Supplementary Materials

Tailoring nanostructured Ni-Nb metallic glassy thin films by substrate

temperature

W. Yaoa, Q.P. Caoa,b,*, S.Y. Liua, X.D. Wanga, H.J. Fechtb, A. Caronc, D.X. Zhangd, J.Z.

Jianga,*

a International Center for New-Structured Materials (ICNSM), School of Materials

Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic

of Chinab Institute of Functional Nanosystems, Ulm University, Albert-Einstein-Allee 47, Ulm

89081, Germanyc School of Energy, Materials and Chemical Engineering, Korea University of

Technology and Education , Cheonan 31253, Republic of Koread State Key Laboratory of Modern Optical Instrumentation, Zhejiang University,

Hangzhou 310027, People's Republic of China

*Corresponding authors. Tel.: +86-571-8795-2107; fax: +86-571-8795-1528.

E-mail address: caoqp@zju.edu.cn (Q.P. Cao); jiangjz@zju.edu.cn (J.Z. Jiang)

Fig. S1. (a) XRD pattern and (b) HRTEM image (inset: the upper-right images were

the corresponding SAED patterns) of 823 K-deposited Ni-Nb thin film. (c) The XRD

patterns of 773 K-deposited and 823 K-deposited Ni-Nb films after annealing at 573

K, 723 K and 823 K for 1 h. (d) Typical nanoindentation load-depth (P-h) curve for

Ni-Nb MGTFs deposited at 823 K.

Fig. S2. (a) Top-surface SEM image, (b) cross-sectional SEM image, (c) two-

dimensional AFM image, (d) three-dimensional AFM image of 823 K-deposited Ni-

Nb MGTFs with RMS roughness of about 2.0 nm. The inset in (b) and (c) is the

corresponding statistics histograms of the column size distribution in cross-section

morphology and the particle size distribution in two-dimensional AFM images,

respectively.

Fig. S3. Typical SEM images, elemental mappings and EDS spectra of Ni-Nb MGTFs

deposited at (a) 773 K and (b) 823 K, respectively.

Fig. S4. (a) The refractive index n, (b) extinction coefficient k, (c) theoretical

reflectivity Rt and (d) the experimental reflectivity R of 823 K-deposited Ni-Nb

MGTFs in the visible light wavelength range from 400 nm to 800 nm.