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Array Detectors. S W McKnight and C A DiMarzio. Focal Plane Arrays. Imaging Systems. H R Runciman, Thermal Imaging, CRC Press. Scanning vs. Staring Arrays. Scanning Systems Point detector or linear array with scanning optics Less complicated detector Calibration easier - PowerPoint PPT Presentation
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Array Detectors
S W McKnight and C A DiMarzio
Focal Plane Arrays
Imaging Systems
H R Runciman, Thermal Imaging, CRC Press
Scanning vs. Staring Arrays• Scanning Systems
– Point detector or linear array with scanning optics– Less complicated detector– Calibration easier– Scanning system expensive, fragile– Fast detector
• Staring Arrays– Multiple detectors elements to capture pixels of image– Less complicated optics (lighter, smaller, no moving parts)– Longer integration time to increase sensitivity– Need multiplexer for signal read-out
• Charge-Coupled Devices (CCD’s) – Charge transfer and collection– Easier processing, less interconnects
• CMOS– Individually addressed and processed pixels – Less power– No loss in tranfer
N-Channel FET Structure
Channel Length1 to 10 m
B, Body
n+ n+
S, Source G, Gate D, Drain
P-Type Material
SiO2 Insulator20-100m
Channel: 2 to 500 m into page
NMOSMetal-Oxide-Semiconductor
Energy Band Picture of MOSFET(No Bias—Flatband)
z
E
Ef
Metal (Al or Poly-Si)
Oxide (SiO2)
Semiconductor (p-Si)
Ec
Ev
Energy Band Picture of MOSFET(Positive Gate Bias)
z
E
Ef
Metal (Al or Poly-Si)
Oxide (SiO2)
Semiconductor (p-Si)
Ec
Ev
Va
Фb1
Фb2
MOSFET Carrier Reconfiguration (Depletion Bias)
z
E
Ef
Metal (Al or Poly-Si)
Oxide (SiO2)
Semiconductor (p-Si)
Ec
Ev
Va
Фb1
Фb2
Depletion Region
Creation of Depletion Layer and Inversion Channel
• Depletion layer forms within 1μs after bias is applied
• Inversion channel created by thermally generated carriers in ~ 1 s
• For times short compared to 1 s, non-equilibrium situation with depletion region and empty channel.
• Carriers created by optical absorption or external injection can be stored in well for many ms.
Carrier Injection
z
E
Ef
Metal (Al or Poly-Si)
Oxide (SiO2)
Semiconductor (p-Si)
Ec
EvVa>Vt Depletion
Region
Ef
Optical Injection Vo-Vi
Current Injection
Charge-Coupled Device (CCD)
Channel Length1 to 10 m
B
S G D S D
B
~10 m X nRows
Charge Transfer in CCD
J Allison, Electronic Engineering Semiconductors and Devices, McGraw-Hill
Streetman & Banerjee, Solid State Electronic Devices, Prentice-Hall
Focal Plane Arrays
• Monolithic Technology– Detector and read-out CCD on same chip– Parallel processing (lower cost)– Improved ruggedness– Lower performance – Lower yield
• Hybrid Technology– Detector and read-out fabricated separately and bonded– Single-device processing (more expensive)– Thermal mismatch– Choice of material for better performance
• HgCdTe for IR detector• Silicon for CCD
Hybrid Technology
H R Runciman, Thermal Imaging, CRC Press
Hybrid Focal Plane Array
J L Miller, Principles of Infrared Technology, Van Norstrand Reinhold
Array Interconnects
J L Miller, Principles of Infrared Technology, Van Norstrand Reinhold
Platinum-Silicide Schottky Detectors
Streetman & Banerjee, Solid State Electronic Devices, Prentice-Hall
PtSi Si
EB~0.22 eV ↔ λ=5.6 μ
hν
PtSi Array Detectors
• Low quantum efficiency (~1%)
• Mid-Wave IR detection (1-5μ)
• Long integration time (~1/60 s)
• Good sensitivity ~0.05o C
• Compatible with Si technology
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