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1 微細化による特性への影響 松田順一 平成26年度 集積回路設計技術・次世代集積回路工学特論資料 本資料は、以下の本をベースに作られている。 Yannis Tsividis, Operation and Modeling of the MOS Transistor Second Edition,McGraw-Hill, New York, 1999.

微細化による特性への影響 - el.gunma-u.ac.jpkobaweb/lecture/2014-07matsuda-5.pdf · Yannis Tsividis, Operation and Modeling of the MOS Transistor Second Edition,McGraw-Hill,

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  • 1

    Yannis Tsividis, Operation and Modeling of the MOS Transistor Second Edition,McGraw-Hill, New York, 1999.

  • 2

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    CLM: Channel Length Modulation

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    *Y. A. Elmansy and A. R. Boothroyd, A Simple two-dimensional model for IGFET operation in the saturation region,

    IEEE Transaction on Electron Devices, vol. ED-24, pp.254-262, 1977.

  • 10

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    Vol. 40, pp.86-95, 1993.

  • 17

    TV

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  • 18

    IDS vs.VGS

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  • 19

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  • 20

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  • 21

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  • 22

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  • 24

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    * L. A. Akers, et. al., Characterization of the inverse-narrow-width effect,

    IEEE Transaction on Electron Devices, vol. ED-34, pp. 2476-2484, 1987.

  • 25

    N+N+

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  • 26

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  • 27

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  • 28

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  • 29

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  • 30

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  • 31

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  • 32

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  • 34

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  • 35

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  • 36

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  • 37

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  • 38

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  • 40

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  • 43

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  • 44

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  • 45

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  • 46

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  • 47

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  • 48

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  • 53

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  • 55

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  • 61

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