Upload
nishi
View
44
Download
2
Embed Size (px)
DESCRIPTION
Design of Capacitive Displacement Sensors for Chip Alignment. Jose Medina Professor N. McGruer. Outline. Introduction Displacement sensors Capacitive sensors FEM simulations Readout circuit Scaled models Experiments Conclusions. Introduction. Approach Assemble Alignment Transfer. - PowerPoint PPT Presentation
Citation preview
Center for High-rate Nanomanufacturing
Design of Capacitive Displacement Sensors for Chip Alignment
Jose Medina
Professor N. McGruer
Center for High-rate Nanomanufacturing
Outline
1. Introduction2. Displacement sensors3. Capacitive sensors4. FEM simulations5. Readout circuit6. Scaled models7. Experiments8. Conclusions
Center for High-rate Nanomanufacturing
Introduction
Approach
1. Assemble
2. Alignment
3. Transfer
2
Center for High-rate Nanomanufacturing
Introduction
• Requirements– Accuracy to nm– Cost effective– Fast– Compatible
• Fabrication• Electronics• Actuator (nanopositioner)
– Variable gap– Connections to only
one side
Center for High-rate Nanomanufacturing
Displacement Sensors
Criteria Probe-based Optical Thermal Capacitive
Accuracy + + + + +/+ + +/+ +Range - /+ + + +/+ + +/+ +Speed + + - +Fabrication - -- + + + +Electronics integration + - + + + +Parasitic forces - /+ + + -/+ --Power consumption +/+ + -/+ + + +
A. A. Kuijpers, ‘Micromachined Capacitive Ling-Range Displacement Sensor for Nano-
positioning of Microactuator Systems’, PhD thesis, Universiteit Twente
Center for High-rate Nanomanufacturing
Capacitive sensors
Capacitive sensor literature– Widely used
• Drug delivery, temperature/humidity sensors, automotive, positioners
– No sensor moves in two dimensions
‘Modeling and Optimization of a Fast ResponseCapacitive Humidity Sensor’, Tetelin
‘Perspectives on MEMS in Bioengineering: A NovelCapacitive Position Microsensor’, Pedrocci
Center for High-rate Nanomanufacturing
Capacitive sensors
Electrodes on substrate and template
Center for High-rate Nanomanufacturing
Capacitive sensor
C=Q/V=f(geometry)
Chip alignment: connections only on one electrode
gnL
dx
dC
g
xwnL
g
AC overlap 1
~
-6 -4 -2 0 2 4 60
0.2
0.4
0.6
0.8
1
1.2x 10
-4
displacement [um]
capa
cita
nce
[pF
/um
]
analytical and numerical capacitance
C13 analy
C23 analyC12 analy
C12//(C13 s C23) analy
C13 numer
C23 numerC12 numer
C12//(C13 s C23) numer
Center for High-rate Nanomanufacturing
Capacitive sensor
Complete system
Equivalent circuit
Center for High-rate Nanomanufacturing
Capacitive sensor
Cantor set geometry– First level
– Second level
– Third level
-80 -60 -40 -20 0 20 40 60 80 100
1.57
1.58
1.59
1.6
1.61
1.62
x 10-4
displacement [um]
capa
cita
nce
[pF
/um
]
filtered output capacitance, 3x3x3x3 model, g=20 um
-4 -3 -2 -1 0 1 2 3 40.8
1
1.2
1.4
1.6
1.8
2
displacement [um]
capa
cita
nce
[pF
]
three groups, bottom substrate glass, g=0.1um
Center for High-rate Nanomanufacturing
Capacitive sensor
Central fractal geometry
– First level
– Second level
– Third level
gnL
dx
dC 1
Center for High-rate Nanomanufacturing
FEM simulations
Numerical method2
2
1CUW
v
ni
ielemkkkkk
elem
iiziyixvEEEdvEW
1
2222
,,,2
1
2
1
6
5
4
3
2
1
34
24
23
14
13
12
234,6
224,6
223,6
214,6
213,6
212,6
234,2
224,2
223,2
214,2
213,2
212,2
234,1
224,1
223,1
214,1
213,1
212,1
..
....2
1
W
W
W
W
W
W
C
C
C
C
C
C
UUUUUU
UUUUUU
UUUUUU
UE
U
02
A. Hiekes, SIEMENS; Baxter, Capacitive Sensors
Center for High-rate Nanomanufacturing
FEM simulations
Modeling scenarios• Closed system
• Open boundary– Natural boundary condition
– Trefftz domain
– Infinite elements
ANSYS, Inc
Center for High-rate Nanomanufacturing
FEM simulations
-4 -3 -2 -1 0 1 2 3 40
0.5
1
1.5
2
2.5
3
3.5x 10
-3
displacement [um]
capa
cita
nce
[pF
/um
]
capacitance simulations g=0.1 um
c12c13
c14
c15
c23c24
c25
c34
c35c45
-3 -2 -1 0 1 2 3
0
1
2
3
x 10-4
displacement [um]
capa
cita
nce
[pF
/um
]
capacitance simulations g=0.1 umc12c13
c14
c15
c23c24
c25
c34
c35c45
Center for High-rate Nanomanufacturing
FEM Simulations
Models– Doped Si substrates– Glass top substrate– Glass bottom
substrate
-4 -3 -2 -1 0 1 2 3 40.5
0.6
0.7
0.8
0.9
1
1.1
1.2
1.3
1.4
1.5x 10
-3
capa
cita
nce
[pF
/um
]
3x3x3x3 electrodes g=0.1 um
wired susbtrates
glass bottom subsglass top subs
5 conductors
Center for High-rate Nanomanufacturing
Readout Circuit
Converter– transforms a signal to another more convenient
Voltage applied at capacitor
dt
dVCgAC
dt
dVV
dt
dgAC
dt
CVd
dt
dQiC ),(),(
)(
)cos())sin(( tACtAdt
dCiC
Center for High-rate Nanomanufacturing
Readout circuit
Alignment precision and converter performance
Circuits– Oscillator– AC-bridge– Transimpedance amplifier
– Switched-capacitor
– Sigma-Delta modulator
BWGBW
CCTK
VC
amp
psB
inrms )(
)2(21min
]/[2
min HzFdCdv
vC
o
nrms
BWf
GBWeC
f
KTC
VC
s
ampnT
s
T
inrms
)2)((122
min
Center for High-rate Nanomanufacturing
Readout circuit
Transimpedance amplifier
Synchronous demodulator
Low pass filter
fso RIV
)sgn( inino VVV
ininout VsRC
RCV
RCs
CssV
1
1
1
1)(
Center for High-rate Nanomanufacturing
Readout circuit
Switched-Capacitor Amplifier
sf
so
fo
ss
VC
CV
CVQ
CVQ
2
1
φ2
φ1
Center for High-rate Nanomanufacturing
Readout circuit
Sigma-Delta modulator
Cap-to-digital converter based on SC modulator
Center for High-rate Nanomanufacturing
Scaled Models
Scaled models
– How do and C scale with geometry?
dxdC
Cx
/min
min
w
wwxx
g
nLw
xxw
wxx
w
g
nL
CC
CCCfC ijout
4
22
22)(
22
1312
1312
minx
g
nL
dx
dC
x
out
0
Center for High-rate Nanomanufacturing
Scaled Models
Theoretical accuracy
Scaled models
''
'),,,()',',','( minmin n
n
L
L
g
gngLwxngLwx
n
n
L
L
g
ggLnwCgLnwC outout
''
'),,,()',',','(
nL
gCx
minmin
Center for High-rate Nanomanufacturing
Experiments
Two PCBs – Large w/g ratio
• Max accuracy?
– Small w/g ratio• Geometry performance?
Large w/d ratio Top board Bottom board
Trace width 0.12’’ 3.048 cm 0.25’’ 6.350 cm
Separation traces 0.12’’ 3.048 cm 0.47’’ 11.938 cm
Separation groups
0.36’’ 9.144 cm
Short w/d ratio Top board Bottom board
Central group
(mm)
Width 0.03’’ 0.762 0.06’’ 1.524
Spacing traces 0.03’’ 0.762 0.03’’ 0.762
Spacing subgroups 0.09’’ 2.286 0.12’’ 3.048
Lateral group
(mm)
Width 0.15’’ 3.81 0.3’’ 7.62
Spacing traces 0.15’’ 3.81
Spacing groups 0.45’’ 11.43 0.54’’ 13.716
Center for High-rate Nanomanufacturing
Experiments
Setup– Stage– PCBs– Readout circuit
• AD7745
– Connectors, wires– Computer
Center for High-rate Nanomanufacturing
Experiments
Results: large feature board
0 5 10 15 20 25 30
4
5
6
7
8
9
10
11
12
13
displacement [mm]c
ap
ac
ita
nc
e [
pF
]
simulation and experiments gap 1 mm
experiment a
experiment bsim 1mm
sim1.5 mm
0 5 10 15 20 25 30 35
-1.8
-1.6
-1.4
-1.2
-1
-0.8
-0.6
-0.4
-0.2
displacement [mm]c
ap
ac
ita
nc
e -
C(d
isp
l=0
) [p
F]
simulation and experiments gap 1 mm
experiment a
experiment bsim 1mm
sim1.5 mm
• Experiments greater capacitance
• Sim and experiments same profile• Experiments different results
1.6 1.8 2 2.2 2.4 2.6 2.8
15.975
15.98
15.985
15.99
15.995
16
16.005
16.01
displacement [mm]
ca
pa
cit
an
ce
[p
F]
experimental results, gap 1 mm
• Accuracy – 5fF (specs 4fF)– 0.1mm (calculations 2 μm)
• Sim/exp results further for long displacements
0 5 10 15 20 25 30 35 40-0.5
-0.45
-0.4
-0.35
-0.3
-0.25
-0.2
-0.15
-0.1
-0.05
0
displacement [mm]c
ap
ac
ita
nc
e -
C(d
isp
l=0
) [p
F]
simulation and experiments
experiment 3 mmsim 3 mm
experiment 6 mm
sim 6 mm
experiment 12 mmsim 12 mm
Center for High-rate Nanomanufacturing
Experiments
Results: small feature board• Cap increases with displacement!• Similar profiles• Good performance
at short gap• Min largest gap
3mm (u=0.762 mm)
0 5 10 15 20 25 30 35 40-1.2
-1
-0.8
-0.6
-0.4
-0.2
0
0.2
displacement [mm]
ca
pa
cit
an
ce
[p
F]
central fractal test board
exp g 1 mm
exp g 2 mmexp g 3mm
exp g 4mm
sim g 1mm
sim g 2 mmsim g 3 mm
sim g 4 mm
Center for High-rate Nanomanufacturing
Conclusions
Simulations– DC capacitance
• Ground close than at infinite• 5 electrodes + stage
– Sim/exp further for large gaps• Cap to stage dominant
– Variations between experiments• Plates not parallel, gap varies
– Increase cap with displacement• C13 and C23 decrease • C12 dominant, board ‘perturbs’ E
Center for High-rate Nanomanufacturing
Conclusions
Sensor design suggestion– Central fractal geometry– Width depends upon min/max gap
• Min: g/w < 1/3 for last level to take over, ideally <1/10• Max: g/w < 1 to avoid instabilities
– Capacitor width w, #levels u
– Chip 15x15 mm sq sensor 0.5x0.5 mm sq
153 nuw
Center for High-rate Nanomanufacturing
Conclusions
Min feature size 1 um 1 um 0.1 um 1 um
w strip-group 1 1-3 um 1-3 um 100-300 nm 1-3 um
w strip-group 2 1-15 um 1-15 um 0.1-1.5 um 1- 291 um
w strip-group 3 5-75 um 5-75 um 0.5-7.5 um 0.1 – 1.5 mm
w strip-group 4 25-375 um 25-375 um 2.5-37.5 um
w strip-group 5 0.125-1.875 mm 12.5-187.5 um
w strip-group 6 0.0625-0.9375 mm
Max gap 25 um 0.1 mm 1 mm 0.1 mm
Min gap 20 nm 20 nm 10 nm 20 nm
Max gap 25 um 0.1 mm 1 mm 0.1 mm
#sets n 5 7 9 49+2
Xmin scaled 240 nm 34 nm 26 nm 5.8 nm
Xmin calculated 4.8 nm 0.68 nm 0.53 nm 0.11 nm
Center for High-rate Nanomanufacturing
Thank you for you attention
Acknowledgments– Advisor: Professor McGruer– Professors: Adams, Busnaina, Muftu,
Papageorgious, Sun – Students: Prashanth, Juan Carlos Aceros,
Peter Ryan, Andy Pamp, Siva, Harris Mussolis
Center for High-rate Nanomanufacturing
Capacitive sensors
Definition Capacitance
g
A
V
QC
s
Conductor a
Conductor b
Vs
+ + + + + + + + + + + + + + + + + + + + + + + + + + +
+ + + + + + + + + + + ++
+
- - - - - - - - - - - - - - - - - - - - - - - - - - - - -
e-
Q
Q
E
dt
dVCgAC
dt
dVV
dt
dgAC
dt
dQiC ),(),(
Center for High-rate Nanomanufacturing
FEM Simulations
Convergence
0 20 40 60 80 100 1200.94
0.95
0.96
0.97
0.98
0.99
1
1.01
1.02
1.03
nodes per surface electrode
capa
cita
nce(
node
s)/c
apac
itanc
e(5
node
s)
convergency, 3x3 model, g=0.1 um
c12c13
c14
c15
c23
c24c25
c34
c35
c45cout
Center for High-rate Nanomanufacturing
Center for High-rate Nanomanufacturing
sf
so
fo
ss
VC
CV
CVQ
CVQ
2
1
• Sampling phase (φ1 on, φ2 off)• Charge-transfer phase (φ1 off, φ2 on)
ssfss CVCCVQ )00()0(1
Switched-Capacitor amplifier
φ2
φ1
fofos CVCVCQ )0()00(2
Center for High-rate Nanomanufacturing
Correlated Double Sampling
• Sampling phase
)0())(())((1 osfosinosin VCVVCCVVCCQ
• Processing phase
)()0)(()0)((2 osoutfosos VVCVCCVCCQ
inf
out VC
CnV
2
Center for High-rate Nanomanufacturing
Simulations switched-capacitors
Time (ms)
V (volts)
Center for High-rate Nanomanufacturing
Bandwidth switched-capacitors
-60
-50
-40
-30
-20
-10
0
Mag
nitu
de (
dB)
109
1010
1011
1012
1013
1014
1015
-90
-45
0
Pha
se (
deg)
Bode Diagram
Frequency (rad/sec)
Ao=1e3, Cp=Cf/10
Ao=1e3, Cp=Cf
Ao=1e3, Cp=Cf*10
Ao=1e5, Cp=Cf/10
Ao=1e5, Cp=Cf
Ao=1e5, Cp=Cf*10
212 CVA
VC
A
VC
A
VQ o
op
oo
1)(
o
o
o
oo
s
sA
ss
sAsA
2
21
2
21
C
CCC
sC
CCCsA
pp
op
oo