12._15301600_The Inspection of Patterned Sapphire Substrate_Semicon Taiwan 2011

8/3/2019 12._15301600_The Inspection of Patterned Sapphire Substrate_Semicon Taiwan 2011

1/15

CONFIDENTIALPrecision Instrument Co., Ltd.

The Inspection of Patterned Sapphire Substrate (PSS)

AFM: Atomic Force MicroscopeAOI: Automated Optical Inspector

TEL:+886-26557010#802

Mobile:0920881161

www.fpic.com.tw


2/15


PWPhotolithography

Eching Epi

check

scratch

check

PR loss

check

PSS loss defect

AOIfull wafer scan

check

roughnesscheck

PR sizecheck

PSS size profile angle

AFMSampling 1~5 point(s) wafer

AFM probe

Inspection of PSS


3/15


For PSS Size, Why AFM?

1.5m

3m

2.7m

0.3m

sharp

peak

Problem1: diffraction limit = = = 0.3m

Problem2: Optical Resolution or Digital Resolution?!

Optical Methods: Confocal, Interferometer

0.61

N.A.

0.61 (0.4m)

0.8

PSS image by a typical optical method

PSS image by SEM

SEM Problems: wafer breaking, vacuum.


4/15


sensor

laser

cantilever

sample

Horizontal scanner

height

Working Principle of AFM


5/15


Specialized AFM for PSS

2.Statistical results, more accurate!

1.Auto pattern recognition!

4.Auto profiling and measurement!

3.Statistical results, more accurate!


6/15



For 2 and 4

For PSS and PR Non-destructive

Repeatability: 3 8nm

Calibrated by NIST-certified standard

High speed robot loading/unloading/sorting

Flat-top detection

Automatic reportingAutomatic multi-site measuring

Z-resolution: ~0.1nm

XY-resolution: ~10nm

XYZ-range: 15 m

Probe duration: ~1000 frame

Scan time: 80s /frame

(10 m, 512 pixel)2


7/15



PR Wet Etching NPSS


8/15


Functions of AOI

original image

pattern loss

auto image process

processed image

contaminationdefect identification,defect classification,defect statistics.


9/15


Working Principle of AOI

Control and

Image Process

Unit Thermal stability of cameraQuality of lens

Uniformity of illumination

Steady speed of robot

Vibration isolation

Auto focusing

Image process algorithms


10/15


High Resolution: for R&D


11/15


Low Resolution: for Mass Production

Result: pattern loss and contamination


12/15


Result Map

Results of AOI

Result Table

Configurable items:

Pass/Fail rules

Size range

Sensitivity

pattern loss contamination

< 7 m2 10 22

7~21 m2 5 5

21~70 m2 2 0

>70 m2 1 0

Total 336m2

=48units

224 m2

=32 units

Result Pass Pass


13/15


Performance Index of AOI

A B C

Taiwan

Resolution 3.5 m

1.4 m

0.7 m

2.5 m 7 m 3.5 m

1.4 m

0.7 mThroughput

(wafer/hour)

199 @ 3.5 m

137 @ 1.4 m

37 @ 0.7 m

~100 ~300 310 @ 3.5 m

140 @ 1.4 m

40 @ 0.7 m

Price $$$$$$ $$$$ ? !


14/15


Conclusion

Force Precision Instrument (Booth 2883) :

1. AFM and AOI technology by ourselves.

2. Own technique, patents, and the fastest service.

3. Technical support: training and suggestion.

4. Development and creativeness abilities.


15/15


Thanks for your attention!

Documents

12._15301600_The Inspection of Patterned Sapphire Substrate_Semicon Taiwan 2011