Upload
others
View
8
Download
0
Embed Size (px)
Citation preview
CHANDA workshop on target preparation –the needs and the possibilities
Goedele Sibbens
E-mail: [email protected]
Paul Scherrer Institute, Villigen
23-25 November 2015
2
Target preparation and characterization at JRC-IRMM
Goedele Sibbens, André Moens, David Vanleeuw, David Lewis, Ananda Sagari Arcot Rajashekar,
Yetunde Aregbe
Goedele SibbensResponsible Target Preparation [email protected]
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
3
Target preparation techniques
� Molecular plating
� Vacuum deposition
� Mechanical techniques
� In-situ polymerization
Target characterization techniques
� Weighing
� Alpha-particle counting at a defined solid angle
� Combustion analysis
� Spectrophotometry
This presentation
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
4
Molecular plating
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
The method is based on the cathodic deposition
of the material onto a backing from isopropanol.
Polyacetal
Cathode
Rotating Pt anode
Stainless Steel
Stainless Steel backing holder and sealing ring
Molecular plating cell
5
238U layer
material: 99.999% 238U
method: molecular plating
deposit diameter: 30 mm
backing: 0.25 mm Al Ø 50 mm
mass 238U: 1.9 mg
areal density 238U: 265 µg.cm-2
TP2010-011-07
TP2015-007-05
U thin layer target
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
6
237Np layer
material: 237Np
method: molecular plating
deposit diameter: 30 mm
backing: 0.25 mm Al Ø 50 mm
Mass 237Np: 1.4 mg
areal density 237Np: 204 µg.cm-2
TP2010-011-07
TP2014-010-09
Np thin layer target
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
7
235U layer
material: 99.934% 235U
method: molecular plating
deposit diameter: 40 mm
backing: 0.25 mm Al Ø 60 mm
Mass 235U : 3.5 mg
areal density 235U: 279µg.cm-2
TP2010-011-07
TP2015-008-03
U thin layer target
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
Molecular plating
To produce thin layers of
U, Pu, Np, Am isotopes
Ø layer 5-60 mm
Areal density: 10-300 µg/cm2
Backing: Al Ø 10-80 mm
� G. Sibbens, A. Moens, R. Eykens, D. Vanleeuw, F. Kehoe, H. Kühn, R.
Jakopic, S. Richter, A. Plompen, Y. Aregbe, Preparation of 240Pu and 242Pu
targets to improve cross section measurements for advanced
reactors and fuel cycles, J Radioanal Nucl Chem (2014) 299:1093–1098
� L. Benedik, G. Sibbens, A. Moens, R. Eykens, M. Nečemer, S. D. Skapin, P.
Kump, Preparation of thick uranium layers on aluminium and
stainless steel backings, Appl Rad Isot (2014) 87:238-241
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
9
Heated coating material in Ta crucible
Vacuum
Vapour
Deposit
Backing mounted on a rotating carrousel
Backing
Backing holder
Mask
Thickness monitor
The method is based on the condensation
of a vaporized substance onto a backing
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015Vacuum deposition
Vacuum deposition
connection to electrodes
Ta crucible with 235UF4
diaphragm
carrouselquartz crystal
shutter
mask
backing with 235UF4 deposit
glass bell jar with metal cage
235UF4 evaporator
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
11
material: 235UF4
method: vacuum deposition
deposit diameter: 50 mm
backing: 0.25 mm Al Ø 72.9 mm
mass 235U : 6.2 mg
areal density 235U : 318 µg cm-2
TP-NP 08-65-02
U thin layer target
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
12
238UF4 evaporator (new)
Vacuum deposition
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
13
material: 238UF4
method: vacuum deposition
deposit diameter: 30 mm
backing: 0.25 mm Al Ø 50 mm
mass 238U : 0.8 mg
areal density 238U : 114 µg cm-2
TP2010-011-07
TP2015-014-12
U thin layer target
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
material: 238UF4
method: vacuum deposition
deposit diameter: 30 mm
backing: 0.25 mm StSt Ø 50 mm
mass 238U : 0.3 mg
areal density 238U : 48 µg cm-2TP2015-014-15
14
� 6LiF heated in Ta crucible to 845ºC
� depos. rate 0.05 - 0.4 nm/s
� metallicLi heated in Alumina crucible
in Ta crucible heater to 600ºC
� depos. rate about 0.35 nm/s
� Au layer to provide electric conductivity
� Au heated in Ta crucible to 1064ºC
� deposition rate 0.01 - 0.05 nm/s
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015Vacuum deposition
Au evaporator
Li evaporator
15
Lithium -gold layer
material: 6LiF and Au
method: vacuum deposition
backing: 41 µg cm-2 PI foil Ø 50 mm
deposit diameter Au: 48.9 mm
mass Au: 0.8 mg
areal density Au: 43 µg cm-2
deposit diameter 6LiF: 30 mm
mass 6LiF: 0.1 mg
areal density 6LiF: 14 µg cm-2
TP2010-011-07
TP2015-012-02
Li-Au thin layer target
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
16
� C57H110O6 heated in Ta crucible to 60ºC
� deposition rate 0.1 - 1.5 nm/s
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015Vacuum deposition
Tristearin evaporator
new evaporatorhome-made
in construction phase
17
tristearin layer
material: C57H110O6
method: vacuum deposition
deposit diameter: 25 mm
backing: 0.1 mm Ta Ø 35 mm
mass C57H110O6 : 36 mg
areal density C57H110O6 : 7213 µg cm-2
TP2010-011-07
TP-NP 07-26-07
Tristearin target
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
18
10B evaporator
� 10B heated by bent electron
beam in Cu crucible to 2076ºC
� depos. rate 0.02 - 0.05 nm/s
Vacuum deposition
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
Vacuum deposition
To produce thin layers of 235U and 238U
Ø layer 5-60 mm
Areal density: 10-300 µg/cm2
Backing: Al, StS, PI foil Ø 10-80 mm
� G. Sibbens, A. Moens, D. Vanleeuw, R. Eykens, S. Oberstedt, Multi-
layer 235UF4-6LiF-Au targets for high-resolution fission fragment
measurements, Appl Rad Isot (2014) 87:229-232
� G. Sibbens, A. Moens, R. Eykens, Preparation and sublimation of
uranium tetrafluoride for the production of thin 235UF4 targets, J
Radioanal Nucl Chem (2015) 305:723-726
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
Vacuum deposition
To produce thin layers of 6LiF, natLiF, 7LiF, metLi, Au, C57H110O6 and 10B
Ø layer 5-80 mm
Areal density: 10-300 µg/cm2
Backing: Al, Ag, Au, StS, Si, Ta, PI foil Ø 10-130 mm
� D. Sapundjiev, A. Dean, U. Jacobsson, K. Luyckx, A. Moens, G. Sibbens,
R. Eykens, Y. Aregbe, Preparation and characterisation of thin film
nuclear targets for neutron physical measurements, Nucl Instr
Meth A 686 (2012) 75–81
� D. Vanleeuw, D. Sapundjiev, G. Sibbens, S. Oberstedt, P. S. Castiñeira,
Physical vapour deposition of metallic lithium, J Radioanal Nucl
Chem (2014) 299:1113–1120
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
Mechanical techniques
Rolling foilsmaterial: Al, other metalsthickness 1.0 – 0.05 mm
Drawing wiresmaterial: Al alloysØ 1.0 – 0.5 mm
Punching discsmaterial: metals, thickness < 0.3 mmØ 1 – 100 mm
Pressing powdersTotal mass by weighing: readability 10 µg
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
22
Punching discs of metals
with thickness < 0.3 mm and diameter 1-100 mm
Drawing wires of Al alloys
with diameter 1.0-0.5 mm
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015Mechanical techniques
23
Preparation of alloys by arc-melting
Rolling foils of Al or other metalswith thickness 1.0-0.05 mm
Mechanical techniques
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
Pb -7.5% In
Na disc prepared by cutting, pressing, mechanical rolling and punching
Pressing of powder compacts
Mechanical techniques
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
Hydraulic press in glove boxHydraulic press
S pellet Ø30mmPress force 200kN
25
Preparation of powder pellets with an hydraulic press
Fume dust pelletin an Al cup
Mechanical techniques
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
Pressing of powder compacts
positioning of the Al cup in the matrix
Mechanical techniques
Canning powder in Al container
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
27
Polymerization
Preparation of polycondensate solution1,2,4,5 - benzenetetracarboxylicdianhydrid + 4,4‘ – diaminodiphenyletherin N,N' – dimethylformamide(dry atmosphere!)
Polymerization 12 min at 350ºC
covering the glassplates with polycondensatesolution
transfer of polyimide foil onto ring
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
To produce thin polyimide foils
Ø 10-90 mm
Areal density: 20-500 µg/cm2
�mechanically strong
�excellent resistance to
- irradiation with charged particles
- temperature
- chemicals
�not commercially available at thickness of interest
� G. Sibbens, K. Luyckx, A. Stolarz, M. Jaskóła, A. Korman, A. Moens, R.
Eykens, D. Sapundjiev, Y. Aregbe, Quality of polyimide foils for
nuclear applications in relation to a new preparation procedure,
Nucl Instr and Methods in Physics Research A 655 (2011) 47–52
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
Polymerization
29
Thickness, diameter and mass determination
Characterisation
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
Microbalancemax 52 g d=0.001 mg
� Thickness and diametercaliper: readability 10 µmmicrometer: readability 1 µm
� Massweighing: readability 1 µg
At IRMM
� Thermal ionization mass spectrometry
(actinides)
� Atomic force microscopy (stable)
� Scanning electron microscopy (stable)
30
Activity measurement by low-geometry alpha-particle counting
LG2LG3
Detector
diaphragm
Ø 20mm
Actinide target
50 200 mm
Detector
diaphragm
Ø 17mm
Actinide target
16
37
mm
LG2
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015Characterisation
Homogeneity measurement of thin actinide layers
by low-geometry alpha-particle counting
Characterisation
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
32
reflection mode
transmission mode
Characterisation
Thickness measurement of
polyimide foils by
photospectrometry
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
33
Combustion analysis
with CHN analyser (Elementar Vario EL III)
� Sample weighing and calibration
� Percentage of element content of C, H and N
Oxidation: C,H,N
Reduction: NO x �N2
Adsorption
Measurement:
N2, H2O and CO2
Characterisation
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
Characterisation
� Weighing
� Alpha-particle counting at a defined solid angle
� Combustion analysis
� Spectrophotometry
� J. Heyse , M. Anastasiou , R. Eykens, A. Moens, A. Plompen, P. Schillebeeckx, G.
Sibbens, D. Vanleeuw, R. Wynants, Characterization of 235U targets for the
development of a secondary neutron fluence standard, J Radioanal Nucl Chem
(2014) 299:1055–1059
� D. Sapundjiev, A. Dean, U. Jacobsson, K. Luyckx, A. Moens, G. Sibbens, R. Eykens, Y.
Aregbe, Preparation and characterisation of thin film nuclear targets for neutron
physical measurements, Nucl Instr Meth A 686 (2012) 75–81
� D. Vanleeuw, G. Sibbens, A. Plompen, Determination of the hydrogen content of
thick tristearin layers prepared by physical vapour deposition, J Radioanal Nucl
Chem (2015) 305:957-962
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
35
Customers
� IRMM GELINA and Van de Graaff accelerator
� CHANDA
� EUFRAT
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
36
Thank you for your attention !
PSI VilligenCHANDA workshop
on target preparation23-25 November 2015
Goedele SibbensResponsible Target Preparation [email protected]