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COST Workshop Barcelona June 2013
Presenter NameFunction in the Action (MC Member/Substitute, WG Member, Participant, External Expert) / Email addressAffiliation / CoPhil MartinNon-COST Partner
CSIRO Australia
CARBON BASED NANOMATERIALSFOR GAS SENSING
CSIRO MATERIAL SCIENCE AND ENGINEERING
Phil Martin, Lakshman Randeniya, Avi Bendavid
Lindfield, Sydney NSW
Australia
CarbonCarbon--Based Nanomaterials for Gas SensingBased Nanomaterials for Gas Sensing
Workshop Barcelona 20 June 2013Workshop Barcelona 20 June 2013
COST Workshop Barcelona June 2013
Vertically aligned MWCNTsVertically aligned MWCNTs
1. MWCNT yarn sensorsMWCNT yarn sensors
3. GrapheneGraphene
2. SWCNT sensorsSWCNT sensors
COST Workshop Barcelona June 2013
Carbon nanotube yarns for environmental gas
sensing applications
Vertically aligned
MWCNTs
Carbon nanotube yarns
COST Workshop Barcelona June 2013
Advantages of carbon nano tubes
Gas adsorption capability, Large specific surface area, High sensitivity,Low operating temperature
Advantages of carbon nanotube yarns
Functional surface availableMechanically robust structuresEasy to functionalise and handleCan be used as a simple chemiresistor
Growth of Vertically Aligned MWCNTs
COST Workshop Barcelona June 2013
95% Helium &
5% Acetylene
@580 sccm
Fe catalyst
Al2O3 layer
SiO2 buffer layer
Si substrate
Aligned CNT
Forest
Structure for ethylene pre-cursor
Quartz reactor tube
Silicon wafer with 5 nm Fe
catalyst layer
Furnace @~ 680 centigrade
COST Workshop Barcelona June 2013
Schematic of web formation
~20 m
(undensified)
sensor
CNT Yarn Properties
COST Workshop Barcelona June 2013
Data for CNT YarnsElectrical Conductivity (S/cm):
Singles yarn ~300
Density/(g/cm3):
Singles yarn ~0.8
Modulus/GPa: (Singles 24 twist)
~100
Strength/GPa: (Singles 24 twist)
~0.92
Toughness/(J/g):
Singles Yarn ~14
Twofold Yarn ~20
No creep:
>20 h at 6% strain (~50% breaking strain)
Knots do not degrade tensile strength:
Retain flexibility/strength :
after heating in air at ~450C
when immersed in liquid N2
Comments and comparisons Electrical Conductivity/(S/cm):
Graphite CF: ~167 3333
Density/(g/cm3):
Graphite CF ~1.8
Modulus/GPa:
Graphite CF ~300
Strength/GPa:
Graphite CF ~3
Toughness/(J/g)
Graphite CF ~12
Solution-spun SWNT/PVAyarns ~600
Knots degrade tensile strengthsof most textile fibres
COST Workshop Barcelona June 2013
Keithley Picoammeter
Mass Flow
Controllers
Gas Cell (mini-16 CF, 60 cm3)
Dry N2
Test Gas (H2, NH3, CH4, NO2)
CNTY sensor
Gas exhaust
Gas Sensing
Cell
Gas inlet
Functionalization of the Yarns
COST Workshop Barcelona June 2013
P-type semiconductor (500 600 Scm-1)
Surface treatments (create active sites)
Plasma and acid methods
Introduce various functional groups
(Carboxylic, N-, S-), and defects (oxygenated
vacancies, pentagon-heptagon pairs etc.)
Incorporation of metal nano clusters
(improves specificity)
Sputtering techniques
Electrochemical techniques (self-
fuelled electrodeposition, SFED)
Pulsed-DC PECVD system used for
surface functionalisation
COST Workshop Barcelona June 2013
Decoration with Au enhances the sensitivity (factor of 5 8)Mechanism is unclear; could be related to the modulation of the Schottky barrier
Ammonia Sensing with Au-decorated CNT yarns
CNTY Surface Treatment
12 | COST Workshop Barcelona June 2013
NH3 : Stability and recovery dependent on surface treatment
0 10000 20000 30000
240
270
300
0 3000 6000 9000 12000222
224
226
228
230
232
Acid-treated
Ar/H2-plasma-treated
NH3 off
10 min
R
e
s
i
s
t
a
n
c
e
(
o
h
m
)
Time (s)
5 min
NH3 on
Plasma
treated
NH3
500 ppm
50 ppm
CNTY Surface Treatment
13 | COST Workshop Barcelona June 2013
0 500 1000 1500 2000 2500
540
550
560
570
580
500 ppm
100 ppm
50 ppm
on
R
e
s
i
s
t
a
n
c
e
(
o
h
m
)
Time (s)
10 ppmoff
0 6000 12000 18000380
384
388
392
396
400
On500 ppb
1 ppm5 ppm
50 ppm
R
e
s
i
s
t
a
n
c
e
(
o
h
m
)
Time (s)
500 ppm
Off
Plasma-treated sample
Quick response
Good recovery
Low concentrations
Reproducible
Acid-treated sample
Quick response
Long or no recovery
Low concentrations
Non-reproducible
NH3
CNTY Surface Treatment
14 | COST Workshop Barcelona June 2013
Particle sizes 10 20 nm
Sparsely distributed
Acid-treated sample Plasma-treated sample
Dual populations
Sparse 10-20 nm
Dense and uniform 2 -3 nmDiffusion out of smaller particles easier ??
Hydrogen detection using Pd and Pd-Pt coated yarns
(low concentrations)
COST Workshop Barcelona June 201315 |
Addition of Pt layer enables the detection of lower concentrations
0 2000 4000 6000 8000
0.0
0.2
0.4
0.6
0.8
0 2 4 6 8 10 120.0
0.2
0.4
0.6
0.8
1.0
R
/
R
0
*
1
0
0
Time (s)
20 ppm
40 ppm 100 ppm
[H2 ]1/2
(ppm)1/2
R
/
R
0
*
1
0
0
0 2000 4000 6000 8000 10000
0.0
0.2
0.4
0.6
0.8
0 2 4 6 8 10 120.0
0.3
0.6
R
/
R
o
*
1
0
0
100 ppm9 ppm
Time (s)
ON
OFF
5 ppm
R
/
R
0
*
1
0
0
[H2]1/2
(ppm1/2)
Pd Only Pd-Pt layered structureH2
CNTY: Pd and Pd-Pt nanostructures
COST Workshop Barcelona June 201316 |
Pd: Sparse Pd populations Pd-Pt: Dense Pd populations
CNTY:Pd and Pt distributions on yarn
COST Workshop Barcelona June 201317 |
PtPt
PdPd
Pt is dispersed particulates on larger Pd grainsPt is dispersed particulates on larger Pd grains
Hydrogen detection using Pd-Pt-coated
(higher concentrations in air)
COST Workshop Barcelona June 201318 |
Excellent response times and recovery timesExcellent response times and recovery times
0 500 1000 1500 2000 2500
0
1
2
3
4
1
0
0
*
R
/
R
0
Time (s)
.04%
1%
2%3% 4%
0.5%
0.1%
CNTY
Hydrogen detection using Pd and Pd-Pt-coated
CNT yarns
COST Workshop Barcelona June 201319 |
Work function of Pd and lattice parameters are sensitive to hydrogen
Room-temperature detection
Concentrations from 20 ppm to 2 % (20,000 ppm) are detectable with Pd-
MWCNT-yarn chemiresistor
Concentrations from 5 ppm to 2 % (20,000 ppm) are detectable with Pt-Pd-
MWCNT-yarn chemiresistor
Excellent response times and recovery times are obtained
Flexible, robust and simple chemiresistor systems
CNTY: Summary
COST Workshop Barcelona June 201320 |
CNT yarn has potential to be used as gas sensors
Robustness
Easy handling
Easy to functionalise
Room-temperature operation
SFED method is a quick and reliable method for incorporating nanocrystaline metals (onto semi-conducting and conducting substrates)
Particle size has a significant impact on the recovery of NH3 and hydrogen sensors
Addition of Pt on Pd increases sensitivity at low concentrations
SWCNT
COST Workshop Barcelona June 201321 |
SEM diagram showing thinly-spread bundles of
CNT on a mesoporous alumina membrane. The
resistance ( ~ 3 mm x 5 mm) ~ 1.6 M under
ambient conditions.
Raman shift for original (without ultrasonic
treatment) and ultrasonic-treated
samples. The increase in D peak intensity
with respect to that of G peak is attributed
to the increase in defects caused by
ultrasonic treatment.
COST Workshop Barcelona June 2013
Keithley Picoammeter
Mass Flow
Controllers
Gas Cell (mini-16 CF, 60 cm3)
Dry N2
Test Gas (H2, NH3, CH4, NO2)
Graphene/SWCNT
sensor
Gas exhaust
Gas Sensing
Cell
Gas inlet
Water
bubbler
SWCNT
COST Workshop Barcelona June 201323 |
Two modes of response of SWCNT/Al2O3 chemiresistors to water vapour.
(a) response change with time when a chemiresistor equilibrated under ambient conditions is introduced into the chamber under dry air flow. The
resistance first drops due to drop in humidity (mode 2 response) and then rises slowly as the water molecules come off (mode 1 response).
(b) Mode 2 responses of the chemiresistor to injections of water (by diverting a fraction of buffer gas flow through an enclosed bubbler) which
temporarily raise the humidity in the chamber to the levels marked.
Mode Mode --22--FastFast
Water molecules donate Water molecules donate
electrons to pelectrons to p--type type
conductor. When removed conductor. When removed
conductivity increasesconductivity increases
Mode Mode --11--SlowSlow
More tightly bound water molecules donate holes More tightly bound water molecules donate holes
When slowly removed conductivity decreasesWhen slowly removed conductivity decreases
SWCNT
COST Workshop Barcelona June 201324 |
Scheme used for NO2 measurements using water-assisted recovery
NO2
Humidity raised (50-75%)
at this point
Vapour off and system
returns to the baseline
c
o
n
d
u
c
t
a
n
c
e
SWCNT: substrate effect
COST Workshop Barcelona June 201325 |
recovery time
tR (= t1 + t2)
~ 10 min
AlAl22OO33
Free standing Free standing
filmfilm
NO2
55 mins 5 ppm
Dry air only
No residual
effect on
recovery
15 mins
SWCNT
on
COST Workshop Barcelona June 201326 |
(a) repeated detection of 5 ppm NO2 using SWCNT deposited on Si wafer with natural oxide layer
(SWCNT/SiO2 chemiresistor). Chemiresistor is exposed to NO2 for 5 min Water-enriched airflow is
maintained for 5 min in each case before reverting to dry airflow. (b) Measurement of different
concentrations of NO2 with 3-min exposures in each case followed by water-assisted recovery. A
SWCNT/Al2O3 chemiresistor was used. -Inset to (b) shows a response versus log concentration
curve.
SiO2
Al2O3
NO25 ppm
SWCNT
on
COST Workshop Barcelona June 201327 |
Detection of ammonia using a SWCNT/Al2O3- chemiresistor; the response is calculated as a percent increase in conductance. (a) Repeated
detection of 50 ppm with water-assisted recovery time (tR) of about 15 minutes when humidity is raised to ~ 75 %; (b) partial and very
slow recovery in dry air; (c) detection of 5 ppm and 500 ppb using the same method. In all cases 5-minute exposure to ammonia used
except for the detection of 500 ppb where a longer exposure time was used.
NH3
Al2O3
SWCNT: humidity effect on different substrates
COST Workshop Barcelona June 201328 |
Lower humidity to achieve recovery.
50% of the buffer gas was diverted
through water bubbler. Relative
humidity in the chamber rose to 52 %
Detection of 5 ppm NO2 using
SWCNT on amorphous TiO2substrate
TiO2Al2O3
NO2
Graphene
COST Workshop Barcelona June 201329 |
SEM images of sections
of chemiresistors used
for gas detection
(a), (c) preparations in
pure water
(b), (d) preparations in
nitric acid
Whatman Anopore
membranes (~ 50 nm
diameter pores) were
used as substrate.
H2OHNO3
Graphene
COST Workshop Barcelona June 201330 |
TEM images of (a) graphene flakes obtained from pure water dispersion (b) graphene
nanomesh obtained from nitric acid dispersion. Schematics of NO2 adsorption on
graphene flakes and graphene nanomesh flakes are shown below the corresponding
TEM images.
water HNO3 nn-- typetypepp-- typetype
Graphene
COST Workshop Barcelona June 201331 |
TEM and HRTEM images of
graphene obtained from HNO3acid dispersions and schematic
interpretation of structures. (a) A
section of regular TEM and (b) to
(d) are HRTEM images of areas
marked as 1, 2 and 3. (e) - (g) are
schematic representations of the
corresponding HRTEM images.
Graphene sensor: enhanced recovery using water vapour
COST Workshop Barcelona June 201332 |
0 1000 2000 3000 4000 5000 6000 7000-10
-5
0
5
10
15
20
0 1000 2000 3000 4000 5000 6000 7000
0
5
10
Time (s)
H2O off
1
0
0
*
G
/
G
0
NO2 on
NO2 off, H2O onb
NO2 off
NO2 on
a 5 mins NO2 5 ppmVery slow
recovery
5 mins NO2 x 5
+ H2O purging
Recovery
dramatically
reduced
NO2
58% RH
1% RH
pp--type responsetype response
Graphene: HNO3-treated
COST Workshop Barcelona June 201333 |
0 1000 2000 3000 4000 5000 6000-40
-30
-20
-10
0
10
20
NO2 on1
0
0
*
G
/
G
0
Time (s)
NO2 on
NO2 off, H2O on
H2O off
NO2 off
baseline
The response of HNO3-treated graphene chemiresistor to 5 ppm of NO2 (5 min exposure). The conductance decreases in
response to NO2 exposure confirming that acid-treated graphene behaves as an n-type semiconductor. There is an upward drift
in baseline (marked by a dashed line) after each run. Four consecutive measurements are shown.
5 ppm NO2
nn--type responsetype response
Graphene: HNO3-treated
COST Workshop Barcelona June 201334 |
0 1000 2000 3000 4000
-30
-20
-10
0
10
0 2000 4000 6000 8000 10000-12
-8
-4
0
4
8
Time (s)
EtOH off
NH3 off,EtOH on
1
0
0
*
G
/
G
0
NH3 on
b
NH3 off
NH3 on
aNH3 off, H2O on
H2O off
NH3 on
Effect of H2O
Effect of EtOH
NH3
1 ppm 10 min
5 ppm
Dry air only
Graphene
COST Workshop Barcelona June 201335 |
A schematic of a plausible mechanism of NO2removal from graphene flakes influenced by
water vapour. The strong adsorption of NO2on graphene is due to overlap of molecular
states (M) and substrate defects states (S)
near the Fermi level (EF ) with the conduction
band (CB) of graphene. When water
molecules are introduced, the electrostatic
forces causes a movement of substrate
defects states and the strong overlap
between NO2 orbitals with that of graphene
is lost.
Wehling et al Appl. Phys. Lett. (2008) 93, 202110
Graphene
COST Workshop Barcelona June 201336 |
1000 1500 2000
5000
10000
15000 HNO3-treated graphene layer film
I
n
t
e
n
s
i
t
y
(
a
r
b
.
u
n
i
t
s
)
Raman Shift (cm-1)
15851342
1579
1346
Non-treated graphene layer film
Raman spectra for graphene. The increase in ID/IG ratio in the nitric-acid-
treated samples is further evidence for increased defects in the structure
Summary
COST Workshop Barcelona June 201337 |
MW-Carbon nanotube yarns: simple robust sensor
with enhanced response when acid-etched and
coated with nanoparticles
SWCNT recovery can be dramatically accelerated
by using water vapour purging
Graphene response is enhanced by acid treatment
to form nanomesh structures. Water vapour
accelerates recovery
CSIRO MATERIAL SCIENCE AND ENGINEERING
Dr Phil Martin
Telephone +61 2 9413 7126email [email protected]
Thank You