65 53 45 40 35 32 28 25 20 18 15 13

post-etch 65 45 37 32 28 25 22 20 18 14 13 10 9

�������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������

KrF 248nm

ArF 193nm

EUV 13nm

F2 immersion157nm

EPL 100keV

immersion

January, 2004

ITRS 2003ITRS 2003

Page 4: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Nikon Strategy for Future Lithography

EUVL:NA=0.25 K1=0.59

ArF imm: NA=1.2 K1=0.28EUVL:NA=0.25 K1=0.83

45nm L/S

32nm L/S

KrF ArF immArF EUVL

EUVL for 45nm technology node

EUV1 (Process Development Tool) E/2006

EUV2 (HVM) (E/2008)

Page 5: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

• Introduction• Current Status

– Source– Optics– Coating– Contamination– Body, Stages

• Development Plan• Summary

Page 6: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Source

Basic requirements for EUV1 arePower at IF : ≧10WRepetition Rate : ≧5KHzEtendue : ≦5.5mm2sr

StatusCurrent status of the source suppliers are close to

our basic requirements.

ChallengesCollector mirror life timeReasonable CoO

Page 7: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

IU and PL Design

Illumination Optics

The illumination optics using 2 reflective optical integrators (fly-eye mirrors) were designed.

Projection Optics

EUV1 PO design was completed.

NA=0.25 Magnification=4X Field size=26X33mm

High stiffness multi-barrel structure

Stress free mounting mechanism

6DOF fine adjustment mechanism

Page 8: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Aspheric mirror for the PO

Polishing Technologies

Computer controlled small tool polishing (STPM)

Magneto Rheological Figuring (MRF)

Ion Beam Figuring (IBF)

Elastic Emission Machining (EEM)  (Tool not available)

Metrologies

      High repeatability Interferometer

Challenges

Improve LSFR,MSFR, and HSFR simultaneously

Polishing and metrology of the peculiar shape mirror

Page 9: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Surface error data

Polishing tool Interferometer

Polishing and Metrology are inseparablePolishing and Metrology are inseparable

Page 10: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

High Repeatability Interferometer

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��������������������������������������������������������������������������������������������������������������������������������������������������������������������������������������

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��������������������������

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CCD

Null Lens

Test mirror

Reference lens

Isolated base

Activevibrationdamper

Laser

Stage

Chamber

Small air fluctuationHigh performance Interferometer unit

Stress free mirror mounting Vibration reduction

Supported by NEDO

Page 11: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

History of the optics for EUV tools

HiNA#1 HiNA#2 HiNA#3 EUV1 EUV2

(2008)2002 2004 20062001

WFE=0.9nmFlare=7%

WFE=1.9nmFlare=25%

WFE=7.5nmFlare=N/A

2 mirrors systemNA=0.3

6 mirrors systemNA=0.25

New mounting technologyNew PDI system

New polishing technology

Page 12: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Figure error data of the HiNA set-3 optics

N/A0.10

0.200.170.32

0.34

0.250.250.66

0.52

N/AN/A0.110.180.200.25M20.090.100.130.170.140.28M1Set-3

0.130.250.340.220.55M1Set-2

0.23

0.1mm 10µmHSFR

0.330.400.66M2

1µmφ1mmZ36RawMSFRLSFR

We successfully reduced LSFR, MSFR and HSFR compared with set-2.

MSFR, which strongly affects the flare, was substantially reduced.

Unit: nm rms

Page 13: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

PSD curve and calculated flare of Set-3 optics

PSD curve Calculated flare

1.E-02

1.E+02

1.E+06

1.E+10

1.E+14

1.E-09 1.E-07 1.E-05 1.E-03 1.E-01

f (nm^-1)

PSD

(nm

^4)

PSD curves  M1  M2

f (nm-1)

PSD

(nm

4 )

0

5

10

15

20

25

30

35

40

0 0.2 0.4 0.6

MSFR(nm rms)

Fla

re(%

)

7% Set-3

25% Set-2

Page 14: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

HiNA set3 PO Apparatus and WFE map

1.21.9Set-2

0.740.90Set-3

Zernike 36-fitRaw data

Measured wavefront error

Unit: nm rms

M2 mirror

Flange

Mirror mounts

Support ring

PO apparatus

Page 15: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Coating

Tools and Technologies

Ion Beam Sputtering system (IBS)

DC magnetron sputtering system (RMC)

Status

High Reflectivity over 70% has been achieved

Precise stress control has been developed

Challenge

Precise thickness distribution control for large mirror

Page 16: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Doubly stacked Multi-layer

0 0.2 0.4 0.6 0.8 1

+2000

+1000

0

−1000

Γ

Stre

ss [M

Pa]

−377−73.5

(−1077)

+294

+619

(+1686)Mo 250nm

Si250nm

doubly stacked(total 175pairs)

The doubly stacked multilayer exhibited a small stress of –6.0MPa.The doubly stacked multilayer exhibited a small stress of –6.0MPa.

substrate

tens.

compr. −σ1

+σ2

, t1

, t2

reflective block

stress-compensation block

−6.0

“doubly stacked” Mo/Si

Com

pres

sive

T

ensi

le

Page 17: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Doubly stacked Multi-layer

High reflectivity 67% was achieved.

12.5 13.513 14Wavelength [nm]

Ref

lect

ivity

[%]

80

70

60

50

40

30

20

10

0

21°70.2%

17°68.8%

Doubly stacked Mo/SiMulti-Layer(175 pairs with low stressof –6MPa)

Mo/Si Multi-layer(50 pairs with large stress of–377MPa)

測定値

Page 18: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Wave Front Sensor

UV-VIS Wave Front sensor

Interferometer system is under manufacture

Actinic Wave Front Sensor

      POC testing has been done using EEI at Subaru-factory

Both PDI and LSI concepts are verified

Tool for 6 mirror PO is under manufacture

Challenges

Improve accuracy

Astigmatism measurement of LSI

Page 19: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Clean chamber

Experimental interferometer

Illumination chamber

Beam line

EUV Experimental Interferometer EUV Experimental Interferometer ((EEIEEI)) Supported by NEDO

Page 20: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Comparison between PDI and LSI acquired by EEIComparison between PDI and LSI acquired by EEI

Both data are well matched. Supported by NEDO

Page 21: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Contamination ControlMitigation

Oxidation : Capping layer

Carbon deposition : EUV+O2 or UV+O2 cleaning

Status

Complete installation of contamination test tool inSuper-ALIS (NTT)

Start study for H2O dependence on carbon/oxidation inNew Subaru (UoH)

Start UV+O2 cleaning test

Challenges

Further understanding for the contamination mechanism

Systemization

Supported by NEDO

Page 22: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

ApparatusApparatus

source

foldingmirror

samplemirror

LL

monochrom

atic light

Irradiationchamber

Zr filter

PD

Super-ALIS beam-line & Apparatus @Atsugi

Supported by NEDO

Page 23: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Body,Stages and Sensors

Vacuum compatible subsystems of the EPL, and novelcontrol system of the Optical Lithography system can beused for the EUVL exposure system.

Vacuum body technologyScanning stage technology.Reticle and wafer loading systemVacuum environmental system.Wafer alignment system.Wafer auto-focus system.

StatusThese subsystems are under design.

Page 24: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Dual Pod Concept by Canon and Nikon

RSPRSP

• Reticle in Cassette(CFP) in Carrier(RSP).• Cassette protects the reticle in loadlocks.• Top cover is similar in function to ASML’s dome

cover, but stays with reticle during in-tool handling.• Reticle remains in CFP in library to protect against

vacuum accidents and contamination.

ReticleReticle

Cassette (CFP)Cassette (CFP)

Top coverTop cover

Bottom coverBottom cover

Page 25: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

• Introduction• Current Status

– Source– Optics– Coating– Contamination– Body, Stages

• Development Plan• Summary

Page 26: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Collaboration

Nikon develops EUVL with more than ten companies and organizations.Nikon gratefully acknowledges METI and NEDO for their support.

Nikon

EUVACanon

KomatsuGigaphoton

Ushio

ASET

Partner companies

UniversitiesLaboratory

Aspheric mirrorContamination Control

Actinic WFS

HiNA set3 POFlare evaluation

Body, StagesReticle handling

Coating

Page 27: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

EUVL Development Plan

Q1 Q2 Q3 Q4 Q1 Q2 Q3 Q4 Q1 Q2 Q3 Q4 Q1 Q2 Q3 Q4 Q1 Q2 Q3 Q4

EUVA Tool Project

EUVA Metrology Project

HiNA-3 Process development at ASET

EUV1basic dvlp. EUV1tool dvlp.

EUV2 basic dvlp. EUV2 Tool dvlp.

CY2007CY2003 CY2004 CY2005 CY2006

Page 28: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Risks

Body,Stages

Contamination

WFS

Coating

Aspheric mirror

IU & PO Design

Source

TimingTechnical

There is no high risk item ( ) on the table.

Page 29: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

Summary

• Source for EUV1 will be available by our required date.• Expected power at IF is 10W and TP is around 5-10WPH.• IU and PO optics have been designed.

– NA=0.25 Magnification=1/4 Field=26x33mm• HiNA set3 PO was successfully completed as the path

finder to the EUV1 PO.• Metrology tools are under manufacture.• High reflective Mo/Si coating with low stress was achieved.• Irradiation tests using SR will be started.• Body and stages are under design.

We plan to develop the EUV1 by the end of 2006. Developments are on going, and there are no major technical

issues so far.

Page 30: EUV Exposure System Development Plan in Nikon · EUV Exposure System Development Plan in Nikon Nov-4.2004 Nikon Corporation Takeshi Asami 3rd EUVL Symposium. ... (STPM) Magneto Rheological

END

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